JP1733480S - 基板処理チャンバ用基板支持体 - Google Patents

基板処理チャンバ用基板支持体

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Publication number
JP1733480S
JP1733480S JP2022014279F JP2022014279F JP1733480S JP 1733480 S JP1733480 S JP 1733480S JP 2022014279 F JP2022014279 F JP 2022014279F JP 2022014279 F JP2022014279 F JP 2022014279F JP 1733480 S JP1733480 S JP 1733480S
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Japan
Prior art keywords
substrate
processing chamber
support
substrate processing
substrate support
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JP2022014279F
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English (en)
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JP2022014279F 2022-01-20 2022-07-04 基板処理チャンバ用基板支持体 Active JP1733480S (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/823,917 USD1071886S1 (en) 2022-01-20 2022-01-20 Substrate support for a substrate processing chamber

Publications (1)

Publication Number Publication Date
JP1733480S true JP1733480S (ja) 2022-12-28

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ID=84601223

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JP2022014276F Active JP1733479S (ja) 2022-01-20 2022-07-04 基板処理チャンバ用基板支持体
JP2022014279F Active JP1733480S (ja) 2022-01-20 2022-07-04 基板処理チャンバ用基板支持体

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JP2022014276F Active JP1733479S (ja) 2022-01-20 2022-07-04 基板処理チャンバ用基板支持体

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US (1) USD1071886S1 (ja)
JP (2) JP1733479S (ja)
TW (2) TWD227251S (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD235071S (zh) 2020-12-10 2024-12-01 日商紐富來科技股份有限公司 (日本) 頂板
USD1116010S1 (en) * 2023-08-23 2026-03-03 Applied Materials, Inc. Gas diffuser assembly
USD1105018S1 (en) * 2024-02-12 2025-12-09 Lam Research Corporation Shower head
USD1101709S1 (en) * 2024-04-12 2025-11-11 Applied Materials, Inc. Process chamber shower head

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USD614593S1 (en) * 2008-07-21 2010-04-27 Asm Genitech Korea Ltd Substrate support for a semiconductor deposition apparatus
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USD947914S1 (en) * 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWD235071S (zh) * 2020-12-10 2024-12-01 日商紐富來科技股份有限公司 (日本) 頂板
USD928269S1 (en) * 2020-12-15 2021-08-17 Qilin Cheng Target
USD998758S1 (en) * 2020-12-28 2023-09-12 Shanghai Advanced Research Institute, Chinese Academy Of Science Sealing disc for sealing vacuum valve
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JP1700776S (ja) * 2021-03-04 2021-11-29 基板処理装置用基板載置プレート
TWD223375S (zh) * 2021-03-29 2023-02-01 大陸商北京北方華創微電子裝備有限公司 靜電卡盤
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USD1023959S1 (en) * 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD990441S1 (en) * 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate
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Also Published As

Publication number Publication date
JP1733479S (ja) 2022-12-28
USD1071886S1 (en) 2025-04-22
TWD227252S (zh) 2023-09-01
TWD227251S (zh) 2023-09-01

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