IT1283206B1 - Stazione di rivestimento - Google Patents

Stazione di rivestimento

Info

Publication number
IT1283206B1
IT1283206B1 IT96MI000446A ITMI960446A IT1283206B1 IT 1283206 B1 IT1283206 B1 IT 1283206B1 IT 96MI000446 A IT96MI000446 A IT 96MI000446A IT MI960446 A ITMI960446 A IT MI960446A IT 1283206 B1 IT1283206 B1 IT 1283206B1
Authority
IT
Italy
Prior art keywords
coating station
station
coating
Prior art date
Application number
IT96MI000446A
Other languages
English (en)
Inventor
Martin Dubs
Roman Schertler
Gregor Strasser
Original Assignee
Balzers Hochvakuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Hochvakuum filed Critical Balzers Hochvakuum
Publication of ITMI960446A0 publication Critical patent/ITMI960446A0/it
Publication of ITMI960446A1 publication Critical patent/ITMI960446A1/it
Application granted granted Critical
Publication of IT1283206B1 publication Critical patent/IT1283206B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing And Processing Devices For Dough (AREA)
  • Fertilizers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Surface Treatment Of Glass (AREA)
IT96MI000446A 1995-03-31 1996-03-08 Stazione di rivestimento IT1283206B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE29505497U DE29505497U1 (de) 1995-03-31 1995-03-31 Beschichtungsstation

Publications (3)

Publication Number Publication Date
ITMI960446A0 ITMI960446A0 (it) 1996-03-08
ITMI960446A1 ITMI960446A1 (it) 1997-09-08
IT1283206B1 true IT1283206B1 (it) 1998-04-16

Family

ID=8006192

Family Applications (1)

Application Number Title Priority Date Filing Date
IT96MI000446A IT1283206B1 (it) 1995-03-31 1996-03-08 Stazione di rivestimento

Country Status (6)

Country Link
US (2) US5911861A (it)
JP (1) JPH08283938A (it)
KR (1) KR100371356B1 (it)
DE (1) DE29505497U1 (it)
FR (1) FR2732362B1 (it)
IT (1) IT1283206B1 (it)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19730993B4 (de) * 1997-07-18 2008-04-03 Ald Vacuum Technologies Ag Vakuumbeschichtungsvorrichtung zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Partikelstrom
DE29716440U1 (de) * 1997-09-12 1997-12-11 Balzers Ag, Balzers Sputterstation
US6730194B2 (en) * 1997-11-05 2004-05-04 Unaxis Balzers Aktiengesellschaft Method for manufacturing disk-shaped workpieces with a sputter station
US6485565B1 (en) 1998-05-28 2002-11-26 The Regents Of The University Of California Process and apparatus for making oriented crystal layers
AUPP740798A0 (en) * 1998-11-30 1998-12-24 Sola International Holdings Ltd Customised coated lens
CH694329A5 (de) * 1999-11-22 2004-11-30 Satis Vacuum Ind Vetriebs Ag Vacuum-Beschichtungsanlage zum Aufbringen von Vergütungsschichten auf optische Substrate.
US6466365B1 (en) * 2000-04-07 2002-10-15 Corning Incorporated Film coated optical lithography elements and method of making
US6914749B2 (en) * 2000-07-25 2005-07-05 Seagate Technology Llc Magnetic anisotropy of soft-underlayer induced by magnetron field
DE10145050C1 (de) * 2001-09-13 2002-11-21 Fraunhofer Ges Forschung Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron- Zerstäuben
DE10145201C1 (de) * 2001-09-13 2002-11-21 Fraunhofer Ges Forschung Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron-Zerstäuben
US8500973B2 (en) * 2004-08-20 2013-08-06 Jds Uniphase Corporation Anode for sputter coating
US7879209B2 (en) * 2004-08-20 2011-02-01 Jds Uniphase Corporation Cathode for sputter coating
US20060049041A1 (en) * 2004-08-20 2006-03-09 Jds Uniphase Corporation Anode for sputter coating
US8146902B2 (en) * 2006-12-21 2012-04-03 Lam Research Corporation Hybrid composite wafer carrier for wet clean equipment
CZ2014115A3 (cs) * 2014-02-26 2015-09-09 Hvm Plasma, Spol.S R.O. Způsob unášení substrátů při depozici tenké vrstvy na povrch substrátů a rotační stolek pro unášení substrátů podle způsobu
CN111733389A (zh) 2015-06-16 2020-10-02 施耐德两合公司 用于镜片覆层的装置
DE102016125278A1 (de) 2016-12-14 2018-06-14 Schneider Gmbh & Co. Kg Vorrichtung, Verfahren und Verwendung zur Beschichtung von Linsen
CN107500559B (zh) * 2017-10-12 2020-06-19 信利光电股份有限公司 一种曲面玻璃镀膜装置
JP7581953B2 (ja) * 2021-02-24 2024-11-13 東京エレクトロン株式会社 スパッタリング処理を行う装置、及び方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3889632A (en) * 1974-05-31 1975-06-17 Ibm Variable incidence drive for deposition tooling
JPS6365069A (ja) * 1986-09-08 1988-03-23 Hitachi Ltd スパツタ装置
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
FR2644180B1 (fr) * 1989-03-08 1991-05-10 Commissariat Energie Atomique Dispositif pour recouvrir une surface plane d'une couche d'epaisseur uniforme
DE59207306D1 (de) * 1991-04-12 1996-11-14 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung mindestens eines Gegenstandes
US5525199A (en) * 1991-11-13 1996-06-11 Optical Corporation Of America Low pressure reactive magnetron sputtering apparatus and method
CH689767A5 (de) * 1992-03-24 1999-10-15 Balzers Hochvakuum Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage.
JPH0649637A (ja) * 1992-08-03 1994-02-22 Hitachi Metals Ltd バイアススパッタリング方法
JPH06322538A (ja) * 1993-05-11 1994-11-22 Shibaura Eng Works Co Ltd スパッタリング装置

Also Published As

Publication number Publication date
ITMI960446A1 (it) 1997-09-08
US5911861A (en) 1999-06-15
JPH08283938A (ja) 1996-10-29
FR2732362B1 (fr) 2003-05-30
KR100371356B1 (ko) 2003-04-08
FR2732362A1 (fr) 1996-10-04
KR960034457A (ko) 1996-10-22
US6123814A (en) 2000-09-26
DE29505497U1 (de) 1995-06-08
ITMI960446A0 (it) 1996-03-08

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Legal Events

Date Code Title Description
0001 Granted