IT990832B - PROCESS FOR MANUFACTURING GAS TIGHT PIPES AND TANKS - Google Patents

PROCESS FOR MANUFACTURING GAS TIGHT PIPES AND TANKS

Info

Publication number
IT990832B
IT990832B IT2604673A IT2604673A IT990832B IT 990832 B IT990832 B IT 990832B IT 2604673 A IT2604673 A IT 2604673A IT 2604673 A IT2604673 A IT 2604673A IT 990832 B IT990832 B IT 990832B
Authority
IT
Italy
Prior art keywords
tanks
gas tight
manufacturing gas
tight pipes
pipes
Prior art date
Application number
IT2604673A
Other languages
Italian (it)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of IT990832B publication Critical patent/IT990832B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
IT2604673A 1972-07-01 1973-06-28 PROCESS FOR MANUFACTURING GAS TIGHT PIPES AND TANKS IT990832B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7209294A NL7209294A (en) 1972-07-01 1972-07-01

Publications (1)

Publication Number Publication Date
IT990832B true IT990832B (en) 1975-07-10

Family

ID=19816451

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2604673A IT990832B (en) 1972-07-01 1973-06-28 PROCESS FOR MANUFACTURING GAS TIGHT PIPES AND TANKS

Country Status (10)

Country Link
JP (1) JPS4943880A (en)
AU (1) AU5740573A (en)
BE (1) BE801747A (en)
BR (1) BR7304772D0 (en)
DE (1) DE2330720C3 (en)
FR (1) FR2190946B1 (en)
GB (1) GB1420526A (en)
IT (1) IT990832B (en)
NL (1) NL7209294A (en)
SE (1) SE384537B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3070578D1 (en) * 1979-08-16 1985-06-05 Ibm Process for applying sio2 films by chemical vapour deposition
DE3441056A1 (en) * 1984-11-09 1986-05-22 Siemens AG, 1000 Berlin und 8000 München Process for reducing wear of quartz parts used in the gas-phase deposition of silicon

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200015A (en) * 1962-09-10 1965-08-10 United Aircraft Corp Process for coating high temperature alloys
FR1524841A (en) * 1966-06-01 1968-05-10 Siemens Ag Process for the preparation of chemically attackable silicon nitride in the form of thin films
US3637423A (en) * 1969-02-10 1972-01-25 Westinghouse Electric Corp Pyrolytic deposition of silicon nitride films
DE1957952A1 (en) * 1969-11-18 1971-05-27 Siemens Ag Silicon nitride coating on quartz walls for diffusion and oxidation reactors

Also Published As

Publication number Publication date
GB1420526A (en) 1976-01-07
DE2330720A1 (en) 1974-01-10
DE2330720B2 (en) 1978-05-24
BE801747A (en) 1974-01-02
FR2190946A1 (en) 1974-02-01
NL7209294A (en) 1974-01-03
DE2330720C3 (en) 1979-01-18
AU5740573A (en) 1975-01-09
SE384537B (en) 1976-05-10
FR2190946B1 (en) 1977-05-13
BR7304772D0 (en) 1974-08-15
JPS4943880A (en) 1974-04-25

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