JP2000206685A5 - - Google Patents
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- Publication number
- JP2000206685A5 JP2000206685A5 JP1999004984A JP498499A JP2000206685A5 JP 2000206685 A5 JP2000206685 A5 JP 2000206685A5 JP 1999004984 A JP1999004984 A JP 1999004984A JP 498499 A JP498499 A JP 498499A JP 2000206685 A5 JP2000206685 A5 JP 2000206685A5
- Authority
- JP
- Japan
- Prior art keywords
- ring
- positive photosensitive
- general formula
- photosensitive composition
- iiia
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP00498499A JP4006665B2 (ja) | 1999-01-12 | 1999-01-12 | ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP00498499A JP4006665B2 (ja) | 1999-01-12 | 1999-01-12 | ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000206685A JP2000206685A (ja) | 2000-07-28 |
| JP2000206685A5 true JP2000206685A5 (da) | 2006-11-02 |
| JP4006665B2 JP4006665B2 (ja) | 2007-11-14 |
Family
ID=11598882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP00498499A Expired - Fee Related JP4006665B2 (ja) | 1999-01-12 | 1999-01-12 | ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4006665B2 (da) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070172758A1 (en) * | 2006-01-20 | 2007-07-26 | Konica Minolta Medical & Graphic, Inc. | Planographic printing plate material and its manufacturing process |
| WO2007091683A1 (ja) * | 2006-02-10 | 2007-08-16 | Kyowa Hakko Chemical Co., Ltd. | ビススクアリリウム化合物 |
| WO2023037843A1 (ja) * | 2021-09-07 | 2023-03-16 | 国立大学法人九州工業大学 | 新規ダブルスクアライン色素及びその製造方法 |
| JP7812563B2 (ja) * | 2021-09-07 | 2026-02-10 | 国立大学法人九州工業大学 | 新規ダブルスクアライン色素及びその製造方法 |
-
1999
- 1999-01-12 JP JP00498499A patent/JP4006665B2/ja not_active Expired - Fee Related
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