IT1054547B - Transistore privo degli effetti associati alla presenza di bordi - Google Patents
Transistore privo degli effetti associati alla presenza di bordiInfo
- Publication number
- IT1054547B IT1054547B IT19687/76A IT1968776A IT1054547B IT 1054547 B IT1054547 B IT 1054547B IT 19687/76 A IT19687/76 A IT 19687/76A IT 1968776 A IT1968776 A IT 1968776A IT 1054547 B IT1054547 B IT 1054547B
- Authority
- IT
- Italy
- Prior art keywords
- edges
- effects associated
- transistor free
- transistor
- free
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6706—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device for preventing leakage current
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/581,041 US4054894A (en) | 1975-05-27 | 1975-05-27 | Edgeless transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1054547B true IT1054547B (it) | 1981-11-30 |
Family
ID=24323661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT19687/76A IT1054547B (it) | 1975-05-27 | 1976-01-28 | Transistore privo degli effetti associati alla presenza di bordi |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4054894A (it) |
| JP (1) | JPS51144586A (it) |
| DE (1) | DE2607203B2 (it) |
| FR (1) | FR2312860A1 (it) |
| GB (1) | GB1525415A (it) |
| IT (1) | IT1054547B (it) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5396767A (en) * | 1977-02-04 | 1978-08-24 | Agency Of Ind Science & Technol | Protecting circuit of semiconductor integrated circuit on insulation substrate |
| US4791464A (en) * | 1987-05-12 | 1988-12-13 | General Electric Company | Semiconductor device that minimizes the leakage current associated with the parasitic edge transistors and a method of making the same |
| US4864380A (en) * | 1987-05-12 | 1989-09-05 | General Electric Company | Edgeless CMOS device |
| US4918498A (en) * | 1987-05-12 | 1990-04-17 | General Electric Company | Edgeless semiconductor device |
| JP2582794B2 (ja) * | 1987-08-10 | 1997-02-19 | 株式会社東芝 | 半導体装置及びその製造方法 |
| USH1435H (en) * | 1991-10-21 | 1995-05-02 | Cherne Richard D | SOI CMOS device having body extension for providing sidewall channel stop and bodytie |
| US5293052A (en) * | 1992-03-23 | 1994-03-08 | Harris Corporation | SOT CMOS device having differentially doped body extension for providing improved backside leakage channel stop |
| GB2283127A (en) * | 1993-09-10 | 1995-04-26 | Philips Electronics Uk Ltd | Thin-film transistors with reduced leakage |
| JP2001196591A (ja) * | 2000-01-13 | 2001-07-19 | Internatl Business Mach Corp <Ibm> | 薄膜トランジスタ、および薄膜トランジスタの製造方法 |
| US7304354B2 (en) | 2004-02-17 | 2007-12-04 | Silicon Space Technology Corp. | Buried guard ring and radiation hardened isolation structures and fabrication methods |
| US8278719B2 (en) * | 2005-10-14 | 2012-10-02 | Silicon Space Technology Corp. | Radiation hardened isolation structures and fabrication methods |
| DE102006036325B4 (de) * | 2006-08-04 | 2009-01-22 | Universität Stuttgart Institut für Hochfrequenztechnik | Ultra-breitbandige Dipolantenne mit dielektrischem Stab und Reflektor |
| GB2460395A (en) * | 2008-04-29 | 2009-12-02 | Sharp Kk | Thin film transistor and active matrix display |
| US20110084324A1 (en) * | 2009-10-09 | 2011-04-14 | Texas Instruments Incorporated | Radiation hardened mos devices and methods of fabrication |
| US9569583B2 (en) | 2014-04-07 | 2017-02-14 | TallannQuest LLC | Method and system for computer-aided design of radiation-hardened integrated circuits |
| CN105448734A (zh) * | 2014-09-02 | 2016-03-30 | 无锡华润上华半导体有限公司 | 一种改善器件双峰效应的方法和半导体器件 |
| US10038058B2 (en) | 2016-05-07 | 2018-07-31 | Silicon Space Technology Corporation | FinFET device structure and method for forming same |
| US11158741B2 (en) * | 2020-02-11 | 2021-10-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Nanostructure device and method |
| US11784250B1 (en) | 2023-02-02 | 2023-10-10 | Apogee Semiconductor, Inc. | Devices and methods for compact radiation-hardened integrated circuits |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3840888A (en) * | 1969-12-30 | 1974-10-08 | Ibm | Complementary mosfet device structure |
| US3898684A (en) * | 1970-12-07 | 1975-08-05 | Motorola Inc | Diffusion guarded metal-oxide-silicon field effect transistors |
| JPS5753668B2 (it) * | 1973-05-15 | 1982-11-13 | ||
| US3890632A (en) * | 1973-12-03 | 1975-06-17 | Rca Corp | Stabilized semiconductor devices and method of making same |
| US4015279A (en) * | 1975-05-27 | 1977-03-29 | Rca Corporation | Edgeless transistor |
-
1975
- 1975-05-27 US US05/581,041 patent/US4054894A/en not_active Expired - Lifetime
-
1976
- 1976-01-28 IT IT19687/76A patent/IT1054547B/it active
- 1976-02-19 GB GB6578/76A patent/GB1525415A/en not_active Expired
- 1976-02-23 DE DE2607203A patent/DE2607203B2/de not_active Withdrawn
- 1976-02-25 JP JP51020550A patent/JPS51144586A/ja active Pending
- 1976-02-26 FR FR7605409A patent/FR2312860A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| FR2312860A1 (fr) | 1976-12-24 |
| DE2607203B2 (de) | 1979-05-23 |
| DE2607203A1 (de) | 1976-12-16 |
| GB1525415A (en) | 1978-09-20 |
| US4054894A (en) | 1977-10-18 |
| JPS51144586A (en) | 1976-12-11 |
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