IL99607A - Carbon dioxide laser with tissue treatment pulse - Google Patents

Carbon dioxide laser with tissue treatment pulse

Info

Publication number: IL99607A
Authority: IL; Israel
Prior art keywords: laser; electrodes; mirrors; resonator; sheets
Prior art date: 1990-10-12

Application number

IL9960791A

Other languages

English (en)

Hebrew (he)

Other versions

IL99607A0 (en

Original Assignee

Coherent Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-10-12

Filing date

1991-09-27

Publication date

1994-07-31

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27560169&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IL99607(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1990-10-12 Priority claimed from US07/597,382 external-priority patent/US5131004A/en

1990-10-12 Priority claimed from US07/596,463 external-priority patent/US5140606A/en

1990-10-12 Priority claimed from US07/596,672 external-priority patent/US5131003A/en

1990-10-12 Priority claimed from US07/596,788 external-priority patent/US5123028A/en

1991-09-27 Application filed by Coherent Inc filed Critical Coherent Inc

1992-08-18 Publication of IL99607A0 publication Critical patent/IL99607A0/xx

1994-07-31 Publication of IL99607A publication Critical patent/IL99607A/en

Links

238000012360 testing method Methods 0.000 claims description 4
230000001427 coherent effect Effects 0.000 claims 5
229910002092 carbon dioxide Inorganic materials 0.000 description 36
239000007789 gas Substances 0.000 description 17
238000013461 design Methods 0.000 description 14
238000013459 approach Methods 0.000 description 11
238000001816 cooling Methods 0.000 description 11
230000015556 catabolic process Effects 0.000 description 10
238000006731 degradation reaction Methods 0.000 description 9
230000008878 coupling Effects 0.000 description 8
238000010168 coupling process Methods 0.000 description 8
238000005859 coupling reaction Methods 0.000 description 8
238000000429 assembly Methods 0.000 description 6
230000000712 assembly Effects 0.000 description 6
230000000694 effects Effects 0.000 description 6
230000005284 excitation Effects 0.000 description 6
238000000926 separation method Methods 0.000 description 6
241000722921 Tulipa gesneriana Species 0.000 description 5
230000008901 benefit Effects 0.000 description 5
238000000034 method Methods 0.000 description 4
239000000203 mixture Substances 0.000 description 4
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
229910052782 aluminium Inorganic materials 0.000 description 3
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
230000008859 change Effects 0.000 description 3
239000011248 coating agent Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
238000002474 experimental method Methods 0.000 description 3
230000005855 radiation Effects 0.000 description 3
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
BKZJXSDQOIUIIG-UHFFFAOYSA-N argon mercury Chemical compound [Ar].[Hg] BKZJXSDQOIUIIG-UHFFFAOYSA-N 0.000 description 2
239000000919 ceramic Substances 0.000 description 2
230000000295 complement effect Effects 0.000 description 2
230000005684 electric field Effects 0.000 description 2
239000012634 fragment Substances 0.000 description 2
229910052732 germanium Inorganic materials 0.000 description 2
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
239000001307 helium Substances 0.000 description 2
229910052734 helium Inorganic materials 0.000 description 2
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
230000003993 interaction Effects 0.000 description 2
239000010410 layer Substances 0.000 description 2
239000000463 material Substances 0.000 description 2
238000005259 measurement Methods 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
125000006850 spacer group Chemical group 0.000 description 2
MZQZQKZKTGRQCG-UHFFFAOYSA-J thorium tetrafluoride Chemical compound F[Th](F)(F)F MZQZQKZKTGRQCG-UHFFFAOYSA-J 0.000 description 2
229910052724 xenon Inorganic materials 0.000 description 2
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
229920005372 Plexiglas® Polymers 0.000 description 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
238000002679 ablation Methods 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
239000001569 carbon dioxide Substances 0.000 description 1
229910010293 ceramic material Inorganic materials 0.000 description 1
239000011247 coating layer Substances 0.000 description 1
238000010276 construction Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
238000012937 correction Methods 0.000 description 1
238000001804 debridement Methods 0.000 description 1
230000001934 delay Effects 0.000 description 1
238000011161 development Methods 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
239000012530 fluid Substances 0.000 description 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
239000010931 gold Substances 0.000 description 1
238000011835 investigation Methods 0.000 description 1
238000002955 isolation Methods 0.000 description 1
235000015250 liver sausages Nutrition 0.000 description 1
230000013011 mating Effects 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
230000007935 neutral effect Effects 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
238000005457 optimization Methods 0.000 description 1
238000004806 packaging method and process Methods 0.000 description 1
230000001737 promoting effect Effects 0.000 description 1
239000010453 quartz Substances 0.000 description 1
230000009467 reduction Effects 0.000 description 1
238000002310 reflectometry Methods 0.000 description 1
238000012552 review Methods 0.000 description 1
XYSQXZCMOLNHOI-UHFFFAOYSA-N s-[2-[[4-(acetylsulfamoyl)phenyl]carbamoyl]phenyl] 5-pyridin-1-ium-1-ylpentanethioate;bromide Chemical compound [Br-].C1=CC(S(=O)(=O)NC(=O)C)=CC=C1NC(=O)C1=CC=CC=C1SC(=O)CCCC[N+]1=CC=CC=C1 XYSQXZCMOLNHOI-UHFFFAOYSA-N 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
239000007787 solid Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000000758 substrate Substances 0.000 description 1
238000001356 surgical procedure Methods 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Landscapes

Physics & Mathematics (AREA)
Electromagnetism (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Optics & Photonics (AREA)
Lasers (AREA)

IL9960791A 1990-10-12 1991-09-27 Carbon dioxide laser with tissue treatment pulse IL99607A (en)

Applications Claiming Priority (6)

Application Number	Priority Date	Filing Date	Title
US59653290A	1990-10-12	1990-10-12
US07/597,382 US5131004A (en)	1990-10-12	1990-10-12	RF excited CO2 slab waveguide laser
US07/596,463 US5140606A (en)	1990-10-12	1990-10-12	RF excited CO2 slab waveguide laser
US07/596,672 US5131003A (en)	1990-10-12	1990-10-12	RF excited CO2 slab waveguide laser
US07/596,788 US5123028A (en)	1990-10-12	1990-10-12	RF Excited CO2 slab waveguide laser
US60791090A	1990-11-01	1990-11-01

Publications (2)

Publication Number	Publication Date
IL99607A0 IL99607A0 (en)	1992-08-18
IL99607A true IL99607A (en)	1994-07-31

Family

ID=27560169

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL9960791A IL99607A (en)	1990-10-12	1991-09-27	Carbon dioxide laser with tissue treatment pulse

Country Status (3)

Country	Link
EP (1)	EP0486152B1 (de)
DE (1)	DE69117258T2 (de)
IL (1)	IL99607A (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5216689A (en)	1990-10-12	1993-06-01	Coherent, Inc.	Slab laser with enhanced lifetime
DE9217640U1 (de) *	1992-12-23	1994-09-29	Rofin-Sinar Laser Gmbh, 22113 Hamburg	Slab- oder Bandleiterlaser
US5353297A (en) *	1993-07-12	1994-10-04	Coherent, Inc.	Gas slab laser with folded resonator structure
US5353296A (en) *	1993-07-12	1994-10-04	Coherent, Inc.	Materials processing with a high repetition rate isotopic carbon dioxide laser
GB9316282D0 (en) *	1993-08-05	1993-09-22	Univ Heriot Watt	Uniformly excited radiofrequency gas discharge of large electrode area
DE19806030A1 (de) *	1998-02-13	1999-08-19	Lasos Laser Fertigung Gmbh	Vorrichtung zum Ableiten von Verlustwärme
CN105846289B (zh) *	2016-05-13	2019-06-28	清华大学深圳研究生院	一种射频co2激光器及其非稳-波导混合腔
CN110455829A (zh) *	2019-08-19	2019-11-15	电子科技大学	高功率微波对电介质材料非热影响机制提取系统及方法
CN110635345B (zh) *	2019-10-31	2025-07-29	成都微深科技有限公司	一种具有可调节支撑装置的二氧化碳激光器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4719639B1 (en) *	1987-01-08	1994-06-28	Boreal Laser Inc	Carbon dioxide slab laser
US5048048A (en) *	1989-08-11	1991-09-10	Mitsubishi Denki K.K.	Gas laser device

1991
- 1991-09-27 IL IL9960791A patent/IL99607A/en not_active IP Right Cessation
- 1991-10-09 DE DE69117258T patent/DE69117258T2/de not_active Expired - Fee Related
- 1991-10-09 EP EP91309288A patent/EP0486152B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
IL99607A0 (en)	1992-08-18
DE69117258T2 (de)	1996-10-02
EP0486152A3 (en)	1992-07-08
DE69117258D1 (de)	1996-03-28
EP0486152A2 (de)	1992-05-20
EP0486152B1 (de)	1996-02-21

Legal Events

Date	Code	Title
1998-02-22	KB	Patent renewed
2001-11-25	KB	Patent renewed
2012-06-28	EXP	Patent expired

Publication	Publication Date	Title
US5123028A (en)	1992-06-16	RF Excited CO2 slab waveguide laser
US5140606A (en)	1992-08-18	RF excited CO2 slab waveguide laser
US5335242A (en)	1994-08-02	Resonator for CO2 slab waveguide laser
US5131003A (en)	1992-07-14	RF excited CO2 slab waveguide laser
US5748663A (en)	1998-05-05	Retangular discharge gas laser
US6788722B1 (en)	2004-09-07	High power waveguide laser
EP0904616B1 (de)	2008-12-03	Hochfrequenz-angeregter wellenleiterlaser
EP0675579B1 (de)	1999-01-20	Verbesserter CO2 Bandleiterlaser
EP0275023B1 (de)	1995-10-04	Plattenförmiger Kohlendioxid-Laser
US7260134B2 (en)	2007-08-21	Dielectric coupled CO2 slab laser
WO1993017474A1 (en)	1993-09-02	Slab laser with enhanced lifetime
US5237580A (en)	1993-08-17	RF excited CO2 slab waveguide laser
US4891819A (en)	1990-01-02	RF excited laser with internally folded resonator
EP0486152B1 (de)	1996-02-21	Scheibenförmiger Gaslaser
US5155739A (en)	1992-10-13	RF excited CO2 slab waveguide laser
US5131004A (en)	1992-07-14	RF excited CO2 slab waveguide laser
EP0098143A2 (de)	1984-01-11	Kombinierte Laser-Resonator-Struktur
US5255282A (en)	1993-10-19	Open waveguide excimer laser
JP2002094147A (ja)	2002-03-29	パルス波ｃｏ２レーザー
EP0776073B1 (de)	2002-10-23	Gaslaser mit rechteckigem Entladungsraum
EP2382695B1 (de)	2013-04-10	Partikelbeschädigungsschutz für hochleistungs-co2-slab-laserspiegel
EP1217700B1 (de)	2004-10-13	Grossflächiger Laser
US20070133643A1 (en)	2007-06-14	Effective excitation, optical energy extraction and beamlet stacking in a multi-channel radial array laser system
WO1996037935A1 (en)	1996-11-28	Microwave excited laser with uniform gas discharge
US5436926A (en)	1995-07-25	Micro gas laser with laser array