IN2014KN02415A - - Google Patents
Info
- Publication number
- IN2014KN02415A IN2014KN02415A IN2415KON2014A IN2014KN02415A IN 2014KN02415 A IN2014KN02415 A IN 2014KN02415A IN 2415KON2014 A IN2415KON2014 A IN 2415KON2014A IN 2014KN02415 A IN2014KN02415 A IN 2014KN02415A
- Authority
- IN
- India
- Prior art keywords
- reflected wave
- wave power
- power
- control
- frequency
- Prior art date
Links
- 230000006978 adaptation Effects 0.000 abstract 1
- 238000009499 grossing Methods 0.000 abstract 1
- 230000007774 longterm Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32944—Arc detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M1/00—Details of apparatus for conversion
- H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
- H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
- H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
- H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/539—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters with automatic control of output wave form or frequency
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
- H05H2242/26—Matching networks
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012136942A JP5534365B2 (ja) | 2012-06-18 | 2012-06-18 | 高周波電力供給装置、及び反射波電力制御方法 |
| PCT/JP2013/065339 WO2013190987A1 (ja) | 2012-06-18 | 2013-06-03 | 高周波電力供給装置、及び反射波電力制御方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014KN02415A true IN2014KN02415A (pl) | 2015-05-01 |
Family
ID=49768589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN2415KON2014 IN2014KN02415A (pl) | 2012-06-18 | 2013-06-03 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9070537B2 (pl) |
| EP (1) | EP2833703B1 (pl) |
| JP (1) | JP5534365B2 (pl) |
| KR (1) | KR101523484B1 (pl) |
| CN (1) | CN104322154B (pl) |
| DE (1) | DE13807713T1 (pl) |
| IN (1) | IN2014KN02415A (pl) |
| PL (1) | PL2833703T3 (pl) |
| TW (1) | TWI472270B (pl) |
| WO (1) | WO2013190987A1 (pl) |
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| DE102013205936B4 (de) * | 2013-04-04 | 2016-07-14 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren zur Regelung einer Regelstrecke mit normierter Auswahlgröße |
| DE102013110883B3 (de) | 2013-10-01 | 2015-01-15 | TRUMPF Hüttinger GmbH + Co. KG | Vorrichtung und Verfahren zur Überwachung einer Entladung in einem Plasmaprozess |
| WO2015073921A1 (en) | 2013-11-14 | 2015-05-21 | Eagle Harbor Technologies, Inc. | This disclosure relates generally to a high voltage nanosecond pulser. |
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-
2012
- 2012-06-18 JP JP2012136942A patent/JP5534365B2/ja active Active
-
2013
- 2013-01-07 TW TW102100411A patent/TWI472270B/zh active
- 2013-06-03 KR KR1020147034773A patent/KR101523484B1/ko active Active
- 2013-06-03 EP EP13807713.6A patent/EP2833703B1/en active Active
- 2013-06-03 DE DE13807713.6T patent/DE13807713T1/de active Pending
- 2013-06-03 US US14/394,341 patent/US9070537B2/en active Active
- 2013-06-03 PL PL13807713T patent/PL2833703T3/pl unknown
- 2013-06-03 WO PCT/JP2013/065339 patent/WO2013190987A1/ja not_active Ceased
- 2013-06-03 IN IN2415KON2014 patent/IN2014KN02415A/en unknown
- 2013-06-03 CN CN201380028359.3A patent/CN104322154B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014002898A (ja) | 2014-01-09 |
| EP2833703B1 (en) | 2017-04-19 |
| KR101523484B1 (ko) | 2015-05-27 |
| TW201401937A (zh) | 2014-01-01 |
| PL2833703T3 (pl) | 2017-09-29 |
| EP2833703A4 (en) | 2015-09-23 |
| DE13807713T1 (de) | 2015-05-21 |
| US9070537B2 (en) | 2015-06-30 |
| EP2833703A1 (en) | 2015-02-04 |
| JP5534365B2 (ja) | 2014-06-25 |
| WO2013190987A1 (ja) | 2013-12-27 |
| US20150084509A1 (en) | 2015-03-26 |
| CN104322154A (zh) | 2015-01-28 |
| CN104322154B (zh) | 2015-11-25 |
| TWI472270B (zh) | 2015-02-01 |
| KR20140147158A (ko) | 2014-12-29 |
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