JP2000321196A - Method for measuring adhesive strength of conductive pad - Google Patents

Method for measuring adhesive strength of conductive pad

Info

Publication number
JP2000321196A
JP2000321196A JP13456899A JP13456899A JP2000321196A JP 2000321196 A JP2000321196 A JP 2000321196A JP 13456899 A JP13456899 A JP 13456899A JP 13456899 A JP13456899 A JP 13456899A JP 2000321196 A JP2000321196 A JP 2000321196A
Authority
JP
Japan
Prior art keywords
pad
pressing force
contact
insulating substrate
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP13456899A
Other languages
Japanese (ja)
Inventor
Hiroyuki Hirai
浩之 平井
Yoshitaka Fukuoka
義孝 福岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP13456899A priority Critical patent/JP2000321196A/en
Publication of JP2000321196A publication Critical patent/JP2000321196A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

(57)【要約】 【課題】 BGA等のエリアアレイパッケージ用配線基
板の微小な導体パッドの接着強度を、簡易な方法で精度
良く測定する。 【解決手段】 本発明では、エポキシ樹脂含浸ガラスク
ロス基板のような絶縁基板1上に形成された微小な(例
えば直径 300μm )導体パッド2の側面に、接触ツール
3の先端部を当接し、このツールを介して絶縁基板1面
に平行な押圧力Fを付加する。そして、押圧力を徐々に
増大させてゆき、導体パッド2が絶縁基板1面から剥離
したときの押圧力を荷重センサーにより測定する。導体
パッド2の厚さが薄く、接触ツール3を導体パッド2に
当接させて押圧力を付加する作業が難しい場合には、導
体パッド2上に同径のはんだ突起物4を固着・形成し、
導体パッド2の側面からはんだ突起物4の側面に亘っ
て、接触ツール3を当接して押圧力を付加する。
(57) [Problem] To accurately measure the adhesion strength of minute conductive pads of a wiring board for an area array package such as a BGA by a simple method. According to the present invention, the tip of a contact tool (3) is brought into contact with a side surface of a minute (for example, 300 μm in diameter) conductive pad (2) formed on an insulating substrate (1) such as an epoxy resin impregnated glass cloth substrate. A pressing force F parallel to the surface of the insulating substrate 1 is applied via a tool. Then, the pressing force is gradually increased, and the pressing force when the conductive pad 2 is separated from the surface of the insulating substrate 1 is measured by a load sensor. If the thickness of the conductor pad 2 is small and it is difficult to apply a pressing force by bringing the contact tool 3 into contact with the conductor pad 2, a solder projection 4 having the same diameter is fixed and formed on the conductor pad 2. ,
The pressing force is applied by contacting the contact tool 3 from the side of the conductor pad 2 to the side of the solder protrusion 4.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、導体パッドの接着
強度の測定方法に係わり、特に、配線基板のフリップチ
ップ接続用パッドや、BGA(ボールグリッドアレイ)
パッケージやCSP(チップサイズパッケージ)の搭載
用パッドのような微小な導体パッドの接着強度を、簡易
に測定し評価する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for measuring the adhesive strength of a conductive pad, and more particularly, to a flip-chip connecting pad on a wiring board, a BGA (ball grid array), and the like.
The present invention relates to a method for easily measuring and evaluating the adhesive strength of a small conductor pad such as a pad for mounting a package or a CSP (chip size package).

【0002】[0002]

【従来の技術】一般に、プリント配線基板のような配線
基板上に形成された導体パターンの、絶縁基板に対する
接着力の大小は、搭載する電子部品のリード端子の接続
信頼性を評価するうえで、極めて重要である。そのた
め、配線基板の段階で、以下に示すようにして、導体パ
ターンと絶縁基板との間の接着強度を測定している。
2. Description of the Related Art In general, the magnitude of the adhesive strength of a conductor pattern formed on a wiring board such as a printed wiring board to an insulating board is important in evaluating the connection reliability of lead terminals of electronic components to be mounted. Very important. Therefore, at the stage of the wiring board, the adhesive strength between the conductor pattern and the insulating substrate is measured as described below.

【0003】すなわち従来は、図5に示すように、導体
パターン11の端部を、引張試験機12のクランパ12
aで掴んで引き上げ、導体パターン11が絶縁基板13
から剥がれるときの荷重を求めることにより、導体パタ
ーン11の剥離強度(接着強度)を測定していた。
That is, conventionally, as shown in FIG. 5, an end of a conductor pattern 11 is connected to a clamper 12 of a tensile tester 12.
a, the conductor pattern 11 is pulled up by the insulating substrate 13.
The peel strength (adhesive strength) of the conductor pattern 11 was measured by determining the load when the conductor pattern 11 was peeled off from the conductor pattern 11.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、この方
法では、導体パターン11の面積がクランパ12aで掴
める程度に大きくなければならないという問題があっ
た。そのため、BGA(ボールグリッドアレイ)パッケ
ージやCSP(チップサイズパッケージ)などのエリア
アレイパッケージにおいて、半導体チップの接続用パッ
ドの評価方法として使用することができなかった。すな
わち、BGA、CSPなどのエリアアレイパッケージ用
の配線基板では、半導体チップをフリップチップボンデ
ィングするための多数の接続パッドが形成されており、
これらの接続パッドが、その下側に形成されたヴィアホ
ールを介して、他面側の配線パターンに接続された構造
になっている。そして、これらのフリップチップボンデ
ィング用パッドが、極めて微小(例えば直径 300〜 400
μm )であるので、端部をクランパで掴んで引き上げ、
剥離強度を測定することが難しかった。
However, this method has a problem that the area of the conductor pattern 11 must be large enough to be gripped by the clamper 12a. Therefore, in an area array package such as a BGA (ball grid array) package or a CSP (chip size package), it cannot be used as a method for evaluating connection pads of a semiconductor chip. That is, in a wiring board for an area array package such as a BGA or a CSP, a large number of connection pads for flip chip bonding of a semiconductor chip are formed.
These connection pads have a structure in which they are connected to wiring patterns on the other side via via holes formed below the connection pads. These flip-chip bonding pads are extremely small (for example, 300 to 400 in diameter).
μm), so grab the end with a clamper and pull it up.
It was difficult to measure the peel strength.

【0005】また、導体パターンの形成工程では、エッ
チングの際などに薬品によりエッジ部の劣化が生じやす
い。導体パターンの面積が大きい場合には、エッジ部が
劣化しても、剥離強度に影響がほとんど及ばないが、B
GAパッケージ用などの微小な接続パッドでは、単位面
積当たりに換算しても、精度の高い測定を行なうことが
できないという問題があった。
In the process of forming a conductor pattern, the edge portion is liable to be deteriorated by a chemical during etching or the like. When the area of the conductor pattern is large, even if the edge portion is deteriorated, the peel strength is hardly affected.
In the case of a minute connection pad for a GA package or the like, there is a problem that high-precision measurement cannot be performed even when converted per unit area.

【0006】さらに、BGAパッケージ用の接続パッド
の剥離強度測定では、図6(a)に示すように、配線基
板14に半導体チップ15を搭載し、はんだバンプ16
によりフリップチップボンディングした後、半導体チッ
プ15を引張試験機12のクランパ12aで掴んで引張
り上げ、半導体チップ15が接続パッド17ごと絶縁基
板13から剥がれるときの荷重を測定していた。そし
て、接続パッド17の1個当りの剥離強度を算出してい
た。
Further, in the measurement of the peel strength of the connection pads for the BGA package, as shown in FIG. 6A, a semiconductor chip 15 is mounted on a wiring board 14 and solder bumps 16 are formed.
After the flip chip bonding, the semiconductor chip 15 was gripped by the clamper 12a of the tensile tester 12 and pulled up, and the load when the semiconductor chip 15 was peeled off from the insulating substrate 13 together with the connection pad 17 was measured. Then, the peel strength per connection pad 17 was calculated.

【0007】しかし、この方法では、はんだ量のばらつ
きにより、接続パッド17の剥離強度に比べてはんだバ
ンプ16の破壊強度が低い場合が生じる。そしてその場
合には、図6(b)に示すように、絶縁基板13からの
接続パッド17の剥離より前に、はんだバンプ16の破
壊が生じるため、接続パッド17の剥離強度を測定する
ことができないという問題があった。
However, in this method, the breaking strength of the solder bump 16 is lower than the peel strength of the connection pad 17 due to the variation in the amount of solder. In this case, as shown in FIG. 6B, the solder bump 16 is broken before the connection pad 17 is separated from the insulating substrate 13, so that the peel strength of the connection pad 17 can be measured. There was a problem that it was not possible.

【0008】本発明は、このような問題を解決するため
になされたもので、BGA等のエリアアレイパッケージ
用配線基板の微小な導体パッドの接着強度を、簡易な方
法で精度良く測定する方法を提供することを目的とす
る。
The present invention has been made in order to solve such a problem, and there is provided a method for accurately measuring the adhesion strength of minute conductive pads of a wiring board for an area array package such as a BGA by a simple method. The purpose is to provide.

【0009】[0009]

【課題を解決するための手段】本発明の導体パッドの接
着強度の測定方法は、絶縁基板上に配線パターンと離隔
されて個別に形成された導体パッドの接着強度を測定す
る方法において、前記導体パッドの側面に触子を当接
し、この触子を介して、前記絶縁基板面に平行な方向の
押圧力を付加し、前記導体パッドが前記絶縁基板面から
剥離するときの押圧力を測定することを特徴とする。
According to the present invention, there is provided a method for measuring the adhesive strength of a conductive pad which is formed separately from a wiring pattern on an insulating substrate. A contact is brought into contact with the side surface of the pad, and a pressing force in a direction parallel to the surface of the insulating substrate is applied through the contact, and the pressing force when the conductor pad is separated from the surface of the insulating substrate is measured. It is characterized by the following.

【0010】本発明の方法では、絶縁基板上に形成され
た導体パッドの側面に、押圧力付加のための触子を当接
し、この触子を介して絶縁基板面に平行な押圧力を付加
することにより、導体パッドの絶縁基板面からの剥離に
要する力を測定しているので、基板面で配線パターンに
直接接続されていない微小面積の導体パッドにおいて、
絶縁基板との間の接着強度を、簡易な方法で精度良く測
定することができる。
In the method of the present invention, a contact for applying a pressing force is brought into contact with a side surface of the conductor pad formed on the insulating substrate, and a pressing force parallel to the surface of the insulating substrate is applied via the contact. By measuring the force required to separate the conductive pad from the insulating substrate surface, the conductive pad with a small area that is not directly connected to the wiring pattern on the substrate surface
The adhesive strength between the insulating substrate and the insulating substrate can be accurately measured by a simple method.

【0011】特に、導体パッドの厚さが薄く、触子の先
端部を絶縁基板面に接触させることなく、導体パッドの
側面に当接させることが難しい場合には、導体パッド上
に、パッドとほぼ同径のはんだ突起物を形成し、こうし
て連接一体化された導体パッドとはんだ突起物との側面
に、触子を当接して押圧力を付加することが望ましい。
このような方法を採ることで、導体パッドへの触子の当
接が容易になる。そして、触子が滑って絶縁基板あるい
は導体パッドに損傷を与えることがなく、接着強度の正
確な測定を作業性良く行なうことができる。
In particular, when the thickness of the conductor pad is small and it is difficult to make the tip of the contactor contact the side surface of the conductor pad without contacting the surface of the insulating substrate, the pad is placed on the conductor pad. It is desirable to form solder protrusions having substantially the same diameter, and apply a pressing force by contacting a touching element to the side surfaces of the solder pads and the conductor pad that is connected and integrated in this way.
By employing such a method, the contact of the touch element to the conductor pad becomes easy. Then, accurate measurement of the adhesive strength can be performed with good workability without damaging the insulating substrate or the conductive pad due to slippage of the contactor.

【0012】さらに、はんだ突起物の代わりに、常温硬
化性または紫外線硬化性の樹脂から成る突起物を導体パ
ッド上に固着・形成して、測定を行なうことも可能であ
る。このような樹脂突起物を使用する場合には、導体パ
ッド(絶縁基板との界面)に熱によるダメージを与える
ことなく、突起物の形成を行なうことができ、熱履歴の
ない状態での導体パッドの接着強度を知ることができ
る。
Further, it is also possible to fix and form a projection made of a resin which is curable at room temperature or an ultraviolet ray on the conductive pad, instead of the solder projection, and then perform the measurement. When such a resin protrusion is used, the protrusion can be formed without damaging the conductor pad (interface with the insulating substrate) by heat, and the conductor pad can be formed without heat history. Of the adhesive.

【0013】[0013]

【発明の実施の形態】以下、本発明の実施の形態を、図
面に基づいて説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0014】本発明の第1の実施例では、図1に示すよ
うに、エポキシ樹脂含浸ガラスクロス基板やBT樹脂含
浸ガラスクロス基板のような絶縁基板1上に形成された
微小な(例えば直径 300μm 、厚さ36μm )導体パッド
2の側面に、剥離試験機(図示を省略。)の接触ツール
3の先端部を当接し、この接触ツール3を介して、絶縁
基板1面に平行な方向に押圧力Fを付加する。接触ツー
ル3の先端部は、導体パッド2の幅( 0.3〜 0.4mm)よ
り小さくし、例えば幅 0.2〜 0.3mm、奥行き(厚さ)50
μm とする。そして、押圧力を 2〜5Nの範囲で徐々に増
大させてゆき、導体パッド2が絶縁基板1面から剥離し
たときの押圧力の大きさを、剥離試験機(荷重センサ
ー)により測定する。
In the first embodiment of the present invention, as shown in FIG. 1, minute (for example, 300 μm in diameter) formed on an insulating substrate 1 such as an epoxy resin impregnated glass cloth substrate or a BT resin impregnated glass cloth substrate. , Thickness 36 μm) The tip of a contact tool 3 of a peeling tester (not shown) is brought into contact with the side surface of the conductor pad 2, and is pushed in a direction parallel to the surface of the insulating substrate 1 via the contact tool 3. Apply pressure F. The tip of the contact tool 3 is smaller than the width (0.3 to 0.4 mm) of the conductive pad 2, for example, 0.2 to 0.3 mm in width and 50 in depth (thickness).
μm. Then, the pressing force is gradually increased in the range of 2 to 5 N, and the magnitude of the pressing force when the conductive pad 2 is separated from the surface of the insulating substrate 1 is measured by a peeling tester (load sensor).

【0015】なお、測定可能な導体パッド2としては、
BGA、CSPなどの配線基板の半導体チップ接続用パ
ッド(フリップチップ接続パッド)のように、ヴィアホ
ールを介して絶縁基板の他方の面側に導通された接続パ
ッドの他に、テスト用の導体パッドやワイヤボンディン
グ用パッドのように、同一基板面で直接配線パターンに
接続されることなく、個別に形成された導体パッドがあ
る。また、配線パターンに接続された導体パッドでも、
配線パターンから切り離した状態で、導体パッド部分の
みの接着強度を測定することができる。
The conductive pads 2 that can be measured include:
Conductor pads for testing as well as connection pads conducted to the other surface side of the insulating substrate through via holes, such as pads for connecting semiconductor chips (flip chip connection pads) of wiring boards such as BGA and CSP There are conductor pads that are individually formed without being directly connected to a wiring pattern on the same substrate surface, such as wire pads and wire bonding pads. In addition, even with the conductor pad connected to the wiring pattern,
In a state separated from the wiring pattern, the adhesive strength of only the conductor pad portion can be measured.

【0016】こうして測定される接着強度は、絶縁基板
1の種類、導体パッド2のサイズ、導体パッド2の表面
処理の違い(例えば、銅箔の黒化処理の有無)、導体パ
ッド2下のヴィアホールの有無およびヴィアホールのサ
イズなどにより異なるので、規格を標準化することは難
しいが、基板面で直接配線パターンに接続されていない
微小面積の導体パッド2の接着強度を、それぞれの条件
で、精度良く測定することができる。
The adhesion strength measured in this manner is based on the type of the insulating substrate 1, the size of the conductive pad 2, the difference in the surface treatment of the conductive pad 2 (for example, whether or not the copper foil is blackened), the via under the conductive pad 2, and the like. It is difficult to standardize the standard because it differs depending on the presence or absence of the hole and the size of the via hole. However, the bonding strength of the conductive pad 2 having a small area which is not directly connected to the wiring pattern on the substrate surface can be accurately measured under each condition. Can be measured well.

【0017】次に、本発明の第2および第3の実施例に
ついて説明する。
Next, second and third embodiments of the present invention will be described.

【0018】第2の実施例では、導体パッド2の厚さが
約20μm と薄く、接触ツール3の先端部を導体パッド2
の側面に当接させて押圧力を付加する作業が難しい場合
に、図2に示すように、導体パッド2上に、このパッド
と同径のはんだから成る突起物4を固着し、導体パッド
2の側面からはんだ突起物4の側面に亘って、接触ツー
ル3を当接して押圧力を付加する。
In the second embodiment, the thickness of the conductor pad 2 is as thin as about 20 μm, and the tip of the contact tool 3 is
When it is difficult to apply a pressing force by contacting the side surface of the conductor pad 2, a protrusion 4 made of solder having the same diameter as the pad is fixed on the conductor pad 2 as shown in FIG. The contact tool 3 is brought into contact with the side surface of the solder projection 4 from the side surface of the solder protrusion 4 to apply a pressing force.

【0019】ここで、以下に示すはんだ肉盛り手段を用
いることで、導体パッド2上にはんだ突起物4を寸法精
度良く形成することができる。すなわち、はんだ盛り寸
法を揃えるために、図3(a)に示すように、導体パッ
ド2上にはんだペースト5をスクリーン印刷により塗布
した後、図3(b)に示すように、約 230℃の温度に加
熱してはんだをリフローさせる。リフロー後のはんだ突
起物4の大きさは、導体パッド2と接触ツール3の大き
さに合わせて設定される。具体的には、導体パッド2と
同じ直径( 300μm )で、高さを 0.1〜 0.2mm(例えば
150μm )とすることが望ましい。
Here, the solder projections 4 can be formed on the conductor pads 2 with high dimensional accuracy by using the solder building-up means described below. That is, as shown in FIG. 3A, a solder paste 5 is applied on the conductive pads 2 by screen printing in order to make the solder pile dimensions uniform, and then, as shown in FIG. Heat to temperature to reflow solder. The size of the solder protrusion 4 after the reflow is set according to the size of the conductor pad 2 and the contact tool 3. Specifically, it has the same diameter (300 μm) as the conductive pad 2 and a height of 0.1 to 0.2 mm (for example,
150 μm).

【0020】このように構成される第2の実施例では、
厚さが薄い導体パッド2の接着強度を、作業性良く正確
に測定することができる。また、接触ツール3の当接お
よび押圧作業をやり直す必要がないので、導体パッド2
に損傷を与えるおそれがない。
In the second embodiment configured as described above,
The adhesive strength of the thin conductive pad 2 can be accurately measured with good workability. Further, since there is no need to repeat the contacting and pressing operations of the contact tool 3, the contact pads 2
There is no risk of damage to

【0021】第3の実施例では、図4に示すように、は
んだに代わり、常温硬化性あるいは紫外線硬化性のエポ
キシ樹脂やアクリル樹脂から成る突起物6を、導体パッ
ド2上に固着・形成した後、導体パッド2の側面および
それに連接して形成された樹脂突起物6の側面に、接触
ツール3を当接して押圧力を付加する。
In the third embodiment, as shown in FIG. 4, a projection 6 made of an epoxy resin or an acrylic resin curable at room temperature or ultraviolet light is fixed and formed on the conductive pad 2 instead of the solder. Thereafter, the contact tool 3 is brought into contact with the side surface of the conductor pad 2 and the side surface of the resin protrusion 6 formed in connection with the conductor pad 2 to apply a pressing force.

【0022】はんだに代わり常温硬化性等の樹脂を使用
する第3の実施例においては、導体パッド2と絶縁基板
1との界面に熱を加えることなく樹脂突起物6を形成す
ることができるので、熱履歴のない状態での導体パッド
2の接着強度を容易に測定することができる。
In the third embodiment in which a resin having room temperature curability is used instead of solder, the resin protrusion 6 can be formed without applying heat to the interface between the conductor pad 2 and the insulating substrate 1. In addition, the adhesive strength of the conductor pad 2 without any heat history can be easily measured.

【0023】[0023]

【発明の効果】以上の記載から明らかなように、本発明
の方法によれば、フリップチップ接続用パッドのよう
な、基板面で直接配線パターンに接続されていない微小
な導体パッドの接着強度を、簡易な方法で精度良く測定
することができる。
As is apparent from the above description, according to the method of the present invention, the bonding strength of minute conductive pads, such as flip-chip connection pads, which are not directly connected to the wiring pattern on the substrate surface is reduced. , And can be accurately measured by a simple method.

【0024】また、特に導体パッドの厚さが薄く、触子
の先端部を導体パッドの側面に当接させて押圧力を付加
することが難しい場合には、導体パッド上に、パッドと
同径のはんだ突起物または常温硬化性などの樹脂突起物
を固着・形成した後、連接一体化された導体パッドと突
起物との側面に触子を当接して押圧することで、導体パ
ッドに損傷を与えることなく、容易に正確な測定を行な
うことができる。
In particular, when the thickness of the conductive pad is small and it is difficult to apply a pressing force by contacting the tip of the contact with the side surface of the conductive pad, the conductive pad has the same diameter as the pad. After fixing and forming the solder projections or the resin projections such as room temperature curing, the contact pads are pressed against the side surfaces of the continuous and integrated conductor pads and the projections, thereby damaging the conductor pads. Without giving, accurate measurement can be easily performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の導体パッドの接着強度測定方法の第1
の実施例を説明するための断面図。
FIG. 1 shows a first method of measuring the adhesive strength of a conductive pad according to the present invention.
Sectional drawing for demonstrating the Example of FIG.

【図2】本発明の第2の実施例を説明するための断面
図。
FIG. 2 is a sectional view for explaining a second embodiment of the present invention.

【図3】第2の実施例において、はんだ突起物の形成方
法を示す断面図。
FIG. 3 is a cross-sectional view illustrating a method of forming a solder protrusion in a second embodiment.

【図4】本発明の第3の実施例を説明するための断面
図。
FIG. 4 is a sectional view for explaining a third embodiment of the present invention.

【図5】従来からの導体パターンの接着強度の測定方法
を示す図。
FIG. 5 is a diagram showing a conventional method for measuring the adhesive strength of a conductor pattern.

【図6】従来からのBGAパッケージ用の接続パッドの
剥離強度測定方法を示す図。
FIG. 6 is a diagram showing a conventional method for measuring the peel strength of a connection pad for a BGA package.

【符号の説明】[Explanation of symbols]

1………絶縁基板 2………導体パッド 3………接触ツール 4………はんだ突起物 5………はんだペースト 6………常温硬化性あるいは紫外線硬化性樹脂突起物 DESCRIPTION OF SYMBOLS 1 ... Insulating board 2 ... Conductor pad 3 ... Contact tool 4 ... Solder protrusion 5 ... Solder paste 6 ... Room temperature curable or ultraviolet curable resin protrusion

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板上に配線パターンと離隔されて
個別に形成された導体パッドの接着強度を測定する方法
において、 前記導体パッドの側面に触子を当接し、この触子を介し
て、前記絶縁基板面に平行な方向の押圧力を付加し、前
記導体パッドが前記絶縁基板面から剥離するときの押圧
力を測定することを特徴とする導体パッドの接着強度の
測定方法。
1. A method for measuring the adhesive strength of a conductor pad formed separately from a wiring pattern on an insulating substrate, wherein a contact is brought into contact with a side surface of the conductor pad, and A method for measuring the adhesive strength of a conductive pad, characterized by applying a pressing force in a direction parallel to the surface of the insulating substrate and measuring the pressing force when the conductive pad peels off from the surface of the insulating substrate.
【請求項2】 前記導体パッド上に、該パッドと同径の
はんだから成る突起物を固着した後、前記導体パッドの
側面から前記はんだ突起物の側面に亘って前記触子を当
接し、前記押圧力を付加することを特徴とする請求項1
記載の導体パッドの接着強度の測定方法。
2. After fixing a protrusion made of solder having the same diameter as the pad on the conductor pad, the contactor is brought into contact with the conductor pad from the side surface to the side surface of the solder protrusion. 2. A pressing force is applied.
The method for measuring the adhesive strength of the conductor pad according to the above.
【請求項3】 前記導体パッド上に、該パッドと同径の
常温硬化性または紫外線硬化性樹脂から成る突起物を固
着した後、前記導体パッドの側面から前記樹脂突起物の
側面に亘って前記触子を当接し、前記押圧力を付加する
ことを特徴とする請求項1記載の導体パッドの接着強度
の測定方法。
3. After fixing a projection made of a room-temperature-curable or ultraviolet-curable resin having the same diameter as the pad on the conductor pad, the projection extends from the side surface of the conductor pad to the side surface of the resin projection. 2. The method for measuring the adhesive strength of a conductive pad according to claim 1, wherein the pressing force is applied by contacting a contact.
JP13456899A 1999-05-14 1999-05-14 Method for measuring adhesive strength of conductive pad Withdrawn JP2000321196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13456899A JP2000321196A (en) 1999-05-14 1999-05-14 Method for measuring adhesive strength of conductive pad

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13456899A JP2000321196A (en) 1999-05-14 1999-05-14 Method for measuring adhesive strength of conductive pad

Publications (1)

Publication Number Publication Date
JP2000321196A true JP2000321196A (en) 2000-11-24

Family

ID=15131392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13456899A Withdrawn JP2000321196A (en) 1999-05-14 1999-05-14 Method for measuring adhesive strength of conductive pad

Country Status (1)

Country Link
JP (1) JP2000321196A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005257514A (en) * 2004-03-12 2005-09-22 National Institute Of Advanced Industrial & Technology Coating film adhesion strength measurement method
RU2528575C1 (en) * 2013-03-29 2014-09-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования Самарский государственный технический университет Method of determining adhesion strength of coating with base
CN105092379A (en) * 2015-08-31 2015-11-25 苏州大学 Evaluation method of laser cladding layer and matrix bonding strength
CN109374439A (en) * 2018-10-23 2019-02-22 北京航天时代光电科技有限公司 A kind of Y waveguide integrated optical device chip shear test tooling and cutting method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005257514A (en) * 2004-03-12 2005-09-22 National Institute Of Advanced Industrial & Technology Coating film adhesion strength measurement method
RU2528575C1 (en) * 2013-03-29 2014-09-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования Самарский государственный технический университет Method of determining adhesion strength of coating with base
CN105092379A (en) * 2015-08-31 2015-11-25 苏州大学 Evaluation method of laser cladding layer and matrix bonding strength
CN109374439A (en) * 2018-10-23 2019-02-22 北京航天时代光电科技有限公司 A kind of Y waveguide integrated optical device chip shear test tooling and cutting method
CN109374439B (en) * 2018-10-23 2021-04-13 北京航天时代光电科技有限公司 Y waveguide integrated optical device chip shearing test tool and shearing method

Similar Documents

Publication Publication Date Title
KR100781856B1 (en) Probe card and semiconductor testing device using probe sheet or probe card and semiconductor device producing method
CN100380622C (en) Semiconductor inspection device and method for manufacturing semiconductor device
US5073117A (en) Flip-chip test socket adaptor and method
KR100415245B1 (en) Probe Card, Probe substrate and Space Transformer using thereto, and Manufacturing Methods thereof
US20100022035A1 (en) Electronic apparatus and manufacturing method thereof
JPH10242350A (en) Bare chip mounting structure and mounting method, and interposer used therefor
US20030116863A1 (en) Semiconductor chip-mounting board
JPH1041694A (en) Substrate mounting structure of semiconductor element and mounting method thereof
US6847121B2 (en) Semiconductor device and package product of the semiconductor device
JP3108398B2 (en) Method of manufacturing probe card
JPH09229963A (en) Contact body for inspecting electronic parts, manufacturing method thereof and inspection method using the same
JP2922486B2 (en) Probe card
JPH11295342A (en) Probe card and method for manufacturing the same
JP2559242B2 (en) Probe card
JP2001007157A (en) Semiconductor device mounting structure
TWI872059B (en) Inspection jig and inspection device
JP2833272B2 (en) IC mounting method
KR20090108791A (en) Probe member and probe card comprising same
JPH09159694A (en) Lsi test probe
JP2003188201A (en) Ball pull strength measurement method
KR20100039953A (en) Coin head and bump formation method which use this
JPH10189660A (en) Circuit element for flip chip connection
JP2001085477A (en) Inspection board and inspection method
JP4417192B2 (en) Manufacturing method of connecting jig
KR960000219B1 (en) Package and manufacture method

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20041126

A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20060801