JP2004170403A5 - - Google Patents

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Publication number: JP2004170403A5
Authority: JP; Japan
Prior art keywords: image; weather resistance; mixed gas; resistance test; test method
Prior art date: 2003-11-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP2003377048A

Other languages

English (en)

Japanese (ja)

Other versions

JP2004170403A (ja

Filing date

2003-11-06

Publication date

2006-12-14

2003-11-06 Application filed filed Critical

2003-11-06 Priority to JP2003377048A priority Critical patent/JP2004170403A/ja

2003-11-06 Priority claimed from JP2003377048A external-priority patent/JP2004170403A/ja

2004-06-17 Publication of JP2004170403A publication Critical patent/JP2004170403A/ja

2006-12-14 Publication of JP2004170403A5 publication Critical patent/JP2004170403A5/ja

Status Pending legal-status Critical Current

Links

239000007789 gas Substances 0.000 claims 17
238000010998 test method Methods 0.000 claims 9
CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 6
RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims 4
MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims 2
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 2
239000000460 chlorine Substances 0.000 claims 2
229910052801 chlorine Inorganic materials 0.000 claims 2
229910000037 hydrogen sulfide Inorganic materials 0.000 claims 2
230000001678 irradiating effect Effects 0.000 claims 2
JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims 2
229910052724 xenon Inorganic materials 0.000 claims 2
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims 2

JP2003377048A 2002-11-07 2003-11-06 画像耐候性試験方法及び画像耐候性試験装置 Pending JP2004170403A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP2003377048A JP2004170403A (ja)	2002-11-07	2003-11-06	画像耐候性試験方法及び画像耐候性試験装置

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2002323799		2002-11-07
JP2003377048A JP2004170403A (ja)	2002-11-07	2003-11-06	画像耐候性試験方法及び画像耐候性試験装置

Publications (2)

Publication Number	Publication Date
JP2004170403A JP2004170403A (ja)	2004-06-17
JP2004170403A5 true JP2004170403A5 (fr)	2006-12-14

Family

ID=32716024

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2003377048A Pending JP2004170403A (ja)	2002-11-07	2003-11-06	画像耐候性試験方法及び画像耐候性試験装置

Country Status (1)

Country	Link
JP (1)	JP2004170403A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4185906B2 (ja)	2004-12-01	2008-11-26	キヤノン株式会社	画像耐ガス性試験方法
JP4920726B2 (ja) *	2009-07-13	2012-04-18	スガ試験機株式会社	ガス腐食試験装置
CN207694811U (zh) *	2017-07-28	2018-08-07	巴斯夫欧洲公司	城市污染环境模拟装置
JP6948070B2 (ja) *	2018-08-24	2021-10-13	スガ試験機株式会社	耐候性試験機

2003
- 2003-11-06 JP JP2003377048A patent/JP2004170403A/ja active Pending

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