IT1164408B - Apparecchiatura di allineamento di proiezioni atta a controllare la luminosita' o intensita', e la distribuzione o uniformita' di esse - Google Patents

Apparecchiatura di allineamento di proiezioni atta a controllare la luminosita' o intensita', e la distribuzione o uniformita' di esse

Info

Publication number
IT1164408B
IT1164408B IT22492/83A IT2249283A IT1164408B IT 1164408 B IT1164408 B IT 1164408B IT 22492/83 A IT22492/83 A IT 22492/83A IT 2249283 A IT2249283 A IT 2249283A IT 1164408 B IT1164408 B IT 1164408B
Authority
IT
Italy
Prior art keywords
uniformity
brightness
intensity
distribution
control
Prior art date
Application number
IT22492/83A
Other languages
English (en)
Other versions
IT8322492A0 (it
Inventor
Morita Koyo
Nomura Keizo
Nishizuka Hiroshi
Hoshi Tai
Tamiya Yoichiro
Asakawa Terushige
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of IT8322492A0 publication Critical patent/IT8322492A0/it
Application granted granted Critical
Publication of IT1164408B publication Critical patent/IT1164408B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
IT22492/83A 1982-08-09 1983-08-09 Apparecchiatura di allineamento di proiezioni atta a controllare la luminosita' o intensita', e la distribuzione o uniformita' di esse IT1164408B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57137269A JPS5928337A (ja) 1982-08-09 1982-08-09 プロジエクシヨンアライナ

Publications (2)

Publication Number Publication Date
IT8322492A0 IT8322492A0 (it) 1983-08-09
IT1164408B true IT1164408B (it) 1987-04-08

Family

ID=15194718

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22492/83A IT1164408B (it) 1982-08-09 1983-08-09 Apparecchiatura di allineamento di proiezioni atta a controllare la luminosita' o intensita', e la distribuzione o uniformita' di esse

Country Status (7)

Country Link
US (3) US4598197A (it)
JP (1) JPS5928337A (it)
KR (1) KR840005916A (it)
DE (1) DE3328578A1 (it)
FR (1) FR2536547B1 (it)
GB (1) GB2126740A (it)
IT (1) IT1164408B (it)

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JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
US5153419A (en) * 1985-04-22 1992-10-06 Canon Kabushiki Kaisha Device for detecting position of a light source with source position adjusting means
US4947030A (en) * 1985-05-22 1990-08-07 Canon Kabushiki Kaisha Illuminating optical device
JPS62133475A (ja) * 1985-12-04 1987-06-16 Fuji Photo Film Co Ltd 未定着駒の定着方法
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
US4924257A (en) * 1988-10-05 1990-05-08 Kantilal Jain Scan and repeat high resolution projection lithography system
US5285488A (en) * 1989-09-21 1994-02-08 Canon Kabushiki Kaisha Exposure apparatus
DE69030348T2 (de) * 1989-10-03 1997-09-04 Canon K.K., Tokio/Tokyo Belichtungsvorrichtung
CA2069132C (en) * 1991-08-29 1996-01-09 Koji Fujii Light-beam heating apparatus
US5291240A (en) * 1992-10-27 1994-03-01 Anvik Corporation Nonlinearity-compensated large-area patterning system
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
EP0614124A3 (en) * 1993-02-01 1994-12-14 Nippon Kogaku Kk Exposure device.
US6753948B2 (en) 1993-04-27 2004-06-22 Nikon Corporation Scanning exposure method and apparatus
KR100296778B1 (ko) * 1993-06-11 2001-10-24 오노 시게오 노광장치및그장치를사용하는소자제조방법
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5559629A (en) * 1994-08-19 1996-09-24 Tamarack Scientific Co., Inc. Unit magnification projection system and method
US5712698A (en) * 1996-03-04 1998-01-27 Siemens Aktiengesellschaft Independently controllable shutters and variable area apertures for off axis illumination
US6013401A (en) * 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
US5966202A (en) * 1997-03-31 1999-10-12 Svg Lithography Systems, Inc. Adjustable slit
US5982475A (en) * 1997-09-30 1999-11-09 Tropel Corporation Raster-scan photolithographic reduction system
JP3517583B2 (ja) 1998-03-27 2004-04-12 キヤノン株式会社 露光装置、デバイス製造方法及び放電灯
EP0952491A3 (en) * 1998-04-21 2001-05-09 Asm Lithography B.V. Lithography apparatus
US6404499B1 (en) * 1998-04-21 2002-06-11 Asml Netherlands B.V. Lithography apparatus with filters for optimizing uniformity of an image
SE514835C2 (sv) 1999-01-21 2001-04-30 Micronic Laser Systems Ab System och metod för mikrolitografiskt skrivande
US7106493B2 (en) * 1999-07-27 2006-09-12 Sanford James E MEMS-based valve device
US6248509B1 (en) 1999-07-27 2001-06-19 James E. Sanford Maskless photoresist exposure system using mems devices
KR20010085493A (ko) * 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법
US6704090B2 (en) 2000-05-11 2004-03-09 Nikon Corporation Exposure method and exposure apparatus
US6788469B2 (en) * 2000-12-30 2004-09-07 Texas Instruments Incorporated Automated lamp focus
EP1267209A1 (en) * 2001-06-13 2002-12-18 James E. Sanford Maskless exposure system using mems devices
EP1491959A1 (en) * 2001-09-07 2004-12-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6744034B2 (en) * 2002-01-30 2004-06-01 Texas Instruments Incorporated Micro-electromechanical apparatus and method with position sensor compensation
WO2005017483A1 (ja) 2003-08-18 2005-02-24 Nikon Corporation 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法
DE102004063314A1 (de) 2004-12-23 2006-07-13 Carl Zeiss Smt Ag Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung
WO2007039257A1 (en) * 2005-10-03 2007-04-12 Firma Carl Zeiss Smt Ag Illumination system comprising an otpical filter
US8467032B2 (en) * 2008-04-09 2013-06-18 Nikon Corporation Exposure apparatus and electronic device manufacturing method
US8610986B2 (en) 2009-04-06 2013-12-17 The Board Of Trustees Of The University Of Illinois Mirror arrays for maskless photolithography and image display
NL2004770A (nl) * 2009-05-29 2010-11-30 Asml Holding Nv Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation.

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US3422442A (en) * 1966-01-12 1969-01-14 Us Army Micro-electronic form masking system
GB1305792A (it) * 1969-02-27 1973-02-07
US3700329A (en) * 1971-08-02 1972-10-24 Logetronics Inc Radiographic reduction system
US3949226A (en) * 1972-05-26 1976-04-06 Zenith Radio Corporation Automatic light intensity controller for CRT lighthouse
JPS5548693B2 (it) * 1973-06-26 1980-12-08
DD114726A1 (it) * 1974-07-23 1975-08-12
JPS5136357A (en) * 1974-09-19 1976-03-27 Kawase Gijutsu Kenkyusho Kk Gakushuzukueniokeru gakushuchunoshodobusokukeihosochi
JPS5182630A (it) * 1975-01-16 1976-07-20 Minolta Camera Kk
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
US4161363A (en) * 1975-08-04 1979-07-17 Quantor Corporation Instantaneous exposure control for film
DE2644341C2 (de) * 1976-10-01 1984-08-02 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren und Anordnungen zur automatischen Verwirklichung des Köhler'schen Beleuchtungsprinzipes
US4190795A (en) * 1977-09-09 1980-02-26 Coberly & Associates Constant intensity light source
US4147429A (en) * 1978-01-31 1979-04-03 Microx Corporation Apparatus and process for photographically duplicating intelligence existing on photoplastic film
US4202623A (en) * 1979-01-08 1980-05-13 The Perkin-Elmer Corporation Temperature compensated alignment system
DE2909336A1 (de) * 1979-03-09 1980-09-18 Agfa Gevaert Ag Verfahren und vorrichtung zur erkennung von filmsorten
DE2926313A1 (de) * 1979-06-29 1981-02-05 Agfa Gevaert Ag Verfahren zur belichtungssteuerung eines mikrofilm-lese-kopiergeraetes sowie mikrofilm-lese-kopiergeraet zur durchfuehrung des verfahrens
JPS56150826A (en) * 1980-04-25 1981-11-21 Hitachi Ltd Supporting mechanism of wafer
DE3271539D1 (en) * 1981-08-13 1986-07-10 Perkin Elmer Corp Method and apparatus for measuring the illumination uniformity in a ring field projection system
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ

Also Published As

Publication number Publication date
US4598197A (en) 1986-07-01
FR2536547A1 (fr) 1984-05-25
FR2536547B1 (fr) 1986-03-14
KR840005916A (ko) 1984-11-19
JPH0445970B2 (it) 1992-07-28
DE3328578A1 (de) 1984-04-05
GB8321335D0 (en) 1983-09-07
GB2126740A (en) 1984-03-28
IT8322492A0 (it) 1983-08-09
JPS5928337A (ja) 1984-02-15
US4701608A (en) 1987-10-20
US4780606A (en) 1988-10-25

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19950828