JP2003285387A - Gas-barrier film roll, laminate and packaging bag using the roll - Google Patents
Gas-barrier film roll, laminate and packaging bag using the rollInfo
- Publication number
- JP2003285387A JP2003285387A JP2002092367A JP2002092367A JP2003285387A JP 2003285387 A JP2003285387 A JP 2003285387A JP 2002092367 A JP2002092367 A JP 2002092367A JP 2002092367 A JP2002092367 A JP 2002092367A JP 2003285387 A JP2003285387 A JP 2003285387A
- Authority
- JP
- Japan
- Prior art keywords
- gas barrier
- roll
- film
- layer
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 9
- 230000004888 barrier function Effects 0.000 claims abstract description 98
- 238000007740 vapor deposition Methods 0.000 claims abstract description 65
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 26
- 239000010408 film Substances 0.000 claims description 154
- 239000010410 layer Substances 0.000 claims description 51
- 239000010409 thin film Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 33
- 229920005989 resin Polymers 0.000 claims description 18
- 239000011347 resin Substances 0.000 claims description 18
- 238000003860 storage Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- 229920002647 polyamide Polymers 0.000 claims description 7
- 239000004952 Polyamide Substances 0.000 claims description 6
- 229920006267 polyester film Polymers 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 5
- 239000012790 adhesive layer Substances 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 15
- 238000007639 printing Methods 0.000 abstract description 7
- 238000003475 lamination Methods 0.000 abstract description 5
- 238000001771 vacuum deposition Methods 0.000 abstract description 3
- 239000002537 cosmetic Substances 0.000 abstract description 2
- 239000003814 drug Substances 0.000 abstract description 2
- 235000013305 food Nutrition 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 85
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 238000004804 winding Methods 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 8
- 230000035699 permeability Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- -1 polyethylene Polymers 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 229920000620 organic polymer Polymers 0.000 description 6
- 229920001225 polyester resin Polymers 0.000 description 6
- 239000004645 polyester resin Substances 0.000 description 6
- 238000010030 laminating Methods 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000005022 packaging material Substances 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 230000037303 wrinkles Effects 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 229920000180 alkyd Polymers 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 238000009820 dry lamination Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229920000578 graft copolymer Polymers 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 238000009998 heat setting Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000002407 reforming Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- 101000705921 Homo sapiens Proline-rich protein 3 Proteins 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920001007 Nylon 4 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 101100219325 Phaseolus vulgaris BA13 gene Proteins 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 102100031053 Proline-rich protein 3 Human genes 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 230000005606 hygroscopic expansion Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Wrappers (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Bag Frames (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、透明性、ガスバリ
ア性、防湿性、印刷性、柔軟性に優れたフィルムロール
に関するものである。さらには印刷層、接着層、アンカ
ーコート層などを介してヒートシール性樹脂層を積層し
た積層体、およびそれを使用した包装袋に関する。TECHNICAL FIELD The present invention relates to a film roll having excellent transparency, gas barrier properties, moisture resistance, printability and flexibility. Furthermore, the present invention relates to a laminate in which a heat-sealable resin layer is laminated via a printing layer, an adhesive layer, an anchor coat layer, and the like, and a packaging bag using the same.
【0002】[0002]
【従来の技術】従来、ガスバリア性に優れたフィルムと
しては、プラスチックフィルム上に金属アルミニウムを
蒸着したものや、塩化ビニリデンやエチレンビニールア
ルコール共重合体をコーティングしたものが知られてい
る。また近年、酸化珪素、酸化アルミニウムなどの無機
酸化物薄膜を真空蒸着法やCVD(化学的気相成長)法
などにより積層したものが知られるようになった。2. Description of the Related Art Heretofore, as a film excellent in gas barrier property, a film formed by vapor-depositing metal aluminum on a plastic film or a film formed by coating vinylidene chloride or ethylene vinyl alcohol copolymer is known. In addition, in recent years, it has become known that inorganic oxide thin films such as silicon oxide and aluminum oxide are laminated by a vacuum vapor deposition method or a CVD (chemical vapor deposition) method.
【0003】真空蒸着法等により無機酸化物薄膜を基材
フィルムに積層したガスバリアフィルムは、蒸着直後は
ガスバリア性が期待したほどに発現しない場合がある。
また、透明性も蒸着直後には蒸着膜の着色により黒褐色
や茶褐色を呈している場合がある。これは蒸着直後の無
機酸化物薄膜が不完全な酸化状態であることや、未結合
の部位が残っており膜密度が粗な状態にあるためと考え
られている。一般的に透明包装材料としては着色してい
るものは敬遠されるが、とくに黄色みががっているもの
は内容物が古く見えるため敬遠される。A gas barrier film obtained by laminating an inorganic oxide thin film on a substrate film by a vacuum vapor deposition method or the like may not exhibit the gas barrier property as expected immediately after vapor deposition.
In addition, the transparency may be blackish brown or dark brown immediately after vapor deposition due to the coloring of the deposited film. It is considered that this is because the inorganic oxide thin film immediately after vapor deposition is in an incompletely oxidized state, and unbonded sites remain so that the film density is rough. Generally, colored ones are shunned as transparent packaging materials, but especially yellowish ones are shunned because the contents look old.
【0004】これらの課題を解決する方法として、以下
のような提案がなされている。
酸化アルミニウムの反応性蒸着ガスバリア膜に対して
は、蒸着後オフラインで水分を吸着させ、さらに水分を
吸着させた温度以上で熱処理することによって、透明
性、ガスバリア性を向上させた透明ガスバリア性フィル
ムを製造する方法が提案されている。(特許第2638
797号公報参照)
また、酸化ケイ素を蒸着したプラスチックフィルムの
蒸着面に、水性液体をコーティングし加熱乾燥すること
によって透明性、ガスバリア性を向上させた積層包装材
料の製造方法が提案されている。(特開平6−5616
4号公報参照)
また、酸化ケイ素を蒸着したプラスティックフィルム
の蒸着面に、過酸化水素水溶液をコーティングし、暗所
もしくは所定の明るさの場所に所定温度で所定時間放置
することにより透明性、ガスバリア性を向上させた酸化
ケイ素蒸着フィルムおよびその製造方法が提案されてい
る。(特開平8−197675号公報参照)
また、酸化アルミニウムの反応性蒸着ガスバリアフィ
ルムを25℃、相対湿度50%RHの環境下に1週間以上放置す
る製造方法が提案されている。(特開2000-355070参
照)さらに、蒸着時、酸化アルミニウム蒸着膜が内側
になるように巻き取った後、蒸着面が外側になるように
巻返した蒸着フィルムを35〜45℃、相対湿度80〜100
%RHの環境下に48時間以上放置する製造方法が提案され
ている。(特開平11−262969参照)
いずれも不完全な酸化状態にあり未結合部分を含む薄膜
構造を有する無機酸化物からなるガスバリア薄膜を種々
の手段により酸化度をあげたり、薄膜構造を緻密化し、
透明性とガスバリア性を向上する目的と考えられる。As a method for solving these problems, the following proposals have been made. For a reactive vapor deposition gas barrier film of aluminum oxide, a transparent gas barrier film with improved transparency and gas barrier properties is obtained by vapor-depositing moisture off-line after vapor deposition and further performing heat treatment at a temperature above the moisture adsorption temperature. A method of manufacturing has been proposed. (Patent No. 2638
Further, there is proposed a method for producing a laminated packaging material in which the vapor deposition surface of a plastic film vapor-deposited with silicon oxide is coated with an aqueous liquid and heated and dried to improve transparency and gas barrier properties. (JP-A-6-5616
In addition, the vapor deposition surface of a plastic film vapor-deposited with silicon oxide is coated with an aqueous hydrogen peroxide solution, and the mixture is left in a dark place or a place with a predetermined brightness at a predetermined temperature for a predetermined time to obtain transparency and a gas barrier. A silicon oxide vapor deposition film having improved properties and a method for producing the same have been proposed. (See Japanese Patent Application Laid-Open No. 8-197675) In addition, a manufacturing method has been proposed in which a reactive vapor deposition gas barrier film of aluminum oxide is allowed to stand for one week or more in an environment of 25 ° C. and relative humidity of 50% RH. (See JP-A-2000-355070) Furthermore, during vapor deposition, the aluminum oxide vapor deposition film was wound up so that the vapor deposition surface was on the inside, and then rewound so that the vapor deposition surface was on the outside. ~ 100
A manufacturing method has been proposed in which it is left in an environment of% RH for 48 hours or more. (See Japanese Patent Application Laid-Open No. 11-262969) In any case, a gas barrier thin film made of an inorganic oxide having a thin film structure including an unbonded portion in an incompletely oxidized state is increased in oxidation degree by various means or the thin film structure is densified.
This is considered to be the purpose of improving transparency and gas barrier properties.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、や
の提案では種々水溶液をコーティングするためにグラビ
アコーターを通す、あるいは水浴をくぐらす等の工程が
必要でありコスト的に不利であるし、またガスバリア
性、とくに防湿性(水蒸気バリア性)が十分でないうち
に蒸着膜に水溶液を塗布すると水分が蒸着膜を透過し、
基材が水分を吸収し、基材フィルムの膨潤によりしわの
原因になったり、とくにポリアミド樹脂など吸水性の樹
脂を原料とする基材フィルムの場合は吸湿寸法変化が大
きく、無機酸化物のガスバリア膜にクラックが入り、ガ
スバリア性の低下を招く。さらにコートした水溶液を乾
燥させるために熱をかけることも、基材フィルムの熱収
縮によるガスバリア膜のダメージを与えることになり、
ガスバリア性を悪くする懸念がある。However, in the proposal of Ya, it is necessary to pass through a gravure coater to coat various aqueous solutions, or to pass a water bath, which is disadvantageous in terms of cost and gas barrier property. , In particular, if an aqueous solution is applied to the vapor deposition film while the moisture proof property (water vapor barrier property) is not sufficient, moisture will pass through the vapor deposition film,
The base material absorbs water and causes swelling due to swelling of the base material film, and especially in the case of a base material film made of a water-absorbent resin such as polyamide resin, the dimensional change in moisture absorption is large, and the gas barrier of inorganic oxides The film is cracked, which causes deterioration of the gas barrier property. Furthermore, applying heat to dry the coated aqueous solution also causes damage to the gas barrier film due to heat shrinkage of the base film,
There is a concern that the gas barrier property will deteriorate.
【0006】また、の提案において特定の温湿
度、または高温高湿下に放置して、改質に必要な水分を
吸着させる方法があげられているが、工業的にはロール
状態のガスバリアフィルムでは、それ自身のガスバリア
性のために、改質に不可欠な水分または酸素をロール内
部まで均一に吸着させることはむずかしく、結果として
透明性、ガスバリア性などの特性がロールの長さ方向、
巾方向でばらついたフィルムとなる懸念がある。[0006] Further, in the proposal, there is mentioned a method of allowing it to stand under a specific temperature and humidity or high temperature and high humidity to adsorb the water necessary for reforming. However, due to its own gas barrier property, it is difficult to uniformly adsorb moisture or oxygen essential for reforming to the inside of the roll, and as a result, properties such as transparency and gas barrier property are taken in the length direction of the roll,
There is a concern that the film may vary in the width direction.
【0007】[0007]
【課題を解決するための手段】本発明者らは上記のよう
な問題点を解決すべく種々の検討を行った結果、巻き取
り式真空蒸着法により基材ロールフィルムの少なくとも
片面に無機酸化物からなるガスバリア性薄膜を蒸着した
ガスバリアフィルムロールを真空蒸着装置から取り出
し、絶対湿度が0.008〜0.018kg/kgの環境下で、蒸着面
が少なくとも一度は該環境下の空気に接触する状態で巻
き返したのち、30〜60℃の恒温環境で一定期間以上保管
することにより透明性とガスバリア性の向上した優れた
ガスバリアフィルムロールが得られるという発明にいた
った。As a result of various investigations to solve the above problems, the present inventors have found that an inorganic oxide is formed on at least one side of a base roll film by a winding vacuum deposition method. The gas barrier film roll on which the gas barrier thin film consisting of was vapor-deposited was taken out from the vacuum vapor deposition apparatus, and was rewound in an environment where the absolute humidity was 0.008 to 0.018 kg / kg, with the vapor deposition surface being in contact with air under the environment at least once. After that, the invention led to the invention that an excellent gas barrier film roll having improved transparency and gas barrier properties can be obtained by storing it in a constant temperature environment of 30 to 60 ° C. for a certain period or longer.
【0008】すなわち本発明は、巻き取り式真空蒸着法
により基材フィルムの少なくとも片面に無機酸化物から
なるガスバリア性薄膜層を蒸着したガスバリアフィルム
ロールであり、該ガスバリアフィルムロールを真空蒸着
装置から取り出し、絶対湿度が0.008〜0.018kg/kgの環
境下で、蒸着面が少なくとも一度は該環境下の空気に接
触する状態で巻き返したのち、ロール状態で30〜60℃の
恒温環境で一定期間以上保管すること、および、保管後
のロールから切り出したフィルムを4枚重ねた状態での
色差b値がロールの幅方向、長さ方向にわたって±3.0以
内であることを特徴とするガスバリアフイルムロールで
ある。また上記ガスバリアフィルムロールの無機酸化物
からなるガスバリア性薄膜層が少なくともアルミ金属酸
化物と珪素酸化物とを含む複合酸化物であることを特徴
とするガスバリアフィルムロールであり、該基材フィル
ムが二軸延伸ポリアミドフィルムまたは二軸延伸ポリエ
ステルフィルムであることを特徴とするガスバリアフィ
ルムロールであり、さらには該基材フィルムとガスバリ
ア性薄膜層との間に蒸着アンカー層を有することを特徴
とするガスバリアフィルムロールである。また、本発明
は上記ガスバリアフィルムロームにおいてガスバリア性
薄膜層上に、必要に応じて印刷層を設けたのち、アンカ
ーコート剤層または接着剤層を介してヒートシール性樹
脂層を積層したことを特徴とする積層体であり、さらに
はこの積層体を用い、ヒートシール性樹脂層を熱融着さ
せて製袋させたことを特徴とする包装袋である。That is, the present invention is a gas barrier film roll obtained by vapor-depositing a gas barrier thin film layer made of an inorganic oxide on at least one side of a substrate film by a winding-type vacuum vapor deposition method. The gas barrier film roll is taken out from a vacuum vapor deposition apparatus. In an environment where the absolute humidity is 0.008 to 0.018 kg / kg, the vapor deposition surface is rewound at least once in contact with the air in the environment, and then rolled and stored in a constant temperature environment of 30 to 60 ° C for a certain period or longer. The gas barrier film roll is characterized in that the color difference b value in a state where four films cut out from the roll after storage are stacked is within ± 3.0 in the width direction and the length direction of the roll. Further, the gas barrier film roll is characterized in that the gas barrier thin film layer made of an inorganic oxide of the gas barrier film roll is a composite oxide containing at least an aluminum metal oxide and a silicon oxide, and the base film has two layers. A gas barrier film roll characterized by being an axially stretched polyamide film or a biaxially stretched polyester film, further comprising a vapor deposition anchor layer between the substrate film and the gas barrier thin film layer. It is a roll. Further, the present invention is characterized in that, in the above gas barrier film loam, a printing layer is provided on the gas barrier thin film layer if necessary, and then a heat sealable resin layer is laminated via an anchor coat agent layer or an adhesive layer. And a heat-sealable resin layer which is heat-sealed to form a bag.
【0009】本発明でいう基材フイルムとは、有機高分
子を溶融押出し、必要に応じ長手方向および、または幅
方向に延伸、冷却、熱固定を施したフイルム、あるいは
溶液流延法により製膜したフィルムを巻き取ったものな
どである。有機高分子としては、ポリエチレン、ポリプ
ロピレン、ポリエチレンテレフタレート、ポリエチレン
−2,6−ナフタレート、ナイロン6、ナイロン4、ナ
イロン66、ナイロン12、ポリ塩化ビニール、ポリ塩
化ビニリデン、ポリビニールアルコール、全芳香族ポリ
アミド、ポリアミドイミド、ポリイミド、ポリエーテル
イミド、ポリスルフォン、ポリフェニレンスルフィド、
ポリフェニレンオキサイド、ポリカーボネート、ポリア
リレートなどがあげられる。また、これらの(有機重合
体)有機高分子は他の有機重合体と共重合をしたりブレ
ンドしたりしてもよい。蒸着基材フィルムとして蒸着適
性、ならびにガスバリアフィルムからなる包装袋として
の適性とのバランスから、特に二軸延伸ポリアミドフィ
ルムまたは二軸延伸ポリエステルフィルムが好ましく用
いられる。The base film referred to in the present invention is a film obtained by melt-extruding an organic polymer and, if necessary, stretching, cooling and heat-setting in the longitudinal direction and / or the width direction, or by a solution casting method. For example, the film is wound up. As the organic polymer, polyethylene, polypropylene, polyethylene terephthalate, polyethylene-2,6-naphthalate, nylon 6, nylon 4, nylon 66, nylon 12, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, wholly aromatic polyamide, Polyamideimide, polyimide, polyetherimide, polysulfone, polyphenylene sulfide,
Examples thereof include polyphenylene oxide, polycarbonate and polyarylate. These (organic polymer) organic polymers may be copolymerized or blended with other organic polymers. A biaxially stretched polyamide film or a biaxially stretched polyester film is particularly preferably used from the viewpoint of a balance between suitability for vapor deposition as a vapor deposition base film and suitability as a packaging bag made of a gas barrier film.
【0010】さらにこの有機高分子には、公知の添加
剤、例えば、紫外線吸収剤、帯電防止剤、可塑剤、滑
剤、着色剤などが添加されていてもよく、その透明度は
特に限定するものではないが、透明ガスバリアフィルム
として使用する場合には、50%以上の透過率をもつも
のが好ましい。本発明の基材フィルムは、本発明の目的
を損なわない限りにおいて、無機酸化物薄膜層を蒸着す
るのに先行して、該フイルムをコロナ放電処理、グロー
放電処理、その他の表面粗面化処理を施してもよい。ま
た、本発明の基材フィルムは、その厚さとして5〜50
0μmの範囲が好ましく、さらに好ましくは8〜100
μmの範囲である。Further, known additives such as an ultraviolet absorber, an antistatic agent, a plasticizer, a lubricant and a coloring agent may be added to the organic polymer, and its transparency is not particularly limited. However, when used as a transparent gas barrier film, those having a transmittance of 50% or more are preferable. The substrate film of the present invention, as long as the object of the present invention is not impaired, prior to depositing the inorganic oxide thin film layer, the film is subjected to corona discharge treatment, glow discharge treatment, and other surface roughening treatment. May be given. The base film of the present invention has a thickness of 5 to 50.
The range is preferably 0 μm, more preferably 8 to 100.
It is in the range of μm.
【0011】本発明でいう蒸着アンカー層とは、基材フ
ィルムとガスバリア性薄膜層との密着力が向上し、各種
後加工後のガスバリア性が維持されるものであれば特に
限定されないが、例えば、ポリエステル樹脂、油変性ア
ルキド樹脂、ウレタンアルキド樹脂、メラミンアルキド
樹脂、エポキシ硬化アクリル樹脂、エポキシ系樹脂(ア
ミン、カルボキシル基末端ポリエステル、フェノール、
イソシアネートによる硬化)、イソシアネート系樹脂
(アミン、尿素、カルボン酸による硬化)、ウレタン−
ポリエステル樹脂、ポリウレタン樹脂、フェノール樹
脂、ポリエステル樹脂、ポリアミド樹脂、反応性アクリ
ル樹脂、塩化ビニル系樹脂等を用いることができる。更
に、これらを水可溶化、水分散化させた樹脂を用いるこ
ともできる。上記材料のなかでも基材フィルムとガスバ
リア性薄膜層との密着力およびガスバリア性が、各種後
加工後も維持される点で、ポリエステル樹脂、または不
飽和ポリエステル樹脂とアクリル系モノマーとのグラフ
ト共重合体が好ましい。The vapor deposition anchor layer referred to in the present invention is not particularly limited as long as the adhesion between the substrate film and the gas barrier thin film layer is improved and the gas barrier property after various post-processing is maintained. , Polyester resin, oil-modified alkyd resin, urethane alkyd resin, melamine alkyd resin, epoxy cured acrylic resin, epoxy resin (amine, carboxyl group terminated polyester, phenol,
(Curing with isocyanate), isocyanate resin (curing with amine, urea, carboxylic acid), urethane-
Polyester resin, polyurethane resin, phenol resin, polyester resin, polyamide resin, reactive acrylic resin, vinyl chloride resin, etc. can be used. Further, a resin obtained by solubilizing or water-dispersing these may be used. Among the above materials, the adhesiveness and gas barrier property between the base film and the gas barrier thin film layer are maintained after various post-processing, and thus the graft copolymerization of the polyester resin or the unsaturated polyester resin and the acrylic monomer is carried out. Coalescence is preferred.
【0012】本発明でいう基材フィルムとガスバリア性
薄膜層との間に蒸着アンカー層を設ける方法としては、
基材フィルム製造時に塗布するインライン方式、フィル
ムの製造とは別工程で塗布するオフライン方式のいずれ
も用いることができる。また、塗布には公知の塗工方法
を用いることができ、たとえば、ロールコート法、リバ
ースコート法、ロールブラッシュ法、スプレーコート
法、エアーナイフコート法、グラビアコート法、含浸
法、カーテンコート法等を用いることができる。生産性
の観点から、基材フィルム製造時にインライン方式で蒸
着アンカー層を設けることが好ましいが、具体的には未
延伸あるいは一軸延伸後の基材フィルム上にグラフト共
重合体含有溶液などを塗布・乾燥した後、必要に応じて
さらに一軸延伸あるいは二軸延伸を行い、さらに熱固定
してもよい。基材フィルム上にグラフト共重合体含有溶
液などを塗布・乾燥する場合、乾燥温度は150℃以
上、特に200℃以上が好ましく、これにより接着性樹
脂層とポリアミド系フィルムとの密着性が向上する。蒸
着アンカー層の厚みは、好ましくは0.01〜1μm、
より好ましくは0.02〜0.5μmである。厚みが薄
すぎると蒸着アンカー層と基材フィルムとの密着性が十
分とならないことがあり、逆に厚すぎるとブロッキング
が発生することがあり好ましくない。The method of providing the vapor deposition anchor layer between the base film and the gas barrier thin film layer in the present invention includes:
Both an in-line method of applying the base material film at the time of manufacturing and an off-line method of applying at a step different from the film manufacturing can be used. Further, known coating methods can be used for coating, for example, roll coating method, reverse coating method, roll brush method, spray coating method, air knife coating method, gravure coating method, impregnation method, curtain coating method and the like. Can be used. From the viewpoint of productivity, it is preferable to provide the vapor deposition anchor layer by an in-line method at the time of manufacturing the base film, but specifically, a graft copolymer-containing solution or the like is applied onto the base film after unstretching or uniaxial stretching. After drying, if necessary, uniaxial stretching or biaxial stretching may be further performed, and further heat setting may be performed. When a graft copolymer-containing solution or the like is applied and dried on the substrate film, the drying temperature is preferably 150 ° C or higher, particularly preferably 200 ° C or higher, which improves the adhesion between the adhesive resin layer and the polyamide-based film. . The thickness of the vapor deposition anchor layer is preferably 0.01 to 1 μm,
More preferably, it is 0.02 to 0.5 μm. If the thickness is too thin, the adhesion between the vapor deposition anchor layer and the substrate film may not be sufficient, and if it is too thick, blocking may occur, which is not preferable.
【0013】本発明でいう巻き取り式真空蒸着法とは、
真空排気設備を備えた真空チャンバー内に冷却機能をも
つコーティングドラムならびにフィルムロールの巻出し
および巻取り機構などの走行系と、坩堝に入った蒸着材
料を加熱蒸発させる蒸発源を有する真空蒸着機によって
基材フィルムロールの少なくとも片面の長手方向に連続
的に無機酸化物からなるガスバリア性薄膜層を積層する
方法であり、必要に応じて開閉シャッター、プラズマ前
処理機、除電設備、シワ取りロール、真空ゲージ、ガス
導入ポート、膜厚モニターなどを備えてもよい。The roll-up type vacuum vapor deposition method referred to in the present invention is
A vacuum deposition machine that has a coating drum with a cooling function in a vacuum chamber equipped with a vacuum exhaust facility, a running system such as a film roll unwinding and winding mechanism, and an evaporation source that heats and evaporates the evaporation material in the crucible. It is a method of continuously laminating a gas barrier thin film layer made of an inorganic oxide in the longitudinal direction of at least one surface of a base film roll, and if necessary, an opening / closing shutter, a plasma pretreatment machine, a static eliminator, a wrinkle removing roll, and a vacuum. A gauge, a gas introduction port, a film thickness monitor, etc. may be provided.
【0014】無機酸化物からなるガスバリア性薄膜の原
料となる金属あるいは金属酸化物などの蒸着材料はカー
ボンや高融点金属製の坩堝に入れられ、抵抗加熱、誘導
加熱あるいは電子銃により間接的あるいは直接的に加熱
蒸発され、その蒸気中を冷却されたコーティングドラム
に密着した基材フィルムが通過することによりフィルム
上にガスバリア性の薄膜が蒸着される。抵抗加熱や誘導
加熱では坩堝を加熱するため、坩堝を構成する材料の蒸
着膜への混入が懸念されるが、電子銃加熱では、蒸着材
料が直接加熱されるため薄膜の不純物が少ないという利
点がある。また、一般的に金属酸化物の融点は、金属よ
りもかなり高温であるが電子銃加熱では坩堝の耐熱性と
いう制約が無いため金属酸化物を蒸着材料とする場合こ
のましく用いられる。また蒸着速度の観点からも電子銃
による材料加熱がこのましい。A vapor deposition material such as a metal or a metal oxide, which is a raw material of a gas barrier thin film made of an inorganic oxide, is put into a crucible made of carbon or a refractory metal, and indirectly or directly by resistance heating, induction heating or an electron gun. The film having a gas barrier property is vapor-deposited on the film by passing through the vaporized base material film which has been adhered to the cooled coating drum. Since resistance heating or induction heating heats the crucible, there is concern that the material forming the crucible may be mixed into the vapor deposition film.However, electron gun heating has the advantage that the vapor deposition material is heated directly and the impurities in the thin film are small. is there. In general, the melting point of metal oxides is considerably higher than that of metals, but there is no restriction on the heat resistance of the crucible in heating with an electron gun, so metal oxides are preferably used as vapor deposition materials. From the viewpoint of the vapor deposition rate, it is preferable to heat the material with an electron gun.
【0015】本発明でいう無機酸化物からなるガスバリ
ア性薄膜の原料となる金属あるいは金属酸化物などの蒸
着材料としては、マグネシウム、カルシウム、アルミニ
ウム、チタン、ケイ素、ゲルマニウム、ジルコニウム、
亜鉛、チタン、クロム、インジウム、錫などの金属およ
びその金属酸化物、またはこれらの複合物を言う。ここ
でいう金属酸化物とは、酸化が完全でなく酸素を若干欠
損したもの、例えばSiOx(x=1.0〜1.9)と
いった表現をする無機酸化物も含む。ガスバリア性の観
点から酸化ケイ素または酸化アルミニウムが好ましく、
さらに耐屈曲性の観点から酸化ケイ素と酸化アルミニウ
ムの複合酸化物が特に好ましい。The vapor deposition material such as metal or metal oxide, which is a raw material of the gas barrier thin film made of an inorganic oxide in the present invention, includes magnesium, calcium, aluminum, titanium, silicon, germanium, zirconium,
Metals such as zinc, titanium, chromium, indium and tin, and metal oxides thereof, or composites thereof. The term “metal oxide” as used herein also includes an oxide that is not completely oxidized and is slightly depleted of oxygen, for example, an inorganic oxide that is expressed as SiOx (x = 1.0 to 1.9). From the viewpoint of gas barrier properties, silicon oxide or aluminum oxide is preferable,
Further, a composite oxide of silicon oxide and aluminum oxide is particularly preferable from the viewpoint of bending resistance.
【0016】本発明でいう無機酸化物からなるガスバリ
ア性薄膜の膜厚は5〜50nmが好ましく、透明性とガスバ
リア性と耐屈曲性のバランスから、より好ましくは10〜
30nmである。膜厚が5nmより薄いと実用的なガスバリ
ア性が得られにくく、逆に膜厚が50nm以上では、ガスバ
リア性薄膜の内部応力による薄膜内部のクラックや基材
からの剥がれなどが発生しやすいため、膜厚相当のガス
バリア性の向上効果が得られず、かえって耐屈曲性や製
造コストの点で不利となる。上記の膜厚は、蛍光X線分
析により薄膜を構成する無機酸化物の金属元素の定量分
析により測定される。真空蒸着機内のコーティングドラ
ムから巻き取り部のパスライン中のロール上で蛍光X線
モニターを取り付け蒸着中にオンラインでモニタリング
し、その結果にもとづき電子銃の出力を微調整しながら
無機酸化物薄膜の膜厚を制御することができる。The film thickness of the gas barrier thin film made of an inorganic oxide according to the present invention is preferably 5 to 50 nm, more preferably 10 to 10 in terms of the balance of transparency, gas barrier property and bending resistance.
30 nm. When the film thickness is thinner than 5 nm, it is difficult to obtain practical gas barrier properties, and conversely, when the film thickness is 50 nm or more, cracks inside the thin film due to internal stress of the gas barrier thin film and peeling from the base material are likely to occur. The effect of improving the gas barrier property equivalent to the film thickness cannot be obtained, which is rather disadvantageous in terms of bending resistance and manufacturing cost. The above-mentioned film thickness is measured by a quantitative analysis of a metal element of an inorganic oxide forming a thin film by fluorescent X-ray analysis. A fluorescent X-ray monitor was installed on the roll in the pass line of the winding part from the coating drum in the vacuum vapor deposition machine to monitor online during vapor deposition, and based on the result, the output of the electron gun was finely adjusted and The film thickness can be controlled.
【0017】本発明でいうフィルムロールの巻き返しと
は、真空蒸着機中の減圧下で巻き取られたフィルムロー
ルをフィルムスリッターなどの設備を使い、無機酸化物
からなるガスバリア薄膜表面を、少なくとも酸素と水蒸
気の存在する空気中にさらし、さらに巻き取ることで、
蒸着フィルムロールのフィルムとフィルムの層間に酸素
と水蒸気を含む空気層を存在せしめる操作のことを指
す。フィルムロール全体に対する空気の体積比は1〜5
%程度とすることが好ましい。The rewinding of the film roll as referred to in the present invention means that the film roll wound under reduced pressure in a vacuum vapor deposition machine is equipped with equipment such as a film slitter, and the gas barrier thin film surface made of an inorganic oxide contains at least oxygen. By exposing it to the air in which water vapor exists and winding it up,
It refers to the operation of allowing an air layer containing oxygen and water vapor to exist between the layers of the vapor-deposited film roll. The volume ratio of air to the whole film roll is 1 to 5
% Is preferable.
【0018】このとき、無機酸化物からなるガスバリア
薄膜表面が少なくとも0.1秒間以上空気に触れること
が好ましい。仮に巻き返しのライン走行速度600m/
minとすると、0.1秒間にフィルムが1m走行する
ので、巻き出しから巻き取りまでのパスラインは少なく
とも1m以上必要である。このときフィルムロールの巻
き巾を変更したり、ロール端面を揃えるためのスリット
操作は必要に応じてされるもので必ずしも必要というわ
けではない。At this time, it is preferable that the surface of the gas barrier thin film made of an inorganic oxide is exposed to air for at least 0.1 seconds. Temporarily rewind line running speed 600m /
When the length is min, the film runs 1 m in 0.1 seconds, so the pass line from unwinding to winding must be at least 1 m or more. At this time, the slitting operation for changing the winding width of the film roll or for aligning the roll end faces is performed as necessary and is not always necessary.
【0019】本発明でいう絶対湿度とは、ある温度の空
気1kg中に含まれる水蒸気の絶対量であり、単位はkg
(水蒸気)/kg(空気)で表される。相対湿度とは、い
わゆる「空気線図」で表わされる、ある温度において含
むことのできる水蒸気限界量に対して何%の水蒸気量が
含まれるかを示している。例えば1気圧(1013hPa)、23℃
の空気では、限界(飽和)水蒸気量が0.0177kg/kgであ
り、相対湿度100%RHでは絶対湿度が0.0178Kg/kgであ
り、相対湿度50%RHでは絶対湿度0.0087kg/kgとなる。The absolute humidity referred to in the present invention is the absolute amount of water vapor contained in 1 kg of air at a certain temperature, and the unit is kg.
It is expressed as (water vapor) / kg (air). Relative humidity indicates what percentage of the amount of water vapor is contained with respect to the water vapor limit amount that can be contained at a certain temperature, which is represented by a so-called “air diagram”. For example, 1 atm (1013 hPa), 23 ℃
, The limit (saturation) water vapor amount is 0.0177 kg / kg, the absolute humidity is 0.0178 kg / kg at a relative humidity of 100% RH, and the absolute humidity is 0.0087 kg / kg at a relative humidity of 50% RH.
【0020】以下に実用的な温度域における相対湿度と
絶対湿度の関係例をあげる。
18℃ 相対湿度65%RH=絶対湿度0.0083kg/kg
20℃ 相対湿度55%RH=絶対湿度0.0080kg/kg
25℃ 相対湿度45%RH=絶対湿度0.0089kg/kg
25℃ 相対湿度85%RH=絶対湿度0.0170kg/kg
28℃ 相対湿度35%RH=絶対湿度0.0082kg/kg
28℃ 相対湿度70%RH=絶対湿度0.0169kg/kg
30℃ 相対湿度65%RH=絶対湿度0.0174kg/kg
32℃ 相対湿度60%RH=絶対湿度0.0180kg/kgAn example of the relationship between relative humidity and absolute humidity in a practical temperature range will be given below. 18 ℃ Relative humidity 65% RH = Absolute humidity 0.0083kg / kg 20 ℃ Relative humidity 55% RH = Absolute humidity 0.0080kg / kg 25 ℃ Relative humidity 45% RH = Absolute humidity 0.0089kg / kg 25 ℃ Relative humidity 85% RH = Absolute humidity 0.0170kg / kg 28 ℃ Relative humidity 35% RH = Absolute humidity 0.0082kg / kg 28 ℃ Relative humidity 70% RH = Absolute humidity 0.0169kg / kg 30 ℃ Relative humidity 65% RH = Absolute humidity 0.0174kg / kg 32 ℃ Relative humidity 60% RH = Absolute humidity 0.0180kg / kg
【0021】蒸着されたフィルムロールを巻き返す湿度
環境として、絶対湿度が0.008Kg/kg以上があることが好
ましく、作業環境の観点から0.008〜0.015kg/kgがより
好ましい。絶対湿度が0.008kg/Kg以下では巻き返し時に
フィルムロールのフィルムとフィルムの層間に取り込ま
れる水蒸気量が不足する。つまり、その後の30℃以上の
恒温環境下での保管工程で、無機酸化物からなるガスバ
リア薄膜が緻密化しガスバリア性が向上するのに必要な
水分量が不足する。また、巻返し時の剥離帯電による静
電気による放電も絶対湿度が大きいほど起こりにくい。
しかしながら、基材フィルムがポリアミド樹脂など吸湿
性の樹脂からなる場合は、絶対湿度が高いと、具体的に
は絶対湿度が0.02kg/kg程度以上になると、吸湿膨張に
よるシワ、滑りにくくなることによるロール巻シワなど
が発生しやすくなり、ガスバリア薄膜層へのダメージが
懸念される。The humidity environment in which the vapor-deposited film roll is rewound is preferably 0.008 kg / kg or more in absolute humidity, and more preferably 0.008 to 0.015 kg / kg from the viewpoint of working environment. When the absolute humidity is 0.008 kg / Kg or less, the amount of water vapor taken in between the film of the film roll and the film layer during rewinding becomes insufficient. That is, in the subsequent storage step under a constant temperature environment of 30 ° C. or more, the gas barrier thin film made of an inorganic oxide becomes dense and the amount of water required for improving the gas barrier property is insufficient. In addition, discharge due to static electricity due to peeling charging during rewinding is less likely to occur as the absolute humidity increases.
However, when the base film is made of a hygroscopic resin such as a polyamide resin, when the absolute humidity is high, specifically, when the absolute humidity is about 0.02 kg / kg or more, wrinkles due to hygroscopic expansion, it becomes difficult to slip. Roll wrinkles are likely to occur, which may cause damage to the gas barrier thin film layer.
【0022】本発明の蒸着フィルムロールは、それ自身
ガスバリア性のフィルムのため、真空蒸着機中の減圧下
で巻き取られたフィルムロールの状態、あるいは巻き返
し操作後の巻き取られたフィルムロールの状態では、外
部からその内部に侵入しうる酸素や水蒸気の量は極めて
少なく、本発明のように絶対湿度0.008kg/kg以上の空気
中での巻き返し操作無くしてはガスバリア性の向上はあ
まり期待できない。Since the vapor-deposited film roll of the present invention is a gas barrier film itself, the state of the film roll wound under reduced pressure in a vacuum vapor deposition machine or the state of the film roll wound after rewinding operation. However, the amount of oxygen and water vapor that can penetrate into the inside from the outside is extremely small, and improvement of the gas barrier property cannot be expected so much without the rewinding operation in the air having an absolute humidity of 0.008 kg / kg or more as in the present invention.
【0023】本発明でいう30〜60℃の恒温環境とは、た
とえば恒温槽内や温調設備を有した保管庫内のことを指
し、設定した温度に対して少なくとも±5℃以内では管
理できる能力を有していればよい。保管期間中の平均温
度が30℃未満であると、無機酸化物からなるガスバリア
薄膜の緻密化がほとんど進行せず、逆に60℃以上では基
材フィルムの添加剤のブリードや、基材フィルム自身の
軟化のため、各種物性が劣化したり、フィルム同士がブ
ロッキングしたりするという問題がある。湿度に関して
は恒温槽内や温調設備を有した保管庫内の調湿能力が備
わっているほうが好ましいが、必ずしも必要ではないが
結露が発生しないような構造であり、およそ30〜70%RH
程度に保たれるのであればより好ましい。The constant temperature environment of 30 to 60 ° C. in the present invention means, for example, in a constant temperature tank or a storage room having a temperature adjusting facility, and can be controlled at least within ± 5 ° C. with respect to the set temperature. All you need is the ability. If the average temperature during the storage period is less than 30 ° C, the densification of the gas barrier thin film made of inorganic oxide hardly progresses, and conversely, at 60 ° C or higher, the bleeding of the additive of the base film and the base film itself. Due to the softening, various physical properties are deteriorated and the films are blocked. Regarding humidity, it is preferable to have a humidity control capability in a thermostatic chamber or a storage room that has temperature control equipment, but it is not necessarily required, but it is a structure that does not cause dew condensation, about 30 to 70% RH
It is more preferable if it is maintained at a certain level.
【0024】上記のような恒温環境下で保管する一定期
間としては、7日間以上が好ましく、より好ましくは1
4日以上である。7日未満であると、無機酸化物からな
るガスバリア薄膜の緻密化がそれほど進行せず、逆にあ
まり長期間保管しても、徐々にガスバリア性や透明性の
向上のペースは低下していくため、実用上は、必要とさ
れる特性と在庫管理コスト等のバランスで保管温度と保
管期間は決められる。また、保管温度と保管期間はある
程度トレードオフの関係があること見出されており、そ
の他の物性を損ねない範囲において、必要に応じ保管温
度を上げて、目標とするガスバリア性と透明性が得られ
るまで期間を短縮することは可能である。逆に温度をあ
げると他の物性面に影響がでる懸念のある場合は、保管
温度を30℃程度にして目標とするガスバリア性と透明性
が得られるまで期間を延長してもよい。The fixed period of storage in the above-mentioned constant temperature environment is preferably 7 days or longer, more preferably 1 day.
4 days or more. If it is less than 7 days, the densification of the gas barrier thin film made of an inorganic oxide does not proceed so much, and conversely, even if it is stored for a long time, the pace of improvement of the gas barrier property and the transparency gradually decreases. In practice, the storage temperature and storage period are determined by the balance between the required characteristics and inventory management costs. In addition, it has been found that there is a trade-off relationship between storage temperature and storage period to some extent, and within the range that does not impair other physical properties, the storage temperature can be raised as necessary to obtain the target gas barrier properties and transparency. It is possible to shorten the period until it is given. On the contrary, if there is a concern that other physical properties will be affected by raising the temperature, the storage temperature may be set to about 30 ° C. and the period may be extended until the target gas barrier properties and transparency are obtained.
【0025】本発明でいうヒートシール性樹脂層とは、
ポリエチレン、ポリプロピレンなどの熱融着可能な樹脂
層であり、その積層方法としては、あらかじめフィルム
状に成型されたものをドライラミネーション法等により
積層したり、あるいは溶融させた状態で押し出しラミネ
ーション法等により積層させても良い。またこのヒート
シール性樹脂層とのラミネートに先立ち、蒸着面に各種
印刷を施してもよい。印刷方法は、本発明の目的を逸脱
しない範囲において、グラビア印刷、フレキソ印刷、オ
フセット印刷など各種公知の印刷法を用いることができ
る。この際、インキ濡れ性向上や蒸着面の保護目的のた
め印刷層の第一色目として、メジウムコートやプライマ
ーコートなどを行ってもよい。The heat-sealable resin layer referred to in the present invention is
It is a heat-fusible resin layer such as polyethylene or polypropylene, and as a lamination method thereof, a film formed in advance is laminated by a dry lamination method or the like, or is extruded in a molten state by a lamination method or the like. You may make it laminate. Further, various printing may be performed on the vapor deposition surface prior to the lamination with the heat-sealable resin layer. As the printing method, various known printing methods such as gravure printing, flexographic printing and offset printing can be used without departing from the object of the present invention. At this time, for the purpose of improving the wettability of the ink and protecting the vapor deposition surface, a medium coat or a primer coat may be applied as the first color of the print layer.
【0026】本発明でいう包装袋とは、上記熱融着可能
なヒートシール樹脂層をラミネートした積層体を、公知
の製袋機により、ヒートシール面同士を熱融着して袋状
に加工したものであり、製袋と同時または製袋後に内容
物が充填され使用される。飲食品、医薬品、化粧品、電
子機器などの包装においては、内容物の腐敗や機能劣化
などの観点から安定したガスバリア性が求められてい
る。The packaging bag referred to in the present invention is a laminate obtained by laminating the above heat-sealable heat-sealing resin layer, and heat-sealing the heat-sealing surfaces thereof by a well-known bag-making machine to form a bag. The contents are filled and used at the same time as or after bag making. In the packaging of foods and drinks, pharmaceuticals, cosmetics, electronic devices, etc., a stable gas barrier property is required from the viewpoint of deterioration of the contents and functional deterioration.
【0027】[0027]
【実施例】以下に実施例をあげて本発明を説明するが、
本発明は特に以下の実施例に限定されるものではない。
(測定方法)The present invention will be described below with reference to examples.
The present invention is not particularly limited to the following examples. (Measuring method)
【0028】本発明でいう色差b値とは、JIS K8722法
に準じ測色色差計(日本電色株式会社製ZE2000)を用い
ハンターLab表色系で測定した場合のb値を表す。一般
的にb値の値が大きいほど黄色みがきつくなる。測定時
の標準合わせには、付属の標準白板(三刺激値 Y=9
4.09、X=92.19、Z=110.78)を用いた。本発明で
は、フィルムロールから4枚重なった状態でロール内の
所定位置よりサンプリングを行い、そのまま4枚重ねに
した状態で光源側に基材フィルム面(反蒸着面)を向け
透過法で測定したときのb値を用いた。The color difference b value in the present invention means the b value when measured by the Hunter Lab color system using a colorimetric color difference meter (ZE2000 manufactured by Nippon Denshoku Co., Ltd.) according to the JIS K8722 method. In general, the larger the b value, the tighter the yellow tint. The standard whiteboard (tristimulus value Y = 9
4.09, X = 92.19, Z = 110.78) were used. In the present invention, sampling was performed from a predetermined position in the roll in a state where four sheets were overlapped from the film roll, and the substrate film surface (anti-deposition surface) was directed to the light source side in the state where four sheets were stacked as it was and measured by a transmission method. The b value at that time was used.
【0029】本発明でいう酸素透過度は、JIS K7126B
法に準じ酸素透過度測定装置(米MOCON社製 OXTRAN-2/
20)を用い、温度23℃、湿度65%RHの測定条件で測定し
た。また水蒸気透過度はJIS K7129B法に準じ水蒸気
透過度測定装置(米MOCON社製PERMATRAN-W3/31)を用い
温度40℃、湿度90%RHの測定条件で測定した。ただし、
基材フィルムに二軸延伸ポリアミドフィルムを使用し、
かつヒートシール性樹脂層を積層していないものだけに
ついては、温度23℃、湿度65%RHで測定した。The oxygen permeability referred to in the present invention is JIS K7126B.
Oxygen permeability measurement device (OXCON-2 /
20) was used and the temperature was 23 ° C. and the humidity was 65% RH. The water vapor permeability was measured using a water vapor permeability measuring device (PERMATRAN-W3 / 31 manufactured by US MOCON Co., Ltd.) according to JIS K7129B method under the conditions of a temperature of 40 ° C. and a humidity of 90% RH. However,
Using a biaxially stretched polyamide film as the base film,
In addition, only those having no heat-sealable resin layer laminated were measured at a temperature of 23 ° C. and a humidity of 65% RH.
【0030】(実施例1)巻き取り式真空蒸着機内のロー
ルフィルム巻き出し側に厚さ12μm全巾2000mmの2軸延伸
ポリエステルフィルムロール(東洋紡績株式会社製 商
品名E5100)を取り付け、冷却ドラムに巻きつけ、巻き
取り側まで通紙したのちチャンバー蓋を閉じ、10-4Pa台
まで減圧した。冷却ドラム直下のカーボン製坩堝に入っ
た酸化アルミニウムおよび酸化ケイ素を電子銃により電
子ビームを走査し加熱蒸発させた。坩堝付近の圧力が安
定したら、フィルムの走行速度を150m/minに加速しシャ
ッターを開いた。酸化アルミニウムと酸化ケイ素からな
る2元系無機酸化物膜をポリエステルフィルム上でイン
ラインの蛍光X線モニターで膜厚を測定し、平均膜厚が2
0nm、Al元素:Si元素の重量比率が1:1になるよう電
子銃出力を微調整しながら蒸着をおこなった。走行速度
150m/minで5000m巻き取ったのちシャッターを閉じ、電
子銃の出力を止め、フィルムの走行を停止した。真空蒸
着機内を大気圧にもどし、蒸着されたフィルムロールを
とりだし、スリッター設備の巻き出し側に取り付け、巻
き取り側に通紙した。フィルム巻き出し点からフィルム
巻取り点までのフィルムパスラインは約2mであり、フ
ィルムはいくつかのロールと接触する箇所以外は空気と
接触している。室温25度、相対湿度60%RH(絶対湿度約
0.012kg/kg)の恒温恒温環境下でフィルムをスリットし
ながらスリッター巻取り側に到達ライン走行速度200m/m
in巻き取った。このスリットされた蒸着フィルムロール
を30℃の恒温槽に7日間保管しガスバリアフィルムロー
ルを調製した。(Example 1) A biaxially stretched polyester film roll (product name E5100 manufactured by Toyobo Co., Ltd.) having a thickness of 12 μm and a total width of 2000 mm was attached to the unwinding side of the roll film in a take-up type vacuum vapor deposition machine and attached to a cooling drum After winding and passing the paper to the winding side, the chamber lid was closed and the pressure was reduced to the level of 10 −4 Pa. Aluminum oxide and silicon oxide contained in a carbon crucible directly below the cooling drum were heated and evaporated by scanning an electron beam with an electron gun. When the pressure near the crucible became stable, the film running speed was accelerated to 150 m / min and the shutter was opened. A binary inorganic oxide film consisting of aluminum oxide and silicon oxide was measured on a polyester film with an in-line fluorescent X-ray monitor to obtain an average film thickness of 2
Vapor deposition was performed while finely adjusting the electron gun output so that the weight ratio of Al element: Si element was 1: 1 at 0 nm. Traveling speed
After winding 5000 m at 150 m / min, the shutter was closed, the output of the electron gun was stopped, and the film running was stopped. The inside of the vacuum vapor deposition machine was returned to atmospheric pressure, the vapor-deposited film roll was taken out, attached to the unwinding side of the slitter equipment, and passed through the winding side. The film path line from the film unwinding point to the film winding point is about 2 m, and the film is in contact with air except where it contacts several rolls. Room temperature 25 degrees, relative humidity 60% RH (absolute humidity approx.
0.012kg / kg) reaching the slitter winding side while slitting the film in a constant temperature and constant temperature environment Line traveling speed 200m / m
in rolled up. This slit vapor deposition film roll was stored in a constant temperature bath at 30 ° C. for 7 days to prepare a gas barrier film roll.
【0031】(実施例2)スリットされた蒸着フィルム
ロールを40℃の恒温槽に7日間保管したこと以外は、実
施例1と同様にガスバリアフィルムロールを調製した。Example 2 A gas barrier film roll was prepared in the same manner as in Example 1 except that the slit vapor deposition film roll was stored in a constant temperature bath at 40 ° C. for 7 days.
【0032】(実施例3)スリットされた蒸着フィルム
ロールを30℃の恒温槽に14日間保管したこと以外は、実
施例1と同様にガスバリアフィルムロールを調製した。(Example 3) A gas barrier film roll was prepared in the same manner as in Example 1 except that the slit vapor deposition film roll was stored in a constant temperature bath at 30 ° C for 14 days.
【0033】(実施例4)基材フィルムロールとして、
含アクリル酸ポリエステル樹脂の水分散体を蒸着アンカ
ー層として製膜時にインラインコートした厚さ15μmの
全巾2000mm2軸延伸ポリアミドフィルムロールを使用し
た以外は実施例1と同様にガスバリアフィルムロールを
調製した。(Example 4) As a base film roll,
A gas barrier film roll was prepared in the same manner as in Example 1 except that an aqueous dispersion of an acrylic acid-containing polyester resin was used as a vapor deposition anchor layer for in-line coating at the time of film formation, and a biaxially stretched polyamide film roll having a total width of 2000 mm and a thickness of 15 μm was used.
【0034】(実施例5)実施例1の30℃の恒温槽に7
日間保管した後のガスバリアフィルムロールに、ドライ
ラミネーション法により蒸着面側にポリエチレンフィル
ム(東洋紡績株式会社製 L6102 40μm)をラミネー
トし積層体を得た。接着剤と硬化剤は東洋モートン株式
会社製 TM590およびCAT56を使用し、接着剤の硬化促進
のため40℃で2日間保管した。(Embodiment 5) A thermostatic bath at 30 ° C. of Embodiment 1 is used.
A polyethylene film (L6102 40 μm manufactured by Toyobo Co., Ltd.) was laminated on the vapor deposition surface side by a dry lamination method on a gas barrier film roll after storage for a day to obtain a laminate. As the adhesive and the curing agent, TM590 and CAT56 manufactured by Toyo Morton Co., Ltd. were used and stored at 40 ° C. for 2 days to accelerate the curing of the adhesive.
【0035】(実施例6)実施例1の30℃の恒温槽に7日
間保管した後のガスバリアフィルムロールに、グラビア
印刷法により蒸着面に印刷部と無地部を含む図柄で印刷
を行った。使用インキは東洋インキ株式会社製ニューLP
スーパー白を用いた。その後実施例5と同様の方法によ
り印刷面にポリエチレンフィルムをドライラミネートし
た積層体を調整した。Example 6 A gas barrier film roll, which had been stored for 7 days in a constant temperature bath at 30 ° C. of Example 1, was printed by a gravure printing method with a pattern including a printed portion and a plain portion on the vapor deposition surface. Ink used is New LP manufactured by Toyo Ink Co., Ltd.
Super white was used. Then, a laminate in which a polyethylene film was dry laminated on the printed surface was prepared in the same manner as in Example 5.
【0036】(実施例7)実施例1の30℃の恒温槽に7日
間保管した後のガスバリアフィルムロールに、アンカー
コート剤として東洋モートン製EL530AおよびEL530Bを使
用し、押出しラミネーション法により蒸着面側にポリエ
チレン樹脂層(住友化学株式会社製 スミカセンL705
を)20μmの厚さでラミネートした積層体を調整した。EXAMPLE 7 Toyo Morton EL530A and EL530B were used as anchor coating agents for the gas barrier film roll after being stored in the constant temperature bath of 30 ° C. of Example 1 for 7 days, and the vapor deposition surface side was formed by the extrusion lamination method. Polyethylene resin layer (Sumitomo Chemical Co., Ltd. Sumikasen L705
The laminated body was prepared by laminating 20 μm thick.
【0037】(比較例1)蒸着機から取り出した蒸着さ
れたフィルムロールをスリットすることなしに、蒸着機
から取り出したロール状態のまま、30℃の恒温槽に7日
間保管したこと以外は実施例1と同様にガスバリアフィ
ルムロールを調製した。(Comparative Example 1) Example 1 except that the vapor-deposited film roll taken out from the vapor deposition machine was stored in a constant temperature bath at 30 ° C for 7 days in the roll state taken out from the vapor deposition machine without slitting. A gas barrier film roll was prepared in the same manner as in 1.
【0038】(比較例2)室温20度、相対湿度40%RH
(絶対湿度 約0.006kg/kg)の恒温恒温環境下でフィル
ムをスリットしながらスリッター巻取り側に巻き取った
こと以外は、実施例1と同様にガスバリアフィルムロー
ルを調製した。(Comparative Example 2) Room temperature 20 ° C, relative humidity 40% RH
A gas barrier film roll was prepared in the same manner as in Example 1 except that the film was slit and wound on the slitter winding side in a constant temperature and constant temperature environment (absolute humidity about 0.006 kg / kg).
【0039】(比較例3)スリットされた蒸着フィルム
ロールを恒温槽などに保管することなくすぐにフィルム
ロールを巻きだしガスバリア性、色差などの物性評価を
実施した。Comparative Example 3 The film roll was immediately unwound without storing the slit vapor deposition film roll in a constant temperature bath and the physical properties such as gas barrier property and color difference were evaluated.
【0040】(比較例4)スリットされた蒸着フィルム
ロールを70℃の恒温槽に保管したこと以外は実施例1と
同様に作成したガスバリアフィルムロームを巻きだそう
としたが、フィルム同士がブロッキングした状態が部分
的にあり実用性を損ねていた。(Comparative Example 4) A gas barrier film loam prepared in the same manner as in Example 1 was tried to be wound, except that the slit vapor deposition film roll was stored in a constant temperature bath at 70 ° C, but the films were blocked. There was a partial state that impaired practicality.
【0041】(比較例5)基材フィルムロールとして厚
さ15μm全巾2000mmの蒸着アンカー層として含アクリル
酸ポリエステル系樹脂の水分散コート剤を製膜時にイン
ラインコートした2軸延伸ポリアミドフィルムロールを
使用した以外は実施例1と同様に作成したフィルムロー
ルを室温30度、相対湿度80%RH(絶対湿度 約0.02
2kg/kg)の恒温恒温環境下でフィルムをスリットしなが
らスリッター巻取り側に巻き取ろうとしたが、吸湿によ
る巻シワが発生し実用品位を損ねてしまった。(Comparative Example 5) As a base film roll, a biaxially stretched polyamide film roll having a thickness of 15 μm and a total width of 2000 mm, which was coated in-line with a water-dispersed coating agent of acrylic acid-containing polyester resin as a vapor deposition anchor layer, was used. A film roll prepared in the same manner as in Example 1 except that the temperature was 30 ° C. and the relative humidity was 80% RH (absolute humidity about 0.02).
Attempting to wind the film on the slitter winding side while slitting the film in a constant temperature and constant temperature environment of 2 kg / kg, the winding wrinkles due to moisture absorption occurred and impaired the practical quality.
【0042】実施例1〜4、比較例1〜3のフィルムロ
ールの長さ方向に対して表層部および中間部から切り出
したフィルム片、および幅方向にたいして端部の酸素透
過度、水蒸気透過度、色差b値の測定結果を表1に示
す。また、実施例5〜7の積層体から切り出したフィル
ム片の酸素透過度、水蒸気透過度を表2に示す。The film rolls of Examples 1 to 4 and Comparative Examples 1 to 3 cut out from the surface layer portion and the intermediate portion in the lengthwise direction, and the oxygen permeability and the water vapor permeability of the edge portion with respect to the width direction, The measurement results of the color difference b value are shown in Table 1. Table 2 shows the oxygen permeability and water vapor permeability of the film pieces cut out from the laminates of Examples 5 to 7.
【0043】[0043]
【表1】 [Table 1]
【0044】[0044]
【表2】 [Table 2]
【0045】上記の実施例、比較例より明らかなよう
に、巻き取り式真空蒸着法により基材ロールフィルムの
少なくとも片面に無機酸化物からなるガスバリア性薄膜
を蒸着したガスバリアフィルムロールを、絶対湿度が0.
008〜0.018kg/kgの環境下で巻き返したのち、30〜60℃
以上の恒温環境で一定期間以上保管することにより、ガ
スバリア性、透明性を長さ方向、幅方向全体にわたって
均一に向上させることができる。またこのガスバリアフ
ィルムロールとヒートシール性樹脂層をラミネートした
積層体においても優れたガスバリア性、透明性が得られ
る。As is clear from the above Examples and Comparative Examples, a gas barrier film roll having a gas barrier thin film made of an inorganic oxide vapor-deposited on at least one side of a substrate roll film by a roll-up type vacuum vapor deposition method was used. 0.
After rewinding in an environment of 008-0.018kg / kg, 30-60 ℃
By storing in the above constant temperature environment for a certain period of time or more, the gas barrier property and the transparency can be uniformly improved over the entire length direction and the width direction. Also, excellent gas barrier properties and transparency can be obtained in a laminate obtained by laminating the gas barrier film roll and the heat sealable resin layer.
【0046】[0046]
【発明の効果】以上のように本発明によるガスバリアフ
ィルムロールは、巻き取り式真空蒸着法により基材ロー
ルフィルムの少なくとも片面に無機酸化物からなるガス
バリア性薄膜を蒸着され、絶対湿度が0.008〜0.018kg/
kgの環境下で蒸着面が該環境下の空気に接触する状態で
巻き返したのち、30〜60℃の恒温環境で一定期間以上保
管することにより、ガスバリア性、透明性が長さ方向、
幅方向わたって均一に向上され、各種包装材料として優
れた特性のフィルムを提供するものである。また本発明
のガスバリアフィルムロールを用いヒートシール性樹脂
層とラミネートされた積層体においても同様の効果があ
り、その積層体を用いた包装袋においても包装材料とし
て特性にばらつきの少ないものが得られる。As described above, the gas barrier film roll according to the present invention has a gas barrier thin film made of an inorganic oxide vapor-deposited on at least one side of a substrate roll film by a winding-type vacuum vapor deposition method and has an absolute humidity of 0.008 to 0.018. kg/
After rewinding in a state where the deposition surface is in contact with air under the environment of kg, by storing in a constant temperature environment of 30 to 60 ° C. for a certain period or longer, the gas barrier property and the transparency in the longitudinal direction,
It is intended to provide a film which is uniformly improved in the width direction and has excellent properties as various packaging materials. Further, the same effect can be obtained in a laminate laminated with a heat-sealing resin layer using the gas barrier film roll of the present invention, and a packaging bag using the laminate can obtain a packaging material with little variation in characteristics. .
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 14/08 C23C 14/08 K // C08L 101:00 C08L 101:00 Fターム(参考) 3E064 BA36 BA54 BB03 BC08 BC18 3E086 AA23 AC07 AD01 BA04 BA13 BA15 BA33 BB02 BB05 BB21 BB51 BB62 BB90 CA01 CA28 CA31 DA08 4F006 AA12 AA17 AA19 AA35 AA38 AA39 AA40 AB74 BA05 CA07 DA01 4F100 AA01A AA19B AA20B AK01D AK04 AK41A AK46A AT00A BA02 BA03 BA04 BA05 BA07 BA10A BA10D CB02 EJ38A EJ65C EJ94 EJ98 GB15 HB31E JD02 JL12D YY00 4K029 AA11 AA25 BA50 BC00 BD00 EA08 GA03 Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) C23C 14/08 C23C 14/08 K // C08L 101: 00 C08L 101: 00 F term (reference) 3E064 BA36 BA54 BB03 BC08 BC18 3E086 AA23 AC07 AD01 BA04 BA13 BA15 BA33 BB02 BB05 BB21 BB51 BB62 BB90 CA01 CA28 CA31 DA08 4F006 AA12 AA17 AA19 AA35 35 EJ98 GB15 HB31E JD02 JL12D YY00 4K029 AA11 AA25 BA50 BC00 BD00 EA08 GA03
Claims (7)
ムの少なくとも片面に無機酸化物からなるガスバリア性
薄膜層を蒸着したガスバリアフィルムロールであり、該
ガスバリアフィルムロールを真空蒸着装置から取り出
し、絶対湿度が0.008〜0.018kg/kgの環境下で、蒸着面
が少なくとも一度は該環境下の空気に接触する状態で巻
き返したのち、ロール状態で30〜60℃の恒温環境で一定
期間以上保管すること、および、保管後のロールから切
り出したフィルムを4枚重ねた状態での色差b値がロール
の幅方向、長さ方向にわたって±3.0以内であることを
特徴とするガスバリアフイルムロール。1. A gas barrier film roll obtained by vapor-depositing a gas barrier thin film layer made of an inorganic oxide on at least one side of a substrate film by a roll-up vacuum vapor deposition method, the gas barrier film roll being taken out from a vacuum vapor deposition apparatus, and having an absolute humidity. Is 0.008 to 0.018 kg / kg in an environment, the vapor deposition surface is rewound at least once in contact with air in the environment, and then stored in a roll at a constant temperature of 30 to 60 ° C. for a certain period or more, Also, the gas barrier film roll is characterized in that the color difference b value in a state where four films cut out from the roll after storage are stacked is within ± 3.0 in the width direction and the length direction of the roll.
バリア性薄膜層が少なくともアルミ金属酸化物と珪素酸
化物とを含む複合酸化物であることを特徴とするガスバ
リアフィルムロール。2. A gas barrier film roll, wherein the gas barrier thin film layer comprising the inorganic oxide according to claim 1 is a composite oxide containing at least aluminum metal oxide and silicon oxide.
ポリアミドフィルムまたは二軸延伸ポリエステルフィル
ムのいずれかであることを特徴とするガスバリアフィル
ムロール。3. A gas barrier film roll, wherein the base film according to claim 1 is either a biaxially stretched polyamide film or a biaxially stretched polyester film.
ア性薄膜層との間に蒸着アンカー層を有することを特徴
とするガスバリアフィルムロール。4. A gas barrier film roll having a vapor deposition anchor layer between the substrate film according to claim 1 and the gas barrier thin film layer.
ムロールにおいてガスバリア性薄膜層上にアンカーコー
ト剤層または接着剤層を介してヒートシール性樹脂層を
積層したことを特徴とする積層体。5. The gas barrier film roll according to any one of claims 1 to 4, wherein a heat-sealing resin layer is laminated on the gas barrier thin film layer via an anchor coating agent layer or an adhesive layer.
ア性薄膜層上に、まず印刷層を設けたのち、アンカーコ
ート剤層または接着剤層を介してヒートシール性樹脂層
を積層したことを特徴とする積層体。6. The laminate according to claim 5, wherein a print layer is first provided on the gas barrier thin film layer, and then a heat-sealable resin layer is laminated via an anchor coat agent layer or an adhesive layer. And a laminate.
載の積層体を用い、ヒートシール性樹脂層を熱融着させ
て製袋したことを特徴とする包装袋。7. A packaging bag, characterized by using the laminate according to claim 5 or 6 to heat-seal a heat-sealable resin layer to produce a bag.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002092367A JP4120865B2 (en) | 2002-03-28 | 2002-03-28 | Gas barrier film roll, laminate using the same, and packaging bag |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002092367A JP4120865B2 (en) | 2002-03-28 | 2002-03-28 | Gas barrier film roll, laminate using the same, and packaging bag |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003285387A true JP2003285387A (en) | 2003-10-07 |
| JP4120865B2 JP4120865B2 (en) | 2008-07-16 |
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ID=29237214
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|---|---|---|---|
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009132059A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, method for producing the same, and laminate material using the same |
| JP2009132058A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, method for producing the same, and laminate material using the same |
| JP2009132061A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, infusion bag using the same, and outer bag for infusion bag |
| JP2009132060A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, method for producing the same, and laminate material using the same |
| JP2013233744A (en) * | 2012-05-09 | 2013-11-21 | Mitsubishi Plastics Inc | Gas barrier film and method of manufacturing the same |
| JP2015042487A (en) * | 2013-07-25 | 2015-03-05 | 東洋紡株式会社 | Transparent barrier film |
-
2002
- 2002-03-28 JP JP2002092367A patent/JP4120865B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009132059A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, method for producing the same, and laminate material using the same |
| JP2009132058A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, method for producing the same, and laminate material using the same |
| JP2009132061A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, infusion bag using the same, and outer bag for infusion bag |
| JP2009132060A (en) * | 2007-11-30 | 2009-06-18 | Dainippon Printing Co Ltd | Gas barrier vapor deposition film, method for producing the same, and laminate material using the same |
| JP2013233744A (en) * | 2012-05-09 | 2013-11-21 | Mitsubishi Plastics Inc | Gas barrier film and method of manufacturing the same |
| JP2015042487A (en) * | 2013-07-25 | 2015-03-05 | 東洋紡株式会社 | Transparent barrier film |
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| Publication number | Publication date |
|---|---|
| JP4120865B2 (en) | 2008-07-16 |
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