IT7829672A0 - Processo di fabbricazione di dispositivi fet perfezionati. - Google Patents

Processo di fabbricazione di dispositivi fet perfezionati.

Info

Publication number
IT7829672A0
IT7829672A0 IT7829672A IT2967278A IT7829672A0 IT 7829672 A0 IT7829672 A0 IT 7829672A0 IT 7829672 A IT7829672 A IT 7829672A IT 2967278 A IT2967278 A IT 2967278A IT 7829672 A0 IT7829672 A0 IT 7829672A0
Authority
IT
Italy
Prior art keywords
manufacturing process
fet devices
devices manufacturing
improved fet
improved
Prior art date
Application number
IT7829672A
Other languages
English (en)
Other versions
IT1160059B (it
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT7829672A0 publication Critical patent/IT7829672A0/it
Application granted granted Critical
Publication of IT1160059B publication Critical patent/IT1160059B/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/027—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
    • H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
    • H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
    • H10P34/422—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing using incoherent radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/093—Laser beam treatment in general
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/901—MOSFET substrate bias
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/91—Controlling charging state at semiconductor-insulator interface
IT29672/78A 1977-11-25 1978-11-10 Processo di fabbricazione di dispositivi fet perfezionati IT1160059B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/854,563 US4116721A (en) 1977-11-25 1977-11-25 Gate charge neutralization for insulated gate field-effect transistors

Publications (2)

Publication Number Publication Date
IT7829672A0 true IT7829672A0 (it) 1978-11-10
IT1160059B IT1160059B (it) 1987-03-04

Family

ID=25319046

Family Applications (1)

Application Number Title Priority Date Filing Date
IT29672/78A IT1160059B (it) 1977-11-25 1978-11-10 Processo di fabbricazione di dispositivi fet perfezionati

Country Status (6)

Country Link
US (1) US4116721A (it)
EP (1) EP0002421B1 (it)
JP (1) JPS5476079A (it)
CA (1) CA1111572A (it)
DE (1) DE2861363D1 (it)
IT (1) IT1160059B (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2461359A1 (fr) * 1979-07-06 1981-01-30 Commissariat Energie Atomique Procede et appareil d'hydrogenation de dispositifs a semi-conducteurs
USRE32613E (en) * 1980-04-17 1988-02-23 American Telephone And Telegraph Company, At&T Bell Laboratories Method of making contact electrodes to silicon gate, and source and drain regions, of a semiconductor device
US4343082A (en) * 1980-04-17 1982-08-10 Bell Telephone Laboratories, Incorporated Method of making contact electrodes to silicon gate, and source and drain regions, of a semiconductor device
US4327477A (en) * 1980-07-17 1982-05-04 Hughes Aircraft Co. Electron beam annealing of metal step coverage
US4395293A (en) * 1981-03-23 1983-07-26 Hughes Aircraft Company Accelerated annealing of gallium arsenide solar cells
US4456490A (en) * 1983-03-09 1984-06-26 Westinghouse Electric Corp. Laser annealing of MIS devices by back surface laser treatment
US4650524A (en) * 1984-06-20 1987-03-17 Sanyo Electric Co., Ltd Method for dividing semiconductor film formed on a substrate into plural regions by backside energy beam irradiation
JP2934456B2 (ja) * 1989-07-14 1999-08-16 株式会社日立製作所 表面処理方法及びその装置
KR100199348B1 (ko) * 1995-12-23 1999-06-15 김영환 반도체 소자의 제조방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3386163A (en) * 1964-08-26 1968-06-04 Ibm Method for fabricating insulated-gate field effect transistor
NL149640B (nl) * 1965-06-05 1976-05-17 Philips Nv Halfgeleiderinrichting met meer dan een schakelelement in een halfgeleiderlichaam en werkwijze voor het vervaardigen daarvan.
US3461547A (en) * 1965-07-13 1969-08-19 United Aircraft Corp Process for making and testing semiconductive devices
GB1107699A (en) * 1966-03-28 1968-03-27 Matsushita Electronics Corp A method of producing semiconductor devices
US3513035A (en) * 1967-11-01 1970-05-19 Fairchild Camera Instr Co Semiconductor device process for reducing surface recombination velocity
US3570112A (en) * 1967-12-01 1971-03-16 Nat Defence Canada Radiation hardening of insulated gate field effect transistors
US3935033A (en) * 1970-07-18 1976-01-27 Siemens Aktiengesellschaft Method of improving the radiation resistance of silicon transistors with a silicon oxide coating
US3894890A (en) * 1972-07-17 1975-07-15 Siemens Ag Method for improving the radiation resistance of silicon transistors
US3867196A (en) * 1974-03-11 1975-02-18 Smc Microsystems Corp Method for selectively establishing regions of different surface charge densities in a silicon wafer
IT1039154B (it) * 1974-08-12 1979-12-10 Ibm Miglioramento a processi di fabricazione di dispositivi impieganti semiconduttori particolarmente strutture mos
US3925107A (en) * 1974-11-11 1975-12-09 Ibm Method of stabilizing mos devices
US3929529A (en) * 1974-12-09 1975-12-30 Ibm Method for gettering contaminants in monocrystalline silicon
US4061506A (en) * 1975-05-01 1977-12-06 Texas Instruments Incorporated Correcting doping defects

Also Published As

Publication number Publication date
EP0002421B1 (fr) 1981-11-25
DE2861363D1 (en) 1982-01-28
CA1111572A (en) 1981-10-27
EP0002421A3 (en) 1979-08-22
JPS5476079A (en) 1979-06-18
IT1160059B (it) 1987-03-04
US4116721A (en) 1978-09-26
JPS5721869B2 (it) 1982-05-10
EP0002421A2 (fr) 1979-06-13

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19931119