ITTO20020787A1 - Macchina di impiantazione ionica perfezionata, relativo - Google Patents
Macchina di impiantazione ionica perfezionata, relativoInfo
- Publication number
- ITTO20020787A1 ITTO20020787A1 IT000787A ITTO20020787A ITTO20020787A1 IT TO20020787 A1 ITTO20020787 A1 IT TO20020787A1 IT 000787 A IT000787 A IT 000787A IT TO20020787 A ITTO20020787 A IT TO20020787A IT TO20020787 A1 ITTO20020787 A1 IT TO20020787A1
- Authority
- IT
- Italy
- Prior art keywords
- perfected
- implantation machine
- ionic implantation
- relative ionic
- relative
- Prior art date
Links
- 238000002513 implantation Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000787A ITTO20020787A1 (it) | 2002-09-10 | 2002-09-10 | Macchina di impiantazione ionica perfezionata, relativo |
| US10/657,801 US7060995B2 (en) | 2002-09-10 | 2003-09-08 | Ion-implantation machine, control method thereof, and process for manufacturing integrated devices |
| US11/449,129 US20060226352A1 (en) | 2002-09-10 | 2006-06-07 | Ion-implantation machine, control method thereof, and process for manufacturing integrated devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000787A ITTO20020787A1 (it) | 2002-09-10 | 2002-09-10 | Macchina di impiantazione ionica perfezionata, relativo |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ITTO20020787A1 true ITTO20020787A1 (it) | 2004-03-11 |
Family
ID=32587902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT000787A ITTO20020787A1 (it) | 2002-09-10 | 2002-09-10 | Macchina di impiantazione ionica perfezionata, relativo |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US7060995B2 (it) |
| IT (1) | ITTO20020787A1 (it) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100725102B1 (ko) * | 2006-01-24 | 2007-06-04 | 삼성전자주식회사 | 이온주입설비의 러핑밸브 오동작 감지장치 |
| CN102047376A (zh) * | 2008-05-30 | 2011-05-04 | 艾克塞利斯科技公司 | 注入硼烷时在半导体基片上的粒子控制 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5466942A (en) * | 1991-07-04 | 1995-11-14 | Kabushiki Kaisha Toshiba | Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus |
| US5308989A (en) * | 1992-12-22 | 1994-05-03 | Eaton Corporation | Fluid flow control method and apparatus for an ion implanter |
| GB2325561B (en) * | 1997-05-20 | 2001-10-17 | Applied Materials Inc | Apparatus for and methods of implanting desired chemical species in semiconductor substrates |
| US6828569B2 (en) * | 2001-11-19 | 2004-12-07 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
-
2002
- 2002-09-10 IT IT000787A patent/ITTO20020787A1/it unknown
-
2003
- 2003-09-08 US US10/657,801 patent/US7060995B2/en not_active Expired - Fee Related
-
2006
- 2006-06-07 US US11/449,129 patent/US20060226352A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US7060995B2 (en) | 2006-06-13 |
| US20040121498A1 (en) | 2004-06-24 |
| US20060226352A1 (en) | 2006-10-12 |
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