IT1054547B - Transistore privo degli effetti associati alla presenza di bordi - Google Patents

Transistore privo degli effetti associati alla presenza di bordi

Info

Publication number
IT1054547B
IT1054547B IT19687/76A IT1968776A IT1054547B IT 1054547 B IT1054547 B IT 1054547B IT 19687/76 A IT19687/76 A IT 19687/76A IT 1968776 A IT1968776 A IT 1968776A IT 1054547 B IT1054547 B IT 1054547B
Authority
IT
Italy
Prior art keywords
edges
effects associated
transistor free
transistor
free
Prior art date
Application number
IT19687/76A
Other languages
English (en)
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Application granted granted Critical
Publication of IT1054547B publication Critical patent/IT1054547B/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6706Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device for preventing leakage current 
IT19687/76A 1975-05-27 1976-01-28 Transistore privo degli effetti associati alla presenza di bordi IT1054547B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/581,041 US4054894A (en) 1975-05-27 1975-05-27 Edgeless transistor

Publications (1)

Publication Number Publication Date
IT1054547B true IT1054547B (it) 1981-11-30

Family

ID=24323661

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19687/76A IT1054547B (it) 1975-05-27 1976-01-28 Transistore privo degli effetti associati alla presenza di bordi

Country Status (6)

Country Link
US (1) US4054894A (it)
JP (1) JPS51144586A (it)
DE (1) DE2607203B2 (it)
FR (1) FR2312860A1 (it)
GB (1) GB1525415A (it)
IT (1) IT1054547B (it)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5396767A (en) * 1977-02-04 1978-08-24 Agency Of Ind Science & Technol Protecting circuit of semiconductor integrated circuit on insulation substrate
US4791464A (en) * 1987-05-12 1988-12-13 General Electric Company Semiconductor device that minimizes the leakage current associated with the parasitic edge transistors and a method of making the same
US4864380A (en) * 1987-05-12 1989-09-05 General Electric Company Edgeless CMOS device
US4918498A (en) * 1987-05-12 1990-04-17 General Electric Company Edgeless semiconductor device
JP2582794B2 (ja) * 1987-08-10 1997-02-19 株式会社東芝 半導体装置及びその製造方法
USH1435H (en) * 1991-10-21 1995-05-02 Cherne Richard D SOI CMOS device having body extension for providing sidewall channel stop and bodytie
US5293052A (en) * 1992-03-23 1994-03-08 Harris Corporation SOT CMOS device having differentially doped body extension for providing improved backside leakage channel stop
GB2283127A (en) * 1993-09-10 1995-04-26 Philips Electronics Uk Ltd Thin-film transistors with reduced leakage
JP2001196591A (ja) * 2000-01-13 2001-07-19 Internatl Business Mach Corp <Ibm> 薄膜トランジスタ、および薄膜トランジスタの製造方法
US7304354B2 (en) 2004-02-17 2007-12-04 Silicon Space Technology Corp. Buried guard ring and radiation hardened isolation structures and fabrication methods
US8278719B2 (en) * 2005-10-14 2012-10-02 Silicon Space Technology Corp. Radiation hardened isolation structures and fabrication methods
DE102006036325B4 (de) * 2006-08-04 2009-01-22 Universität Stuttgart Institut für Hochfrequenztechnik Ultra-breitbandige Dipolantenne mit dielektrischem Stab und Reflektor
GB2460395A (en) * 2008-04-29 2009-12-02 Sharp Kk Thin film transistor and active matrix display
US20110084324A1 (en) * 2009-10-09 2011-04-14 Texas Instruments Incorporated Radiation hardened mos devices and methods of fabrication
US9569583B2 (en) 2014-04-07 2017-02-14 TallannQuest LLC Method and system for computer-aided design of radiation-hardened integrated circuits
CN105448734A (zh) * 2014-09-02 2016-03-30 无锡华润上华半导体有限公司 一种改善器件双峰效应的方法和半导体器件
US10038058B2 (en) 2016-05-07 2018-07-31 Silicon Space Technology Corporation FinFET device structure and method for forming same
US11158741B2 (en) * 2020-02-11 2021-10-26 Taiwan Semiconductor Manufacturing Company, Ltd. Nanostructure device and method
US11784250B1 (en) 2023-02-02 2023-10-10 Apogee Semiconductor, Inc. Devices and methods for compact radiation-hardened integrated circuits

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3840888A (en) * 1969-12-30 1974-10-08 Ibm Complementary mosfet device structure
US3898684A (en) * 1970-12-07 1975-08-05 Motorola Inc Diffusion guarded metal-oxide-silicon field effect transistors
JPS5753668B2 (it) * 1973-05-15 1982-11-13
US3890632A (en) * 1973-12-03 1975-06-17 Rca Corp Stabilized semiconductor devices and method of making same
US4015279A (en) * 1975-05-27 1977-03-29 Rca Corporation Edgeless transistor

Also Published As

Publication number Publication date
FR2312860A1 (fr) 1976-12-24
DE2607203B2 (de) 1979-05-23
DE2607203A1 (de) 1976-12-16
GB1525415A (en) 1978-09-20
US4054894A (en) 1977-10-18
JPS51144586A (en) 1976-12-11

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