JP2000301534A - Prepreg, metal-clad laminated board, and printed wiring board using prepreg and laminated board - Google Patents
Prepreg, metal-clad laminated board, and printed wiring board using prepreg and laminated boardInfo
- Publication number
- JP2000301534A JP2000301534A JP2000041462A JP2000041462A JP2000301534A JP 2000301534 A JP2000301534 A JP 2000301534A JP 2000041462 A JP2000041462 A JP 2000041462A JP 2000041462 A JP2000041462 A JP 2000041462A JP 2000301534 A JP2000301534 A JP 2000301534A
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- silicone polymer
- inorganic filler
- metal
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005573 silicon-containing polymer Polymers 0.000 claims abstract description 63
- 239000011256 inorganic filler Substances 0.000 claims abstract description 58
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 58
- 229920005989 resin Polymers 0.000 claims abstract description 41
- 239000011347 resin Substances 0.000 claims abstract description 41
- 239000011342 resin composition Substances 0.000 claims abstract description 33
- 239000007822 coupling agent Substances 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000011888 foil Substances 0.000 claims abstract description 12
- -1 siloxane unit Chemical group 0.000 claims description 82
- 229910000077 silane Inorganic materials 0.000 claims description 33
- 230000001588 bifunctional effect Effects 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 11
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 4
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 3
- 125000000962 organic group Chemical group 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 abstract description 8
- 239000000243 solution Substances 0.000 description 54
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 42
- 239000002966 varnish Substances 0.000 description 27
- 239000000945 filler Substances 0.000 description 24
- 239000007787 solid Substances 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- 239000004927 clay Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- 239000007788 liquid Substances 0.000 description 15
- 239000003822 epoxy resin Substances 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- 239000000460 chlorine Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 229920003986 novolac Polymers 0.000 description 10
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical class [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 8
- 229910010271 silicon carbide Inorganic materials 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 6
- 239000012153 distilled water Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 5
- 239000002759 woven fabric Substances 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- TUQLLQQWSNWKCF-UHFFFAOYSA-N trimethoxymethylsilane Chemical compound COC([SiH3])(OC)OC TUQLLQQWSNWKCF-UHFFFAOYSA-N 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229910003923 SiC 4 Inorganic materials 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000010485 coping Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 150000002903 organophosphorus compounds Chemical class 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- GLGNXYJARSMNGJ-VKTIVEEGSA-N (1s,2s,3r,4r)-3-[[5-chloro-2-[(1-ethyl-6-methoxy-2-oxo-4,5-dihydro-3h-1-benzazepin-7-yl)amino]pyrimidin-4-yl]amino]bicyclo[2.2.1]hept-5-ene-2-carboxamide Chemical compound CCN1C(=O)CCCC2=C(OC)C(NC=3N=C(C(=CN=3)Cl)N[C@H]3[C@H]([C@@]4([H])C[C@@]3(C=C4)[H])C(N)=O)=CC=C21 GLGNXYJARSMNGJ-VKTIVEEGSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NCVGSSQICKMAIA-UHFFFAOYSA-N 2-heptadecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NCCN1 NCVGSSQICKMAIA-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- YSWBFLWKAIRHEI-UHFFFAOYSA-N 4,5-dimethyl-1h-imidazole Chemical compound CC=1N=CNC=1C YSWBFLWKAIRHEI-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- UMHKOAYRTRADAT-UHFFFAOYSA-N [hydroxy(octoxy)phosphoryl] octyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OP(O)(=O)OCCCCCCCC UMHKOAYRTRADAT-UHFFFAOYSA-N 0.000 description 1
- ZCHPKWUIAASXPV-UHFFFAOYSA-N acetic acid;methanol Chemical compound OC.CC(O)=O ZCHPKWUIAASXPV-UHFFFAOYSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229940118662 aluminum carbonate Drugs 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940125758 compound 15 Drugs 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- RQAGEUFKLGHJPA-UHFFFAOYSA-N prop-2-enoylsilicon Chemical compound [Si]C(=O)C=C RQAGEUFKLGHJPA-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、プリプレグ、金属
張積層板及びこれらを用いた印刷配線板に関する。[0001] The present invention relates to a prepreg, a metal-clad laminate, and a printed wiring board using the same.
【0002】[0002]
【従来の技術】パーソナルコンピュータや携帯電話等の
情報端末電子機器の普及に伴い、これに搭載される印刷
配線板は小型化、高密度化が進んでいる。その実装形態
は、これまでのピン挿入型から表面実装型へ、そして近
年ではプラスチック基板を使用したBGA(ボールグリ
ッドアレイ)等に代表されるエリアアレイ型へと進んで
いる。中でも、BGA等のベアチップを直接実装する基
板では、チップと基板の接続は熱超音波圧着によるワイ
ヤボンディングで行うのが一般的である。このため、ベ
アチップを実装する基板は150℃以上の高温にさらさ
れることになり、圧着時にある程度の硬度を保つ必要が
ある。さらに、処理速度の高速化に伴いMPUのI/O
数が増加し、ワイヤボンディングで接続する端子数の増
加と端子幅の狭小化が進んでいる。つまり、非常に小さ
な端子にこれまで以上に短時間でワイヤボンディング接
続を行う必要があり、これに用いられる積層板には高速
ワイヤボンディングに対応できる優れた特性が要求され
ている。高速ワイヤボンディングに対応する積層板特性
としては、高温での優れた表面硬度と狭小化する接続端
子を含めた基板の優れた表面平滑性が挙げられる。2. Description of the Related Art With the spread of information terminal electronic devices such as personal computers and mobile phones, printed wiring boards mounted thereon have been reduced in size and density. The mounting form has been changed from the conventional pin insertion type to the surface mounting type, and in recent years, to the area array type represented by a BGA (ball grid array) using a plastic substrate. Above all, in the case of a substrate on which a bare chip such as a BGA is directly mounted, the connection between the chip and the substrate is generally performed by wire bonding using thermosonic pressure bonding. For this reason, the substrate on which the bare chip is mounted is exposed to a high temperature of 150 ° C. or higher, and it is necessary to maintain a certain degree of hardness during pressure bonding. Furthermore, with the increase in processing speed, I / O of MPU
The number of terminals is increasing, and the number of terminals connected by wire bonding is increasing and the terminal width is being narrowed. In other words, it is necessary to perform wire bonding connection to a very small terminal in a shorter time than ever before, and a laminate used for this purpose is required to have excellent characteristics capable of coping with high-speed wire bonding. Laminate characteristics corresponding to high-speed wire bonding include excellent surface hardness at high temperatures and excellent surface smoothness of a substrate including connection terminals that are narrowed.
【0003】高温での表面硬度を向上させる手法として
は、従来から樹脂の高Tg(ガラス転移温度)化等によ
る樹脂硬化物物性の改良が広く行われてきた(特開昭6
3−312316)。しかしながら、架橋密度を高くし
てTgを上げるだけでは、Tg以上の温度領域での硬度
の低下割合が大きいため、今後ますます厳しくなる高速
ワイヤボンディングへの対応が困難になる。また、一般
的に高Tg系の樹脂硬化物は樹脂骨格の嵩高さとあいま
って硬化や冷却による収縮量が大きく、積層板とした場
合に基材の凹凸をひろいやすく、表面粗さが増加する傾
向を示す。As a technique for improving the surface hardness at a high temperature, improvement in the physical properties of a cured resin by increasing the Tg (glass transition temperature) of the resin has been widely performed (Japanese Patent Application Laid-Open No. Sho.
3-321316). However, simply increasing the Tg by increasing the cross-linking density causes a large decrease in hardness in a temperature region higher than the Tg, which makes it difficult to cope with increasingly severe high-speed wire bonding in the future. In general, a high Tg-based resin cured product has a large amount of shrinkage due to curing and cooling in combination with the bulkiness of the resin skeleton, and when it is used as a laminated board, it tends to spread irregularities of the base material and tends to increase the surface roughness. Is shown.
【0004】表面硬度と表面平滑性を向上させる手法と
して、金属張積層板の基材に使用される織布の種類を変
更する方法がある。表面硬度を向上させるためには弾性
率の高い織布が有効であり、表面平滑性を向上させるた
めには織布の織り形態をできるだけ偏平にする等の方法
があるが、硬度・粗さとも基材を変更するだけではある
レベル以上の向上は困難である。一方,樹脂組成物の中
に無機充填剤を配合する方法がある(特公平2−453
48号)。表面硬度や表面平滑性を向上させるためには
ある程度以上の無機充填剤を配合する必要があるが,無
機充填剤を樹脂組成物中に高充填化すると無機充填剤自
体の凝集や樹脂組成物溶液の粘度が高くなるため,基材
に含浸後加熱・加圧して金属張積層板とした場合に,ミ
クロボイドや未含浸部分が多発し,得られた金属張積層
板の耐熱性の低下や著しい絶縁劣化等を招く。As a technique for improving the surface hardness and the surface smoothness, there is a method of changing the type of a woven fabric used as a base material of a metal-clad laminate. In order to improve the surface hardness, a woven fabric having a high elastic modulus is effective.In order to improve the surface smoothness, there are methods such as flattening the woven form of the woven fabric as much as possible. It is difficult to improve beyond a certain level only by changing the base material. On the other hand, there is a method of blending an inorganic filler in the resin composition (Japanese Patent Publication No. 2-453).
No. 48). In order to improve the surface hardness and surface smoothness, it is necessary to add a certain amount of inorganic filler. However, if the inorganic filler is highly filled in the resin composition, the aggregation of the inorganic filler itself and the resin composition solution When the metal-clad laminate is heated and pressurized to form a metal-clad laminate after being impregnated into the base material, microvoids and unimpregnated parts occur frequently, resulting in a decrease in the heat resistance of the resulting metal-clad laminate and marked insulation. It causes deterioration.
【0005】[0005]
【発明が解決しようとする課題】本発明は、上記従来技
術の問題点を解消し、高速ワイヤボンディングに対応可
能な高温での表面硬度が高く、表面粗さが小さいプリプ
レグ、金属張積層板及びそれを用いた印刷配線板を提供
するものである。SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems of the prior art, and provides a prepreg, a metal-clad laminate having a high surface hardness at a high temperature and a small surface roughness capable of coping with high-speed wire bonding. A printed wiring board using the same is provided.
【0006】[0006]
【課題を解決するための手段】本発明は、次のものに関
する。 1. 基材に、樹脂、無機充填剤25体積%以上及びシ
リコーン重合体を含む樹脂組成物を含浸させてなるプリ
プレグ。 2. 無機充填剤が予めシリコーン重合体で表面処理さ
れているものである項1に記載のプリプレグ。 3. 樹脂組成物がさらにカップリング剤を含む項1又
は項2に記載のプリプレグ。 4. 無機充填剤が予めシリコーン重合体とカップリン
グ剤で処理されているものである項1〜3に記載のプリ
プレグ。 5. 樹脂組成物がシリコーン重合体の溶液に分散され
た無機充填剤入り溶液に樹脂を配合して得た樹脂組成物
である項1又は項2記載のプリプレグ。 6. 樹脂組成物がシリコーン重合体及びカップリング
剤の溶液に分散された無機充填剤入り溶液に樹脂を配合
して得た樹脂組成物である項1又は項2記載のプリプレ
グ。 7. シリコーン重合体が3次元架橋しているものであ
る項1〜6のいずれかに記載のプリプレグ。 8. シリコーン重合体が、分子内に3官能性シロキサ
ン単位(RSiO3/2)或いは4官能性シロキサン単位
(SiO4/2)を含有するものである項7に記載のプリ
プレグ。(上記式中、R基は同じか又は別異な有機基で
ある) 9. シリコーン重合体が分子内に全シロキサン単位に
対して、4官能性シラン化合物又は3官能性シラン化合
物15〜100モル%及び2官能性シラン化合物0〜8
5モル%含有するものである項8記載のプリプレグ。 10. シリコーン重合体が分子内に全シロキサン単位
に対して、4官能性シロキサン単位を15〜100モル
%、3官能性シロキサン単位を0〜85モル%及び2官
能性シロキサン単位を0〜85モル%含有するものであ
る項9記載のプリプレグ。 11. 項1〜10のいずれかに記載のプリプレグ又は
その積層体の両面又は片面に金属箔を積層し、加熱加圧
して得られる金属張積層板。 12. 金属張積層板の表面硬度(金属でない表面又は
金属を除いた表面の硬度)が、200℃でのバーコール
硬度で30以上である項11に記載の金属張積層板。 13. 項11又は項12に記載の金属張積層板を用い
て回路加工を施してなる印刷配線板。The present invention relates to the following. 1. A prepreg obtained by impregnating a base material with a resin composition containing at least 25% by volume of a resin, an inorganic filler and a silicone polymer. 2. Item 2. The prepreg according to Item 1, wherein the inorganic filler has been previously surface-treated with a silicone polymer. 3. Item 3. The prepreg according to item 1 or 2, wherein the resin composition further contains a coupling agent. 4. Item 4. The prepreg according to items 1 to 3, wherein the inorganic filler has been previously treated with a silicone polymer and a coupling agent. 5. Item 3. The prepreg according to item 1 or 2, wherein the resin composition is a resin composition obtained by blending a resin with a solution containing an inorganic filler dispersed in a solution of a silicone polymer. 6. Item 3. The prepreg according to item 1 or 2, wherein the resin composition is a resin composition obtained by blending a resin with a solution containing an inorganic filler dispersed in a solution of a silicone polymer and a coupling agent. 7. Item 7. The prepreg according to any one of Items 1 to 6, wherein the silicone polymer is three-dimensionally crosslinked. 8. Item 8. The prepreg according to item 7, wherein the silicone polymer contains a trifunctional siloxane unit (RSiO 3/2 ) or a tetrafunctional siloxane unit (SiO 4/2 ) in the molecule. (In the above formula, the R groups are the same or different organic groups.) The silicone polymer contains 15 to 100% by mole of a tetrafunctional silane compound or a trifunctional silane compound and 0 to 8 of a bifunctional silane compound based on all siloxane units in the molecule.
Item 9. The prepreg according to item 8, which contains 5 mol%. 10. The silicone polymer contains 15 to 100 mol% of a tetrafunctional siloxane unit and 0 to 85 mol% of a trifunctional siloxane unit and 0 to 85 mol% of a difunctional siloxane unit, based on all siloxane units in the molecule. Item 10. The prepreg according to item 9, wherein 11. Item 10. A metal-clad laminate obtained by laminating a metal foil on both surfaces or one surface of the prepreg or the laminate thereof according to any one of Items 1 to 10, and heating and pressing. 12. Item 12. The metal-clad laminate according to item 11, wherein the metal-clad laminate has a surface hardness (hardness of a nonmetallic surface or a surface excluding a metal) of not less than 30 in Barcol hardness at 200 ° C. 13. Item 13. A printed wiring board obtained by performing circuit processing using the metal-clad laminate according to item 11 or 12.
【0007】[0007]
【発明の実施の形態】本発明で用いる樹脂は特に制限さ
れないが、樹脂としては、熱硬化性樹脂が好ましく、耐
熱性に富む熱可塑性樹脂も好ましい。樹脂としては、例
えばエポキシ樹脂、ポリイミド樹脂、トリアジン樹脂、
メラミン樹脂、フェノール樹脂等が用いられる。また、
これらの樹脂は2種類以上を併用してもよく、必要に応
じて各種硬化剤、硬化促進剤等を樹脂に配合してもよ
い。これらは溶剤溶液にして使用することができる。溶
剤としては、アルコール系溶剤、エーテル系溶剤、ケト
ン系溶剤、アミド系溶剤、芳香族炭化水素系溶剤、エス
テル系溶剤、ニトリル系溶剤などを用いることができ、
また2種以上の溶剤を混合した混合溶剤を使用すること
もできる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The resin used in the present invention is not particularly limited, but the resin is preferably a thermosetting resin, and a thermoplastic resin having high heat resistance is also preferable. As the resin, for example, epoxy resin, polyimide resin, triazine resin,
Melamine resin, phenol resin and the like are used. Also,
Two or more of these resins may be used in combination, and various curing agents, curing accelerators, and the like may be added to the resin as necessary. These can be used as a solvent solution. As the solvent, alcohol solvents, ether solvents, ketone solvents, amide solvents, aromatic hydrocarbon solvents, ester solvents, nitrile solvents and the like can be used,
Further, a mixed solvent obtained by mixing two or more solvents can also be used.
【0008】硬化剤としては、従来公知の種々のものを
使用することができ、例えば樹脂としてエポキシ樹脂を
用いる場合には、ジシアンジアミド、ジアミノジフェニ
ルメタン、ジアミノジフェニルスルフォン等のアミン化
合物、無水フタル酸、無水ピロメリット酸等の酸無水物
化合物、フェノールノボラック樹脂やクレゾールノボラ
ック樹脂等の多官能性フェノール化合物などを挙げるこ
とができる。これらの硬化剤は何種類かを併用すること
も可能である。また、ポリイミド樹脂やトリアジン樹脂
等は通常使用されているエポキシ樹脂やアミン化合物等
により硬化させたものが一般的であるが,これに限定さ
れるものではない。硬化剤の配合量は特に限定するもの
ではないが,エポキシ樹脂等の主材の官能基に対して
0.5〜1.5等量が好ましい。いずれの樹脂系とも硬
化を促進するために促進剤を使用してもよい。促進剤の
種類は特に限定するものではなく、例えばイミダゾール
系化合物、有機リン系化合物、第2級アミン、第3級ア
ミン、第4級アンモニウム塩等が用いられ、2種類以上
を併用してもよい。促進剤の配合量も特に限定するもの
ではないが,主材である樹脂100重量部に対して0.
01〜10.0重量部が好ましい。As the curing agent, various conventionally known curing agents can be used. For example, when an epoxy resin is used as the resin, an amine compound such as dicyandiamide, diaminodiphenylmethane, diaminodiphenylsulfone, phthalic anhydride, Examples thereof include acid anhydride compounds such as pyromellitic acid, and polyfunctional phenol compounds such as phenol novolak resins and cresol novolak resins. Some of these curing agents can be used in combination. The polyimide resin, triazine resin, and the like are generally cured with a commonly used epoxy resin, amine compound, or the like, but are not limited thereto. The amount of the curing agent is not particularly limited, but is preferably 0.5 to 1.5 equivalents to the functional group of the main material such as an epoxy resin. Accelerators may be used to promote curing with any of the resin systems. The type of the accelerator is not particularly limited, and examples thereof include an imidazole compound, an organic phosphorus compound, a secondary amine, a tertiary amine, and a quaternary ammonium salt. Good. The amount of the accelerator is not particularly limited, either, but is not limited to 100 parts by weight of the resin as the main material.
It is preferably from 0.01 to 10.0 parts by weight.
【0009】前記イミダゾール系化合物としては、イミ
ダゾール化合物としては、イミダゾール、2−エチルイ
ミダゾール、2−エチル−4−メチルイミダゾール、2
−フェニルイミダゾール、2−ウンデシルイミダゾー
ル、1−ベンジル−2−メチルイミダゾール、2−ヘプ
タデシルイミダゾール、4,5−ジフェニルイミダゾー
ル、2−メチルイミダゾリン、2−フェニルイミダゾリ
ン、2−ウンデシルイミダゾリン、2−ヘプタデシルイ
ミダゾリン、2−イソプロピルイミダゾール、2,4−
ジメチルイミダゾール、2−フェニル−4−メチルイミ
ダゾール、2−エチルイミダゾリン、2−イソプロピル
イミダゾリン、2,4−ジメチルイミダゾリン、2−フ
ェニル−4−メチルイミダゾリンなどが挙げられる。こ
れらはマスク剤によりマスクされていてもよい。マスク
化剤としては、アクリロニトリル、フェニレンジイソシ
アネート、トルイジンイソシアネート、ナフタレンジイ
ソシアネート、メチレンビスフェニルイソシアネート、
メラミンアクリレートなどが挙げられる。The imidazole compounds include imidazole compounds such as imidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole,
-Phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2-heptadecylimidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2- Heptadecylimidazoline, 2-isopropylimidazole, 2,4-
Examples thereof include dimethylimidazole, 2-phenyl-4-methylimidazole, 2-ethylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, and 2-phenyl-4-methylimidazoline. These may be masked by a masking agent. As a masking agent, acrylonitrile, phenylene diisocyanate, toluidine isocyanate, naphthalene diisocyanate, methylene bisphenyl isocyanate,
Melamine acrylate and the like.
【0010】前記有機リン系化合物としてはトリフェニ
ルホスフィン等があり、第2級アミンとしてはピペリジ
ン等、前記第三級アミンとしてはジメチルベンジルアミ
ン、トリス(ジメチルアミノメチル)フェノール等、前
記第四級アンモニウム塩としてはテトラブチルアンモニ
ウムブロマイド、テトラブチルアンモニウムクロライト
等がある。The organic phosphorus compounds include triphenylphosphine and the like; the secondary amines include piperidine; and the tertiary amines include dimethylbenzylamine and tris (dimethylaminomethyl) phenol; Examples of the ammonium salt include tetrabutylammonium bromide and tetrabutylammonium chloride.
【0011】本発明では高温での表面硬度及び表面粗さ
の向上を目的として無機充填剤を樹脂組成物固形分総量
に対して25体積%以上使用する。無機充填剤の種類は
特に制約はなく、例えば、炭酸カルシウム、アルミナ、
酸化チタン、マイカ、炭酸アルミニウム、水酸化アルミ
ニウム、ケイ酸マグネシウム、ケイ酸アルミニウム、シ
リカ、ガラス短繊維、ホウ酸アルミニウムウィスカや炭
化ケイ素ウィスカ等の各種ウィスカ等が用いられる。ま
た、これらを数種類併用しても良い。これら無機充填剤
の配合量は、樹脂組成物固形分総量に対して25体積%
以上であれば特に限定されるものではないが,積層板と
した場合の表面硬度(ただし、金属でない表面又は金属
を除いた表面の硬度)が、200℃におけるバーコール
硬度で30以上となり、また、表面粗さをできるだけ向
上させるためには25〜65体積%が好ましい。無機充
填剤の配合量の測定は,特に限定するものではないが,
無機充填剤を含んだ樹脂組成物の硬化物の重量と400
〜700℃程度で数時間加熱処理した後に残った無機成
分重量との割合から無機充填剤を含まない樹脂組成物の
硬化物の比重及び無機充填剤の比重の値から体積換算し
算出するのが一般的である。In the present invention, an inorganic filler is used in an amount of 25% by volume or more based on the total solid content of the resin composition for the purpose of improving the surface hardness and surface roughness at a high temperature. The type of the inorganic filler is not particularly limited, for example, calcium carbonate, alumina,
Titanium oxide, mica, aluminum carbonate, aluminum hydroxide, magnesium silicate, aluminum silicate, silica, short glass fibers, various whiskers such as aluminum borate whiskers and silicon carbide whiskers are used. These may be used in combination of several types. The blending amount of these inorganic fillers is 25% by volume based on the total amount of the resin composition solids.
Although not particularly limited as long as it is above, the surface hardness of the laminated plate (however, the hardness of the non-metal surface or the surface excluding the metal) becomes 30 or more in Barcol hardness at 200 ° C., In order to improve the surface roughness as much as possible, 25 to 65% by volume is preferable. The measurement of the blending amount of the inorganic filler is not particularly limited,
Weight of cured product of resin composition containing inorganic filler and 400
It is calculated by converting the volume from the value of the specific gravity of the cured product of the resin composition containing no inorganic filler and the specific gravity of the inorganic filler from the ratio with the weight of the inorganic component remaining after heating at about 700 ° C. for several hours. General.
【0012】本発明では、無機充填剤の樹脂組成物の硬
化物中での分散性を向上させることを目的としてシリコ
ーン重合体が用いられる。無機充填剤は、このシリコー
ン重合体により表面処理されていることが好ましい。シ
リコーン重合体は、無機充填剤入り樹脂組成物に直接添
加することができ、これによっても無機充填剤のシリコ
ーン重合体による表面処理の効果がある。In the present invention, a silicone polymer is used for the purpose of improving the dispersibility of the inorganic filler in the cured product of the resin composition. The inorganic filler is preferably surface-treated with this silicone polymer. The silicone polymer can be directly added to the resin composition containing an inorganic filler, which also has the effect of surface treatment of the inorganic filler with the silicone polymer.
【0013】無機充填剤は、シリコーン重合体により予
め表面処理されていることが好ましく、そのためには、
無機充填剤をシリコーン重合体溶液に配合することが好
ましい。ついで、これにより得られた溶液とその他の樹
脂材料を配合することによりプリプレグ製造用の樹脂組
成物を調製することが特に好ましい。以上において、混
合時の温度には、特に制限はないが、常温以上200℃
以下であることが好ましく、150℃以下であることが
より好ましい。The inorganic filler is preferably surface-treated in advance with a silicone polymer.
Preferably, an inorganic filler is incorporated into the silicone polymer solution. Next, it is particularly preferable to prepare a resin composition for producing a prepreg by blending the obtained solution with other resin materials. In the above, the temperature at the time of mixing is not particularly limited, but is equal to or higher than normal temperature
Or less, more preferably 150 ° C. or less.
【0014】また、無機充填剤をシリコーン重合体溶液
に配合し、シリコーン重合体が表面に付着した無機充填
剤を分離乾燥して、シリコーン重合体により表面処理さ
れた無機充填剤を調製し、これを樹脂組成物の他の成分
と混合してもよいが、このとき、乾燥の温度は、50〜
200℃が好ましく、80〜150℃がより好ましい。
また、乾燥時間は、5〜60分間が好ましく、10〜3
0分間がより好ましい。Further, an inorganic filler is mixed with the silicone polymer solution, and the inorganic filler having the silicone polymer adhered to the surface is separated and dried to prepare an inorganic filler surface-treated with the silicone polymer. May be mixed with other components of the resin composition. At this time, the drying temperature is 50 to
200 ° C is preferable, and 80 to 150 ° C is more preferable.
The drying time is preferably 5 to 60 minutes, and 10 to 3 minutes.
0 minutes is more preferable.
【0015】シリコーン重合体は、無機充填剤に対し
て、0.01〜10重量%使用することが好ましく、
0.05〜5重量%使用することが好ましい。The silicone polymer is preferably used in an amount of 0.01 to 10% by weight based on the weight of the inorganic filler.
It is preferable to use 0.05 to 5% by weight.
【0016】本発明におけるシリコーン重合体は、3官
能性シロキサン単位(RSiO3/2)(式中、Rは有機
基であり、シリコーン重合体中のR基は互いに同一であ
ってもよいし、異なっていてもよい。)及び4官能性シ
ロキサン単位(SiO4/2)から選ばれる少なくとも1
種類のシロキサン単位を含有し、重合度は2〜7000
が好ましい。より好ましい下限は3である。さらに好ま
しい重合度は5〜5000、特に好ましい重合度は10
〜100であり、末端に水酸基と反応する官能基を1個
以上有するものである。ここで、重合度は、その重合体
の分子量(低重合度の場合)又はゲルパーミエーション
クロマトグラフィーにより標準ポリスチレン若しくはポ
リエチレングリコールの検量線を利用して測定した数平
均分子量から算出したものである。シロキサン単位とし
ては、他に、2官能性シロキサン単位(R2SiO2/2)
が、全体の単位数に対して0〜85%含まれていてもよ
い。前記のRとしては、炭素数1〜4のアルキル基、フ
ェニル基等があり、水酸基と反応する官能基としては、
シラノール基、炭素数1〜4のアルコキシル基、炭素数
2〜5のアシルオキシ基、塩素、臭素等のハロゲン等が
ある。In the present invention, the silicone polymer may be a trifunctional siloxane unit (RSiO 3/2 ) wherein R is an organic group, and the R groups in the silicone polymer may be the same as each other; And at least one selected from tetrafunctional siloxane units (SiO 4/2 )
Contains siloxane units of various types and has a degree of polymerization of 2 to 7000
Is preferred. A more preferred lower limit is 3. A more preferred degree of polymerization is 5 to 5000, and a particularly preferred degree of polymerization is 10
-100, and has at least one functional group that reacts with a hydroxyl group at the terminal. Here, the degree of polymerization is calculated from the molecular weight of the polymer (in the case of a low degree of polymerization) or the number average molecular weight measured by gel permeation chromatography using a calibration curve of standard polystyrene or polyethylene glycol. As the siloxane unit, besides, a bifunctional siloxane unit (R 2 SiO 2/2 )
May be contained in an amount of 0 to 85% with respect to the total number of units. Examples of the R include an alkyl group having 1 to 4 carbon atoms and a phenyl group. Examples of the functional group that reacts with a hydroxyl group include:
Examples include a silanol group, an alkoxyl group having 1 to 4 carbon atoms, an acyloxy group having 2 to 5 carbon atoms, and halogens such as chlorine and bromine.
【0017】本発明におけるシリコーン重合体は、3次
元架橋しているものである。例えば、3官能性シロキサ
ン単位のみからなるもの、4官能性シロキサン単位のみ
からなるもの、2官能性シロキサン単位と3官能性シロ
キサン単位からなるもの、2官能性シロキサン単位と4
官能性シロキサン単位からなるもの、3官能性シロキサ
ン単位と4官能性シロキサン単位からなるもの、及び2
官能性シロキサン単位と3官能性シロキサン単位と4官
能性シロキサン単位からなるものが好ましい。具体的な
含有量としては、全シロキサン単位に対して、4官能性
シロキサン単位又は3官能性シロキサン単位を15〜1
00モル%および2官能性シロキサン単位を0〜85モ
ル%が好ましく、4官能性シロキサン単位または3官能
性シロキサン単位の1種以上を20〜100モル%およ
び2官能性シロキサン単位を0〜80モル%がより好ま
しい。特に、全シロキサン単位に対して、4官能性シロ
キサン単位15〜100モル%、3官能性シロキサン単
位を0〜85モル%及び2官能性シロキサン単位を0〜
85モル%が好ましく、4官能性シロキサン単位20〜
60モル%、3官能性シロキサン単位を0〜80モル%
及び2官能性シロキサン単位を0〜80モル%を含有す
ることがより好ましい。The silicone polymer used in the present invention is three-dimensionally crosslinked. For example, a product consisting of only trifunctional siloxane units, a product consisting of only tetrafunctional siloxane units, a product consisting of difunctional siloxane units and trifunctional siloxane units, a product consisting of difunctional siloxane units and 4
Consisting of a functional siloxane unit, consisting of a trifunctional siloxane unit and a tetrafunctional siloxane unit, and 2
What consists of a functional siloxane unit, a trifunctional siloxane unit, and a tetrafunctional siloxane unit is preferable. As a specific content, a tetrafunctional siloxane unit or a trifunctional siloxane unit is 15 to 1 based on all siloxane units.
The content of 00 mol% and the amount of the bifunctional siloxane unit is preferably 0 to 85 mol%, and the content of at least one of the tetrafunctional siloxane unit and the trifunctional siloxane unit is 20 to 100 mol% and the content of the bifunctional siloxane unit is 0 to 80 mol. % Is more preferred. In particular, based on the total siloxane units, 15 to 100 mol% of the 4-functional siloxane units, 0 to 85 mol% of the trifunctional siloxane units, and 0 to 85 mol% of the bifunctional siloxane units.
85 mol% is preferred, and a tetrafunctional siloxane unit of 20 to
60 mol%, 0 to 80 mol% of trifunctional siloxane unit
And more preferably contains 0 to 80 mol% of a bifunctional siloxane unit.
【0018】本発明おけるシリコーン重合体は、一般式
(I)The silicone polymer of the present invention has the general formula (I)
【化1】R′nSiX4-n (I) (式中Xは、塩素、臭素等のハロゲン又は−ORを示
し、ここで、Rは炭素数1〜4のアルキル基、炭素数1
〜4のアルキルを有するアルキルカルボニル基を示し、
R′は炭素数1〜4のアルキル基、フェニル基等のアリ
ール基、nは0〜2の整数を意味する)で表されるシラ
ン化合物を加水分解、重縮合させて得ることができる。Embedded image R ′ n SiX 4-n (I) (wherein X represents halogen such as chlorine or bromine or —OR, wherein R is an alkyl group having 1 to 4 carbon atoms, 1 carbon atom)
Represents an alkylcarbonyl group having an alkyl of 4 to 4,
R 'is an alkyl group having 1 to 4 carbon atoms, an aryl group such as a phenyl group, and n is an integer of 0 to 2).
【0019】前記一般式(I)で表されるシラン化合物
は、具体的にはThe silane compound represented by the general formula (I) is specifically described below.
【化2】Si(OCH3)4、Si(OC2H5)4、 Si(OC3H7)4、Si(OC4H9)4 等のテトラアルコキシシラン などの4官能性シラン化合物(以下、シラン化合物にお
ける官能性とは、縮合反応性の官能基を有することを意
味する。)、Embedded image Tetraalkoxysilane such as Si (OCH 3 ) 4 , Si (OC 2 H 5 ) 4 , Si (OC 3 H 7 ) 4 , Si (OC 4 H 9 ) 4, etc. Hereinafter, the functionality in the silane compound means that the silane compound has a condensation-reactive functional group.)
【化3】 H3CSi(OCH3)3、H5C2Si(OCH3)3、 H7C3Si(OCH3)3、H9C4Si(OCH3)3、 H3CSi(OC2H5)3、H5C2Si(OC2H5)3、 H7C3Si(OC2H5)3、H9C4Si(OC2H5)3、 H3CSi(OC3H7)3、H5C2Si(OC3H7)3、 H7C3Si(OC3H7)3、H9C4Si(OC3H7)3、 H3CSi(OC4H9)3、H5C2Si(OC4H9)3、 H7C3Si(OC4H9)3、H9C4Si(OC4H9)3、 等のモノアルキルトリアルコキシシラン、Embedded image H 3 CSi (OCH 3 ) 3 , H 5 C 2 Si (OCH 3 ) 3 , H 7 C 3 Si (OCH 3 ) 3 , H 9 C 4 Si (OCH 3 ) 3 , H 3 CSi ( OC 2 H 5) 3, H 5 C 2 Si (OC 2 H 5) 3, H 7 C 3 Si (OC 2 H 5) 3, H 9 C 4 Si (OC 2 H 5) 3, H 3 CSi ( OC 3 H 7) 3, H 5 C 2 Si (OC 3 H 7) 3, H 7 C 3 Si (OC 3 H 7) 3, H 9 C 4 Si (OC 3 H 7) 3, H 3 CSi ( OC 4 H 9) 3, H 5 C 2 Si (OC 4 H 9) 3, H 7 C 3 Si (OC 4 H 9) 3, H 9 C 4 Si (OC 4 H 9) 3, monoalkyl etc. Trialkoxysilane,
【化4】 PhSi(OCH3)3、PhSi(OC2H5)3、 PhSi(OC3H7)3、PhSi(OC4H9)3 (ただし、Phはフェニル基を示す。以下同様)等のフ
ェニルトリアルコキシシラン、Embedded image PhSi (OCH 3 ) 3 , PhSi (OC 2 H 5 ) 3 , PhSi (OC 3 H 7 ) 3 , PhSi (OC 4 H 9 ) 3 (wherein Ph represents a phenyl group; the same applies hereinafter) Phenyl trialkoxysilane such as,
【化5】(H3CCOO)3SiCH3、(H3CCOO)
3SiC2H5、 (H3CCOO)3SiC3H7、(H3CCOO)3SiC
4H9 等のモノアルキルトリアシルオキシシランEmbedded image (H 3 CCOO) 3 SiCH 3 , (H 3 CCOO)
3 SiC 2 H 5 , (H 3 CCOO) 3 SiC 3 H 7 , (H 3 CCOO) 3 SiC
Monoalkyl triacyloxy silanes such as 4 H 9
【化6】Cl3SiCH3、Cl3SiC2H5、 Cl3SiC3H7、Cl3SiC4H9 Br3SiCH3、Br3SiC2H5、 Br3SiC3H7、Br3SiC4H9 等のモノアルキルトリハロゲノシランなどの3官能性シ
ラン化合物、Embedded image Cl 3 SiCH 3 , Cl 3 SiC 2 H 5 , Cl 3 SiC 3 H 7 , Cl 3 SiC 4 H 9 Br 3 SiCH 3 , Br 3 SiC 2 H 5 , Br 3 SiC 3 H 7 , Br 3 trifunctional silane compounds such as monoalkyl trihalogenosilane such SiC 4 H 9,
【化7】(H3C)2Si(OCH3)2、(H5C2)2S
i(OCH3)2、 (H7C3)2Si(OCH3)2、(H9C4)2Si(OC
H3)2、 (H3C)2Si(OC2H5)2、(H5C2)2Si(OC
2H5)2、 (H7C3)2Si(OC2H5)2、(H9C4)2Si(O
C2H5)2、 (H3C)2Si(OC3H7)2、(H5C2)2Si(OC
3H7)2、 (H7C3)2Si(OC3H7)2、(H9C4)2Si(O
C3H7)2、 (H3C)2Si(OC4H9)2、(H5C2)2Si(OC
4H9)2、 (H7C3)2Si(OC4H9)2、(H9C4)2Si(O
C4H9)2 等のジアルキルジアルコキシシラン、Embedded image (H 3 C) 2 Si (OCH 3 ) 2 , (H 5 C 2 ) 2 S
i (OCH 3 ) 2 , (H 7 C 3 ) 2 Si (OCH 3 ) 2 , (H 9 C 4 ) 2 Si (OC
H 3) 2, (H 3 C) 2 Si (OC 2 H 5) 2, (H 5 C 2) 2 Si (OC
2 H 5) 2, (H 7 C 3) 2 Si (OC 2 H 5) 2, (H 9 C 4) 2 Si (O
C 2 H 5 ) 2 , (H 3 C) 2 Si (OC 3 H 7 ) 2 , (H 5 C 2 ) 2 Si (OC
3 H 7) 2, (H 7 C 3) 2 Si (OC 3 H 7) 2, (H 9 C 4) 2 Si (O
C 3 H 7) 2, ( H 3 C) 2 Si (OC 4 H 9) 2, (H 5 C 2) 2 Si (OC
4 H 9) 2, (H 7 C 3) 2 Si (OC 4 H 9) 2, (H 9 C 4) 2 Si (O
Dialkyl dialkoxysilane of C 4 H 9) 2 and the like,
【化8】 Ph2Si(OCH3)2、Ph2Si(OC2H5)2 等のジフェニルジアルコキシシラン、Embedded image Diphenyldialkoxysilanes such as Ph 2 Si (OCH 3 ) 2 and Ph 2 Si (OC 2 H 5 ) 2
【化9】(H3CCOO)2Si(CH3)2、(H3CC
OO)2Si(C2H5)2、 (H3CCOO)2Si(C3H7)2、(H3CCOO)2
Si(C4H9)2 等のジアルキルジアシルオキシシラン、Embedded image (H 3 CCOO) 2 Si (CH 3 ) 2 , (H 3 CC
OO) 2 Si (C 2 H 5 ) 2 , (H 3 CCOO) 2 Si (C 3 H 7 ) 2 , (H 3 CCOO) 2
Si dialkyl acyloxysilane such as (C 4 H 9) 2,
【化10】 Cl2Si(CH3)2、Cl2Si(C2H5)2、 Cl2Si(C3H7)3、Cl2Si(C4H9)2、 Br2Si(CH3)2、Br2Si(C2H5)2、 Br2Si(C3H7)2、Br2Si(C4H9)2 等のアルキルジハロゲノシランなどの2官能性シラン化
合物がある。Embedded image Cl 2 Si (CH 3 ) 2 , Cl 2 Si (C 2 H 5 ) 2 , Cl 2 Si (C 3 H 7 ) 3 , Cl 2 Si (C 4 H 9 ) 2 , Br 2 Si ( Bifunctional silane compounds such as alkyl dihalogenosilanes such as CH 3 ) 2 , Br 2 Si (C 2 H 5 ) 2 , Br 2 Si (C 3 H 7 ) 2 and Br 2 Si (C 4 H 9 ) 2 There is.
【0020】本発明に用いられる前記一般式(I)で表
されるシラン化合物としては、4官能性シラン化合物又
は3官能性シラン化合物が必須成分として用いられ、2
官能性シラン化合物は必要に応じて適宜使用される。特
に、4官能性シラン化合物としてはテトラアルコキシシ
ランが好ましく、3官能性シラン化合物としてはモノア
ルキルトリアルコキシシランが好ましく、2官能性シラ
ン化合物としてはジアルキルジアルコキシシランが好ま
しい。シラン化合物の使用割合は、好ましくは、4官能
性シラン化合物又は3官能性シラン化合物15〜100
モル%及び2官能性シラン化合物を0〜85モル%が好
ましく、4官能性シラン化合物または3官能性シラン化
合物の1種以上を20〜100モル%及び2官能性シラ
ン化合物を0〜80モル%がより好ましい。また、特
に、4官能性シラン化合物を15〜100モル%、3官
能性シラン化合物0〜85モル%及び2官能性シラン化
合物0〜85モル%の割合で使用することが好ましく、
4官能性シラン化合物を20〜100モル%、3官能性
シラン化合物を0〜80モル%と、2官能性シラン化合
物を0〜80モル%の割合で使用することがより好まし
い。As the silane compound represented by the general formula (I) used in the present invention, a tetrafunctional silane compound or a trifunctional silane compound is used as an essential component.
The functional silane compound is appropriately used as needed. In particular, the tetrafunctional silane compound is preferably a tetraalkoxysilane, the trifunctional silane compound is preferably a monoalkyl trialkoxysilane, and the bifunctional silane compound is preferably a dialkyldialkoxysilane. The proportion of the silane compound used is preferably a tetrafunctional silane compound or a trifunctional silane compound 15 to 100.
The mol% and the bifunctional silane compound are preferably 0 to 85 mol%, and at least one of the tetrafunctional silane compound and the trifunctional silane compound is 20 to 100 mol% and the bifunctional silane compound is 0 to 80 mol%. Is more preferred. In addition, it is particularly preferable to use a tetrafunctional silane compound in a proportion of 15 to 100 mol%, a trifunctional silane compound of 0 to 85 mol%, and a bifunctional silane compound of 0 to 85 mol%.
More preferably, the tetrafunctional silane compound is used at a ratio of 20 to 100 mol%, the trifunctional silane compound is used at a ratio of 0 to 80 mol%, and the bifunctional silane compound is used at a ratio of 0 to 80 mol%.
【0021】本発明におけるシリコーン重合体は、前記
した一般式(I)で表されるシラン化合物を加水分解、
重縮合して製造されるが、このとき、触媒としては、塩
酸、硫酸、リン酸、硝酸、フッ酸等の無機酸、シュウ
酸、マレイン酸、スルホン酸、ギ酸、酢酸等の有機酸を
使用することが好ましく、アンモニア、トリメチルアン
モニウムなどの塩基性触媒を用いることもできる。これ
ら触媒は、一般式(I)で表されるシラン化合物の量に
応じて適当量用いられるが、好適には一般式(I)で表
されるシラン化合物1モルに対し0.001〜0.5モ
ルの範囲で用いられる。The silicone polymer of the present invention hydrolyzes the silane compound represented by the above general formula (I),
It is produced by polycondensation.At this time, as a catalyst, an inorganic acid such as hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid, or hydrofluoric acid, or an organic acid such as oxalic acid, maleic acid, sulfonic acid, formic acid, or acetic acid is used. It is preferable to use a basic catalyst such as ammonia or trimethylammonium. These catalysts are used in an appropriate amount depending on the amount of the silane compound represented by the general formula (I). It is used in a range of 5 mol.
【0022】また、上記の加水分解・重縮合は、後記の
ワニス化に使用する溶剤中で行うことが好ましく、特に
アルコール系溶剤、ケトン系溶剤中で行なうことがより
好ましい。また、この反応に際して、水が存在させられ
る。水の量も適宜決められるが、多すぎる場合には塗布
液の保存安定性が低下するなどの問題があるので、水の
量は、一般式(I)で表されるシラン化合物1モルに対
して、0〜5モル%が好ましく、0.5〜4モルの範囲
とすることがより好ましい。The above-mentioned hydrolysis and polycondensation are preferably carried out in a solvent used for varnish formation described below, and more preferably carried out in an alcohol solvent or a ketone solvent. In this reaction, water is present. The amount of water is also appropriately determined. However, if the amount is too large, there is a problem that storage stability of the coating solution is reduced. Therefore, the amount of water is determined based on 1 mol of the silane compound represented by the general formula (I). Therefore, the content is preferably 0 to 5 mol%, more preferably 0.5 to 4 mol.
【0023】また,これらのシリコーン重合体は各種カ
ップリング剤と併用してもよい。カップリング剤として
はシラン系カップリング剤やチタネート系カップリング
剤等が挙げられ、シラン系カップリング剤としては、一
般にエポキシシラン系カップリング剤、アミノシラン系
カップリング剤、カチオニックシラン系カップリング
剤、ビニルシラン系カップリング剤、アクリルシラン系
カップリング剤、メルカプトシラン系カップリング剤及
びこれらの複合系等がある。カップリング剤は使用する
ときは、種々の調製作業等の作業においてシリコーン重
合体と同時に使用することがもっとも好ましい。カップ
リング剤は使用するときは、無機充填剤に対して、0.
01〜10重量%使用することが好ましく、0.05〜
5重量%使用することが好ましい。[0023] These silicone polymers may be used in combination with various coupling agents. Examples of the coupling agent include a silane-based coupling agent and a titanate-based coupling agent. Examples of the silane-based coupling agent include an epoxysilane-based coupling agent, an aminosilane-based coupling agent, and a cationic silane-based coupling agent. , A vinylsilane-based coupling agent, an acrylsilane-based coupling agent, a mercaptosilane-based coupling agent, and a composite thereof. When the coupling agent is used, it is most preferable to use it simultaneously with the silicone polymer in various preparation operations and the like. When a coupling agent is used, it is added to the inorganic filler in an amount of 0.1%.
It is preferably used in an amount of from 0.01 to 10% by weight,
It is preferable to use 5% by weight.
【0024】これら樹脂材料、無機充填剤等含む樹脂組
成物は、溶剤で希釈してワニス化して使用することが好
ましい。このとき使用される溶剤の種類は特に制限はな
く、例えば、メタノール、エタノールなどのアルコール
系溶剤、エチレングリコールモノメチルエーテルなどの
エーテル系溶剤、アセトン、メチルエチルケトン、メチ
ルイソブチルケトンなどのケトン系溶剤、N,N−ジメ
チルホルムアミドなどのアミド系溶剤、トルエン、キシ
レンなどの芳香族炭化水素系溶剤、酢酸エチルなどのエ
ステル系溶剤、ブチロニトリルなどのニトリル系溶剤等
があり、これらは何種類かを混合してもよい。また、ワ
ニスの固形分濃度は特に制限はなく、樹脂組成や無機充
填剤の種類及び配合量等により適宜変更できるが、50
重量%〜80重量%の範囲が好ましい。50重量%未満
では、ワニス粘度が低く、プリプレグの樹脂分が低くな
る傾向があり、80重量%を超えるとワニスの増粘等に
よりプリプレグの外観等が著しく低下しやすくなる傾向
がある。好ましくは55重量%〜75重量%である。The resin composition containing these resin materials, inorganic fillers and the like is preferably diluted with a solvent to form a varnish before use. The type of the solvent used at this time is not particularly limited. For example, alcohol solvents such as methanol and ethanol, ether solvents such as ethylene glycol monomethyl ether, ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; There are amide solvents such as N-dimethylformamide, aromatic hydrocarbon solvents such as toluene and xylene, ester solvents such as ethyl acetate, nitrile solvents such as butyronitrile, and the like. Good. The solid content concentration of the varnish is not particularly limited, and can be appropriately changed depending on the resin composition, the type and the amount of the inorganic filler, and the like.
The range of from 80% by weight to 80% by weight is preferred. If it is less than 50% by weight, the varnish viscosity tends to be low, and the resin content of the prepreg tends to be low. If it exceeds 80% by weight, the appearance and the like of the prepreg tend to be remarkably deteriorated due to thickening of the varnish. Preferably it is 55 to 75% by weight.
【0025】樹脂、無機充填剤及びシリコーン重合体を
含む樹脂組成物のワニスを基材に含浸させ、80℃〜2
00℃の範囲で乾燥させて、プリプレグを製造する。基
材としては、金属箔張り積層板や多層印刷配線板を製造
する際に用いられるものであれば特に制限されないが、
通常織布や不織布等の繊維基材が用いられる。繊維基材
の材質としては、ガラス、アルミナ、アスベスト、ボロ
ン、シリカアルミナガラス、シリカガラス、チラノ、炭
化ケイ素、窒化ケイ素、ジルコニア等の無機繊維やアラ
ミド、ポリエーテルエーテルケトン、ポリエーテルイミ
ド、ポリエーテルサルフォン、カーボン、セルロース等
の有機繊維等及びこれらの混抄系があり、特にガラス繊
維の織布が好ましく用いられる。プリプレグに使用され
る基材としては、30μm〜200μmのガラスクロス
が特に好適に用いられる。A base material is impregnated with a varnish of a resin composition containing a resin, an inorganic filler and a silicone polymer.
The prepreg is dried by drying at a temperature of 00 ° C. The substrate is not particularly limited as long as it is used when manufacturing a metal foil-clad laminate or a multilayer printed wiring board,
Usually, a fibrous base material such as a woven or nonwoven fabric is used. Examples of the material of the fiber base include glass, alumina, asbestos, boron, silica-alumina glass, silica glass, tyrano, silicon carbide, silicon nitride, inorganic fibers such as zirconia, aramid, polyetheretherketone, polyetherimide, and polyether. There are organic fibers such as sulfone, carbon, cellulose and the like, and a mixed system thereof, and a woven fabric of glass fiber is particularly preferably used. As a substrate used for the prepreg, a glass cloth of 30 μm to 200 μm is particularly preferably used.
【0026】プリプレグの製造条件等は特に制限するも
のではないが,ワニスに使用した溶剤が80重量%以上
揮発していることが好ましい。このため,製造方法や乾
燥条件等も制限はなく,乾燥時の温度は80℃〜200
℃,時間はワニスのゲル化時間との兼ね合いで特に制限
はない。Although the production conditions of the prepreg are not particularly limited, it is preferable that the solvent used for the varnish is volatilized by 80% by weight or more. For this reason, the production method and drying conditions are not limited, and the drying temperature is 80 ° C to 200 ° C.
The temperature and the temperature are not particularly limited in consideration of the gel time of the varnish.
【0027】また、ワニスの含浸量は、ワニス固形分と
基材の総量に対して、ワニス固形分が35〜70重量%
になるようにされることが好ましい。The impregnated amount of the varnish is 35 to 70% by weight based on the total amount of the varnish solid and the substrate.
It is preferable that
【0028】絶縁板、積層板又は金属張積層板の製造方
法は次の通りである。本発明におけるプリプレグ又はそ
れを複数枚積層した積層体に、必要に応じてその片面又
は両面に金属箔を重ね、通常130〜250℃、好まし
くは150℃〜200℃の範囲の温度で、通常0.5〜
20MPa、好ましくは1〜8MPaの範囲の圧力で、
加熱加圧成形することにより絶縁板、積層体又は金属張
積層体を製造することができる。金属箔を使用して金属
張積層板とすることにより、これに回路加工を施して印
刷回路板とすることができる。金属張積層体は、金属の
ない状態の表面の硬度、別の言い方をすれば、金属でな
い表面又は金属を除いた表面の硬度が、200℃でのバ
ーコール硬度で30以上であることが好ましい。The method for producing an insulating plate, a laminate or a metal-clad laminate is as follows. The prepreg of the present invention or a laminate obtained by laminating a plurality of the prepregs, if necessary, has a metal foil layered on one or both sides thereof, usually at 130 to 250 ° C, preferably at a temperature in the range of 150 ° C to 200 ° C, usually 0 ° C. .5-
At a pressure in the range of 20 MPa, preferably 1 to 8 MPa,
An insulating plate, a laminate, or a metal-clad laminate can be manufactured by heating and pressing. By using a metal foil to form a metal-clad laminate, circuit processing can be performed on the laminate to form a printed circuit board. The metal-clad laminate preferably has a surface hardness in the absence of a metal, in other words, a hardness of a non-metal surface or a surface excluding a metal of not less than 30 in terms of Barcol hardness at 200 ° C.
【0029】本発明に用いられる金属箔は、銅箔やアル
ミニウム箔が一般的に用いられるが、通常積層板に用い
られている5〜200μmのものを使用できる。また、
ニッケル、ニッケル−リン、ニッケル−スズ合金、ニッ
ケル−鉄合金、鉛、鉛−スズ合金等を中間層とし、この
両面に0.5〜15μmの銅層と10〜300μmの銅
層を設けた3層構造の複合箔あるいはアルミニウムと銅
箔を複合した2層構造複合箔を用いることができる。As the metal foil used in the present invention, a copper foil or an aluminum foil is generally used, but a metal foil having a thickness of 5 to 200 μm which is usually used for a laminated board can be used. Also,
Nickel, nickel-phosphorus, nickel-tin alloy, nickel-iron alloy, lead, lead-tin alloy, etc. were used as an intermediate layer, and a copper layer of 0.5 to 15 μm and a copper layer of 10 to 300 μm were provided on both surfaces. A composite foil having a layer structure or a composite foil having a two-layer structure in which aluminum and copper foil are combined can be used.
【0030】本発明における金属張積層板を用いて,従
来の方法により金属箔表面もしくは金属箔エッチング面
に対して回路加工することにより印刷配線板を製造する
ことができる。特に、これらの両面あるいは片面配線板
を内層板としてその両側もしくは片側にプリプレグを配
してプレス成形後、層間接続のためのドリル等による穴
あけ,めっき等を行い,上記と同様に回路加工等を施す
ことにより多層印刷配線板を製造できる。Using the metal-clad laminate of the present invention, a printed wiring board can be manufactured by performing circuit processing on a metal foil surface or a metal foil etched surface by a conventional method. In particular, these two-sided or one-sided wiring boards are used as inner layers, prepregs are arranged on both sides or one side thereof, and after press molding, drilling or plating is performed for interlayer connection, and circuit processing is performed in the same manner as described above. By applying, a multilayer printed wiring board can be manufactured.
【0031】上記の回路加工は、公知の方法により行う
ことができる。例えば、ドリルにより必要なスルーホー
ルを形成し、スルホールに導通させるためのメッキを施
し、レジストパターンを形成後、エッチングにより不要
部分をのメッキを除去し、最後にレジストパターンを剥
離することにより行うことができる。このようにして得
られた印刷配線板の表面にさらに上記の金属箔張り積層
板を前記したのと同様の条件で積層し、さらに、上記と
同様にして回路加工して多層印刷配線板とすることがで
きる。この場合、必ずしもスルホールを形成する必要は
なく、バイアホールを形成してもよく、両方を形成して
もよい。このような多層化は所定枚数を積層化して行わ
れる。The above circuit processing can be performed by a known method. For example, by forming necessary through holes with a drill, applying plating for conduction to the through holes, forming a resist pattern, removing unnecessary plating by etching, and finally peeling off the resist pattern Can be. On the surface of the printed wiring board thus obtained, the above-mentioned metal foil-clad laminate is further laminated under the same conditions as described above, and further, circuit processing is performed in the same manner as above to obtain a multilayer printed wiring board. be able to. In this case, it is not necessary to form a through hole, and a via hole may be formed, or both may be formed. Such multilayering is performed by laminating a predetermined number of sheets.
【0032】[0032]
【実施例】以下に本発明の実施例について具体的に説明
するが、本発明はこれに限定されるものでない。EXAMPLES The present invention will now be described in detail with reference to Examples, but it should not be construed that the present invention is limited thereto.
【0033】実施例1 撹拌装置とコンデンサと温度計とを備えたガラスフラス
コに、テトラメトキシシランを40g、メタノールを9
3g配合した溶液に、酢酸を0.47g、蒸留水を1
8.9g配合し、ついで50℃で8時間撹拌し、シリコ
ーン重合体を合成した。得られたシリコーン重合体のシ
ロキサン繰り返し単位の平均は20であった。このシリ
コーン重合体溶液にメチルエチルケトンを加えて、固形
分10重量%の処理液を作製した。この処理液に無機充
填剤として焼成クレーを1300g配合して室温で1時
間撹拌し、処理充填剤入り溶液を作製した。得られた処
理充填剤入り溶液を50℃に加熱し、この溶液中の無機
充填剤180重量部に対して、下記に示す配合量の樹脂
及び化合物および重量比50:50のメチルエチルケト
ンおよびエチレングリコールモノメチルエーテルの溶剤
を加えて、固形分70重量%の樹脂組成物ワニスを作製
した。ここで、樹脂組成物固形分の総量に対する無機充
填剤の比率は約37体積%であった。 臭素化ビスフェノールA型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESB400T、エポキシ当量:400) オルソクレゾールノボラック型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESCN195、エポキシ当量:195) フェノールノボラック樹脂 42重量部 (日立化成工業株式会社製HP850N、水酸基当量:108) 2−エチル−4−メチルイミダゾール 0.5重量部 作製したワニスを厚さ約0.1mmのガラス布(スタイ
ル2116、E−ガラス)に含浸後、150℃で5分加
熱、乾燥して樹脂分43重量%のプリプレグを得た。こ
のプリプレグを4枚重ね、その両側に厚さ18μmの銅
箔を重ね、170℃、90分、4.0MPaのプレス条
件で両面銅張積層板を作製した。Example 1 A glass flask equipped with a stirrer, a condenser and a thermometer was charged with 40 g of tetramethoxysilane and 9 g of methanol.
0.47 g of acetic acid and 1 part of distilled water were added to the solution containing 3 g.
8.9 g were blended and then stirred at 50 ° C. for 8 hours to synthesize a silicone polymer. The average of the siloxane repeating units of the obtained silicone polymer was 20. Methyl ethyl ketone was added to this silicone polymer solution to prepare a treatment liquid having a solid content of 10% by weight. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. The obtained solution containing the treated filler is heated to 50 ° C., and the resin and the compound in the following amounts, and methyl ethyl ketone and ethylene glycol monomethyl in a weight ratio of 50:50 are added to 180 parts by weight of the inorganic filler in the solution. An ether solvent was added to prepare a resin composition varnish having a solid content of 70% by weight. Here, the ratio of the inorganic filler to the total amount of the resin composition solids was about 37% by volume. 50 parts by weight of brominated bisphenol A type epoxy resin (ESB400T, Sumitomo Chemical Co., Ltd., epoxy equivalent: 400) 50 parts by weight of ortho-cresol novolak type epoxy resin (ESCN195, epoxy equivalent: 195 of Sumitomo Chemical Co., Ltd.) Phenol novolak resin 42 parts by weight (HP850N manufactured by Hitachi Chemical Co., Ltd., hydroxyl equivalent: 108) 0.5 parts by weight of 2-ethyl-4-methylimidazole 0.5 g by weight of the prepared varnish was applied to a glass cloth (style 2116, E-glass having a thickness of about 0.1 mm). ), And heated and dried at 150 ° C. for 5 minutes to obtain a prepreg having a resin content of 43% by weight. Four prepregs were laminated, and a copper foil having a thickness of 18 μm was laminated on both sides thereof, and a double-sided copper-clad laminate was produced at 170 ° C. for 90 minutes at 4.0 MPa.
【0034】実施例2 実施例1と同様に、トリメトキシメチルシランを40
g、メタノールを93g配合した溶液に、酢酸を0.5
3g、蒸留水を15.8g配合し、ついで50℃で8時
間撹拌し、シリコーン重合体を合成した。得られたシリ
コーン重合体のシロキサン繰り返し単位の平均は15で
あった。このシリコーン重合体溶液にメチルエチルケト
ンを加えて、固形分10重量%の処理液を作製した。こ
の処理液に無機充填剤として焼成クレーを1300g配
合して室温で1時間撹拌し、処理充填剤入り溶液を作製
した。この処理充填剤入り溶液を用いて、このあとは実
施例1と同様にしてプリプレグおよび両面銅張積層板を
作製した。Example 2 As in Example 1, trimethoxymethylsilane was added to 40
g, 93 g of methanol in a solution containing 0.5 g of acetic acid.
3 g and 15.8 g of distilled water were blended and then stirred at 50 ° C. for 8 hours to synthesize a silicone polymer. The average number of siloxane repeating units in the obtained silicone polymer was 15. Methyl ethyl ketone was added to this silicone polymer solution to prepare a treatment liquid having a solid content of 10% by weight. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0035】実施例3 実施例1と同様に、ジメトキシジメチルシランを34
g、テトラメトキシシランを8g、メタノールを98g
配合した溶液に、酢酸を0.60g、蒸留水を14.0
g配合し、ついで50℃で8時間撹拌し、シリコーン重
合体を合成した。得られたシリコーン重合体のシロキサ
ン繰り返し単位の平均は28であった。このシリコーン
重合体溶液にメチルエチルケトンを加えて、固形分10
重量%の処理液を作製した。この処理液に無機充填剤と
して焼成クレーを1300g配合して室温で1時間撹拌
し、処理充填剤入り溶液を作製した。この処理充填剤入
り溶液を用いて、このあとは実施例1と同様にしてプリ
プレグおよび両面銅張積層板を作製した。Example 3 As in Example 1, dimethoxydimethylsilane was added to 34
g, 8 g of tetramethoxysilane and 98 g of methanol
0.60 g of acetic acid and 14.0 g of distilled water were added to the blended solution.
g, and then stirred at 50 ° C. for 8 hours to synthesize a silicone polymer. The average number of siloxane repeating units in the obtained silicone polymer was 28. Methyl ethyl ketone was added to the silicone polymer solution to obtain a solid content of 10%.
By weight, a treatment liquid was prepared. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0036】実施例4 実施例1と同様に、ジメトキシジメチルシランを20
g、テトラメトキシシランを25g、メタノールを10
5g配合した溶液に、酢酸を0.60g、蒸留水を1
7.8g配合し、ついで50℃で8時間撹拌し、シリコ
ーン重合体を合成した。得られたシリコーン重合体のシ
ロキサン繰り返し単位の平均は30であった。このシリ
コーン重合体溶液にメチルエチルケトンを加えて、固形
分10重量%の処理液を作製した。この処理液に無機充
填剤として焼成クレーを1300g配合して室温で1時
間撹拌し、処理充填剤入り溶液を作製した。この処理充
填剤入り溶液を用いて、このあとは実施例1と同様にし
てプリプレグおよび両面銅張積層板を作製した。Example 4 As in Example 1, dimethoxydimethylsilane was added to 20
g, 25 g of tetramethoxysilane and 10 g of methanol.
0.60 g of acetic acid and 1 part of distilled water were added to the solution containing 5 g.
7.8 g were blended and then stirred at 50 ° C. for 8 hours to synthesize a silicone polymer. The average number of siloxane repeating units in the obtained silicone polymer was 30. Methyl ethyl ketone was added to this silicone polymer solution to prepare a treatment liquid having a solid content of 10% by weight. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0037】実施例5 実施例1と同様に、トリメトキシメチルシランを20
g、テトラメトキシシランを22g、メタノールを98
g配合した溶液に、酢酸を0.52g、蒸留水を18.
3g配合し、ついで50℃で8時間撹拌し、シリコーン
重合体を合成した。得られたシリコーン重合体のシロキ
サン繰り返し単位の平均は25であった。このシリコー
ン重合体溶液にメチルエチルケトンを加えて、固形分1
0重量%の処理液を作製した。この処理液に無機充填剤
として焼成クレーを1300g配合して室温で1時間撹
拌し、処理充填剤入り溶液を作製した。この処理充填剤
入り溶液を用いて、このあとは実施例1と同様にしてプ
リプレグおよび両面銅張積層板を作製した。Example 5 As in Example 1, trimethoxymethylsilane was added to 20
g, 22 g of tetramethoxysilane, 98 g of methanol
acetic acid 0.52 g and distilled water 18.
3 g were blended and then stirred at 50 ° C. for 8 hours to synthesize a silicone polymer. The average of the siloxane repeating units in the obtained silicone polymer was 25. Methyl ethyl ketone was added to the silicone polymer solution to obtain a solid content of 1%.
A treatment solution of 0% by weight was prepared. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0038】実施例6 実施例1と同様に、ジメトキシジメチルシランを10
g、トリメトキシメチルシランを10g、テトラメトキ
シシランを20g、メタノールを93g配合した溶液
に、酢酸を0.52g、蒸留水を16.5g配合し、つ
いで50℃で8時間撹拌し、シリコーン重合体を合成し
た。得られたシリコーン重合体のシロキサン繰り返し単
位の平均は23であった。このシリコーン重合体溶液に
メチルエチルケトンを加えて、固形分10重量%の処理
液を作製した。この処理液に無機充填剤として焼成クレ
ーを1300g配合して室温で1時間撹拌し、処理充填
剤入り溶液を作製した。この処理充填剤入り溶液を用い
て、このあとは実施例1と同様にしてプリプレグおよび
両面銅張積層板を作製した。Example 6 As in Example 1, dimethoxydimethylsilane was added to 10
g, 10 g of trimethoxymethylsilane, 20 g of tetramethoxysilane, and 93 g of methanol, 0.52 g of acetic acid and 16.5 g of distilled water were added, and then the mixture was stirred at 50 ° C. for 8 hours to obtain a silicone polymer. Was synthesized. The average of the siloxane repeating units in the obtained silicone polymer was 23. Methyl ethyl ketone was added to this silicone polymer solution to prepare a treatment liquid having a solid content of 10% by weight. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0039】実施例7 無機充填剤として、焼成クレーを1300gに代えて2
000g配合したこと以外は実施例1と同様にして、充
填剤入り溶液を作製した。この処理充填剤入り溶液を用
いて、このあとは実施例1と同様にしてプリプレグおよ
び両面銅張積層板を作製した。ただし、溶液中の無機充
填剤200重量部に対する樹脂及び化合物の配合量は下
記であり、このときの樹脂組成物固形分の総量に対する
無機充填剤の比率は約40体積%であった。 臭素化ビスフェノールA型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESB400T、エポキシ当量:400) オルソクレゾールノボラック型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESCN195、エポキシ当量:195) フェノールノボラック樹脂 42重量部 (日立化成工業株式会社製HP850N、水酸基当量:108) 2−エチル−4−メチルイミダゾール 0.5重量部Example 7 As the inorganic filler, 2300 was used instead of 1300 g of calcined clay.
A filler-containing solution was prepared in the same manner as in Example 1 except that 000 g was blended. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler. However, the blending amounts of the resin and the compound with respect to 200 parts by weight of the inorganic filler in the solution were as follows, and the ratio of the inorganic filler to the total amount of the solid content of the resin composition was about 40% by volume. 50 parts by weight of brominated bisphenol A type epoxy resin (ESB400T, Sumitomo Chemical Co., Ltd., epoxy equivalent: 400) 50 parts by weight of ortho-cresol novolak type epoxy resin (ESCN195, epoxy equivalent: 195 of Sumitomo Chemical Co., Ltd.) Phenol novolak resin 42 parts by weight (HP850N manufactured by Hitachi Chemical Co., Ltd., hydroxyl equivalent: 108) 0.5 parts by weight of 2-ethyl-4-methylimidazole
【0040】実施例8 無機充填剤として、焼成クレーに代えてタルクを配合し
たこと以外は、実施例1と同様に処理充填剤入り溶液を
作製した。この処理充填剤入り溶液を用いて、このあと
は実施例1と同様にしてプリプレグおよび両面銅張積層
板を作製した。このときの樹脂組成物固形分の総量に対
する無機充填剤の比率は約37体積%であった。Example 8 A treated filler-containing solution was prepared in the same manner as in Example 1, except that talc was used instead of calcined clay as the inorganic filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler. At this time, the ratio of the inorganic filler to the total amount of the resin composition solids was about 37% by volume.
【0041】実施例9 無機充填剤として、焼成クレーに代えてシリカを配合し
たこと以外は、実施例1と同様に処理充填剤入り溶液を
作製した。この処理充填剤入り溶液を用いて、このあと
は実施例1と同様にしてプリプレグおよび両面銅張積層
板を作製した。このときの樹脂組成物固形分の総量に対
する無機充填剤の比率は約31体積%であった。Example 9 A treated filler-containing solution was prepared in the same manner as in Example 1 except that silica was used instead of calcined clay as an inorganic filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler. At this time, the ratio of the inorganic filler to the total amount of the resin composition solids was about 31% by volume.
【0042】実施例10 実施例1で得られたシリコーン重合体溶液に、シランカ
ップリング剤としてγ−グリシドキシプロピルトリメト
キシシラン(商品名:A−187、日本ユニカー(株)
製)とメチルエチルケトンを加えて、固形分10重量%
の処理液を作製した。ここで、シリコーン重合体とA−
187は重量比50:50で配合した。この処理液に無
機充填剤として焼成クレーを1300g配合して室温で
1時間撹拌し、処理充填剤入り溶液を作製した。この処
理充填剤入り溶液を用いて、このあとは実施例1と同様
にしてプリプレグおよび両面銅張積層板を作製した。Example 10 γ-glycidoxypropyltrimethoxysilane (trade name: A-187, manufactured by Nippon Unicar Co., Ltd.) was added to the silicone polymer solution obtained in Example 1 as a silane coupling agent.
Made) and methyl ethyl ketone, and the solid content is 10% by weight.
Was prepared. Here, the silicone polymer and A-
187 was blended at a weight ratio of 50:50. 1300 g of calcined clay was added to this treatment liquid as an inorganic filler and stirred at room temperature for 1 hour to prepare a solution containing the treatment filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0043】実施例11 実施例4で得られたシリコーン重合体溶液に、チタネー
トカップリング剤としてイソプロピルトリス(ジオクチ
ルパイロホスフェート)チタネート(商品名:KR46
B、味の素(株)製)とメチルエチルケトンを加えて、
固形分10重量%の処理液を作製した。ここで、シリコ
ーン重合体とKR46Bは重量比50:50で配合し
た。この処理液に無機充填剤として焼成クレーを130
0g配合して室温で1時間撹拌し、処理充填剤入り溶液
を作製した。この処理充填剤入り溶液を用いて、このあ
とは実施例1と同様にしてプリプレグおよび両面銅張積
層板を作製した。Example 11 To the silicone polymer solution obtained in Example 4 was added isopropyl tris (dioctyl pyrophosphate) titanate (trade name: KR46) as a titanate coupling agent.
B, Ajinomoto Co.) and methyl ethyl ketone
A treatment liquid having a solid content of 10% by weight was prepared. Here, the silicone polymer and KR46B were blended in a weight ratio of 50:50. A calcined clay as an inorganic filler is added to this treatment liquid at 130.
0 g was mixed and stirred at room temperature for 1 hour to prepare a solution containing the treated filler. A prepreg and a double-sided copper-clad laminate were thereafter manufactured in the same manner as in Example 1 using the solution containing the treated filler.
【0044】実施例12 実施例1で得られたシリコーン重合体溶液2重量部とメ
チルエチルケトンおよびエチレングリコールモノメチル
エーテルとを、以下に示す樹脂、化合物および無機充填
剤に加えて、固形分70重量%のワニスを作製した。作
製したワニスを厚さ約0.1mmのガラス布(スタイル
2116、E−ガラス)に含浸後、150℃で5分加
熱、乾燥して樹脂分43重量%のプリプレグを得た。こ
のプリプレグを4枚重ね、その両側に厚さ18μmの銅
箔を重ね、170℃、90分、4.0MPaのプレス条
件で両面銅張積層板を作製した。 臭素化ビスフェノールA型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESB400T、エポキシ当量:400) オルソクレゾールノボラック型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESCN195、エポキシ当量:195) フェノールノボラック樹脂 42重量部 (日立化成工業株式会社製HP850N、水酸基当量:108) 2−エチル−4−メチルイミダゾール 0.5重量部 焼成クレー(約37体積%) 180重量部Example 12 2 parts by weight of the silicone polymer solution obtained in Example 1, methyl ethyl ketone and ethylene glycol monomethyl ether were added to the following resin, compound and inorganic filler to give a solid content of 70% by weight. A varnish was prepared. The prepared varnish was impregnated into a glass cloth (style 2116, E-glass) having a thickness of about 0.1 mm, heated and dried at 150 ° C. for 5 minutes to obtain a prepreg having a resin content of 43% by weight. Four prepregs were laminated, and a copper foil having a thickness of 18 μm was laminated on both sides thereof, and a double-sided copper-clad laminate was produced at 170 ° C. for 90 minutes at 4.0 MPa. 50 parts by weight of brominated bisphenol A type epoxy resin (ESB400T, Sumitomo Chemical Co., Ltd., epoxy equivalent: 400) 50 parts by weight of ortho-cresol novolak type epoxy resin (ESCN195, epoxy equivalent: 195 of Sumitomo Chemical Co., Ltd.) Phenol novolak resin 42 parts by weight (HP850N manufactured by Hitachi Chemical Co., Ltd., hydroxyl equivalent: 108) 0.5 parts by weight of 2-ethyl-4-methylimidazole 180 parts by weight calcined clay (about 37% by volume)
【0045】実施例13 実施例10で得られたシリコーン重合体溶液2重量部と
メチルエチルケトンおよびエチレングリコールモノメチ
ルエーテルとを、実施例12に示した樹脂、化合物およ
び無機充填剤に加えて、固形分70重量%のワニスを作
製した。作製したワニスを用いて、実施例12と同様に
して、プリプレグおよび両面銅張積層板を作製した。Example 13 2 parts by weight of the silicone polymer solution obtained in Example 10, methyl ethyl ketone and ethylene glycol monomethyl ether were added to the resin, compound and inorganic filler shown in Example 12 to give a solid content of 70%. A weight percent varnish was made. A prepreg and a double-sided copper-clad laminate were produced in the same manner as in Example 12 using the produced varnish.
【0046】実施例14 実施例11で得られたシリコーン重合体溶液2重量部と
メチルエチルケトンおよびエチレングリコールモノメチ
ルエーテルとを、実施例12に示した樹脂、化合物およ
び無機充填剤に加えて、固形分70重量%のワニスを作
製した。作製したワニスを用いて、実施例12と同様に
して、プリプレグおよび両面銅張積層板を作製した。Example 14 2 parts by weight of the silicone polymer solution obtained in Example 11, methyl ethyl ketone and ethylene glycol monomethyl ether were added to the resin, compound and inorganic filler shown in Example 12 to give a solid content of 70%. A weight percent varnish was made. A prepreg and a double-sided copper-clad laminate were produced in the same manner as in Example 12 using the produced varnish.
【0047】比較例1 下記に示す配合量の、処理溶液で処理されていない未処
理の焼成クレー、樹脂、化合物、メチルエチルケトン及
びエチレングリコールモノメチルエーテルを混合して、
固形分70重量%のワニスを作製した。このワニスを用
いて、実施例12と同様にして、プリプレグおよび両面
銅張積層板を作製した。 臭素化ビスフェノールA型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESB400T、エポキシ当量:400) オルソクレゾールノボラック型エポキシ樹脂 50重量部 (住友化学工業株式会社製ESCN195、エポキシ当量:195) フェノールノボラック樹脂 42重量部 (日立化成工業株式会社製HP850N、水酸基当量:108) 2−エチル−4−メチルイミダゾール 0.5重量部 焼成クレー(約37体積%) 180重量部Comparative Example 1 An untreated calcined clay, a resin, a compound, methyl ethyl ketone and ethylene glycol monomethyl ether which were not treated with the treatment solution and were mixed in the following amounts were mixed.
A varnish having a solid content of 70% by weight was prepared. Using this varnish, a prepreg and a double-sided copper-clad laminate were produced in the same manner as in Example 12. 50 parts by weight of brominated bisphenol A type epoxy resin (ESB400T, Sumitomo Chemical Co., Ltd., epoxy equivalent: 400) 50 parts by weight of ortho-cresol novolak type epoxy resin (ESCN195, epoxy equivalent: 195 of Sumitomo Chemical Co., Ltd.) Phenol novolak resin 42 parts by weight (HP850N manufactured by Hitachi Chemical Co., Ltd., hydroxyl equivalent: 108) 0.5 parts by weight of 2-ethyl-4-methylimidazole 180 parts by weight calcined clay (about 37% by volume)
【0048】比較例2 比較例1のワニスに、さらにシランカップリング剤とし
てγ−グリシドキシプロピルトリメトキシシラン(商品
名:A−187、日本ユニカー(株)製)を2重量部配
合したこと以外は、比較例1と同様にしてワニスを作製
した。このワニスを用いて、実施例12と同様にして、
プリプレグおよび両面銅張積層板を作製した。Comparative Example 2 The varnish of Comparative Example 1 was further blended with 2 parts by weight of γ-glycidoxypropyltrimethoxysilane (trade name: A-187, manufactured by Nippon Unicar Co., Ltd.) as a silane coupling agent. A varnish was prepared in the same manner as in Comparative Example 1 except for the above. Using this varnish, in the same manner as in Example 12,
A prepreg and a double-sided copper-clad laminate were produced.
【0049】比較例3 シリコーン重合体のかわりに、エポキシ変性シリコーン
オイル(商品名:KF101、信越化学工業(株)製)
を用いたこと以外は、実施例1と同様にして充填剤入り
溶液を作製した。この充填剤入り溶液を用いて、実施例
1と同様にして、プリプレグおよび両面銅張積層板を作
製した。Comparative Example 3 Epoxy-modified silicone oil (trade name: KF101, manufactured by Shin-Etsu Chemical Co., Ltd.) instead of the silicone polymer
A filler-containing solution was prepared in the same manner as in Example 1 except that the solution was used. Using this filler-containing solution, a prepreg and a double-sided copper-clad laminate were produced in the same manner as in Example 1.
【0050】比較例4 シランカップリング剤(γ−グリシドキシプロピルトリ
メトキシシラン(商品名:A−187、日本ユニカー
(株)製))とメタノールで固形分1重量%の処理液を
作製し、これに未処理の焼成クレーを室温で1時間浸漬
・撹拌した後、120℃で1時間乾燥して表面処理を施
した。この処理済み焼成クレーを用いて、比較例1と同
様にしてワニスを作製した。このワニスを用いて、実施
例12と同様にして、プリプレグおよび両面銅張積層板
を作製した。Comparative Example 4 A treatment liquid having a solid content of 1% by weight was prepared with silane coupling agent (γ-glycidoxypropyltrimethoxysilane (trade name: A-187, manufactured by Nippon Unicar Co., Ltd.)) and methanol. The untreated calcined clay was immersed and stirred at room temperature for 1 hour, and then dried at 120 ° C. for 1 hour to perform a surface treatment. Using this treated calcined clay, a varnish was produced in the same manner as in Comparative Example 1. Using this varnish, a prepreg and a double-sided copper-clad laminate were produced in the same manner as in Example 12.
【0051】比較例5 無機充填剤の配合量を180重量部に代えて100重量
部(樹脂組成物固形分の総量に対して約20体積%)と
したこと以外は全て実施例1と同様にワニスを作製し
た。このワニスを用いて、実施例12と同様にして、プ
リプレグおよび両面銅張積層板を作製した。Comparative Example 5 The same procedure as in Example 1 was carried out except that the amount of the inorganic filler was changed to 100 parts by weight (about 20% by volume based on the total amount of the resin composition solids) instead of 180 parts by weight. A varnish was prepared. Using this varnish, a prepreg and a double-sided copper-clad laminate were produced in the same manner as in Example 12.
【0052】次に、実施例1〜14および比較例1〜5
で作製した両面銅張積層板を用いて、回路加工を施して
印刷配線板を製造した。回路加工は、ドリルにより両面
銅張積層板に必要なスルーホールを形成し、スルーホー
ルに導通させるためのめっきを施し、レジストパターン
を形成後、エッチングにより不要な銅箔やめっきを除去
し、最後にレジストパターンを剥離することにより行な
った。その際、めっきを施す前の穴径は、場所により直
径0.05mm〜1.0mmから選択した。また、パタ
ーン形成によるライン(L)/スペース(S)を、L/
S=100μm/100μm〜L/S=25μm/25
μmから適宜選択して加工した。Next, Examples 1 to 14 and Comparative Examples 1 to 5
Using the double-sided copper-clad laminate prepared in the above, circuit processing was performed to produce a printed wiring board. For circuit processing, use a drill to form the required through-holes on the double-sided copper-clad laminate, apply plating for conduction to the through-holes, form a resist pattern, remove unnecessary copper foil and plating by etching, By removing the resist pattern. At this time, the hole diameter before plating was selected from 0.05 mm to 1.0 mm depending on the location. Further, the line (L) / space (S) by pattern formation is represented by L /
S = 100 μm / 100 μm to L / S = 25 μm / 25
Processing was performed by appropriately selecting from μm.
【0053】こうして得られた実施例1〜14および比
較例1〜5の両面銅張積層板について、表面平滑性、バ
ーコール硬度、ワイヤボンディング性、はんだ耐熱性お
よび耐電食性を評価した。その結果を表1に示す。The thus obtained double-sided copper-clad laminates of Examples 1 to 14 and Comparative Examples 1 to 5 were evaluated for surface smoothness, Barcol hardness, wire bonding property, solder heat resistance and corrosion resistance. Table 1 shows the results.
【0054】試験方法は以下の通りである。表面平滑性
は、両面銅張積層板の横方向を接触式表面粗さ計により
測定し、表面粗さは、JIS B 0601に基づき基
準長さ8mmにおけるRmax(最大高さ)で表示し
た。バーコール硬度は、銅箔を全面エッチングした積層
板を用いてホットプレートにより加熱し、基板表面が2
00℃になった際のバーコール硬度を測定した。ワイヤ
ボンディング性は、両面銅張積層板を用いてワイヤボン
ディング評価用のパターンを有する印刷配線板を作製
し、100本のワイヤボンディング中の付着率と密着強
度を評価した。はんだ耐熱性は、プレッシャークッカー
テスター中に2時間保持した後、260℃のはんだに2
0秒間浸漬して、外観を目視で調査した。表中の「O
K」は、ミーズリング(ガラス繊維の織り目の重なり部
分の熱ひずみに伴う樹脂の剥離)やふくれがないことを
意味する。耐電食性は、直径0.4mmφのドリルを用い
て、回転数:80,000rpm、送り速度:3,20
0mm/minで穴あけを行い、約20μmのめっきを施した
後の穴壁間隔300μmのスルーホールを使用し、温度
85℃、相対湿度85%、印加電圧100Vで、導通破
壊までの時間を測定した。なお、導通破壊場所は全てス
ルーホール間のCAF(CONDUCTIVE ANODIC FILAMENT)で
起こっていることを確認した。The test method is as follows. The surface smoothness was measured in the lateral direction of the double-sided copper-clad laminate with a contact-type surface roughness meter, and the surface roughness was represented by Rmax (maximum height) at a reference length of 8 mm based on JIS B0601. The Barcol hardness was measured by heating a hot plate using a laminate obtained by etching the entire surface of a copper foil.
Barcol hardness when the temperature reached 00 ° C. was measured. For the wire bonding property, a printed wiring board having a pattern for wire bonding evaluation was prepared using a double-sided copper-clad laminate, and the adhesion rate and adhesion strength during 100 wire bondings were evaluated. Solder heat resistance was measured by holding in a pressure cooker tester for 2 hours and then soldering at 260 ° C.
After immersion for 0 second, the appearance was visually inspected. "O" in the table
"K" means that there is no measling (peeling of the resin due to thermal strain in the overlapping portion of the glass fiber weave) or blistering. The electrolytic corrosion resistance was measured using a drill having a diameter of 0.4 mmφ with a rotation speed of 80,000 rpm and a feed speed of 3,20.
A hole was drilled at 0 mm / min, and after plating about 20 μm, a through-hole with a hole wall interval of 300 μm was used. The time until conduction breakdown was measured at a temperature of 85 ° C., a relative humidity of 85%, and an applied voltage of 100 V. . In addition, it was confirmed that all the conduction breakdown locations occurred in CAF (CONDUCTIVE ANODIC FILAMENT) between the through holes.
【0055】[0055]
【表1】 [Table 1]
【0056】以上の結果から、次のことが分かる。実施
例1〜14は、はんだ耐熱性や耐電食性の低下がなく、
また表面粗さが5μm以下と小さく、かつ200℃での
バーコール硬度は30以上であった。さらに、200℃
でのワイヤボンディング時の付着率は100%(不良率
0%)であり、その密着強度も十分に高く、優れたワイ
ヤボンディング性を有する。The following can be understood from the above results. In Examples 1 to 14, there is no decrease in solder heat resistance or electric corrosion resistance,
The surface roughness was as small as 5 μm or less, and the Barcol hardness at 200 ° C. was 30 or more. In addition, 200 ° C
Is 100% (0% defect rate) at the time of wire bonding, the adhesion strength is sufficiently high, and excellent wire bonding properties are obtained.
【0057】[0057]
【発明の効果】本発明におけるプリプレグ用いて得られ
る金属張積層板およびそれを用いた印刷配線板は、無機
充填剤を多量に充填しても、耐熱性や耐電食性の低下が
なく、表面平滑性に優れ、かつ高温での表面硬度が高い
ため、優れたワイヤボンディング性を発揮する。The metal-clad laminate obtained by using the prepreg according to the present invention and the printed wiring board using the same do not have a decrease in heat resistance and electrolytic corrosion resistance even when filled with a large amount of an inorganic filler, and have a smooth surface. It has excellent wire bonding properties due to its excellent properties and high surface hardness at high temperatures.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08J 5/08 CFH C08J 5/08 CFH 5/24 CFH 5/24 CFH H05K 1/03 610 H05K 1/03 610R // B29K 105:08 105:16 B29L 9:00 31:34 (72)発明者 宮武 正人 茨城県下館市大字小川1500番地 日立化成 工業株式会社総合研究所内 (72)発明者 尾瀬 昌久 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館事業所内──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C08J 5/08 CFH C08J 5/08 CFH 5/24 CFH 5/24 CFH H05K 1/03 610 H05K 1/03 610R // B29K 105: 08 105: 16 B29L 9:00 31:34 (72) Inventor Masato Miyatake 1500 Oji Ogawa, Shimodate-shi, Ibaraki Pref. Hitachi Chemical Co., Ltd. (72) Inventor Masahisa Oze Shimodate, Ibaraki 1500 Ogawa, Oita-shi, Hitachi Chemical Industry Co., Ltd.
Claims (13)
上及びシリコーン重合体を含む樹脂組成物を含浸させて
なるプリプレグ。1. A prepreg obtained by impregnating a base material with a resin composition containing a resin, at least 25% by volume of an inorganic filler and a silicone polymer.
面処理されているものである請求項1に記載のプリプレ
グ。2. The prepreg according to claim 1, wherein the inorganic filler has been previously surface-treated with a silicone polymer.
む請求項1又は2に記載のプリプレグ。3. The prepreg according to claim 1, wherein the resin composition further comprises a coupling agent.
ップリング剤で処理されているものである請求項1ない
し3に記載のプリプレグ。4. The prepreg according to claim 1, wherein the inorganic filler has been previously treated with a silicone polymer and a coupling agent.
散された無機充填剤入り溶液に樹脂を配合して得た樹脂
組成物である請求項1又は2記載のプリプレグ。5. The prepreg according to claim 1, wherein the resin composition is a resin composition obtained by mixing a resin with a solution containing an inorganic filler dispersed in a solution of a silicone polymer.
リング剤の溶液に分散された無機充填剤入り溶液に樹脂
を配合して得た樹脂組成物である請求項1又は2記載の
プリプレグ。6. The prepreg according to claim 1, which is a resin composition obtained by blending a resin with a solution containing an inorganic filler dispersed in a solution of a silicone polymer and a coupling agent.
ものである請求項1〜6のいずれかに記載のプリプレ
グ。7. The prepreg according to claim 1, wherein the silicone polymer is three-dimensionally crosslinked.
シロキサン単位(RSiO3/2)或いは4官能性シロキ
サン単単位(SiO4/2)を含有するものである請求項
7に記載のプリプレグ(上記式中、R基は同じか又は別
異な有機基である)。8. The prepreg according to claim 7, wherein the silicone polymer contains a trifunctional siloxane unit (RSiO 3/2 ) or a tetrafunctional siloxane single unit (SiO 4/2 ) in the molecule. (In the above formula, the R groups are the same or different organic groups).
ン単位に対して、4官能性シロキサン単位又は3官能性
シロキサン単位15〜100モル%及び2官能性シラン
化合物0〜85モル%含有するものである請求項8記載
のプリプレグ。9. A silicone polymer containing 15 to 100 mol% of a tetrafunctional siloxane unit or trifunctional siloxane unit and 0 to 85 mol% of a difunctional silane compound, based on all siloxane units in the molecule. The prepreg according to claim 8, wherein
サン単位に対して、4官能性シロキサン単位を15〜1
00モル%、3官能性シロキサン単位を0〜85モル%
及び2官能性シロキサン単位を0〜85モル%含有する
ものである請求項9記載のプリプレグ。10. The silicone polymer contains 15 to 1 tetrafunctional siloxane units based on all siloxane units in the molecule.
00 mol%, 0 to 85 mol% of trifunctional siloxane unit
The prepreg according to claim 9, wherein the prepreg contains 0 to 85 mol% of a bifunctional siloxane unit.
リプレグ又はその積層体の両面又は片面に金属箔を積層
し、加熱加圧して得られる金属張積層板。11. A metal-clad laminate obtained by laminating a metal foil on both surfaces or one surface of the prepreg or the laminate thereof according to any one of claims 1 to 10, and applying heat and pressure.
表面又は金属を除いた表面の硬度)が、200℃でのバ
ーコール硬度で30以上である請求項11に記載の金属
張積層板。12. The metal-clad laminate according to claim 11, wherein the metal-clad laminate has a surface hardness (hardness of a nonmetallic surface or a surface excluding metal) of not less than 30 in Barcoal hardness at 200 ° C.
層板を用いて回路加工を施してなる印刷配線板。13. A printed wiring board obtained by performing circuit processing using the metal-clad laminate according to claim 11 or 12.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000041462A JP2000301534A (en) | 1999-02-19 | 2000-02-15 | Prepreg, metal-clad laminated board, and printed wiring board using prepreg and laminated board |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11-40754 | 1999-02-19 | ||
| JP4075499 | 1999-02-19 | ||
| JP2000041462A JP2000301534A (en) | 1999-02-19 | 2000-02-15 | Prepreg, metal-clad laminated board, and printed wiring board using prepreg and laminated board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000301534A true JP2000301534A (en) | 2000-10-31 |
Family
ID=26380276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000041462A Pending JP2000301534A (en) | 1999-02-19 | 2000-02-15 | Prepreg, metal-clad laminated board, and printed wiring board using prepreg and laminated board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000301534A (en) |
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|---|---|---|---|---|
| WO2004048435A1 (en) * | 2002-11-28 | 2004-06-10 | Mitsubishi Rayon Co., Ltd. | Epoxy resin for prepreg, prepreg, fiber-reinforced composite material, and processes for producing these |
| JP2007035718A (en) * | 2005-07-22 | 2007-02-08 | Hitachi Ltd | Molded electronic circuit device and manufacturing method thereof |
| WO2008023517A1 (en) | 2006-07-20 | 2008-02-28 | Hitachi Chemical Company, Ltd. | Optical/electrical mixed mounting substrate |
| JP2008098366A (en) * | 2006-10-11 | 2008-04-24 | Shinko Electric Ind Co Ltd | Electronic component built-in substrate and method for manufacturing electronic component built-in substrate |
| KR100881342B1 (en) * | 2007-11-13 | 2009-02-02 | 삼성정밀화학 주식회사 | Prepreg having uniform dielectric constant, metal foil laminate and printed wiring board employing the prepreg |
| WO2009078341A1 (en) | 2007-12-17 | 2009-06-25 | Hitachi Chemical Company, Ltd. | Optical waveguide and method for manufacturing the same |
| WO2009064121A3 (en) * | 2007-11-13 | 2009-08-06 | Samsung Fine Chemicals Co Ltd | Prepreg having uniform permittivity, and metal clad laminates and print wiring board using the same |
| JP5332608B2 (en) * | 2006-03-03 | 2013-11-06 | 住友ベークライト株式会社 | Intermediate layer materials and composite laminates |
| JP2015113381A (en) * | 2013-12-10 | 2015-06-22 | 株式会社栗本鐵工所 | Coating composition for metal tube and metal tube formed by applying the same |
-
2000
- 2000-02-15 JP JP2000041462A patent/JP2000301534A/en active Pending
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|---|---|---|---|---|
| US7959838B2 (en) | 2002-11-28 | 2011-06-14 | Mitsubishi Rayon Co., Ltd. | Epoxy resin for prepreg, prepreg, fiber-reinforced composite material and methods for production thereof |
| WO2004048435A1 (en) * | 2002-11-28 | 2004-06-10 | Mitsubishi Rayon Co., Ltd. | Epoxy resin for prepreg, prepreg, fiber-reinforced composite material, and processes for producing these |
| US8486518B2 (en) | 2002-11-28 | 2013-07-16 | Mitsubishi Rayon Co., Ltd. | Epoxy resin for prepreg, prepreg, and fiber-reinforced composite material and methods for production thereof |
| US8470435B2 (en) | 2002-11-28 | 2013-06-25 | Mitsubishi Rayon Co., Ltd. | Epdxy resin for prepreg, prepreg, fiber-reinforced composite material, and methods for production thereof |
| US7591973B2 (en) | 2002-11-28 | 2009-09-22 | Mitsubishi Rayon Co., Ltd. | Method for producing a fiber-reinforced composite material plate |
| JP2007035718A (en) * | 2005-07-22 | 2007-02-08 | Hitachi Ltd | Molded electronic circuit device and manufacturing method thereof |
| JP5332608B2 (en) * | 2006-03-03 | 2013-11-06 | 住友ベークライト株式会社 | Intermediate layer materials and composite laminates |
| WO2008023517A1 (en) | 2006-07-20 | 2008-02-28 | Hitachi Chemical Company, Ltd. | Optical/electrical mixed mounting substrate |
| JP2008098366A (en) * | 2006-10-11 | 2008-04-24 | Shinko Electric Ind Co Ltd | Electronic component built-in substrate and method for manufacturing electronic component built-in substrate |
| CN101795859A (en) * | 2007-11-13 | 2010-08-04 | 三星精密化学株式会社 | Prepreg having uniform permittivity, and metal clad laminates and print wiring board using the same |
| WO2009064121A3 (en) * | 2007-11-13 | 2009-08-06 | Samsung Fine Chemicals Co Ltd | Prepreg having uniform permittivity, and metal clad laminates and print wiring board using the same |
| KR100881342B1 (en) * | 2007-11-13 | 2009-02-02 | 삼성정밀화학 주식회사 | Prepreg having uniform dielectric constant, metal foil laminate and printed wiring board employing the prepreg |
| WO2009078341A1 (en) | 2007-12-17 | 2009-06-25 | Hitachi Chemical Company, Ltd. | Optical waveguide and method for manufacturing the same |
| JP2015113381A (en) * | 2013-12-10 | 2015-06-22 | 株式会社栗本鐵工所 | Coating composition for metal tube and metal tube formed by applying the same |
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