IN2012DN03251A - - Google Patents

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Publication number
IN2012DN03251A
IN2012DN03251A IN3251DEN2012A IN2012DN03251A IN 2012DN03251 A IN2012DN03251 A IN 2012DN03251A IN 3251DEN2012 A IN3251DEN2012 A IN 3251DEN2012A IN 2012DN03251 A IN2012DN03251 A IN 2012DN03251A
Authority
IN
India
Prior art keywords
substrate
core
terminals
coupled
layers
Prior art date
Application number
Inventor
Qing Ma
Chuan Hu
Patrick Morrow
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of IN2012DN03251A publication Critical patent/IN2012DN03251A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/685—Shapes or dispositions thereof comprising multiple insulating layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • H05K3/4605—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated made from inorganic insulating material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00—Arrangements for thermal protection or thermal control
    • H10W40/20—Arrangements for cooling
    • H10W40/22—Arrangements for cooling characterised by their shape, e.g. having conical or cylindrical projections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/095—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63—Vias, e.g. via plugs
    • H10W70/635—Through-vias
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65—Shapes or dispositions of interconnections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/08—PCBs, i.e. printed circuit boards
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0183—Dielectric layers
    • H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/096—Vertically aligned vias, holes or stacked vias
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65—Shapes or dispositions of interconnections
    • H10W70/654—Top-view layouts
    • H10W70/656—Fan-in layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H10W72/07231—Techniques
    • H10W72/07236—Soldering or alloying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/874—On different surfaces
    • H10W72/877—Bump connectors and die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Combinations Of Printed Boards (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

Disclosed are embodiments of a substrate for an integrated circuit (IC) device. The substrate includes a core comprised of two or more discrete glass layers that have been bonded together. A separate bonding layer may be disposed between adjacent glass layers to couple these layers together. The substrate may also include build-up structures on opposing sides of the multi-layer glass core, or perhaps on one side of the core. Electrically conductive terminals may be formed on both sides of the substrate, and an IC die may be coupled with the terminals on one side of the substrate. The terminals on the opposing side may be coupled with a next-level component, such as a circuit board. One or more conductors extend through the multi-layer glass core, and one or more of the conductors may be electrically coupled with the build-up structures disposed over the core. Other embodiments are described and claimed.
IN3251DEN2012 2009-12-17 2010-11-01 IN2012DN03251A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/653,722 US9420707B2 (en) 2009-12-17 2009-12-17 Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
PCT/US2010/054931 WO2011084216A2 (en) 2009-12-17 2010-11-01 Substrate for integrated circuit devices including multi-layer glass core and methods of making the same

Publications (1)

Publication Number Publication Date
IN2012DN03251A true IN2012DN03251A (en) 2015-10-23

Family

ID=44149499

Family Applications (1)

Application Number Title Priority Date Filing Date
IN3251DEN2012 IN2012DN03251A (en) 2009-12-17 2010-11-01

Country Status (9)

Country Link
US (2) US9420707B2 (en)
JP (2) JP2013512583A (en)
KR (1) KR101466582B1 (en)
CN (2) CN102656685B (en)
DE (1) DE112010004888B4 (en)
GB (1) GB2488265B (en)
IN (1) IN2012DN03251A (en)
TW (1) TWI467717B (en)
WO (1) WO2011084216A2 (en)

Families Citing this family (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8207453B2 (en) 2009-12-17 2012-06-26 Intel Corporation Glass core substrate for integrated circuit devices and methods of making the same
US9420707B2 (en) 2009-12-17 2016-08-16 Intel Corporation Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
US20110229687A1 (en) * 2010-03-19 2011-09-22 Qualcomm Incorporated Through Glass Via Manufacturing Process
JP5419226B2 (en) * 2010-07-29 2014-02-19 日東電工株式会社 Flip chip type film for semiconductor back surface and use thereof
JP6088724B2 (en) * 2010-08-31 2017-03-01 ユニ・チャーム株式会社 Absorber manufacturing apparatus and breathable member manufacturing method
US8853072B2 (en) * 2011-06-06 2014-10-07 Micron Technology, Inc. Methods of forming through-substrate interconnects
US8780576B2 (en) 2011-09-14 2014-07-15 Invensas Corporation Low CTE interposer
WO2013133827A1 (en) 2012-03-07 2013-09-12 Intel Corporation Glass clad microelectronic substrate
US10629993B2 (en) * 2012-07-19 2020-04-21 HungYu David Yang Method and apparatus for a 60 GHz endfire antenna
US20140027163A1 (en) * 2012-07-30 2014-01-30 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and method for manufacturing the same
US10115671B2 (en) 2012-08-03 2018-10-30 Snaptrack, Inc. Incorporation of passives and fine pitch through via for package on package
US9001520B2 (en) 2012-09-24 2015-04-07 Intel Corporation Microelectronic structures having laminated or embedded glass routing structures for high density packaging
US9373586B2 (en) 2012-11-14 2016-06-21 Taiwan Semiconductor Manufacturing Co., Ltd. Copper etching integration scheme
JP2014120687A (en) * 2012-12-18 2014-06-30 Hitachi Chemical Co Ltd Laminated plate, multilayer laminated plate, printed wiring board, multilayer printed wiring board, and method for manufacturing laminated plate
US9312219B2 (en) * 2012-12-28 2016-04-12 Dyi-chung Hu Interposer and packaging substrate having the interposer
US20150366077A1 (en) * 2013-01-30 2015-12-17 Kyocera Corporation Method for producing mounted structure
KR20150014167A (en) * 2013-07-29 2015-02-06 삼성전기주식회사 Pcb having glass core
US9178572B1 (en) * 2013-09-24 2015-11-03 Amazon Technologies, Inc. Integrated radio frequency or near field communications antenna
KR20150042042A (en) * 2013-10-10 2015-04-20 삼성전기주식회사 Printed circuit board and method of manufacturing the same
JP5846185B2 (en) 2013-11-21 2016-01-20 大日本印刷株式会社 Through electrode substrate and semiconductor device using the through electrode substrate
JP2015146401A (en) * 2014-02-04 2015-08-13 大日本印刷株式会社 Glass interposer
JP6273873B2 (en) * 2014-02-04 2018-02-07 大日本印刷株式会社 Manufacturing method of glass interposer substrate
KR101894227B1 (en) * 2014-05-06 2018-09-04 인텔 코포레이션 Multi-layer package with integrated antenna
JP2016009844A (en) * 2014-06-26 2016-01-18 ソニー株式会社 Semiconductor device and manufacturing method of semiconductor device
US9368436B2 (en) * 2014-08-04 2016-06-14 Infineon Technologies Ag Source down semiconductor devices and methods of formation thereof
CN104409429A (en) * 2014-11-23 2015-03-11 北京工业大学 Chip package structure with stress sacrifice structure and package method
JP6447075B2 (en) * 2014-12-10 2019-01-09 凸版印刷株式会社 Wiring substrate, semiconductor device, and manufacturing method of semiconductor device
US9397048B1 (en) * 2015-03-23 2016-07-19 Inotera Memories, Inc. Semiconductor structure and manufacturing method thereof
CN106356351B (en) * 2015-07-15 2019-02-01 凤凰先驱股份有限公司 Substrate structure and manufacturing method thereof
TWI581460B (en) * 2015-09-04 2017-05-01 錼創科技股份有限公司 Light-emitting element and manufacturing method thereof
KR102470168B1 (en) * 2015-12-08 2022-11-23 삼성전기주식회사 Package substrate
CN107424974A (en) * 2016-05-24 2017-12-01 胡迪群 Packaging substrate with embedded noise shielding wall
JP6372546B2 (en) * 2016-11-15 2018-08-15 大日本印刷株式会社 Through electrode substrate and semiconductor device using the through electrode substrate
DE102016222885A1 (en) * 2016-11-21 2018-05-24 Daimler Ag Electronic component and method for its production
EP3615488B1 (en) * 2017-04-26 2021-10-06 Corning Incorporated Micro-perforated glass laminates and methods of making the same
TWI859122B (en) * 2017-07-24 2024-10-21 美商康寧公司 Precision structured glass articles, integrated circuit packages, optical devices, microfluidic devices, and methods for making the same
TWI713842B (en) * 2018-05-10 2020-12-21 恆勁科技股份有限公司 Flip-chip package substrate and method of fabricating the same
US10672859B2 (en) 2018-06-27 2020-06-02 Intel Corporation Embedded magnetic inductor
CN112912995A (en) * 2018-10-19 2021-06-04 康宁股份有限公司 Apparatus including vias and methods and materials for making vias
KR102652986B1 (en) 2019-03-07 2024-03-28 앱솔릭스 인코포레이티드 Packaging substrate and semiconductor apparatus comprising same
JP7433318B2 (en) 2019-03-07 2024-02-19 アブソリックス インコーポレイテッド Packaging substrates and semiconductor devices including the same
EP3913662A4 (en) 2019-03-12 2022-11-02 Absolics Inc. ENCAPSULATING SUBSTRATE AND METHOD FOR MAKING IT
JP7254930B2 (en) * 2019-03-12 2023-04-10 アブソリックス インコーポレイテッド Packaging substrate and semiconductor device including the same
US11981501B2 (en) 2019-03-12 2024-05-14 Absolics Inc. Loading cassette for substrate including glass and substrate loading method to which same is applied
KR102396184B1 (en) 2019-03-12 2022-05-10 앱솔릭스 인코포레이티드 Packaging substrate and semiconductor device including same
CN114678344B (en) 2019-03-29 2025-08-15 爱玻索立克公司 Package glass substrate for semiconductor, semiconductor package substrate, and semiconductor device
CN110335542B (en) * 2019-04-03 2021-04-30 上海天马微电子有限公司 Display panel, manufacturing method thereof and display device
CN112039460B (en) 2019-07-19 2022-05-10 中芯集成电路(宁波)有限公司 Film bulk acoustic resonator and manufacturing method thereof
US12191240B2 (en) * 2019-08-13 2025-01-07 Intel Corporation Hybrid glass core for wafer level and panel level packaging applications
EP3905323B1 (en) 2019-08-23 2024-08-14 Absolics Inc. Packaging substrate and semiconductor device comprising same
US11659660B2 (en) 2019-11-01 2023-05-23 Raytheon Company Oxide liner stress buffer
GB2590643B (en) * 2019-12-20 2022-08-03 Graphcore Ltd Method of manufacturing a computer device
US11503704B2 (en) * 2019-12-30 2022-11-15 General Electric Company Systems and methods for hybrid glass and organic packaging for radio frequency electronics
CN111244063B (en) 2020-03-12 2023-03-21 奥特斯科技(重庆)有限公司 Component carrier and method for producing a component carrier
US11398419B2 (en) * 2020-07-16 2022-07-26 Advanced Semiconductor Engineering, Inc. Wiring structure and method for manufacturing the same
US12557211B2 (en) * 2021-06-04 2026-02-17 Intel Corporation Package having thick glass core with high aspect ratio vias
US12621937B2 (en) 2021-06-04 2026-05-05 Intel Corporation Package substrate including core with trench vias and planes
US20220406617A1 (en) * 2021-06-16 2022-12-22 Intel Corporation Dual sided glass interconnect dual damascene vias
CN115513228B (en) * 2021-06-23 2025-09-19 京东方科技集团股份有限公司 Substrate integrated with passive device and preparation method thereof
US12525496B2 (en) * 2021-12-21 2026-01-13 Intel Corporation Glass vias and planes with reduced tapering
US20230207407A1 (en) * 2021-12-24 2023-06-29 Intel Corporation Plate-up hybrid structures using modified glass patterning processes
CN114430001B (en) * 2022-01-10 2025-02-18 深圳Tcl新技术有限公司 Glass substrate processing method and display device
US20230317621A1 (en) * 2022-03-29 2023-10-05 Intel Corporation Glass substrate package with hybrid bonded die
US20240071883A1 (en) * 2022-08-23 2024-02-29 Intel Corporation Self-alignment of glass core halves using protruded bumps
US20240153857A1 (en) * 2022-11-08 2024-05-09 Intel Corporation High aspect ratio tgv substrates through direct hybrid bonding of thin tgv substrates
US20240154514A1 (en) * 2022-11-09 2024-05-09 Intel Corporation Current equalization and reconfigurable double control loop for voltage regulators
CN118830080A (en) * 2022-12-16 2024-10-22 京东方科技集团股份有限公司 Functional substrate and preparation method thereof
US12199027B2 (en) * 2023-02-10 2025-01-14 Dyi-chung Hu Substrate and manufacturing method thereof
US12100632B2 (en) * 2023-02-10 2024-09-24 Dyi-chung Hu Glass core substrate and manufacturing method thereof
CN118591082A (en) * 2023-03-02 2024-09-03 奥特斯奥地利科技与系统技术有限公司 Component carrier and method for producing a component carrier
CN117038633B (en) * 2023-10-08 2024-01-26 甬矽电子(宁波)股份有限公司 Fan-out type packaging structure, packaging product and fan-out type packaging method
KR20260007725A (en) * 2024-07-08 2026-01-15 엘지이노텍 주식회사 Circuit board and package substrate having the same
CN119252813B (en) * 2024-08-20 2025-10-03 深圳市紫光同创电子股份有限公司 Packaging structure and chip
CN119581429B (en) * 2024-11-25 2025-10-03 上海人工智能创新中心 Wafer-level integrated structure and manufacturing method thereof
KR102944837B1 (en) 2025-06-20 2026-03-27 곽재정 Pin array block for TGV of glass substrate, manufacturing method of the pin array block and manufacturing method of glass substrate apparatus using the pin array block

Family Cites Families (135)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3958317A (en) 1974-09-25 1976-05-25 Rockwell International Corporation Copper surface treatment for epoxy bonding
US4221047A (en) * 1979-03-23 1980-09-09 International Business Machines Corporation Multilayered glass-ceramic substrate for mounting of semiconductor device
US4379553A (en) * 1979-07-20 1983-04-12 General Electric Company Bowling lane with fire retardant decorative surface
US4327143A (en) * 1981-01-23 1982-04-27 Westinghouse Electric Corp. Moisture resistant laminates impregnated with an impregnating composition comprising epoxy resin and a dicyandiamide derivative
US4404060A (en) * 1981-05-08 1983-09-13 Siemens Aktiengesellschaft Method for producing insulating ring zones by galvanic and etch technologies at orifice areas of through-holes in a plate
US4664309A (en) * 1983-06-30 1987-05-12 Raychem Corporation Chip mounting device
US4622058A (en) 1984-06-22 1986-11-11 International Business Machines Corporation Formation of a multi-layer glass-metallized structure formed on and interconnected to multi-layered-metallized ceramic substrate
JPS61116881A (en) 1984-11-12 1986-06-04 Nippon Soken Inc How to connect electrodes
US4639543A (en) * 1985-02-04 1987-01-27 Richard J. Birch Semiconductor devices having a metallic glass substrate
JPH0634452B2 (en) 1985-08-05 1994-05-02 株式会社日立製作所 Ceramic circuit board
US4828597A (en) * 1987-12-07 1989-05-09 General Electric Company Flexible glass fiber mat bonding method
JPH01247041A (en) 1988-03-28 1989-10-02 Meiji Seika Kaisha Ltd Preparation of candy containing sealed high-pressure gas
DE3830364C1 (en) 1988-09-07 1990-01-18 Schott Glaswerke, 6500 Mainz, De
DE68927499D1 (en) 1988-09-30 1997-01-09 Right Hemisphere Pty Ltd TELEVISION PROGRAM DISTRIBUTION SYSTEM
JP2598152B2 (en) * 1990-04-28 1997-04-09 シャープ株式会社 Touch panel
US5294238A (en) * 1991-03-27 1994-03-15 Semiconductor Energy Laboratory Co., Ltd. Glass substrate for a semiconductor device and method for making same
US5253319A (en) * 1992-02-24 1993-10-12 Corning Incorporated Planar optical waveguides with planar optical elements
JPH05267853A (en) 1992-03-23 1993-10-15 Nec Toyama Ltd Manufacture of multilayer printed circuit board
US5466488A (en) * 1993-02-08 1995-11-14 Mitsubishi Materials Corporation Method of making glazed AlN substrate with an Al2 O3 -SiO2 interfacial layer
JPH06237081A (en) 1993-02-10 1994-08-23 Matsushita Electric Ind Co Ltd Method for manufacturing multilayer ceramic substrate
JP3102192B2 (en) * 1993-03-18 2000-10-23 株式会社日立製作所 Method for manufacturing multilayer wiring board
US5455385A (en) * 1993-06-28 1995-10-03 Harris Corporation Multilayer LTCC tub architecture for hermetically sealing semiconductor die, external electrical access for which is provided by way of sidewall recesses
US5585675A (en) * 1994-05-11 1996-12-17 Harris Corporation Semiconductor die packaging tub having angularly offset pad-to-pad via structure configured to allow three-dimensional stacking and electrical interconnections among multiple identical tubs
JP2595909B2 (en) * 1994-09-14 1997-04-02 日本電気株式会社 Semiconductor device
US5705855A (en) * 1995-01-13 1998-01-06 Motorola, Inc. Integrated circuit for directly attaching to a glass substrate and method for manufacturing the same
JPH0917919A (en) * 1995-06-29 1997-01-17 Fujitsu Ltd Semiconductor device
US5917652A (en) * 1996-02-05 1999-06-29 Minnesota Mining And Manufacturing Company Durable retroreflective elements
TW322591B (en) * 1996-02-09 1997-12-11 Handotai Energy Kenkyusho Kk
JP2959480B2 (en) * 1996-08-12 1999-10-06 日本電気株式会社 Semiconductor device and manufacturing method thereof
US5981880A (en) * 1996-08-20 1999-11-09 International Business Machines Corporation Electronic device packages having glass free non conductive layers
DE69739289D1 (en) * 1996-10-17 2009-04-16 Avago Technologies Wireless Ip CHTOBERFLÄCHENWELLENRESONATOREN
EP0838980B1 (en) 1996-10-25 2006-03-08 Canon Kabushiki Kaisha Glass circuit substrate and fabrication method thereof
JP3395621B2 (en) 1997-02-03 2003-04-14 イビデン株式会社 Printed wiring board and manufacturing method thereof
JP3961092B2 (en) 1997-06-03 2007-08-15 株式会社東芝 Composite wiring board, flexible substrate, semiconductor device, and method of manufacturing composite wiring board
CA2304576C (en) * 1997-10-24 2007-07-31 Agfa-Gevaert Naamloze Vennootschap A laminate comprising a thin borosilicate glass substrate as a constituting layer
JP4538107B2 (en) * 1998-03-02 2010-09-08 エヌエックスピー ビー ヴィ Semiconductor device having a glass support to which an insulating layer having a semiconductor element and a metallized layer is attached by an adhesive
US6154176A (en) * 1998-08-07 2000-11-28 Sarnoff Corporation Antennas formed using multilayer ceramic substrates
JP2000119047A (en) 1998-10-08 2000-04-25 Nippon Sheet Glass Co Ltd Glass laminate and its production
JP4221859B2 (en) 1999-02-12 2009-02-12 株式会社デンソー Manufacturing method of semiconductor device
US6539750B1 (en) * 1999-04-30 2003-04-01 Matsushita Electric Industrial Co., Ltd. Glass substrate forming mold and production method for glass substrate
JP3756041B2 (en) * 1999-05-27 2006-03-15 Hoya株式会社 Manufacturing method of multilayer printed wiring board
WO2000076281A1 (en) * 1999-06-02 2000-12-14 Ibiden Co., Ltd. Multilayer printed wiring board and method of manufacturing multilayer printed wiring board
US6413620B1 (en) 1999-06-30 2002-07-02 Kyocera Corporation Ceramic wiring substrate and method of producing the same
JP2001053191A (en) 1999-08-05 2001-02-23 Fujitsu Ltd Substrate derived from electrode protrusion and method of manufacturing the same
DE60042976D1 (en) * 1999-08-06 2009-10-29 Ibiden Co Ltd SOLUTION FOR ELECTROCHEMICAL DEPOSITION, METHOD, MAKING A PCB WITH THE USE OF THIS SOLUTION, AND MULTILAYER CONDUCTOR PLATE
US6876554B1 (en) * 1999-09-02 2005-04-05 Ibiden Co., Ltd. Printing wiring board and method of producing the same and capacitor to be contained in printed wiring board
DE60027141T2 (en) * 1999-10-26 2006-12-28 Ibiden Co., Ltd., Ogaki PRINTED MULTILAYER PLATE AND MANUFACTURING METHOD FOR PRINTED MULTILAYER PLATE
TW512653B (en) * 1999-11-26 2002-12-01 Ibiden Co Ltd Multilayer circuit board and semiconductor device
WO2001063991A1 (en) * 2000-02-25 2001-08-30 Ibiden Co., Ltd. Multilayer printed wiring board and method for producing multilayer printed wiring board
DE10019355A1 (en) * 2000-04-18 2001-10-31 Schott Glas Vitreous body with increased strength
JP2001307547A (en) * 2000-04-25 2001-11-02 Murata Mfg Co Ltd Conductive composition and printed circuit board using the same
JP3407716B2 (en) 2000-06-08 2003-05-19 株式会社村田製作所 Composite laminated electronic components
JP2001354439A (en) * 2000-06-12 2001-12-25 Matsushita Electric Ind Co Ltd Glass substrate processing method and high frequency circuit manufacturing method
US6753483B2 (en) 2000-06-14 2004-06-22 Matsushita Electric Industrial Co., Ltd. Printed circuit board and method of manufacturing the same
DE10034507C1 (en) * 2000-07-15 2002-02-21 Schott Glas Process for the production of microstructures on glass or plastic substrates according to the hot molding technology and associated molding tool
US6518514B2 (en) * 2000-08-21 2003-02-11 Matsushita Electric Industrial Co., Ltd. Circuit board and production of the same
JP4372330B2 (en) 2000-10-30 2009-11-25 富士通株式会社 Distributed optical amplifier, optical communication station, and optical communication system
US6577490B2 (en) * 2000-12-12 2003-06-10 Ngk Spark Plug Co., Ltd. Wiring board
JP2002290030A (en) * 2001-03-23 2002-10-04 Ngk Spark Plug Co Ltd Wiring board
JP3905325B2 (en) 2001-04-23 2007-04-18 富士通株式会社 Multilayer printed wiring board
JP4092890B2 (en) 2001-05-31 2008-05-28 株式会社日立製作所 Multi-chip module
JP2002366051A (en) * 2001-06-08 2002-12-20 Sanyo Electric Co Ltd Integrated circuit chip and display device using the same
US7183650B2 (en) 2001-07-12 2007-02-27 Renesas Technology Corp. Wiring glass substrate for connecting a semiconductor chip to a printed wiring substrate and a semiconductor module having the wiring glass substrate
JP4485790B2 (en) * 2001-08-24 2010-06-23 ショット アクチエンゲゼルシャフト Process for manufacturing microelectromechanical components
JP2003110238A (en) 2001-09-28 2003-04-11 Murata Mfg Co Ltd Manufacturing method of glass ceramic multilayer substrate
TWI312166B (en) * 2001-09-28 2009-07-11 Toppan Printing Co Ltd Multi-layer circuit board, integrated circuit package, and manufacturing method for multi-layer circuit board
JP4079699B2 (en) * 2001-09-28 2008-04-23 富士通株式会社 Multilayer wiring circuit board
JP2003142804A (en) 2001-10-31 2003-05-16 Kyocera Corp Circuit board
US6673698B1 (en) * 2002-01-19 2004-01-06 Megic Corporation Thin film semiconductor package utilizing a glass substrate with composite polymer/metal interconnect layers
DE10215654A1 (en) * 2002-04-09 2003-11-06 Infineon Technologies Ag Electronic component with at least one semiconductor chip and flip-chip contacts and method for its production
US6657304B1 (en) * 2002-06-06 2003-12-02 Advanced Micro Devices, Inc. Conformal barrier liner in an integrated circuit interconnect
US7260890B2 (en) 2002-06-26 2007-08-28 Georgia Tech Research Corporation Methods for fabricating three-dimensional all organic interconnect structures
US7102367B2 (en) * 2002-07-23 2006-09-05 Fujitsu Limited Probe card and testing method of semiconductor chip, capacitor and manufacturing method thereof
EP1544635B1 (en) 2002-08-30 2012-01-18 Nittobo Acoustic Engineering Co.,Ltd. Sound source search system
EP1535315B1 (en) * 2002-09-06 2010-11-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Glass-type planar substrate, use thereof, and method for the production thereof
TW560698U (en) * 2002-09-09 2003-11-01 Via Tech Inc Structure of chip package
JP3822549B2 (en) * 2002-09-26 2006-09-20 富士通株式会社 Wiring board
TWI227050B (en) * 2002-10-11 2005-01-21 Sanyo Electric Co Semiconductor device and method for manufacturing the same
GB2401485B (en) * 2002-12-11 2006-07-26 Dainippon Printing Co Ltd Multilayer wiring board and manufacture method thereof
KR100919674B1 (en) 2002-12-27 2009-10-06 주식회사 하이닉스반도체 Manufacturing Method of Semiconductor Device
JP4199198B2 (en) * 2003-01-16 2008-12-17 富士通株式会社 Multilayer wiring board and manufacturing method thereof
EP1603170B1 (en) * 2003-03-10 2018-08-01 Toyoda Gosei Co., Ltd. Method for manufacturing a solid-state optical element device
JP2005005488A (en) 2003-06-12 2005-01-06 Dainippon Printing Co Ltd Semiconductor module and manufacturing method thereof
JP2005045150A (en) * 2003-07-25 2005-02-17 Matsushita Electric Ind Co Ltd Wiring substrate for intermediate connection, multilayer wiring board, and manufacturing method thereof
CN100484372C (en) * 2003-07-30 2009-04-29 国际商业机器公司 Printed-wiring board and method of producing the same
WO2005027606A1 (en) * 2003-09-09 2005-03-24 Hoya Corporation Method for manufacturing double-sided printed glass board
JP2005144622A (en) * 2003-11-18 2005-06-09 Seiko Epson Corp Structure manufacturing method, droplet discharge head, and droplet discharge apparatus
JP3965695B2 (en) * 2004-01-30 2007-08-29 船井電機株式会社 Liquid crystal display
JP4387231B2 (en) * 2004-03-31 2009-12-16 新光電気工業株式会社 Capacitor-mounted wiring board and manufacturing method thereof
US6976306B1 (en) * 2004-07-12 2005-12-20 Unitech Printed Circuit Board Corporation Modular method for manufacturing circuit board
JP4528062B2 (en) 2004-08-25 2010-08-18 富士通株式会社 Semiconductor device and manufacturing method thereof
US7339260B2 (en) * 2004-08-27 2008-03-04 Ngk Spark Plug Co., Ltd. Wiring board providing impedance matching
DE102004049233A1 (en) * 2004-10-09 2006-04-20 Schott Ag Process for the microstructuring of substrates made of flat glass
KR100701205B1 (en) 2005-01-12 2007-03-29 박성호 Laminating material joining method and device
KR100594327B1 (en) 2005-03-24 2006-06-30 삼성전자주식회사 A semiconductor device having nanowires having a round cross section and a method of manufacturing the same
JP4527585B2 (en) 2005-03-30 2010-08-18 財団法人鉄道総合技術研究所 Bearing monitoring system and bearing monitoring program
JP4534062B2 (en) 2005-04-19 2010-09-01 ルネサスエレクトロニクス株式会社 Semiconductor device
US7795134B2 (en) 2005-06-28 2010-09-14 Micron Technology, Inc. Conductive interconnect structures and formation methods using supercritical fluids
US7759582B2 (en) * 2005-07-07 2010-07-20 Ibiden Co., Ltd. Multilayer printed wiring board
US7834273B2 (en) * 2005-07-07 2010-11-16 Ibiden Co., Ltd. Multilayer printed wiring board
JP4072176B2 (en) * 2005-08-29 2008-04-09 新光電気工業株式会社 Manufacturing method of multilayer wiring board
US20070060970A1 (en) * 2005-09-15 2007-03-15 Burdon Jeremy W Miniaturized co-fired electrical interconnects for implantable medical devices
US7164572B1 (en) * 2005-09-15 2007-01-16 Medtronic, Inc. Multi-path, mono-polar co-fired hermetic electrical feedthroughs and methods of fabrication therfor
US20070090416A1 (en) 2005-09-28 2007-04-26 Doyle Brian S CMOS devices with a single work function gate electrode and method of fabrication
CN101371352B (en) * 2006-02-14 2010-11-10 株式会社村田制作所 Multilayer ceramic electronic component, multilayer ceramic substrate, and manufacturing method of multilayer ceramic electronic component
JP4904891B2 (en) * 2006-03-31 2012-03-28 富士通株式会社 Circuit board, electronic device, and method for manufacturing circuit board
KR101037229B1 (en) * 2006-04-27 2011-05-25 스미토모 베이클리트 컴퍼니 리미티드 Semiconductor device and manufacturing method of semiconductor device
JP5003082B2 (en) * 2006-09-26 2012-08-15 富士通株式会社 Interposer and manufacturing method thereof
JPWO2008053833A1 (en) * 2006-11-03 2010-02-25 イビデン株式会社 Multilayer printed wiring board
CN101558490A (en) * 2006-12-05 2009-10-14 住友电木株式会社 Semiconductor package, core layer material, build-up layer material, and sealing resin composition
US8093506B2 (en) * 2006-12-21 2012-01-10 Ngk Spark Plug Co., Ltd. Multilayer wiring board and power supply structure to be embedded in multilayer wiring board
JP4279869B2 (en) * 2006-12-26 2009-06-17 Tdk株式会社 Multilayer ceramic substrate
JP4265668B2 (en) * 2007-03-08 2009-05-20 ソニー株式会社 Circuit board manufacturing method and circuit board
US20080217748A1 (en) * 2007-03-08 2008-09-11 International Business Machines Corporation Low cost and low coefficient of thermal expansion packaging structures and processes
TWI416673B (en) * 2007-03-30 2013-11-21 住友電木股份有限公司 Splicing structure, buildup material, sealing resin composition and circuit substrate for flip chip semiconductor package
JP2008283140A (en) 2007-05-14 2008-11-20 Shinko Electric Ind Co Ltd Wiring board manufacturing method and wiring board
US8877565B2 (en) 2007-06-28 2014-11-04 Intel Corporation Method of forming a multilayer substrate core structure using sequential microvia laser drilling and substrate core structure formed according to the method
JP5080234B2 (en) * 2007-12-19 2012-11-21 新光電気工業株式会社 Wiring board and manufacturing method thereof
US20090174069A1 (en) * 2008-01-04 2009-07-09 National Semiconductor Corporation I/o pad structure for enhancing solder joint reliability in integrated circuit devices
JP5138395B2 (en) 2008-01-22 2013-02-06 新光電気工業株式会社 Wiring board and manufacturing method thereof
TW200933899A (en) 2008-01-29 2009-08-01 Sanyo Electric Co Mesa type semiconductor device and method for making the same
JP5207868B2 (en) * 2008-02-08 2013-06-12 ルネサスエレクトロニクス株式会社 Semiconductor device
JP5176995B2 (en) 2008-05-14 2013-04-03 凸版印刷株式会社 Manufacturing method of multilayer substrate for semiconductor package
JP5217639B2 (en) * 2008-05-30 2013-06-19 富士通株式会社 Core substrate and printed wiring board
WO2009147936A1 (en) 2008-06-02 2009-12-10 イビデン株式会社 Method for manufacturing multilayer printed wiring board
JP5352146B2 (en) * 2008-07-23 2013-11-27 ルネサスエレクトロニクス株式会社 Semiconductor device
US7749900B2 (en) * 2008-09-30 2010-07-06 Intel Corporation Method and core materials for semiconductor packaging
US20100164030A1 (en) * 2008-12-31 2010-07-01 International Business Machines Corporation Chip carrier bearing large silicon for high performance computing and related method
US9420707B2 (en) 2009-12-17 2016-08-16 Intel Corporation Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
US8207453B2 (en) 2009-12-17 2012-06-26 Intel Corporation Glass core substrate for integrated circuit devices and methods of making the same
JP2011204765A (en) 2010-03-24 2011-10-13 Toshiba Corp Method for manufacturing semiconductor device, and semiconductor device
WO2012061304A1 (en) * 2010-11-02 2012-05-10 Georgia Tech Research Corporation Ultra-thin interposer assemblies with through vias
US8674235B2 (en) 2011-06-06 2014-03-18 Intel Corporation Microelectronic substrate for alternate package functionality
WO2013133827A1 (en) 2012-03-07 2013-09-12 Intel Corporation Glass clad microelectronic substrate
US9001520B2 (en) 2012-09-24 2015-04-07 Intel Corporation Microelectronic structures having laminated or embedded glass routing structures for high density packaging

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