JP2008166830A5 - - Google Patents
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- JP2008166830A5 JP2008166830A5 JP2008011466A JP2008011466A JP2008166830A5 JP 2008166830 A5 JP2008166830 A5 JP 2008166830A5 JP 2008011466 A JP2008011466 A JP 2008011466A JP 2008011466 A JP2008011466 A JP 2008011466A JP 2008166830 A5 JP2008166830 A5 JP 2008166830A5
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- Prior art keywords
- cassette
- wafer
- process processing
- processing apparatus
- transfer means
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- 238000000034 method Methods 0.000 claims 27
- 235000012431 wafers Nutrition 0.000 claims 22
- 238000003672 processing method Methods 0.000 claims 4
Claims (4)
前記カセット内に収納された複数のウェハを前記搬送手段を介して共通の処理を施す複数のプロセス処理装置へ順次搬送し、搬送したウェハに共通のレシピを適用して共通の処理を施す処理、及び前記複数のカセット内に収納された複数のウェハを前記搬送手段を介してカセット毎にそれぞれ異なるプロセス処理装置へ搬送し、搬送したウェハにプロセス処理装置毎に異なるレシピを適用して異なる処理を施す処理の何れかを選択的に施すとともに処理を施した後のウェハを前記搬送手段を介してもとのカセットに戻すことを特徴とする真空処理装置。 A plurality of process processing apparatuses for vacuum processing a wafer, a cassette mounting means for mounting a plurality of cassettes capable of storing wafers, and a transfer means provided between the plurality of process processing apparatuses and the cassette mounting means And a wafer is carried into each of the process processing apparatuses from an arbitrary cassette mounted on the cassette mounting means using the transfer means, and a processed wafer that has been vacuum-processed by each of the process processing apparatuses is unloaded. In a vacuum processing apparatus configured with a control means for performing transport control,
A process of sequentially transferring a plurality of wafers stored in the cassette to a plurality of process processing apparatuses that perform a common process via the transfer means, and applying a common recipe to the transferred wafer, And transferring a plurality of wafers stored in the plurality of cassettes to different process processing apparatuses for each cassette via the transfer means, and applying different recipes to the transferred wafers for each process processing apparatus. A vacuum processing apparatus characterized by selectively performing any of the processing to be performed and returning the processed wafer to the original cassette via the transfer means.
前記いずれかのプロセス処理装置に装置停止の必要が生じたとき、装置停止の必要が生じたプロセス処理装置に対するカセットからのウェハの搬出を中断し、前記装置停止の必要が生じたプロセス処理装置内のウェハをもとのカセットに戻したのち装置停止の必要がないプロセス処理装置に対するカセットからのウェハの搬出を継続し処埋を再開することを特徴とする真空処理装置。 The vacuum processing apparatus according to claim 1, wherein
When any one of the process processing apparatuses needs to be stopped, the carrying out of the wafer from the cassette to the process processing apparatus where the apparatus needs to be stopped is interrupted, and the inside of the process processing apparatus where the need to stop the apparatus occurs. A vacuum processing apparatus characterized in that after the wafer is returned to the original cassette, the wafer is unloaded from the cassette to the process processing apparatus which does not need to be stopped, and the processing is resumed.
前記カセット内に収納された複数のウェハを前記搬送手段を介して共通の処理を施す複数のプロセス処理装置へ順次搬送し、搬送したウェハに共通のレシピを適用して共通の処理を施す処理、及び前記複数のカセット内に収納された複数のウェハを前記搬送手段を介して各カセット毎にそれぞれ異なるプロセス処理装置へ搬送し、搬送したウェハにプロセス処理装置毎に異なるレシピを適用して異なる処理を施す処理の何れかを選択的に施すとともに処理を施した後のウェハを前記搬送手段を介してもとのカセットに戻すことを特徴とする真空処理方法。 In a vacuum processing method in which a wafer is transferred from a cassette placed on a cassette mounting means to a plurality of process processing apparatuses via a transfer means, and vacuum processing of the wafer is performed.
A process of sequentially transferring a plurality of wafers stored in the cassette to a plurality of process processing apparatuses that perform a common process via the transfer means, and applying a common recipe to the transferred wafer, And a plurality of wafers stored in the plurality of cassettes are transferred to different process processing apparatuses for each cassette via the transfer means, and different processes are applied to the transferred wafers by applying different recipes for each process processing apparatus. A vacuum processing method characterized by selectively performing any one of the processes for performing the process and returning the wafer after the process to the original cassette via the transfer means.
前記いずれかのプロセス処理装置に装置停止の必要が生じたとき、装置停止の必要が生じたプロセス処理装置に対するカセットからのウェハの搬出を中断し、前記装置停止の必要が生じたプロセス処理装置内のウェハをもとのカセットに戻したのち装置停止の必要がないプロセス処理装置に対するカセットからのウェハの搬出を継続し処埋を再開することを特徴とする真空処埋方法。 In the vacuum processing method of Claim 3,
When any one of the process processing apparatuses needs to be stopped, the carrying out of the wafer from the cassette to the process processing apparatus where the apparatus needs to be stopped is interrupted, and the inside of the process processing apparatus where the need to stop the apparatus occurs. A vacuum processing method characterized in that after the wafer is returned to the original cassette, the wafer is unloaded from the cassette to the process processing apparatus which does not need to be stopped, and processing is resumed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008011466A JP2008166830A (en) | 2008-01-22 | 2008-01-22 | Vacuum processing method and vacuum processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008011466A JP2008166830A (en) | 2008-01-22 | 2008-01-22 | Vacuum processing method and vacuum processing apparatus |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004153482A Division JP4121480B2 (en) | 2004-05-24 | 2004-05-24 | Vacuum processing method and vacuum processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008166830A JP2008166830A (en) | 2008-07-17 |
| JP2008166830A5 true JP2008166830A5 (en) | 2009-04-30 |
Family
ID=39695744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008011466A Pending JP2008166830A (en) | 2008-01-22 | 2008-01-22 | Vacuum processing method and vacuum processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008166830A (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3238432B2 (en) * | 1991-08-27 | 2001-12-17 | 東芝機械株式会社 | Multi-chamber type single wafer processing equipment |
| JPH07106215A (en) * | 1993-10-08 | 1995-04-21 | Kokusai Electric Co Ltd | Failure processing method in semiconductor manufacturing equipment |
| JP3328869B2 (en) * | 1995-06-27 | 2002-09-30 | 東京エレクトロン株式会社 | Processing method and processing apparatus |
| JPH0950948A (en) * | 1995-08-08 | 1997-02-18 | Kokusai Electric Co Ltd | Failure coping system for semiconductor manufacturing equipment |
-
2008
- 2008-01-22 JP JP2008011466A patent/JP2008166830A/en active Pending
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