JP2000506117A - 光学ガラスの初期透過率を増大させる方法 - Google Patents

光学ガラスの初期透過率を増大させる方法

Info

Publication number: JP2000506117A
Authority: JP; Japan
Prior art keywords: optical glass; transmittance; glass; hydrogen; deuterium
Prior art date: 1996-03-05
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP9531834A

Other languages

English (en)

Japanese (ja)

Inventor

エフボーレリ，ニコラス

アールセムポリンスキー，ダニエル

ピーサードセワード，トーマス

スミス，チャーリーン

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Corning Inc

Original Assignee

Corning Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-03-05

Filing date

1997-02-28

Publication date

2000-05-23

1997-02-28 Application filed by Corning Inc filed Critical Corning Inc

2000-05-23 Publication of JP2000506117A publication Critical patent/JP2000506117A/ja

Status Pending legal-status Critical Current

Links

238000002834 transmittance Methods 0.000 title claims abstract description 36
239000005304 optical glass Substances 0.000 title claims abstract description 20
238000000034 method Methods 0.000 title claims description 18
229910052739 hydrogen Inorganic materials 0.000 claims abstract description 38
239000001257 hydrogen Substances 0.000 claims abstract description 38
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 36
YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims abstract description 27
229910052805 deuterium Inorganic materials 0.000 claims abstract description 27
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
239000005350 fused silica glass Substances 0.000 claims description 17
239000012535 impurity Substances 0.000 claims description 17
239000001301 oxygen Substances 0.000 claims description 15
229910052760 oxygen Inorganic materials 0.000 claims description 15
229910021645 metal ion Inorganic materials 0.000 claims description 14
-1 polymethylsiloxane Polymers 0.000 claims description 10
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
239000000203 mixture Substances 0.000 claims description 7
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
238000010521 absorption reaction Methods 0.000 claims description 6
239000007789 gas Substances 0.000 claims description 6
230000003287 optical effect Effects 0.000 claims description 6
238000012546 transfer Methods 0.000 claims description 6
150000002500 ions Chemical class 0.000 claims description 5
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 claims description 3
150000002431 hydrogen Chemical class 0.000 claims description 3
229910052757 nitrogen Inorganic materials 0.000 claims description 3
HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 3
229910001428 transition metal ion Inorganic materials 0.000 claims description 3
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 2
229910052786 argon Inorganic materials 0.000 claims description 2
229910002091 carbon monoxide Inorganic materials 0.000 claims description 2
HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 claims 2
UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical group C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims 2
229910003902 SiCl 4 Inorganic materials 0.000 claims 1
229910052799 carbon Inorganic materials 0.000 claims 1
239000011521 glass Substances 0.000 abstract description 46
239000000523 sample Substances 0.000 description 16
229910020175 SiOH Inorganic materials 0.000 description 14
230000005540 biological transmission Effects 0.000 description 10
238000001228 spectrum Methods 0.000 description 8
238000002835 absorbance Methods 0.000 description 7
230000006872 improvement Effects 0.000 description 6
238000006243 chemical reaction Methods 0.000 description 5
230000003595 spectral effect Effects 0.000 description 5
238000009792 diffusion process Methods 0.000 description 4
238000002329 infrared spectrum Methods 0.000 description 4
238000004519 manufacturing process Methods 0.000 description 4
238000000862 absorption spectrum Methods 0.000 description 3
230000008901 benefit Effects 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 3
230000008859 change Effects 0.000 description 3
239000013068 control sample Substances 0.000 description 3
OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 description 2
230000008033 biological extinction Effects 0.000 description 2
238000002474 experimental method Methods 0.000 description 2
239000000463 material Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
238000012545 processing Methods 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
238000006467 substitution reaction Methods 0.000 description 2
238000002211 ultraviolet spectrum Methods 0.000 description 2
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 description 1
230000009471 action Effects 0.000 description 1
230000004075 alteration Effects 0.000 description 1
239000003638 chemical reducing agent Substances 0.000 description 1
230000006835 compression Effects 0.000 description 1
238000007906 compression Methods 0.000 description 1
230000007423 decrease Effects 0.000 description 1
230000007547 defect Effects 0.000 description 1
230000000694 effects Effects 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
238000005470 impregnation Methods 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
230000000155 isotopic effect Effects 0.000 description 1
239000003446 ligand Substances 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
ACXIAEKDVUJRSK-UHFFFAOYSA-N methyl(silyloxy)silane Chemical compound C[SiH2]O[SiH3] ACXIAEKDVUJRSK-UHFFFAOYSA-N 0.000 description 1
238000001393 microlithography Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
239000000843 powder Substances 0.000 description 1
239000002243 precursor Substances 0.000 description 1
239000002994 raw material Substances 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
239000005049 silicon tetrachloride Substances 0.000 description 1
238000000411 transmission spectrum Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/007—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in gaseous phase
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/22—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with deuterium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/22—Doped silica-based glasses containing non-metals other than boron or halide containing deuterium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Geochemistry & Mineralogy (AREA)
General Chemical & Material Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Physics & Mathematics (AREA)
Thermal Sciences (AREA)
Optics & Photonics (AREA)
Manufacturing & Machinery (AREA)
Glass Compositions (AREA)

JP9531834A 1996-03-05 1997-02-28 光学ガラスの初期透過率を増大させる方法 Pending JP2000506117A (ja)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
US1288196P	1996-03-05	1996-03-05
US1294196P	1996-03-06	1996-03-06
US60/012,881		1996-03-06
US60/012,941		1996-03-06
PCT/US1997/003100 WO1997032821A1 (en)	1996-03-05	1997-02-28	Method of increasing the initial transmittance of optical glass

Publications (1)

Publication Number	Publication Date
JP2000506117A true JP2000506117A (ja)	2000-05-23

Family

ID=26684126

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP9531834A Pending JP2000506117A (ja)	1996-03-05	1997-02-28	光学ガラスの初期透過率を増大させる方法

Country Status (3)

Country	Link
EP (1)	EP0885176A4 (de)
JP (1)	JP2000506117A (de)
WO (1)	WO1997032821A1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2008162880A (ja) *	2006-11-30	2008-07-17	Corning Inc	Ｏｄドープトシリカガラスから構成された光学部材
JP2009514774A (ja) *	2005-11-07	2009-04-09	コーニングインコーポレイテッド	デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
JP2013075827A (ja) *	2005-11-07	2013-04-25	Corning Inc	デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6977137B2 (en)	1999-07-29	2005-12-20	Corning Incorporated	Direct writing of optical devices in silica-based glass using femtosecond pulse lasers
US6796148B1 (en)	1999-09-30	2004-09-28	Corning Incorporated	Deep UV laser internally induced densification in silica glasses
US6950591B2 (en)	2002-05-16	2005-09-27	Corning Incorporated	Laser-written cladding for waveguide formations in glass
DE102018112069A1 (de) *	2018-05-18	2019-11-21	Schott Ag	Verwendung eines Flachglases in elektronischen Bauteilen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0401845B2 (de) *	1989-06-09	2001-04-11	Heraeus Quarzglas GmbH & Co. KG	Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung
US5043002A (en) *	1990-08-16	1991-08-27	Corning Incorporated	Method of making fused silica by decomposing siloxanes

1997
- 1997-02-28 EP EP97907924A patent/EP0885176A4/de not_active Ceased
- 1997-02-28 JP JP9531834A patent/JP2000506117A/ja active Pending
- 1997-02-28 WO PCT/US1997/003100 patent/WO1997032821A1/en not_active Ceased

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2009514774A (ja) *	2005-11-07	2009-04-09	コーニングインコーポレイテッド	デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
JP2013075827A (ja) *	2005-11-07	2013-04-25	Corning Inc	デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
JP2017186254A (ja) *	2005-11-07	2017-10-12	コーニングインコーポレイテッド	デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
JP2008162880A (ja) *	2006-11-30	2008-07-17	Corning Inc	Ｏｄドープトシリカガラスから構成された光学部材

Also Published As

Publication number	Publication date
WO1997032821A1 (en)	1997-09-12
EP0885176A1 (de)	1998-12-23
EP0885176A4 (de)	1999-03-17

Publication	Publication Date	Title
US5668067A (en)	1997-09-16	High purity fused silica having high resistance to optical damage
US5735921A (en)	1998-04-07	Method of reducing laser-induced optical damage in silica
Shelby	1979	Radiation effects in hydrogen‐impregnated vitreous silica
US5474589A (en)	1995-12-12	UV light-permeable glass and article comprising the same
EP1695375A2 (de)	2006-08-30	Synthetisches quarzglas für ein optisches glied und herstellungsverfahren dafür
JP3893816B2 (ja)	2007-03-14	合成石英ガラスおよびその製造方法
EP2048121A1 (de)	2009-04-15	Schwarzes synthetisches Quarzglas mit transparenter Schicht
US6619073B2 (en)	2003-09-16	Method of increasing the initial transmittance of optical glass
JP2000506117A (ja)	2000-05-23	光学ガラスの初期透過率を増大させる方法
US9416044B2 (en)	2016-08-16	Hydrogen-supported fluorination of soot bodies
JP4778138B2 (ja)	2011-09-21	光学部品のための石英ガラス体およびその製造法
JP4193358B2 (ja)	2008-12-10	合成石英ガラス光学部材およびその製造方法
JPH0891867A (ja)	1996-04-09	紫外光透過用合成石英ガラスおよびその製造方法
JP2003183037A (ja)	2003-07-03	光学部材用石英ガラスブランクおよびその使用
CN1604878A (zh)	2005-04-06	含铝熔凝石英玻璃
Nonaka et al.	1988	Photochemical vapor deposition of amorphous silica films using disilane and perfluorosilanes: Defect structures and deposition mechanism
WO2011011662A2 (en)	2011-01-27	Silica glass with saturated induced absorption and method of making
JP2001180962A (ja)	2001-07-03	合成石英ガラスとその製造方法
JP3919831B2 (ja)	2007-05-30	光学用合成石英ガラス
JP4459608B2 (ja)	2010-04-28	合成石英ガラス部材の製造方法
JP4409481B2 (ja)	2010-02-03	光ファイバの製造方法
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JP3408567B2 (ja)	2003-05-19	合成シリカガラス及びその製造方法
Nishikawa et al.	1989	Role of nonstoichiometry on UV absorption and luminescence in high-purity silica.
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