JP2003243531A - 半導体装置およびその製造方法 - Google Patents

半導体装置およびその製造方法

Info

Publication number
JP2003243531A
JP2003243531A JP2002035084A JP2002035084A JP2003243531A JP 2003243531 A JP2003243531 A JP 2003243531A JP 2002035084 A JP2002035084 A JP 2002035084A JP 2002035084 A JP2002035084 A JP 2002035084A JP 2003243531 A JP2003243531 A JP 2003243531A
Authority
JP
Japan
Prior art keywords
gate
insulating film
gate electrode
semiconductor device
doped polysilicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002035084A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003243531A5 (2
Inventor
Masao Nishida
征男 西田
Katsuyuki Hotta
勝之 堀田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2002035084A priority Critical patent/JP2003243531A/ja
Priority to US10/214,593 priority patent/US20030151098A1/en
Priority to KR1020020063797A priority patent/KR20030068374A/ko
Publication of JP2003243531A publication Critical patent/JP2003243531A/ja
Publication of JP2003243531A5 publication Critical patent/JP2003243531A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85—Complementary IGFETs, e.g. CMOS
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
    • H10D64/691—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator comprising metallic compounds, e.g. metal oxides or metal silicates 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/013—Manufacture or treatment of electrodes having a conductor capacitively coupled to a semiconductor by an insulator
    • H10D64/01302—Manufacture or treatment of electrodes having a conductor capacitively coupled to a semiconductor by an insulator the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H10D64/01304—Manufacture or treatment of electrodes having a conductor capacitively coupled to a semiconductor by an insulator the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H10D64/01306—Manufacture or treatment of electrodes having a conductor capacitively coupled to a semiconductor by an insulator the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • H10D84/0172—Manufacturing their gate conductors
    • H10D84/0177—Manufacturing their gate conductors the gate conductors having different materials or different implants
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/017—Manufacture or treatment using dummy gates in processes wherein at least parts of the final gates are self-aligned to the dummy gates, i.e. replacement gate processes

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2002035084A 2002-02-13 2002-02-13 半導体装置およびその製造方法 Pending JP2003243531A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002035084A JP2003243531A (ja) 2002-02-13 2002-02-13 半導体装置およびその製造方法
US10/214,593 US20030151098A1 (en) 2002-02-13 2002-08-09 Semiconductor device having dual-gate structure and method of manufacturing the same
KR1020020063797A KR20030068374A (ko) 2002-02-13 2002-10-18 반도체장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002035084A JP2003243531A (ja) 2002-02-13 2002-02-13 半導体装置およびその製造方法

Publications (2)

Publication Number Publication Date
JP2003243531A true JP2003243531A (ja) 2003-08-29
JP2003243531A5 JP2003243531A5 (2) 2005-08-11

Family

ID=27654959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002035084A Pending JP2003243531A (ja) 2002-02-13 2002-02-13 半導体装置およびその製造方法

Country Status (3)

Country Link
US (1) US20030151098A1 (2)
JP (1) JP2003243531A (2)
KR (1) KR20030068374A (2)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005303256A (ja) * 2004-03-17 2005-10-27 Renesas Technology Corp 半導体装置及び半導体装置の製造方法
JP2008504693A (ja) * 2004-06-30 2008-02-14 インテル コーポレイション 異なるゲート誘電体を用いたｎｍｏｓ及びｐｍｏｓトランジスタを具備する相補型金属酸化物半導体集積回路
JP2009278042A (ja) * 2008-05-19 2009-11-26 Renesas Technology Corp 半導体装置、およびその製造方法
JP2016507909A (ja) * 2013-03-14 2016-03-10 クアルコム，インコーポレイテッド 高密度用ローカルインターコネクト構造
US10692808B2 (en) 2017-09-18 2020-06-23 Qualcomm Incorporated High performance cell design in a technology with high density metal routing

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FR2844396B1 (fr) * 2002-09-06 2006-02-03 St Microelectronics Sa Procede de realisation d'un composant electronique integre et dispositif electrique incorporant un composant integre ainsi obtenu
JP3980985B2 (ja) * 2002-10-04 2007-09-26 株式会社東芝 半導体装置とその製造方法
US7115479B2 (en) * 2002-11-26 2006-10-03 Intel Corporation Sacrificial annealing layer for a semiconductor device and a method of fabrication
US7196013B2 (en) * 2002-12-12 2007-03-27 Intel Corporation Capping layer for a semiconductor device and a method of fabrication
KR100713326B1 (ko) * 2002-12-30 2007-05-04 동부일렉트로닉스 주식회사 반도체 소자의 극 미세 트랜지스터 제작방법
US6977194B2 (en) * 2003-10-30 2005-12-20 International Business Machines Corporation Structure and method to improve channel mobility by gate electrode stress modification
US7153734B2 (en) * 2003-12-29 2006-12-26 Intel Corporation CMOS device with metal and silicide gate electrodes and a method for making it
US7217611B2 (en) * 2003-12-29 2007-05-15 Intel Corporation Methods for integrating replacement metal gate structures
KR100555577B1 (ko) * 2004-10-26 2006-03-03 삼성전자주식회사 에스램 셀의 형성 방법
US7173312B2 (en) * 2004-12-15 2007-02-06 International Business Machines Corporation Structure and method to generate local mechanical gate stress for MOSFET channel mobility modification
US8097500B2 (en) * 2008-01-14 2012-01-17 International Business Machines Corporation Method and apparatus for fabricating a high-performance band-edge complementary metal-oxide-semiconductor device
US8283734B2 (en) * 2010-04-09 2012-10-09 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-threshold voltage device and method of making same
CN102956452B (zh) * 2011-08-18 2015-02-18 中芯国际集成电路制造(上海)有限公司 在制作金属栅极过程中制作金属塞的方法
CN116897427A (zh) * 2021-05-31 2023-10-17 中芯国际集成电路制造(上海)有限公司 半导体结构及其形成方法
CN115799164B (zh) * 2021-09-09 2025-08-08 无锡华润上华科技有限公司 浮置接触孔的形成方法及半导体器件

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US4692755A (en) * 1985-02-22 1987-09-08 Rite-Hite Corporation Loading dock signal and control system
JP2954263B2 (ja) * 1990-03-22 1999-09-27 沖電気工業株式会社 半導体装置の製造方法
US5831540A (en) * 1995-07-24 1998-11-03 United Dominion Ind., Inc. Control system for loading docks
US5700716A (en) * 1996-02-23 1997-12-23 Micron Technology, Inc. Method for forming low contact resistance contacts, vias, and plugs with diffusion barriers
KR100198674B1 (ko) * 1996-10-18 1999-06-15 구본준 씨모스펫 및 그 제조방법
US6124638A (en) * 1996-10-31 2000-09-26 United Microelectronics Semiconductor device and a method of manufacturing the same
KR100268923B1 (ko) * 1997-09-29 2000-10-16 김영환 반도체소자의이중게이트형성방법
WO1999045167A1 (en) * 1998-03-06 1999-09-10 Asm America, Inc. Method of depositing silicon with high step coverage
KR100259097B1 (ko) * 1998-04-02 2000-06-15 김영환 반도체 소자 및 그의 제조 방법
TW406312B (en) * 1998-12-18 2000-09-21 United Microelectronics Corp The method of etching doped poly-silicon
GB2356389B (en) * 1999-09-02 2003-07-16 Bruce Stanley Gunton Loading bay dock control
KR100353551B1 (ko) * 2000-01-28 2002-09-27 주식회사 하이닉스반도체 실리사이드 형성방법
JP2001332630A (ja) * 2000-05-19 2001-11-30 Sharp Corp 半導体装置の製造方法
US20030141560A1 (en) * 2002-01-25 2003-07-31 Shi-Chung Sun Incorporating TCS-SiN barrier layer in dual gate CMOS devices

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005303256A (ja) * 2004-03-17 2005-10-27 Renesas Technology Corp 半導体装置及び半導体装置の製造方法
JP2008504693A (ja) * 2004-06-30 2008-02-14 インテル コーポレイション 異なるゲート誘電体を用いたｎｍｏｓ及びｐｍｏｓトランジスタを具備する相補型金属酸化物半導体集積回路
JP2009278042A (ja) * 2008-05-19 2009-11-26 Renesas Technology Corp 半導体装置、およびその製造方法
JP2016507909A (ja) * 2013-03-14 2016-03-10 クアルコム，インコーポレイテッド 高密度用ローカルインターコネクト構造
US10692808B2 (en) 2017-09-18 2020-06-23 Qualcomm Incorporated High performance cell design in a technology with high density metal routing

Also Published As

Publication number Publication date
US20030151098A1 (en) 2003-08-14
KR20030068374A (ko) 2003-08-21

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