IT8620958A0 - Dispositivo per il trattamento di pezzi con una camera evacuabile. - Google Patents
Dispositivo per il trattamento di pezzi con una camera evacuabile.Info
- Publication number
- IT8620958A0 IT8620958A0 IT8620958A IT2095886A IT8620958A0 IT 8620958 A0 IT8620958 A0 IT 8620958A0 IT 8620958 A IT8620958 A IT 8620958A IT 2095886 A IT2095886 A IT 2095886A IT 8620958 A0 IT8620958 A0 IT 8620958A0
- Authority
- IT
- Italy
- Prior art keywords
- treatment
- parts
- evacuable chamber
- evacuable
- chamber
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Details (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH280685 | 1985-07-01 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IT8620958A0 true IT8620958A0 (it) | 1986-06-27 |
| IT8620958A1 IT8620958A1 (it) | 1987-12-27 |
| IT1190648B IT1190648B (it) | 1988-02-16 |
Family
ID=4242008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT20958/86A IT1190648B (it) | 1985-07-01 | 1986-06-27 | Dispositivo per il trattamento di pezzi con camera evacuabile |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS624876A (it) |
| DE (1) | DE3614398A1 (it) |
| ES (1) | ES8703938A1 (it) |
| FR (1) | FR2584099A1 (it) |
| GB (1) | GB2178228A (it) |
| IT (1) | IT1190648B (it) |
| SE (1) | SE8602907L (it) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4029268C2 (de) * | 1990-09-14 | 1995-07-06 | Balzers Hochvakuum | Verfahren zur gleichspannungs-bogenentladungs-unterstützten, reaktiven Behandlung von Gut und Vakuumbehandlungsanlage zur Durchführung |
| DE4029270C1 (it) * | 1990-09-14 | 1992-04-09 | Balzers Ag, Balzers, Li | |
| JPH04326725A (ja) * | 1991-04-26 | 1992-11-16 | Tokyo Electron Ltd | プラズマ装置 |
| CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
| US5868878A (en) * | 1993-08-27 | 1999-02-09 | Hughes Electronics Corporation | Heat treatment by plasma electron heating and solid/gas jet cooling |
| DE19750909C1 (de) * | 1997-11-17 | 1999-04-15 | Bosch Gmbh Robert | Drehvorrichtung zur plasma-immersions-gestützten Behandlung von Substraten |
| RU2152454C1 (ru) * | 1998-08-25 | 2000-07-10 | Сенокосов Евгений Степанович | Способ нанесения защитных покрытий на металлические трубы и установка для его реализации |
| DE10149588B4 (de) * | 2001-10-08 | 2017-09-07 | Oerlikon Trading Ag, Trübbach | Verfahren zur Diamantbeschichtung von Substraten |
| ES2344981B1 (es) * | 2010-03-01 | 2011-05-06 | Asociacion De La Industria Navarra (Ain) | Procedimiento para la nitruracion de aleaciones metalicas y dispositivo para llevar a cabo dicho procedimiento. |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT364899A (it) * | 1937-08-27 | |||
| CH310968A (de) * | 1953-02-17 | 1955-11-15 | Berghaus Elektrophysik Anst | Verfahren zur thermischen, metallurgischen oder chemischen Behandlung von metallischen Gegenständen mittels elektrischer Glimmentladungen |
| NL232698A (it) * | 1953-12-09 | |||
| DE1204047B (de) * | 1957-04-10 | 1965-10-28 | Berghaus Elektrophysik Anst | Verfahren zur Diffusionsbehandlung von Koerpern |
| FR2403645A2 (fr) * | 1977-09-14 | 1979-04-13 | Vide & Traitement Sa | Four pour le traitement thermochimique, en continu, de pieces metalliques, par bombardement ionique |
| FR2385290A1 (fr) * | 1977-03-23 | 1978-10-20 | Vide & Traitement Sa | Four pour traitement thermo-ionique a multicathodes |
| DE2811942C2 (de) * | 1977-03-23 | 1986-09-18 | Vide et Traitement S.A., Neuilly-en-Thelle | Ofen zur ionischen Nitrierbehandlung von metallischen Werkstücken |
| JPS5576057A (en) * | 1978-11-30 | 1980-06-07 | Nippon Denshi Kogyo Kk | Ion treating apparatus |
| JPS5798669A (en) * | 1980-12-08 | 1982-06-18 | Nippon Denshi Kogyo Kk | Glow discharge heat treatment processor |
| CA1269950A (en) * | 1984-06-22 | 1990-06-05 | Yoshihisa Tawada | Glow-discharge decomposition apparatus |
-
1986
- 1986-04-28 DE DE19863614398 patent/DE3614398A1/de not_active Withdrawn
- 1986-05-13 ES ES554903A patent/ES8703938A1/es not_active Expired
- 1986-06-19 FR FR8608853A patent/FR2584099A1/fr active Pending
- 1986-06-26 GB GB08615590A patent/GB2178228A/en not_active Withdrawn
- 1986-06-27 IT IT20958/86A patent/IT1190648B/it active
- 1986-06-30 SE SE8602907A patent/SE8602907L/ not_active Application Discontinuation
- 1986-06-30 JP JP61151843A patent/JPS624876A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| ES8703938A1 (es) | 1987-03-01 |
| IT1190648B (it) | 1988-02-16 |
| ES554903A0 (es) | 1987-03-01 |
| DE3614398A1 (de) | 1987-01-08 |
| IT8620958A1 (it) | 1987-12-27 |
| JPS624876A (ja) | 1987-01-10 |
| GB2178228A (en) | 1987-02-04 |
| SE8602907D0 (sv) | 1986-06-30 |
| FR2584099A1 (fr) | 1987-01-02 |
| GB8615590D0 (en) | 1986-07-30 |
| SE8602907L (sv) | 1987-01-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IT8223655A0 (it) | Dispositivo per il trattamento di bellezza. | |
| IT8224322A0 (it) | Dispositivo per il trasferimento di sostanze mediche. | |
| DE3855422D1 (de) | Kammerunterstützungsgerät | |
| DE3750115D1 (de) | Plasmabearbeitungsgerät. | |
| DE3788160D1 (de) | Plasmabehandlungsvorrichtung. | |
| IT7921967A0 (it) | Custodia per disposizione di semiconduttori. | |
| DE3671482D1 (de) | Kammer fuer plasma-behandlung. | |
| IT8247936A0 (it) | Trattamento di residui di carbonilazione | |
| IT8620958A1 (it) | Disposizione per il trattamento di pezzi con una camera evacuabile | |
| IT1208386B (it) | Procedimento e dispositivo per l azionamento di centrifughe | |
| IT7827273A0 (it) | Procedimento per il trattamento superficiale stabilizzante di corpi semiconduttori. | |
| IT1197805B (it) | Metodo per il tratamento di lenti a contatto | |
| IT8324318A0 (it) | Circuito per la elaborazione e la utilizzazione di segnali. | |
| IT8219344A0 (it) | Procedimento e dispositivo per lapreparazione di blocchi muniti di placcatura. | |
| IT1087728B (it) | Circuito per la correzione della durata di impulsi | |
| IT1130480B (it) | Telescrivente elettronica per il trattamento di messaggi | |
| DE3561902D1 (en) | Device for the calibration of injection pumps | |
| ES512448A0 (es) | Procedimiento para el tratamiento de una escoria fosfurada. | |
| IT8321507A0 (it) | Procedimento di preparazione fermentativa di l-leucina. | |
| IT1136587B (it) | Procedimento per il trattamento di acque contenenti solfuri | |
| SU638579A1 (ru) | Паста дл металлизации пьезоэлектрической керамики | |
| IT8267490A0 (it) | Dispositivo per il controllo della presenza di microorganismi e procedimento per la disinfezione di oggetti e ambienti utilizzante tale dispositivo | |
| IT8620828A1 (it) | Procedimento per la produzione di una L-α -aspartil-L-fenilalanina N-protetta | |
| IT1181999B (it) | Camera di trattamento sotto vuoto | |
| IT1221922B (it) | Camera di fermentazione |