IT8121579A0 - Soluzione rameica ammoniacale alcalina perfezionata di agente di attacco chimico per ridurre il sottosquadro di attacco chimico eprocedimento per ottenere detta riduzione di sottosquadro. - Google Patents

Soluzione rameica ammoniacale alcalina perfezionata di agente di attacco chimico per ridurre il sottosquadro di attacco chimico eprocedimento per ottenere detta riduzione di sottosquadro.

Info

Publication number
IT8121579A0
IT8121579A0 IT8121579A IT2157981A IT8121579A0 IT 8121579 A0 IT8121579 A0 IT 8121579A0 IT 8121579 A IT8121579 A IT 8121579A IT 2157981 A IT2157981 A IT 2157981A IT 8121579 A0 IT8121579 A0 IT 8121579A0
Authority
IT
Italy
Prior art keywords
undercut
chemical attacking
procedure
obtaining
reduction
Prior art date
Application number
IT8121579A
Other languages
English (en)
Other versions
IT1211038B (it
Inventor
Kenneth J Murski
Original Assignee
Hunt Chem Corp Philip A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hunt Chem Corp Philip A filed Critical Hunt Chem Corp Philip A
Publication of IT8121579A0 publication Critical patent/IT8121579A0/it
Application granted granted Critical
Publication of IT1211038B publication Critical patent/IT1211038B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/34—Alkaline compositions for etching copper or alloys thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
IT8121579A 1980-11-05 1981-05-08 Soluzione rameica ammoniacale alcalina perfezionata di agente di attacco chimico per ridurre il sottosquadro di attacco chimico eprocedimento per ottenere detta riduzione di sottosquadro. IT1211038B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/204,216 US4319955A (en) 1980-11-05 1980-11-05 Ammoniacal alkaline cupric etchant solution for and method of reducing etchant undercut

Publications (2)

Publication Number Publication Date
IT8121579A0 true IT8121579A0 (it) 1981-05-08
IT1211038B IT1211038B (it) 1989-09-29

Family

ID=22757083

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8121579A IT1211038B (it) 1980-11-05 1981-05-08 Soluzione rameica ammoniacale alcalina perfezionata di agente di attacco chimico per ridurre il sottosquadro di attacco chimico eprocedimento per ottenere detta riduzione di sottosquadro.

Country Status (6)

Country Link
US (1) US4319955A (it)
JP (1) JPS5779175A (it)
DE (1) DE3104522A1 (it)
FR (1) FR2493330A1 (it)
GB (1) GB2086808A (it)
IT (1) IT1211038B (it)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62151589A (ja) * 1985-12-25 1987-07-06 Seiken Kagaku Kk 錫鉛合金のエツチング抑制剤
US4695348A (en) * 1986-09-15 1987-09-22 Psi Star Copper etching process and product
US4911785A (en) * 1987-02-04 1990-03-27 Andus Corporation The method of forming a thin film artwork compounds
US5011569A (en) * 1987-02-04 1991-04-30 Andus Corporation Thin film artwork compounds
US4978423A (en) * 1988-09-26 1990-12-18 At&T Bell Laboratories Selective solder formation on printed circuit boards
US4952275A (en) * 1989-12-15 1990-08-28 Microelectronics And Computer Technology Corporation Copper etching solution and method
AT395177B (de) * 1990-07-05 1992-10-12 Provera Gmbh Aetzloesung
US5328561A (en) * 1992-07-10 1994-07-12 Macdermid Incorporated Microetchant for copper surfaces and processes for using same
JPH06287774A (ja) * 1993-04-05 1994-10-11 Metsuku Kk 銅および銅合金の表面処理剤
US5431776A (en) * 1993-09-08 1995-07-11 Phibro-Tech, Inc. Copper etchant solution additives
US6656370B1 (en) * 2000-10-13 2003-12-02 Lenora Toscano Method for the manufacture of printed circuit boards
US6521138B2 (en) * 2001-06-01 2003-02-18 Silicon Integrated Systems Corporation Method for measuring width of bottom under cut during etching process
JP3807505B2 (ja) * 2004-07-13 2006-08-09 セイコーエプソン株式会社 配線基板の製造方法
DE202006018111U1 (de) * 2006-07-25 2007-02-08 Lang, Marcus Vorrichtung zum beschleunigten nasschemischen Behandeln von Oberflächen
CN114554706B (zh) * 2022-04-27 2022-07-12 惠州威尔高电子有限公司 一种精细线路碱性蚀刻方法
CN119710698A (zh) * 2024-12-27 2025-03-28 东莞舒铂迈特精工实业有限公司 铜铝复合材料线路蚀刻加工工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3553101A (en) * 1968-05-17 1971-01-05 Exxon Research Engineering Co Prevention of corrosion using heterocyclic nitrogen compounds
JPS5120972B1 (it) * 1971-05-13 1976-06-29
JPS5332341B2 (it) * 1973-03-27 1978-09-07
JPS5224508B2 (it) * 1973-11-19 1977-07-01 Tokai Electro Chemical Co
GB1565349A (en) * 1975-10-20 1980-04-16 Albright & Wilson Aluminium polishing compositions
US4060447A (en) * 1976-03-29 1977-11-29 Philip A. Hunt Chemical Corporation Process for etching of metal

Also Published As

Publication number Publication date
JPS5779175A (en) 1982-05-18
GB2086808A (en) 1982-05-19
IT1211038B (it) 1989-09-29
US4319955A (en) 1982-03-16
FR2493330A1 (fr) 1982-05-07
DE3104522A1 (de) 1982-06-09

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