IT1112272B - Apparecchiatura per controllare lo sviluppo di un tracciato su una pellicola resistiva - Google Patents

Apparecchiatura per controllare lo sviluppo di un tracciato su una pellicola resistiva

Info

Publication number
IT1112272B
IT1112272B IT24900/78A IT2490078A IT1112272B IT 1112272 B IT1112272 B IT 1112272B IT 24900/78 A IT24900/78 A IT 24900/78A IT 2490078 A IT2490078 A IT 2490078A IT 1112272 B IT1112272 B IT 1112272B
Authority
IT
Italy
Prior art keywords
track
development
control
resistive film
resistive
Prior art date
Application number
IT24900/78A
Other languages
English (en)
Other versions
IT7824900A0 (it
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT7824900A0 publication Critical patent/IT7824900A0/it
Application granted granted Critical
Publication of IT1112272B publication Critical patent/IT1112272B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IT24900/78A 1977-06-30 1978-06-23 Apparecchiatura per controllare lo sviluppo di un tracciato su una pellicola resistiva IT1112272B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/811,758 US4142107A (en) 1977-06-30 1977-06-30 Resist development control system

Publications (2)

Publication Number Publication Date
IT7824900A0 IT7824900A0 (it) 1978-06-23
IT1112272B true IT1112272B (it) 1986-01-13

Family

ID=25207490

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24900/78A IT1112272B (it) 1977-06-30 1978-06-23 Apparecchiatura per controllare lo sviluppo di un tracciato su una pellicola resistiva

Country Status (8)

Country Link
US (1) US4142107A (it)
JP (1) JPS5412672A (it)
CA (1) CA1085968A (it)
DE (1) DE2825546A1 (it)
FR (1) FR2396332A1 (it)
GB (1) GB2000606B (it)
IT (1) IT1112272B (it)
NL (1) NL7804574A (it)

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US4201579A (en) * 1978-06-05 1980-05-06 Motorola, Inc. Method for removing photoresist by hydrogen plasma
JPS56157032A (en) * 1980-05-09 1981-12-04 Nec Corp Manufacture of element having minute pattern
JPS589242A (ja) * 1981-07-08 1983-01-19 Pioneer Electronic Corp フオトレジスト湿式現像方法及び装置
GB2108707B (en) * 1981-07-08 1985-06-19 Pioneer Electronic Corp Method and system for developing a photo-resist material used as a recording medium
JPS5857843U (ja) * 1981-10-16 1983-04-19 パイオニア株式会社 フオトレジスト湿式現像装置
JPS5870530A (ja) * 1981-10-22 1983-04-27 Toshiba Corp レジストパタ−ン形成方法
US4462860A (en) * 1982-05-24 1984-07-31 At&T Bell Laboratories End point detection
US4569717A (en) * 1983-05-24 1986-02-11 Dainippon Screen Mfg. Co., Ltd. Method of surface treatment
JPH0669031B2 (ja) * 1984-07-17 1994-08-31 日本電気株式会社 半導体装置
JPS62193247A (ja) * 1986-02-20 1987-08-25 Fujitsu Ltd 現像終点決定方法
GB8606748D0 (en) * 1986-03-19 1986-04-23 Secr Defence Monitoring surface layer growth
US4788117A (en) * 1987-01-28 1988-11-29 American Telephone And Telegraph Company, At&T Bell Laboratories Semiconductor device fabrication including a non-destructive method for examining lithographically defined features
US5158845A (en) * 1989-10-20 1992-10-27 Crown Roll Leaf, Inc. Multi-colored material using rainbow grating
US5196285A (en) * 1990-05-18 1993-03-23 Xinix, Inc. Method for control of photoresist develop processes
US5124216A (en) * 1990-07-31 1992-06-23 At&T Bell Laboratories Method for monitoring photoresist latent images
IL99823A0 (en) * 1990-11-16 1992-08-18 Orbot Instr Ltd Optical inspection method and apparatus
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method
US5264328A (en) * 1992-04-24 1993-11-23 International Business Machines Corporation Resist development endpoint detection for X-ray lithography
US6461544B1 (en) * 1993-05-03 2002-10-08 Crown Roll Leaf, Inc. Two-dimensional/three-dimensional graphic material and method of making same
US5988896A (en) * 1996-10-26 1999-11-23 Applied Science Fiction, Inc. Method and apparatus for electronic film development
US6069714A (en) 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
US6017688A (en) 1997-01-30 2000-01-25 Applied Science Fiction, Inc. System and method for latent film recovery in electronic film development
JP4327266B2 (ja) * 1997-02-26 2009-09-09 株式会社東芝 パターン寸法評価方法及びパターン形成方法
EP1086577B1 (en) 1998-02-23 2002-09-18 Applied Science Fiction, Inc. Progressive area scan in electronic film development
US6245492B1 (en) 1998-08-13 2001-06-12 International Business Machines Corporation Photoresist system and process for aerial image enhancement
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
AU6202100A (en) * 1999-06-29 2001-01-31 Applied Science Fiction, Inc. Slot coating device for electronic film development
US6439784B1 (en) 1999-08-17 2002-08-27 Applied Science Fiction, Inc. Method and system for using calibration patches in electronic film processing
JP2001174409A (ja) * 1999-12-15 2001-06-29 Internatl Business Mach Corp <Ibm> ２波長管、検査用照明装置、検査装置及び該方法
AU2054401A (en) * 1999-12-17 2001-06-25 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
US6540416B2 (en) 1999-12-30 2003-04-01 Applied Science Fiction, Inc. System and method for digital film development using visible light
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US20010030685A1 (en) * 1999-12-30 2001-10-18 Darbin Stephen P. Method and apparatus for digital film processing using a scanning station having a single sensor
US6864973B2 (en) * 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
EP1247140A1 (en) 1999-12-30 2002-10-09 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
AU2463501A (en) * 1999-12-30 2001-07-24 Applied Science Fiction, Inc. Methods and apparatus for transporting and positioning film in a digital film processing system
WO2001050197A1 (en) 1999-12-30 2001-07-12 Applied Science Fiction, Inc. System and method for digital color dye film processing
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
AU2733601A (en) * 1999-12-31 2001-07-16 Applied Science Fiction, Inc. Digital film processing method
US6786655B2 (en) 2000-02-03 2004-09-07 Eastman Kodak Company Method and system for self-service film processing
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
WO2001057796A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Method, system, and software for signal processing using pyramidal decomposition
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US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
JP2004514156A (ja) 2000-02-03 2004-05-13 アプライド・サイエンス・フィクション フィルム処理液カートリッジ、および、フィルムを現像しかつディジタル化するための方法
WO2001057797A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Method, system and software for signal processing using sheep and shepherd artifacts
US20060182337A1 (en) * 2000-06-28 2006-08-17 Ford Benjamin C Method and apparatus for improving the quality of reconstructed information
US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
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US20020146171A1 (en) * 2000-10-01 2002-10-10 Applied Science Fiction, Inc. Method, apparatus and system for black segment detection
US6888997B2 (en) * 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
JP2004523793A (ja) 2001-02-09 2004-08-05 イーストマン コダック カンパニー デジタルフィルム処理液およびデジタルフィルムの処理方法
US6551750B2 (en) * 2001-03-16 2003-04-22 Numerical Technologies, Inc. Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks
US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
US6942546B2 (en) 2002-01-17 2005-09-13 Asm Nutool, Inc. Endpoint detection for non-transparent polishing member
AU2003248673A1 (en) * 2002-01-17 2003-09-16 Nutool, Inc. Advanced chemical mechanical polishing system with smart endpoint detection
CN100490505C (zh) * 2004-02-13 2009-05-20 索尼株式会社 图像处理装置和图像处理方法

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* Cited by examiner, † Cited by third party
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CH552197A (de) * 1972-11-24 1974-07-31 Bbc Brown Boveri & Cie Einrichtung zum messen der rauhigkeit einer oberflaeche.
US3874959A (en) * 1973-09-21 1975-04-01 Ibm Method to establish the endpoint during the delineation of oxides on semiconductor surfaces and apparatus therefor
FR2279135A1 (fr) * 1974-07-19 1976-02-13 Ibm Procede de fabrication d'un masque pour lithographie aux rayons x

Also Published As

Publication number Publication date
US4142107A (en) 1979-02-27
GB2000606A (en) 1979-01-10
NL7804574A (nl) 1979-01-03
GB2000606B (en) 1982-01-13
JPS5626977B2 (it) 1981-06-22
DE2825546A1 (de) 1979-01-04
CA1085968A (en) 1980-09-16
IT7824900A0 (it) 1978-06-23
FR2396332B1 (it) 1982-07-09
FR2396332A1 (fr) 1979-01-26
JPS5412672A (en) 1979-01-30

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