IT8683671A0 - Procedimento e dispositivo per deposizione chimica da fase vapore attivata mediante plasma. - Google Patents

Procedimento e dispositivo per deposizione chimica da fase vapore attivata mediante plasma.

Info

Publication number
IT8683671A0
IT8683671A0 IT8683671A IT8367186A IT8683671A0 IT 8683671 A0 IT8683671 A0 IT 8683671A0 IT 8683671 A IT8683671 A IT 8683671A IT 8367186 A IT8367186 A IT 8367186A IT 8683671 A0 IT8683671 A0 IT 8683671A0
Authority
IT
Italy
Prior art keywords
plasma
procedure
vapor phase
chemical deposition
phase activated
Prior art date
Application number
IT8683671A
Other languages
English (en)
Other versions
IT1207445B (it
Inventor
Ubaldo Mastromatteo
Silvia Fossati
Original Assignee
Sgs Microelettronica Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sgs Microelettronica Spa filed Critical Sgs Microelettronica Spa
Priority to IT8683671A priority Critical patent/IT1207445B/it
Publication of IT8683671A0 publication Critical patent/IT8683671A0/it
Priority to FR8717945A priority patent/FR2608634A1/fr
Priority to NL8703117A priority patent/NL8703117A/nl
Application granted granted Critical
Publication of IT1207445B publication Critical patent/IT1207445B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
IT8683671A 1986-12-23 1986-12-23 Procedimento e dispositivo per deposizione chimica da fase vapore attivata mediante plasma. IT1207445B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT8683671A IT1207445B (it) 1986-12-23 1986-12-23 Procedimento e dispositivo per deposizione chimica da fase vapore attivata mediante plasma.
FR8717945A FR2608634A1 (fr) 1986-12-23 1987-12-22 Procede et dispositif de depot chimique en phase vapeur activee par plasma
NL8703117A NL8703117A (nl) 1986-12-23 1987-12-23 Werkwijze en inrichting voor het door plasma geactiveerd chemisch opdampen.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8683671A IT1207445B (it) 1986-12-23 1986-12-23 Procedimento e dispositivo per deposizione chimica da fase vapore attivata mediante plasma.

Publications (2)

Publication Number Publication Date
IT8683671A0 true IT8683671A0 (it) 1986-12-23
IT1207445B IT1207445B (it) 1989-05-17

Family

ID=11323750

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8683671A IT1207445B (it) 1986-12-23 1986-12-23 Procedimento e dispositivo per deposizione chimica da fase vapore attivata mediante plasma.

Country Status (3)

Country Link
FR (1) FR2608634A1 (it)
IT (1) IT1207445B (it)
NL (1) NL8703117A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5374456A (en) * 1992-12-23 1994-12-20 Hughes Aircraft Company Surface potential control in plasma processing of materials
JP3164019B2 (ja) * 1997-05-21 2001-05-08 日本電気株式会社 酸化シリコン膜およびその形成方法と成膜装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4287851A (en) * 1980-01-16 1981-09-08 Dozier Alfred R Mounting and excitation system for reaction in the plasma state
JPS58212128A (ja) * 1982-06-03 1983-12-09 Shigeru Minomura アモルフアス半導体膜の製造方法

Also Published As

Publication number Publication date
IT1207445B (it) 1989-05-17
FR2608634A1 (fr) 1988-06-24
NL8703117A (nl) 1988-07-18

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19961227