IT8148391A0 - Soluzione di sviluppo per pellicole fotosensibili contenenti uno strato di photoresist su un substrato rivestito con alluminio e procedimento di impiego - Google Patents

Soluzione di sviluppo per pellicole fotosensibili contenenti uno strato di photoresist su un substrato rivestito con alluminio e procedimento di impiego

Info

Publication number
IT8148391A0
IT8148391A0 IT8148391A IT4839181A IT8148391A0 IT 8148391 A0 IT8148391 A0 IT 8148391A0 IT 8148391 A IT8148391 A IT 8148391A IT 4839181 A IT4839181 A IT 4839181A IT 8148391 A0 IT8148391 A0 IT 8148391A0
Authority
IT
Italy
Prior art keywords
photoresist
aluminum
procedure
layer
film containing
Prior art date
Application number
IT8148391A
Other languages
English (en)
Inventor
Richard S Fisch
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of IT8148391A0 publication Critical patent/IT8148391A0/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT8148391A 1980-05-05 1981-05-04 Soluzione di sviluppo per pellicole fotosensibili contenenti uno strato di photoresist su un substrato rivestito con alluminio e procedimento di impiego IT8148391A0 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/146,642 US4314022A (en) 1980-05-05 1980-05-05 Photoresist developers and process

Publications (1)

Publication Number Publication Date
IT8148391A0 true IT8148391A0 (it) 1981-05-04

Family

ID=22518305

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8148391A IT8148391A0 (it) 1980-05-05 1981-05-04 Soluzione di sviluppo per pellicole fotosensibili contenenti uno strato di photoresist su un substrato rivestito con alluminio e procedimento di impiego

Country Status (8)

Country Link
US (1) US4314022A (it)
EP (1) EP0051627A4 (it)
JP (1) JPS57500530A (it)
BE (1) BE888666A (it)
BR (1) BR8108583A (it)
CA (1) CA1166507A (it)
IT (1) IT8148391A0 (it)
WO (1) WO1981003231A1 (it)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4330614A (en) * 1980-10-14 1982-05-18 International Business Machines Corporation Process for forming a patterned resist mask
US4366224A (en) * 1981-08-06 1982-12-28 American Hoechst Corporation Inorganic lithium developer composition
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4436807A (en) 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
JPS59121336A (ja) * 1982-12-28 1984-07-13 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液
US4708920A (en) * 1985-09-16 1987-11-24 Minnesota Mining And Manufacturing Company Microlens sheet containing directional half-tone images and method for making the same
US4758368A (en) * 1986-07-21 1988-07-19 Motorola Inc. Method for etching silicon wafers using a potassium hydroxide and water etching solution
DE69416564T2 (de) * 1993-04-28 1999-07-15 Toray Industries, Inc., Tokio/Tokyo Positiv arbeitender elektronenstrahlresist
US5445911A (en) * 1993-07-28 1995-08-29 Hewlett-Packard Company Chelating positive charge director for liquid electrographic toner
US5589311A (en) * 1994-11-28 1996-12-31 Hewlett-Packard Company Cage complexes for charge direction in liquid toners
EP0716347B1 (en) * 1994-12-06 2002-07-24 Fuji Photo Film Co., Ltd. Developer for photosensitive lithographic printing plate
US5952050A (en) 1996-02-27 1999-09-14 Micron Technology, Inc. Chemical dispensing system for semiconductor wafer processing
US20120129093A1 (en) * 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions
TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
JP7589179B2 (ja) 2019-06-28 2024-11-25 ラム リサーチ コーポレーション 金属含有レジストのリソグラフィ性能を向上させるためのベーキング方法
KR20230041688A (ko) 2020-06-22 2023-03-24 램 리써치 코포레이션 금속-함유 포토레지스트 (photoresist) 증착을 위한 표면 개질
CN116134383A (zh) * 2020-07-17 2023-05-16 朗姆研究公司 用于含金属光致抗蚀剂的显影的金属螯合剂
JP7681106B2 (ja) 2020-12-08 2025-05-21 ラム リサーチ コーポレーション 有機蒸気によるフォトレジストの現像
KR20240160248A (ko) 2022-07-01 2024-11-08 램 리써치 코포레이션 에칭 정지 억제를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상
KR20250069677A (ko) 2023-07-27 2025-05-19 램 리써치 코포레이션 금속-함유 포토레지스트에 대한 올-인-원 건식 현상

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
US3615480A (en) * 1969-02-24 1971-10-26 Du Pont Developer solutions for photopolymerized layers
US4193797A (en) * 1971-03-22 1980-03-18 E. I. Dupont De Nemours And Company Method for making photoresists
US3957553A (en) * 1972-08-09 1976-05-18 Pennwalt Corporation Non-chromated alkaline etching bath and etching process for aluminum
JPS5821257B2 (ja) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ
US3980587A (en) * 1974-08-16 1976-09-14 G. T. Schjeldahl Company Stripper composition
US3957583A (en) * 1974-12-02 1976-05-18 Mcdonnell Douglas Corporation Apparatus and process for determining the susceptibility of microorganisms to antibiotics
US4028205A (en) * 1975-09-29 1977-06-07 Kaiser Aluminum & Chemical Corporation Surface treatment of aluminum
JPS5299103A (en) * 1976-02-16 1977-08-19 Fuji Photo Film Co Ltd Method of reducing strength of dot image
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates
FR2406838A1 (fr) * 1977-10-24 1979-05-18 Fuji Photo Film Co Ltd Procede de developpement de plaques de tirage planographique
DE3201241A1 (de) * 1982-01-16 1983-07-28 Continental Gummi-Werke Ag, 3000 Hannover Laufstreifenerneuerter guertelreifen

Also Published As

Publication number Publication date
WO1981003231A1 (en) 1981-11-12
EP0051627A4 (en) 1983-02-04
BE888666A (fr) 1981-11-04
CA1166507A (en) 1984-05-01
BR8108583A (pt) 1982-04-06
JPS57500530A (it) 1982-03-25
EP0051627A1 (en) 1982-05-19
US4314022A (en) 1982-02-02

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