ITUA20164571A1 - Dispositivo optoelettronico multibanda per applicazioni colorimetriche e relativo metodo di fabbricazione - Google Patents
Dispositivo optoelettronico multibanda per applicazioni colorimetriche e relativo metodo di fabbricazioneInfo
- Publication number
- ITUA20164571A1 ITUA20164571A1 ITUA2016A004571A ITUA20164571A ITUA20164571A1 IT UA20164571 A1 ITUA20164571 A1 IT UA20164571A1 IT UA2016A004571 A ITUA2016A004571 A IT UA2016A004571A IT UA20164571 A ITUA20164571 A IT UA20164571A IT UA20164571 A1 ITUA20164571 A1 IT UA20164571A1
- Authority
- IT
- Italy
- Prior art keywords
- manufacturing
- optoelectronic device
- colorimetric
- applications
- band optoelectronic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/251—Colorimeters; Construction thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/225—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/014—Manufacture or treatment of image sensors covered by group H10F39/12 of CMOS image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/103—Integrated devices the at least one element covered by H10F30/00 having potential barriers, e.g. integrated devices comprising photodiodes or phototransistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
- H10F39/1825—Multicolour image sensors having stacked structure, e.g. NPN, NPNPN or multiple quantum well [MQW] structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
- H10F39/8027—Geometry of the photosensitive area
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
- H10F39/8033—Photosensitive area
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/807—Pixel isolation structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/95—Circuit arrangements
- H10F77/953—Circuit arrangements for devices having potential barriers
- H10F77/959—Circuit arrangements for devices having potential barriers for devices working in avalanche mode
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Light Receiving Elements (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITUA2016A004571A ITUA20164571A1 (it) | 2016-06-21 | 2016-06-21 | Dispositivo optoelettronico multibanda per applicazioni colorimetriche e relativo metodo di fabbricazione |
| US15/346,578 US9978802B2 (en) | 2016-06-21 | 2016-11-08 | Multiband optoelectronic device for colorimetric applications and related manufacturing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITUA2016A004571A ITUA20164571A1 (it) | 2016-06-21 | 2016-06-21 | Dispositivo optoelettronico multibanda per applicazioni colorimetriche e relativo metodo di fabbricazione |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ITUA20164571A1 true ITUA20164571A1 (it) | 2017-12-21 |
Family
ID=57133344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ITUA2016A004571A ITUA20164571A1 (it) | 2016-06-21 | 2016-06-21 | Dispositivo optoelettronico multibanda per applicazioni colorimetriche e relativo metodo di fabbricazione |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US9978802B2 (it) |
| IT (1) | ITUA20164571A1 (it) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11837669B2 (en) | 2013-03-15 | 2023-12-05 | ActLight SA | Photo detector systems and methods of operating same |
| US10964837B2 (en) | 2013-03-15 | 2021-03-30 | ActLight SA | Photo detector systems and methods of operating same |
| US11114480B2 (en) | 2013-03-15 | 2021-09-07 | ActLight SA | Photodetector |
| IT201800004149A1 (it) * | 2018-03-30 | 2019-09-30 | St Microelectronics Srl | Fotorivelatore di luce ultravioletta di carburo di silicio e suo processo di fabbricazione |
| US11018168B2 (en) | 2018-09-20 | 2021-05-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Image sensor with improved timing resolution and photon detection probability |
| US11251217B2 (en) | 2019-04-17 | 2022-02-15 | ActLight SA | Photodetector sensor arrays |
| EP3748698A1 (en) * | 2019-06-03 | 2020-12-09 | Ams Ag | Semiconductor body, avalanche photodiode and method for fabricating a semiconductor body |
| US11322639B2 (en) * | 2020-04-09 | 2022-05-03 | Globalfoundries U.S. Inc. | Avalanche photodiode |
| US11611002B2 (en) | 2020-07-22 | 2023-03-21 | Globalfoundries U.S. Inc. | Photodiode and/or pin diode structures |
| FR3114440B1 (fr) * | 2020-09-21 | 2022-08-19 | Commissariat Energie Atomique | Photodiode passivée comportant une portion périphérique ferroélectrique |
| US11424377B2 (en) | 2020-10-08 | 2022-08-23 | Globalfoundries U.S. Inc. | Photodiode with integrated, light focusing element |
| DE102021200828A1 (de) | 2021-01-29 | 2022-08-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Fotodiode mit orthogonalem Schichtaufbau |
| US12474453B2 (en) | 2022-01-20 | 2025-11-18 | ActLight SA | Control techniques for photodetector systems |
| US11949034B2 (en) | 2022-06-24 | 2024-04-02 | Globalfoundries U.S. Inc. | Photodetector with dual doped semiconductor material |
| US12598374B2 (en) | 2023-09-27 | 2026-04-07 | ActLight SA | Techniques for minimizing power consumption in photodetector measurements |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100148040A1 (en) * | 2008-12-17 | 2010-06-17 | Stmicroelectronics S.R.L. | Geiger-mode photodiode with integrated and adjustable quenching resistor, photodiode array, and manufacturing method thereof |
| US20100271108A1 (en) * | 2009-04-23 | 2010-10-28 | Stmicroelectronics S.R.L. | Geiger-mode photodiode with integrated and jfet-effect-adjustable quenching resistor, photodiode array, and corresponding manufacturing method |
| US20110241149A1 (en) * | 2010-03-30 | 2011-10-06 | Stmicroelectronics S.R.L. | Geiger-mode avalanche photodiode with high signal-to-noise ratio, and corresponding manufacturing process |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITTO20110689A1 (it) * | 2011-07-28 | 2013-01-29 | St Microelectronics Srl | Spettrometro includente un fotodiodo a valanga operante in modalita' geiger |
-
2016
- 2016-06-21 IT ITUA2016A004571A patent/ITUA20164571A1/it unknown
- 2016-11-08 US US15/346,578 patent/US9978802B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100148040A1 (en) * | 2008-12-17 | 2010-06-17 | Stmicroelectronics S.R.L. | Geiger-mode photodiode with integrated and adjustable quenching resistor, photodiode array, and manufacturing method thereof |
| US20100271108A1 (en) * | 2009-04-23 | 2010-10-28 | Stmicroelectronics S.R.L. | Geiger-mode photodiode with integrated and jfet-effect-adjustable quenching resistor, photodiode array, and corresponding manufacturing method |
| US20110241149A1 (en) * | 2010-03-30 | 2011-10-06 | Stmicroelectronics S.R.L. | Geiger-mode avalanche photodiode with high signal-to-noise ratio, and corresponding manufacturing process |
Also Published As
| Publication number | Publication date |
|---|---|
| US9978802B2 (en) | 2018-05-22 |
| US20170365636A1 (en) | 2017-12-21 |
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