IN166919B - - Google Patents

Info

Publication number
IN166919B
IN166919B IN655/DEL/86A IN655DE1986A IN166919B IN 166919 B IN166919 B IN 166919B IN 655DE1986 A IN655DE1986 A IN 655DE1986A IN 166919 B IN166919 B IN 166919B
Authority
IN
India
Application number
IN655/DEL/86A
Other languages
English (en)
Inventor
Wolodymyr Czubatyj
Michael Gordon Hack
Michael Shur
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of IN166919B publication Critical patent/IN166919B/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/817Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
    • H10H20/818Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0421Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
    • H01S5/0422Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/202FETs having static field-induced regions, e.g. static-induction transistors [SIT] or permeable base transistors [PBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/80FETs having rectifying junction gate electrodes
    • H10D30/87FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
    • H10D30/871Vertical FETs having Schottky gate electrodes 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/859Complementary IGFETs, e.g. CMOS comprising both N-type and P-type wells, e.g. twin-tub
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/062Light-emitting semiconductor devices having field effect type light-emitting regions, e.g. light-emitting High-Electron Mobility Transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06203Transistor-type lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)
  • Solid State Image Pick-Up Elements (AREA)
IN655/DEL/86A 1985-07-26 1986-07-21 IN166919B (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US75963485A 1985-07-26 1985-07-26
US78859485A 1985-10-17 1985-10-17

Publications (1)

Publication Number Publication Date
IN166919B true IN166919B (fr) 1990-08-04

Family

ID=27116708

Family Applications (1)

Application Number Title Priority Date Filing Date
IN655/DEL/86A IN166919B (fr) 1985-07-26 1986-07-21

Country Status (9)

Country Link
EP (1) EP0212328A1 (fr)
KR (1) KR950001949B1 (fr)
CN (1) CN1009232B (fr)
AU (1) AU587845B2 (fr)
BR (1) BR8603571A (fr)
CA (1) CA1267965C (fr)
IL (1) IL79505A0 (fr)
IN (1) IN166919B (fr)
MX (1) MX169134B (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6998656B2 (en) * 2003-02-07 2006-02-14 Hewlett-Packard Development Company, L.P. Transparent double-injection field-effect transistor
CN100385677C (zh) * 2002-08-07 2008-04-30 皇家飞利浦电子股份有限公司 绝缘栅晶体管、晶体管电路、晶体管装置及晶体管的操作方法
US7115916B2 (en) * 2002-09-26 2006-10-03 International Business Machines Corporation System and method for molecular optical emission
TW200501456A (en) * 2003-04-23 2005-01-01 Hoya Corp Light-emitting diode
KR100626036B1 (ko) 2004-11-17 2006-09-20 삼성에스디아이 주식회사 유기 발광 소자 및 상기 유기 발광 소자의 제조방법
DE102008044884A1 (de) * 2008-08-29 2010-03-04 Albert-Ludwigs-Universität Freiburg Verfahren zur Bestimmung der Rekombinationseigenschaften an einem Messteilbereich einer Messseite einer Halbleiterstruktur
WO2011118364A1 (fr) 2010-03-26 2011-09-29 Semiconductor Energy Laboratory Co., Ltd. Dispositif semi-conducteur
JP5687885B2 (ja) * 2010-11-25 2015-03-25 エルジー ディスプレイ カンパニー リミテッド 薄膜トランジスタおよび表示装置用電極基板の製造方法
TWI581466B (zh) * 2013-01-16 2017-05-01 隆達電子股份有限公司 發光二極體晶片結構及發光二極體元件
US10281421B2 (en) 2014-02-14 2019-05-07 Universite Du Quebec A Chicoutimi Method for analyzing an anode and device thereof
CN106960864A (zh) * 2017-03-15 2017-07-18 四川太锦信息技术有限公司 一种关于执法记录仪oled栅极的器件
CN109728101A (zh) * 2017-10-30 2019-05-07 中国科学院宁波材料技术与工程研究所 场效应晶体管、显示元件、图像显示装置及其制作方法
US10224430B1 (en) 2017-12-06 2019-03-05 International Business Machines Corporation Thin film transistors with epitaxial source/drain and drain field relief
WO2021040050A1 (fr) * 2019-08-30 2021-03-04 太陽誘電株式会社 Dispositif de détermination de gaz, procédé de détermination de gaz et système de détermination de gaz
US11637209B2 (en) * 2019-12-23 2023-04-25 Nexgen Power Systems, Inc. JFET with implant isolation
CN115188826B (zh) * 2022-07-06 2026-02-27 京东方科技集团股份有限公司 晶体管、制备方法及显示面板
CN119401971B (zh) * 2024-09-25 2026-01-23 电子科技大学 一种基于共面电极结构的固态装配型体声波谐振器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1497548A (fr) * 1966-07-22 1967-10-13 Jeumont Schneider Dispositif semi-conducteur bistable pour courants forts
US3680204A (en) * 1969-12-12 1972-08-01 Massachusetts Inst Technology Solid state device

Also Published As

Publication number Publication date
MX169134B (es) 1993-06-23
EP0212328A1 (fr) 1987-03-04
AU6058486A (en) 1987-01-29
BR8603571A (pt) 1987-03-04
KR870001673A (ko) 1987-03-17
CN86105609A (zh) 1987-04-29
AU587845B2 (en) 1989-08-31
CA1267965A (fr) 1990-04-17
KR950001949B1 (ko) 1995-03-07
CN1009232B (zh) 1990-08-15
CA1267965C (fr) 1990-04-17
IL79505A0 (en) 1986-10-31

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