JP2003280207A5 - - Google Patents
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- Publication number
- JP2003280207A5 JP2003280207A5 JP2002081328A JP2002081328A JP2003280207A5 JP 2003280207 A5 JP2003280207 A5 JP 2003280207A5 JP 2002081328 A JP2002081328 A JP 2002081328A JP 2002081328 A JP2002081328 A JP 2002081328A JP 2003280207 A5 JP2003280207 A5 JP 2003280207A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- resist
- intermediate layer
- forming
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 239000011368 organic material Substances 0.000 claims 2
- 125000002524 organometallic group Chemical group 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 230000033444 hydroxylation Effects 0.000 claims 1
- 238000005805 hydroxylation reaction Methods 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002081328A JP3813890B2 (ja) | 2002-03-22 | 2002-03-22 | ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法 |
| US10/392,814 US6884571B2 (en) | 2002-03-22 | 2003-03-21 | Intermediate layer composition for three-layer resist process and pattern formation method using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002081328A JP3813890B2 (ja) | 2002-03-22 | 2002-03-22 | ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003280207A JP2003280207A (ja) | 2003-10-02 |
| JP2003280207A5 true JP2003280207A5 (2) | 2005-04-07 |
| JP3813890B2 JP3813890B2 (ja) | 2006-08-23 |
Family
ID=29230004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002081328A Expired - Fee Related JP3813890B2 (ja) | 2002-03-22 | 2002-03-22 | ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6884571B2 (2) |
| JP (1) | JP3813890B2 (2) |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6743885B2 (en) * | 2001-07-31 | 2004-06-01 | Sumitomo Chemical Company, Limited | Resin composition for intermediate layer of three-layer resist |
| US7365023B2 (en) * | 2003-04-17 | 2008-04-29 | Nissan Chemical Industries, Ltd. | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating |
| US7901864B2 (en) * | 2004-09-23 | 2011-03-08 | International Business Machines Corporation | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition |
| US7375172B2 (en) * | 2005-07-06 | 2008-05-20 | International Business Machines Corporation | Underlayer compositions containing heterocyclic aromatic structures |
| JP2007218943A (ja) * | 2006-02-14 | 2007-08-30 | Shin Etsu Chem Co Ltd | 基板及びパターン形成方法 |
| WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| JP2009215423A (ja) * | 2008-03-10 | 2009-09-24 | Chisso Corp | かご型シルセスキオキサン構造を含む重合体とそれを含むネガ型レジスト材料 |
| JP5493689B2 (ja) * | 2008-12-10 | 2014-05-14 | Ｊｎｃ株式会社 | 重合性液晶組成物およびホモジニアス配向液晶フィルム |
| US8614053B2 (en) | 2009-03-27 | 2013-12-24 | Eastman Chemical Company | Processess and compositions for removing substances from substrates |
| US8309502B2 (en) * | 2009-03-27 | 2012-11-13 | Eastman Chemical Company | Compositions and methods for removing organic substances |
| US8444768B2 (en) | 2009-03-27 | 2013-05-21 | Eastman Chemical Company | Compositions and methods for removing organic substances |
| JP5324361B2 (ja) * | 2009-08-28 | 2013-10-23 | 東京応化工業株式会社 | 表面処理剤及び表面処理方法 |
| KR101813298B1 (ko) | 2010-02-24 | 2017-12-28 | 바스프 에스이 | 잠재성 산 및 그의 용도 |
| US9029268B2 (en) | 2012-11-21 | 2015-05-12 | Dynaloy, Llc | Process for etching metals |
| EP3019559A4 (en) | 2013-08-22 | 2017-04-05 | Sony Corporation | Water soluble fluorescent or colored dyes and methods for their use |
| KR101829159B1 (ko) | 2014-01-16 | 2018-02-13 | 소니 주식회사 | 수용성 형광 또는 유색 염료 |
| US9994538B2 (en) | 2015-02-02 | 2018-06-12 | Basf Se | Latent acids and their use |
| US11827661B2 (en) | 2015-02-26 | 2023-11-28 | Sony Group Corporation | Water soluble fluorescent or colored dyes comprising conjugating groups |
| KR102646956B1 (ko) * | 2015-02-26 | 2024-03-14 | 소니그룹주식회사 | 페닐에티닐나프탈렌 염료 및 이의 사용 방법 |
| CN107709470B (zh) | 2015-05-11 | 2021-01-29 | 索尼公司 | 超亮二聚或多聚染料 |
| CN109415574B (zh) | 2016-04-01 | 2021-05-28 | 索尼公司 | 具有刚性间隔基团的超亮二聚体或聚合物染料 |
| AU2017240154B2 (en) | 2016-04-01 | 2021-08-12 | Sony Group Corporation | Ultra bright dimeric or polymeric dyes |
| WO2017177065A2 (en) | 2016-04-06 | 2017-10-12 | Sony Corporation | Ultra bright dimeric or polymeric dyes with spacing linker groups |
| JP7527537B2 (ja) | 2016-05-10 | 2024-08-05 | ソニーグループ株式会社 | ペプチド骨格を有する超明色ポリマー染料 |
| EP3455299B1 (en) | 2016-05-10 | 2024-01-17 | Sony Group Corporation | Compositions comprising a polymeric dye and a cyclodextrin and uses thereof |
| EP3455300A1 (en) | 2016-05-11 | 2019-03-20 | Sony Corporation | Ultra bright dimeric or polymeric dyes |
| EP3464477A1 (en) | 2016-06-06 | 2019-04-10 | Sony Corporation | Ionic polymers comprising fluorescent or colored reporter groups |
| JP7312929B2 (ja) | 2016-07-29 | 2023-07-24 | ソニーグループ株式会社 | 超明色二量体またはポリマー色素およびその調製のための方法 |
| WO2019071153A1 (en) | 2017-10-05 | 2019-04-11 | Sony Corporation | PROGRAMMABLE DENDRITIC MEDICINES |
| KR20260011205A (ko) | 2017-10-05 | 2026-01-22 | 소니그룹주식회사 | 프로그램가능한 중합체성 약물 |
| CN111836645A (zh) | 2017-11-16 | 2020-10-27 | 索尼公司 | 可编程的聚合药物 |
| CN111565756A (zh) | 2018-01-12 | 2020-08-21 | 索尼公司 | 包含生物活性化合物的具有刚性间隔基团的聚合物 |
| US12539334B2 (en) | 2018-01-12 | 2026-02-03 | Sony Group Corporation | Phosphoalkyl polymers comprising biologically active agents |
| EP3737417B1 (en) | 2018-01-12 | 2025-08-27 | Sony Group Corporation | Phosphoalkyl ribose polymers comprising biologically active compounds |
| KR102742386B1 (ko) | 2018-03-19 | 2024-12-16 | 소니그룹주식회사 | 형광 신호 향상을 위한 2가 금속의 사용 |
| CN118480073A (zh) | 2018-03-21 | 2024-08-13 | 索尼公司 | 具有连接体基团的聚合串联染料 |
| JP7580689B2 (ja) | 2018-06-27 | 2024-11-12 | ソニーグループ株式会社 | デオキシリボースを含むリンカー基を有するポリマー色素 |
| KR20210032434A (ko) | 2018-07-13 | 2021-03-24 | 소니 주식회사 | 유기인산염 단위를 포함하는 백본을 갖는 중합체성 염료 |
| WO2021062176A2 (en) | 2019-09-26 | 2021-04-01 | Sony Corporation | Polymeric tandem dyes with linker groups |
| EP4038081A1 (en) | 2019-09-30 | 2022-08-10 | Sony Group Corporation | Nucleotide probes |
| CN111533860B (zh) * | 2020-06-10 | 2021-10-01 | 青岛天祥环保工程有限公司 | 水性涂料超疏水改性剂及其制备方法 |
| EP4256078A1 (en) | 2020-12-07 | 2023-10-11 | Sony Group Corporation | Spacing linker group design for brightness enhancement in dimeric or polymeric dyes |
| US12568803B2 (en) * | 2023-03-03 | 2026-03-03 | Applied Materials, Inc. | Methods of forming interconnect structures |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2573371B2 (ja) | 1989-10-11 | 1997-01-22 | 沖電気工業株式会社 | ３層レジスト法用の中間層形成材 |
| JPH0443264A (ja) | 1990-06-08 | 1992-02-13 | Hitachi Zosen Corp | 吸収式熱源装置 |
| JPH0444741A (ja) | 1990-06-12 | 1992-02-14 | Toshiba Corp | ステレオｘ線テレビ装置 |
| JP2641644B2 (ja) | 1991-05-16 | 1997-08-20 | 東京応化工業株式会社 | 多層レジスト法用積層材料の製造方法 |
| JPH0638400A (ja) | 1992-07-17 | 1994-02-10 | Hitachi Ltd | 小型情報処理装置のバッテリ装置 |
| JP2901044B2 (ja) | 1993-12-08 | 1999-06-02 | 沖電気工業株式会社 | 三層レジスト法によるパターン形成方法 |
| US6743885B2 (en) * | 2001-07-31 | 2004-06-01 | Sumitomo Chemical Company, Limited | Resin composition for intermediate layer of three-layer resist |
-
2002
- 2002-03-22 JP JP2002081328A patent/JP3813890B2/ja not_active Expired - Fee Related
-
2003
- 2003-03-21 US US10/392,814 patent/US6884571B2/en not_active Expired - Lifetime
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