IL98646A - A light-sensitive resin containing a history of quinondiazide and preparations containing it - Google Patents

A light-sensitive resin containing a history of quinondiazide and preparations containing it

Info

Publication number
IL98646A
IL98646A IL9864691A IL9864691A IL98646A IL 98646 A IL98646 A IL 98646A IL 9864691 A IL9864691 A IL 9864691A IL 9864691 A IL9864691 A IL 9864691A IL 98646 A IL98646 A IL 98646A
Authority
IL
Israel
Prior art keywords
substituted
cresol
composition
substrate
molecular weight
Prior art date
Application number
IL9864691A
Other languages
English (en)
Hebrew (he)
Other versions
IL98646A0 (en
Original Assignee
Ocg Microelectronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ocg Microelectronic Materials filed Critical Ocg Microelectronic Materials
Publication of IL98646A0 publication Critical patent/IL98646A0/xx
Publication of IL98646A publication Critical patent/IL98646A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
IL9864691A 1990-06-29 1991-06-27 A light-sensitive resin containing a history of quinondiazide and preparations containing it IL98646A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/545,702 US5145763A (en) 1990-06-29 1990-06-29 Positive photoresist composition

Publications (2)

Publication Number Publication Date
IL98646A0 IL98646A0 (en) 1992-07-15
IL98646A true IL98646A (en) 1994-02-27

Family

ID=24177219

Family Applications (1)

Application Number Title Priority Date Filing Date
IL9864691A IL98646A (en) 1990-06-29 1991-06-27 A light-sensitive resin containing a history of quinondiazide and preparations containing it

Country Status (5)

Country Link
US (1) US5145763A (de)
EP (1) EP0468227A1 (de)
JP (1) JP2617381B2 (de)
CA (1) CA2045917C (de)
IL (1) IL98646A (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5413894A (en) * 1993-05-07 1995-05-09 Ocg Microelectronic Materials, Inc. High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
JP3393919B2 (ja) * 1993-06-15 2003-04-07 住友化学工業株式会社 カラーフィルター形成用ポジ型レジスト組成物
US5589553A (en) * 1995-03-29 1996-12-31 Shipley Company, L.L.C. Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
ES2114521T3 (es) 1996-04-23 2000-01-16 Kodak Polychrome Graphics Co Precursor de la forma para impresion litografica y su utilizacion en la formacion de imagenes por calor.
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
EP0996869A1 (de) 1997-07-05 2000-05-03 Kodak Polychrome Graphics LLC Bilderzeugungsverfahren und strahlungsempfindliche materialen
TW459162B (en) * 1997-08-01 2001-10-11 Shipley Co Llc Photoresist composition
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
DE69829590T2 (de) 1997-10-17 2006-02-09 Fuji Photo Film Co., Ltd., Minami-Ashigara Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser und positiv arbeitende Zusammensetzung für Infrarotlaser
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
JP2002207291A (ja) * 2001-01-11 2002-07-26 Toyo Gosei Kogyo Kk ナフトキノンジアジド系感光剤溶液の製造方法
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6905809B2 (en) * 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
JP3977307B2 (ja) * 2003-09-18 2007-09-19 東京応化工業株式会社 ポジ型フォトレジスト組成物及びレジストパターン形成方法
DE102004063416A1 (de) * 2004-12-23 2006-07-06 Az Electronic Materials (Germany) Gmbh Verfahren zur Herstellung einer Photoresistlösung

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (de) * 1950-10-31
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
JPS5619619B2 (de) * 1973-07-27 1981-05-08
DE2541982A1 (de) * 1975-09-20 1977-03-24 Ibm Deutschland Verfahren zur sensibilisierung eines positiv arbeitenden photoresists sowie photoresistmaterial
US4173470A (en) * 1977-11-09 1979-11-06 Bell Telephone Laboratories, Incorporated Novolak photoresist composition and preparation thereof
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4460674A (en) * 1981-01-16 1984-07-17 Konishiroku Photo Industry Co., Ltd. Posi-type quinone diazide photosensitive composition with sensitizer therefor
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4365019A (en) * 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
US4600683A (en) * 1985-04-22 1986-07-15 International Business Machines Corp. Cross-linked polyalkenyl phenol based photoresist compositions
US4684597A (en) * 1985-10-25 1987-08-04 Eastman Kodak Company Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor
US4997742A (en) * 1986-06-27 1991-03-05 Texas Instruments Inc. Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
JPH0769605B2 (ja) * 1988-02-25 1995-07-31 富士写真フイルム株式会社 感光性組成物
SG48028A1 (en) * 1988-08-10 1998-04-17 Hoechst Celanese Corp Light-sensitive novolac resins

Also Published As

Publication number Publication date
JPH04233543A (ja) 1992-08-21
US5145763A (en) 1992-09-08
IL98646A0 (en) 1992-07-15
CA2045917C (en) 1995-04-11
CA2045917A1 (en) 1991-12-30
EP0468227A1 (de) 1992-01-29
JP2617381B2 (ja) 1997-06-04

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