ITMI20021436A1 - Apparecchiatura e procedimento per esporre un oggetto con luce - Google Patents

Apparecchiatura e procedimento per esporre un oggetto con luce

Info

Publication number
ITMI20021436A1
ITMI20021436A1 IT2002MI001436A ITMI20021436A ITMI20021436A1 IT MI20021436 A1 ITMI20021436 A1 IT MI20021436A1 IT 2002MI001436 A IT2002MI001436 A IT 2002MI001436A IT MI20021436 A ITMI20021436 A IT MI20021436A IT MI20021436 A1 ITMI20021436 A1 IT MI20021436A1
Authority
IT
Italy
Prior art keywords
exposing
procedure
light
Prior art date
Application number
IT2002MI001436A
Other languages
English (en)
Inventor
Jin-Jun Park
Doo-Hoon Goo
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of ITMI20021436A0 publication Critical patent/ITMI20021436A0/it
Publication of ITMI20021436A1 publication Critical patent/ITMI20021436A1/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
IT2002MI001436A 2001-11-05 2002-06-28 Apparecchiatura e procedimento per esporre un oggetto con luce ITMI20021436A1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2001-0068657A KR100431883B1 (ko) 2001-11-05 2001-11-05 노광방법 및 투영 노광 장치

Publications (2)

Publication Number Publication Date
ITMI20021436A0 ITMI20021436A0 (it) 2002-06-28
ITMI20021436A1 true ITMI20021436A1 (it) 2003-12-29

Family

ID=19715713

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2002MI001436A ITMI20021436A1 (it) 2001-11-05 2002-06-28 Apparecchiatura e procedimento per esporre un oggetto con luce

Country Status (10)

Country Link
US (1) US6757052B2 (it)
JP (1) JP2003151897A (it)
KR (1) KR100431883B1 (it)
CN (1) CN100507717C (it)
DE (1) DE10237325B4 (it)
FR (1) FR2831967A1 (it)
GB (1) GB2381591B (it)
IT (1) ITMI20021436A1 (it)
NL (1) NL1021785C2 (it)
TW (1) TW535029B (it)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101799587B (zh) 2004-01-16 2012-05-30 卡尔蔡司Smt有限责任公司 光学系统、投影系统及微结构半导体部件的制造方法
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
TWI456267B (zh) * 2006-02-17 2014-10-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
CN100388056C (zh) * 2006-06-02 2008-05-14 上海微电子装备有限公司 一种投影物镜光学系统
CN102736427B (zh) * 2011-04-07 2014-11-12 上海微电子装备有限公司 一种曝光装置及其方法
US8845163B2 (en) * 2012-08-17 2014-09-30 Ultratech, Inc. LED-based photolithographic illuminator with high collection efficiency
CN103616801B (zh) * 2013-10-28 2016-01-13 东莞科视自动化科技有限公司 一种pcb表面油墨曝光专用高均匀度光源的制备方法及设备
CN110119071B (zh) * 2018-02-06 2021-05-28 苏州苏大维格科技集团股份有限公司 干涉光刻系统、打印装置和干涉光刻方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
JPH05335208A (ja) * 1992-06-02 1993-12-17 Nikon Corp 投影露光装置
JP3295956B2 (ja) * 1992-03-05 2002-06-24 株式会社ニコン 露光装置及び半導体素子の製造方法
JP2946950B2 (ja) * 1992-06-25 1999-09-13 キヤノン株式会社 照明装置及びそれを用いた露光装置
US5446587A (en) 1992-09-03 1995-08-29 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
JP2917704B2 (ja) * 1992-10-01 1999-07-12 日本電気株式会社 露光装置
DE69418131D1 (de) 1993-03-01 1999-06-02 Gen Signal Corp Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE4421053A1 (de) * 1994-06-17 1995-12-21 Zeiss Carl Fa Beleuchtungseinrichtung
JPH09320952A (ja) 1996-05-29 1997-12-12 Nikon Corp 露光装置
JPH11271619A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
EP0949541B1 (en) * 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithography apparatus
KR100596490B1 (ko) * 1999-06-16 2006-07-03 삼성전자주식회사 투영 노광 장치
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1170635B1 (en) * 2000-07-05 2006-06-07 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
JP2003151897A (ja) 2003-05-23
NL1021785C2 (nl) 2004-10-27
ITMI20021436A0 (it) 2002-06-28
GB2381591A (en) 2003-05-07
GB0223465D0 (en) 2002-11-13
NL1021785A1 (nl) 2003-05-07
GB2381591B (en) 2004-02-25
FR2831967A1 (fr) 2003-05-09
DE10237325B4 (de) 2009-01-29
CN100507717C (zh) 2009-07-01
TW535029B (en) 2003-06-01
CN1417644A (zh) 2003-05-14
US20030086070A1 (en) 2003-05-08
US6757052B2 (en) 2004-06-29
DE10237325A1 (de) 2003-05-22
KR20030037793A (ko) 2003-05-16
KR100431883B1 (ko) 2004-05-17

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