IL98888A - Process for the preparation of arylalkylmethylsilanes - Google Patents
Process for the preparation of arylalkylmethylsilanesInfo
- Publication number
- IL98888A IL98888A IL9888891A IL9888891A IL98888A IL 98888 A IL98888 A IL 98888A IL 9888891 A IL9888891 A IL 9888891A IL 9888891 A IL9888891 A IL 9888891A IL 98888 A IL98888 A IL 98888A
- Authority
- IL
- Israel
- Prior art keywords
- formula
- halogen
- preparation
- iii
- hal
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000002360 preparation method Methods 0.000 title claims abstract description 7
- 150000002367 halogens Chemical class 0.000 claims abstract description 9
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 8
- UWGIJJRGSGDBFJ-UHFFFAOYSA-N dichloromethylsilane Chemical compound [SiH3]C(Cl)Cl UWGIJJRGSGDBFJ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 3
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 3
- 125000004438 haloalkoxy group Chemical group 0.000 claims abstract description 3
- 125000001188 haloalkyl group Chemical group 0.000 claims abstract description 3
- 125000004995 haloalkylthio group Chemical group 0.000 claims abstract 2
- 239000002904 solvent Substances 0.000 abstract description 8
- 150000004791 alkyl magnesium halides Chemical class 0.000 abstract description 2
- 150000004792 aryl magnesium halides Chemical class 0.000 abstract description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 28
- 150000004795 grignard reagents Chemical class 0.000 description 14
- 239000000047 product Substances 0.000 description 12
- 239000007818 Grignard reagent Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 239000012043 crude product Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WVUYYXUATWMVIT-UHFFFAOYSA-N 1-bromo-4-ethoxybenzene Chemical compound CCOC1=CC=C(Br)C=C1 WVUYYXUATWMVIT-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- -1 for example Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- CCERQOYLJJULMD-UHFFFAOYSA-M magnesium;carbanide;chloride Chemical compound [CH3-].[Mg+2].[Cl-] CCERQOYLJJULMD-UHFFFAOYSA-M 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012074 organic phase Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- DRSHXJFUUPIBHX-UHFFFAOYSA-N COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 Chemical compound COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 DRSHXJFUUPIBHX-UHFFFAOYSA-N 0.000 description 2
- 238000003747 Grignard reaction Methods 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- DECGNXVVNBDTQK-UHFFFAOYSA-N (4-ethoxyphenyl)-dimethylsilane Chemical compound CCOC1=CC=C([SiH](C)C)C=C1 DECGNXVVNBDTQK-UHFFFAOYSA-N 0.000 description 1
- BQHMIPMIXCLXEE-UHFFFAOYSA-N (6-ethylsulfanylpyridin-3-yl)-dimethylsilane Chemical compound CCSC1=CC=C([SiH](C)C)C=N1 BQHMIPMIXCLXEE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- FKLJPTJMIBLJAV-UHFFFAOYSA-N Compound IV Chemical compound O1N=C(C)C=C1CCCCCCCOC1=CC=C(C=2OCCN=2)C=C1 FKLJPTJMIBLJAV-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 230000000895 acaricidal effect Effects 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- YGHUUVGIRWMJGE-UHFFFAOYSA-N chlorodimethylsilane Chemical compound C[SiH](C)Cl YGHUUVGIRWMJGE-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- NLFBCYMMUAKCPC-KQQUZDAGSA-N ethyl (e)-3-[3-amino-2-cyano-1-[(e)-3-ethoxy-3-oxoprop-1-enyl]sulfanyl-3-oxoprop-1-enyl]sulfanylprop-2-enoate Chemical compound CCOC(=O)\C=C\SC(=C(C#N)C(N)=O)S\C=C\C(=O)OCC NLFBCYMMUAKCPC-KQQUZDAGSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000000749 insecticidal effect Effects 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 230000002147 killing effect Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0896—Compounds with a Si-H linkage
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4023288A DE4023288A1 (de) | 1990-07-21 | 1990-07-21 | Verfahren zur herstellung von aryl-alkylmethylsilanen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL98888A0 IL98888A0 (en) | 1992-07-15 |
| IL98888A true IL98888A (en) | 1994-12-29 |
Family
ID=6410791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL9888891A IL98888A (en) | 1990-07-21 | 1991-07-18 | Process for the preparation of arylalkylmethylsilanes |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5124470A (fr) |
| EP (1) | EP0468373B1 (fr) |
| JP (1) | JPH04234397A (fr) |
| KR (1) | KR920002618A (fr) |
| DE (2) | DE4023288A1 (fr) |
| IE (1) | IE912549A1 (fr) |
| IL (1) | IL98888A (fr) |
| PT (1) | PT98402A (fr) |
| ZA (1) | ZA915681B (fr) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE467015A (fr) * | 1940-12-26 | |||
| US2561178A (en) * | 1949-07-28 | 1951-07-17 | Gen Electric | Organopolysiloxanes |
| US2813886A (en) * | 1953-11-20 | 1957-11-19 | Metal & Thermit Corp | Preparation of arylhalosilanes |
| US2813887A (en) * | 1953-11-20 | 1957-11-19 | Metal & Thermit Corp | Preparation of arylhalosilanes |
| BE758312A (fr) * | 1969-11-03 | 1971-04-30 | Dow Corning | Procede a haute temperature pour la preparation de composes contenant des liaisons silicium-hydrogene |
| JPS60222492A (ja) * | 1984-04-17 | 1985-11-07 | Shin Etsu Chem Co Ltd | 第3級炭化水素シリル化合物の製造方法 |
| FR2575465B1 (fr) * | 1984-12-27 | 1987-02-20 | Centre Nat Rech Scient | Complexes de silicium pentacoordines, leur procede de preparation et leur application a la preparation d'organosilanes |
| ES2016793B3 (es) * | 1985-10-26 | 1990-12-01 | Hoechst Ag | Nuevos derivados de silanos, procedimientos para su obtencion, productos que los contienen y su empleo como plaguicidas. |
-
1990
- 1990-07-21 DE DE4023288A patent/DE4023288A1/de not_active Withdrawn
-
1991
- 1991-07-18 EP EP91112047A patent/EP0468373B1/fr not_active Expired - Lifetime
- 1991-07-18 IL IL9888891A patent/IL98888A/en not_active IP Right Cessation
- 1991-07-18 DE DE59107677T patent/DE59107677D1/de not_active Expired - Fee Related
- 1991-07-19 PT PT98402A patent/PT98402A/pt not_active Application Discontinuation
- 1991-07-19 JP JP3179615A patent/JPH04234397A/ja not_active Withdrawn
- 1991-07-19 ZA ZA915681A patent/ZA915681B/xx unknown
- 1991-07-19 IE IE254991A patent/IE912549A1/en unknown
- 1991-07-19 US US07/732,792 patent/US5124470A/en not_active Expired - Fee Related
- 1991-07-20 KR KR1019910012449A patent/KR920002618A/ko not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR920002618A (ko) | 1992-02-28 |
| DE4023288A1 (de) | 1992-01-23 |
| IL98888A0 (en) | 1992-07-15 |
| PT98402A (pt) | 1992-05-29 |
| US5124470A (en) | 1992-06-23 |
| EP0468373A1 (fr) | 1992-01-29 |
| ZA915681B (en) | 1992-04-29 |
| JPH04234397A (ja) | 1992-08-24 |
| EP0468373B1 (fr) | 1996-04-17 |
| DE59107677D1 (de) | 1996-05-23 |
| IE912549A1 (en) | 1992-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RH | Patent void |