IN2014DN07329A - - Google Patents
Info
- Publication number
- IN2014DN07329A IN2014DN07329A IN7329DEN2014A IN2014DN07329A IN 2014DN07329 A IN2014DN07329 A IN 2014DN07329A IN 7329DEN2014 A IN7329DEN2014 A IN 7329DEN2014A IN 2014DN07329 A IN2014DN07329 A IN 2014DN07329A
- Authority
- IN
- India
- Prior art keywords
- substrate
- ion implanted
- implanted layer
- waveguide
- cation
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 5
- 150000002500 ions Chemical class 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 150000001768 cations Chemical class 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 238000009827 uniform distribution Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0055—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ion implantation
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/145—Measuring characteristics of blood in vivo, e.g. gas concentration or pH-value ; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid or cerebral tissue
- A61B5/1455—Measuring characteristics of blood in vivo, e.g. gas concentration or pH-value ; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid or cerebral tissue using optical sensors, e.g. spectral photometrical oximeters
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12061—Silicon
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12188—Ion implantation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Health & Medical Sciences (AREA)
- Pathology (AREA)
- Biomedical Technology (AREA)
- Heart & Thoracic Surgery (AREA)
- Medical Informatics (AREA)
- Molecular Biology (AREA)
- Surgery (AREA)
- Animal Behavior & Ethology (AREA)
- Biophysics (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Integrated Circuits (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1202128.3A GB201202128D0 (en) | 2012-02-08 | 2012-02-08 | Novel material |
| PCT/GB2013/050300 WO2013117941A2 (fr) | 2012-02-08 | 2013-02-08 | Nouveau matériau |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014DN07329A true IN2014DN07329A (fr) | 2015-04-24 |
Family
ID=45896770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN7329DEN2014 IN2014DN07329A (fr) | 2012-02-08 | 2013-02-08 |
Country Status (10)
| Country | Link |
|---|---|
| US (3) | US10604445B2 (fr) |
| EP (1) | EP2819968B1 (fr) |
| KR (1) | KR102060211B1 (fr) |
| CN (1) | CN104093676B (fr) |
| ES (1) | ES2779628T3 (fr) |
| GB (1) | GB201202128D0 (fr) |
| HK (1) | HK1199869A1 (fr) |
| IN (1) | IN2014DN07329A (fr) |
| SG (2) | SG10201900166SA (fr) |
| WO (1) | WO2013117941A2 (fr) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201202128D0 (en) | 2012-02-08 | 2012-03-21 | Univ Leeds | Novel material |
| GB201514431D0 (en) * | 2015-08-13 | 2015-09-30 | Univ Leeds | Improvements in and relating to materials |
| WO2017178171A1 (fr) * | 2016-04-12 | 2017-10-19 | Agc Glass Europe | Substrat en verre antireflet et son procédé de fabrication |
| US20210087106A1 (en) * | 2018-03-05 | 2021-03-25 | Agc Glass Europe | Anti-glare glass sheet |
| CN114245721A (zh) * | 2020-05-22 | 2022-03-25 | 谷歌有限责任公司 | 在检测光电容积描记时用于光学放大的掺铒玻璃 |
Family Cites Families (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4281030A (en) * | 1980-05-12 | 1981-07-28 | Bell Telephone Laboratories, Incorporated | Implantation of vaporized material on melted substrates |
| GB2080027B (en) | 1980-07-10 | 1985-02-27 | Hughes Technology Pty Ltd | Laser particle generator |
| US4751100A (en) * | 1983-06-20 | 1988-06-14 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium and method for making the same |
| JPS614240A (ja) * | 1984-06-18 | 1986-01-10 | Toshiba Corp | 半導体装置の製造方法 |
| FR2594853A1 (fr) * | 1986-02-25 | 1987-08-28 | Commissariat Energie Atomique | Procede et dispositif de traitement d'un materiau par effet thermo-ionique en vue d'en modifier ses proprietes physico-chimiques |
| EP0244496B1 (fr) * | 1986-05-06 | 1991-01-16 | Ibm Deutschland Gmbh | Masque pour lithographie avec des ions, des électrons ou avec des rayons X et procédé de fabrication |
| IT1211939B (it) | 1987-11-27 | 1989-11-08 | Siv Soc Italiana Vetro | Procedimento per la fabbricazione di vetri con caratteristiche energetiche modificate e prodotto cosi'ottenuto |
| US5342690A (en) | 1992-11-20 | 1994-08-30 | Ford Motor Company | Reticular glass surface |
| FR2709763B1 (fr) * | 1993-09-08 | 1995-10-13 | Commissariat Energie Atomique | Dispositif de traitement d'un matériau, à tête photo-ionique miniaturisée. |
| JP3514500B2 (ja) * | 1994-01-28 | 2004-03-31 | 株式会社ルネサステクノロジ | 半導体装置及びその製造方法 |
| JPH08133793A (ja) | 1994-10-31 | 1996-05-28 | Asahi Glass Co Ltd | 熱線反射ガラス及びその製造方法 |
| US5683757A (en) * | 1995-08-25 | 1997-11-04 | Iskanderova; Zelina A. | Surface modification of polymers and carbon-based materials by ion implantation and oxidative conversion |
| JP2832340B2 (ja) | 1996-01-19 | 1998-12-09 | 工業技術院長 | 光誘起屈折率変化ガラス材料の製造方法、光誘起屈折率変化ガラス材料およびガラス材料の屈折率変化方法 |
| US5871826A (en) * | 1996-05-30 | 1999-02-16 | Xerox Corporation | Proximity laser doping technique for electronic materials |
| JP3337953B2 (ja) * | 1997-09-05 | 2002-10-28 | シャープ株式会社 | Soi・mosfet及びその製造方法 |
| US6107641A (en) * | 1997-09-10 | 2000-08-22 | Xerox Corporation | Thin film transistor with reduced parasitic capacitance and reduced feed-through voltage |
| DE19756348C1 (de) | 1997-11-03 | 1999-04-15 | Fraunhofer Ges Forschung | Verfahren zum Bekeimen und/oder Implantieren und/oder Beschichten und/oder Strukturieren einer Oberfläche und Lasersputteranlage zur Durchführung des Verfahrens |
| US6600563B1 (en) * | 1997-12-12 | 2003-07-29 | Applera Corporation | Optical resonance analysis system |
| US6294223B1 (en) * | 1997-12-23 | 2001-09-25 | Georgia Tech Research Corp. | Method for ion implantation induced embedded particle formation via reduction |
| US6372585B1 (en) | 1998-09-25 | 2002-04-16 | Texas Instruments Incorporated | Semiconductor device method |
| US6330388B1 (en) * | 1999-01-27 | 2001-12-11 | Northstar Photonics, Inc. | Method and apparatus for waveguide optics and devices |
| US6509070B1 (en) * | 2000-09-22 | 2003-01-21 | The United States Of America As Represented By The Secretary Of The Air Force | Laser ablation, low temperature-fabricated yttria-stabilized zirconia oriented films |
| US6878562B2 (en) * | 2000-10-20 | 2005-04-12 | Phosistor Technologies, Incorporated | Method for shifting the bandgap energy of a quantum well layer |
| FR2818390B1 (fr) * | 2000-12-15 | 2003-11-07 | Ion Beam Services | Guide d'onde comportant un canal sur un substrat optique |
| JP2003057469A (ja) * | 2001-04-11 | 2003-02-26 | Makoto Fujimaki | 光導波路グレーティング、その形成方法、およびその形成用マスク |
| US7386207B2 (en) * | 2001-12-27 | 2008-06-10 | Kotura, Inc. | In-line light sensor |
| US7462857B2 (en) * | 2002-09-19 | 2008-12-09 | Sharp Kabushiki Kaisha | Memory device including resistance-changing function body |
| JP4563652B2 (ja) * | 2003-03-13 | 2010-10-13 | シャープ株式会社 | メモリ機能体および微粒子形成方法並びにメモリ素子、半導体装置および電子機器 |
| KR100547830B1 (ko) * | 2003-08-13 | 2006-01-31 | 삼성전자주식회사 | 집적광학장치 및 그 제조방법 |
| GB2408209A (en) | 2003-11-18 | 2005-05-25 | Qinetiq Ltd | Flexible medical light source |
| CN102064367B (zh) * | 2003-12-08 | 2013-01-30 | 松下电器产业株式会社 | 半导体电极及其制造方法、和使用该半导体电极的光电池 |
| JP4378527B2 (ja) | 2004-02-03 | 2009-12-09 | 国立大学法人 千葉大学 | 複数のコアを有する光ファイバーの製造方法及びその製造に用い得る柱状ガラス体の製造方法 |
| WO2005080285A1 (fr) | 2004-02-20 | 2005-09-01 | Waseda University | Procédé de durcissement de verre et verre durci produit par le procede |
| JP5028640B2 (ja) * | 2004-03-26 | 2012-09-19 | 日亜化学工業株式会社 | 窒化物半導体レーザ素子 |
| JP4359207B2 (ja) * | 2004-08-30 | 2009-11-04 | シャープ株式会社 | 微粒子含有体の製造方法 |
| EP1826814B8 (fr) * | 2004-12-13 | 2011-04-13 | Panasonic Corporation | Procede de dopage au plasma |
| FI20050216A0 (fi) * | 2005-02-23 | 2005-02-23 | Ruuttu Jari | Menetelmä valmistaa timanttia, muita jalokiviä, kuten safiiria, rubiinia jne. ja suorittaa näillä pinnoituksia sekä suorittaa pinnoituksia muilla aineilla, kuten boriideillä, oksideillä, nitrideillä jne. |
| US20060240275A1 (en) * | 2005-04-25 | 2006-10-26 | Gadkaree Kishor P | Flexible display substrates |
| CN101160643B (zh) * | 2005-05-12 | 2012-04-18 | 松下电器产业株式会社 | 等离子体掺入方法和等离子体掺入设备 |
| JP4834412B2 (ja) | 2006-02-03 | 2011-12-14 | 富士フイルム株式会社 | 固体撮像装置およびこれを用いた電子内視鏡 |
| WO2007096476A2 (fr) * | 2006-02-23 | 2007-08-30 | Picodeon Ltd Oy | Revêtement sur substrat médical et produit médical revêtu |
| US20070267762A1 (en) * | 2006-05-19 | 2007-11-22 | Interuniversitair Microelektronica Centrum Vzw (Imec) | Semiconductor devices |
| CN101186446B (zh) * | 2007-11-27 | 2010-08-11 | 西安交通大学 | 光敏特性的二氧化锗基有机-无机复合材料的制备方法 |
| KR100918381B1 (ko) * | 2007-12-17 | 2009-09-22 | 한국전자통신연구원 | 광통신을 위한 회절격자 커플러를 포함하는 반도체집적회로 및 그 형성 방법 |
| US8535766B2 (en) * | 2008-10-22 | 2013-09-17 | Applied Materials, Inc. | Patterning of magnetic thin film using energized ions |
| JP2010062291A (ja) * | 2008-09-03 | 2010-03-18 | Sumco Corp | 半導体基板及びその製造方法 |
| JP2010184825A (ja) | 2009-02-10 | 2010-08-26 | Olympus Corp | 複合型光学素子の製造方法および複合型光学素子 |
| WO2011000357A2 (fr) * | 2009-06-30 | 2011-01-06 | Vascotec Gmbh | Procédé et dispositif de dépôt de couches minces, notamment pour la fabrication de couches multi-strates, de nanocouches, de nanostructures et de nanocomposites |
| GB0915944D0 (en) | 2009-09-10 | 2009-10-28 | Univ Leeds | Device |
| US8269931B2 (en) * | 2009-09-14 | 2012-09-18 | The Aerospace Corporation | Systems and methods for preparing films using sequential ion implantation, and films formed using same |
| NL2003488C2 (nl) * | 2009-09-14 | 2011-03-15 | Rexnord Flattop Europe Bv | Transportketting. |
| US8581349B1 (en) * | 2011-05-02 | 2013-11-12 | Monolithic 3D Inc. | 3D memory semiconductor device and structure |
| EP2588639B1 (fr) | 2010-07-02 | 2016-09-07 | Aptar France SAS | Procede de traitement de surface d'un dispositif de distribution de produit fluide. |
| WO2012001330A2 (fr) | 2010-07-02 | 2012-01-05 | Valois Sas | Procede de traitement de surface d'un dispositif de distribution de produit fluide. |
| US8946864B2 (en) * | 2011-03-16 | 2015-02-03 | The Aerospace Corporation | Systems and methods for preparing films comprising metal using sequential ion implantation, and films formed using same |
| GB201202128D0 (en) * | 2012-02-08 | 2012-03-21 | Univ Leeds | Novel material |
| US20150132507A1 (en) * | 2012-05-25 | 2015-05-14 | University Of Leeds | Medium For Random Laser And Manufacturing Process of the Same |
| US20140227461A1 (en) | 2013-02-14 | 2014-08-14 | Dillard University | Multiple Beam Pulsed Laser Deposition Of Composite Films |
| FR3002240B1 (fr) | 2013-02-15 | 2015-07-10 | Quertech Ingenierie | Procede de traitement par un faisceau d'ions pour produire des materiaux en verre antireflet durable |
| CA2939489A1 (fr) * | 2014-02-11 | 2015-08-20 | The Mackinac Technology Company | Materiaux carbones semblables au diamant, fluores et hydrogenes, pour revetements anti-reflet |
| US10502895B2 (en) * | 2016-01-06 | 2019-12-10 | Elenion Technologies, Llc | Integrated on-chip polarizer |
-
2012
- 2012-02-08 GB GBGB1202128.3A patent/GB201202128D0/en not_active Ceased
-
2013
- 2013-02-08 CN CN201380008820.9A patent/CN104093676B/zh active Active
- 2013-02-08 SG SG10201900166SA patent/SG10201900166SA/en unknown
- 2013-02-08 US US14/377,403 patent/US10604445B2/en active Active
- 2013-02-08 EP EP13705240.3A patent/EP2819968B1/fr active Active
- 2013-02-08 KR KR1020147025134A patent/KR102060211B1/ko active Active
- 2013-02-08 WO PCT/GB2013/050300 patent/WO2013117941A2/fr not_active Ceased
- 2013-02-08 ES ES13705240T patent/ES2779628T3/es active Active
- 2013-02-08 IN IN7329DEN2014 patent/IN2014DN07329A/en unknown
- 2013-02-08 HK HK15100402.5A patent/HK1199869A1/xx unknown
- 2013-02-08 SG SG11201404329WA patent/SG11201404329WA/en unknown
-
2019
- 2019-02-08 US US16/270,735 patent/US11198643B2/en active Active
-
2020
- 2020-03-18 US US16/822,468 patent/US20200239362A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140143755A (ko) | 2014-12-17 |
| CN104093676A (zh) | 2014-10-08 |
| ES2779628T3 (es) | 2020-08-18 |
| US11198643B2 (en) | 2021-12-14 |
| US20200239362A1 (en) | 2020-07-30 |
| WO2013117941A3 (fr) | 2013-10-24 |
| WO2013117941A2 (fr) | 2013-08-15 |
| SG10201900166SA (en) | 2019-02-27 |
| GB201202128D0 (en) | 2012-03-21 |
| US20170297958A9 (en) | 2017-10-19 |
| HK1199869A1 (en) | 2015-07-24 |
| KR102060211B1 (ko) | 2019-12-27 |
| US20190256413A1 (en) | 2019-08-22 |
| US20170152174A9 (en) | 2017-06-01 |
| EP2819968A2 (fr) | 2015-01-07 |
| SG11201404329WA (en) | 2014-08-28 |
| US10604445B2 (en) | 2020-03-31 |
| US20150353419A1 (en) | 2015-12-10 |
| CN104093676B (zh) | 2018-04-10 |
| EP2819968B1 (fr) | 2020-01-08 |
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