ITRM20040430A1 - Materiale ibrido a base di ossido di tatanio, relativo processo di preparazione e usi. - Google Patents

Materiale ibrido a base di ossido di tatanio, relativo processo di preparazione e usi.

Info

Publication number
ITRM20040430A1
ITRM20040430A1 IT000430A ITRM20040430A ITRM20040430A1 IT RM20040430 A1 ITRM20040430 A1 IT RM20040430A1 IT 000430 A IT000430 A IT 000430A IT RM20040430 A ITRM20040430 A IT RM20040430A IT RM20040430 A1 ITRM20040430 A1 IT RM20040430A1
Authority
IT
Italy
Prior art keywords
tatanium
hybrid
preparation process
based material
oxide based
Prior art date
Application number
IT000430A
Other languages
English (en)
Inventor
Antonella Curulli
Giuseppina Padeletti
Marco Viticoli
Original Assignee
Consiglio Nazionale Ricerche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consiglio Nazionale Ricerche filed Critical Consiglio Nazionale Ricerche
Priority to IT000430A priority Critical patent/ITRM20040430A1/it
Publication of ITRM20040430A1 publication Critical patent/ITRM20040430A1/it
Priority to US11/662,775 priority patent/US7708911B2/en
Priority to EP05789475A priority patent/EP1807551B1/en
Priority to PCT/EP2005/054486 priority patent/WO2006027381A2/en
Priority to CA002579950A priority patent/CA2579950A1/en
Priority to JP2007530719A priority patent/JP5052346B2/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1233—Organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/28—Electrolytic cell components
    • G01N27/30—Electrodes, e.g. test electrodes; Half-cells
    • G01N27/327—Biochemical electrodes, e.g. electrical or mechanical details for in vitro measurements
    • G01N27/3271—Amperometric enzyme electrodes for analytes in body fluids, e.g. glucose in blood

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
IT000430A 2004-09-10 2004-09-10 Materiale ibrido a base di ossido di tatanio, relativo processo di preparazione e usi. ITRM20040430A1 (it)

Priority Applications (6)

Application Number Priority Date Filing Date Title
IT000430A ITRM20040430A1 (it) 2004-09-10 2004-09-10 Materiale ibrido a base di ossido di tatanio, relativo processo di preparazione e usi.
US11/662,775 US7708911B2 (en) 2004-09-10 2005-09-09 Titanium oxide based hybrid material, respective preparation process and uses
EP05789475A EP1807551B1 (en) 2004-09-10 2005-09-09 Titanium oxide based hybrid material, respective preparation process and uses
PCT/EP2005/054486 WO2006027381A2 (en) 2004-09-10 2005-09-09 Titanium oxide based hybrid material, respective preparation process and uses
CA002579950A CA2579950A1 (en) 2004-09-10 2005-09-09 Titanium oxide based hybrid material, respective preparation process and uses
JP2007530719A JP5052346B2 (ja) 2004-09-10 2005-09-09 二酸化チタンを基礎としたハイブリッド材料、並びに関連する調製方法及び使用

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000430A ITRM20040430A1 (it) 2004-09-10 2004-09-10 Materiale ibrido a base di ossido di tatanio, relativo processo di preparazione e usi.

Publications (1)

Publication Number Publication Date
ITRM20040430A1 true ITRM20040430A1 (it) 2004-12-10

Family

ID=35482315

Family Applications (1)

Application Number Title Priority Date Filing Date
IT000430A ITRM20040430A1 (it) 2004-09-10 2004-09-10 Materiale ibrido a base di ossido di tatanio, relativo processo di preparazione e usi.

Country Status (6)

Country Link
US (1) US7708911B2 (it)
EP (1) EP1807551B1 (it)
JP (1) JP5052346B2 (it)
CA (1) CA2579950A1 (it)
IT (1) ITRM20040430A1 (it)
WO (1) WO2006027381A2 (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9603522B2 (en) 2009-08-26 2017-03-28 Mayo Foundation For Medical Education And Research Detecting neurochemical or electrical signals within brain tissue
US9841403B2 (en) 2011-07-21 2017-12-12 Mayo Foundation For Medical Education And Research Differentiating analytes detected using fast scan cyclic voltammetry
US10029101B2 (en) 2013-01-09 2018-07-24 Mayo Foundation For Medical Education And Research Systems for the detection and delivery of neurochemical and electrical signals for functional restoration
GB2552217B (en) * 2016-07-15 2021-09-08 Univ Swansea Method of manufacturing a biosensor platform
US11040197B2 (en) 2017-06-22 2021-06-22 Mayo Foundation For Medical Education And Research Voltammetric neurochemical detection in whole blood
WO2021092452A1 (en) * 2019-11-06 2021-05-14 The Regents Of The University Of Michigan Therapeutic protein-based nanoparticles and methods for making the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548798A (en) * 1984-04-16 1985-10-22 Exxon Research And Engineering Co. Laser synthesis of refractory oxide powders
JPH0267953A (ja) * 1988-09-01 1990-03-07 Fuji Photo Film Co Ltd ｐＨセンサ
JP2002181777A (ja) * 2000-12-11 2002-06-26 Hitachi Software Eng Co Ltd スキャナー装置
DE602004017518D1 (de) * 2004-04-06 2008-12-11 Lg Electronics Inc Mit einem ultrahydrophilen und antibakteriellen dünnen film überzogenes metallprodukt und herstellungsverfahren dafür

Also Published As

Publication number Publication date
US20080258116A1 (en) 2008-10-23
JP5052346B2 (ja) 2012-10-17
JP2008512665A (ja) 2008-04-24
US7708911B2 (en) 2010-05-04
WO2006027381A2 (en) 2006-03-16
EP1807551B1 (en) 2012-11-28
EP1807551A2 (en) 2007-07-18
WO2006027381A3 (en) 2006-05-18
CA2579950A1 (en) 2006-03-16

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