JP2012144353A - Substrate conveyance apparatus and substrate conveyance method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate conveyance apparatus capable of adjusting the size of a substrate holding mechanism in accordance with the size of a substrate to be conveyed.SOLUTION: The substrate conveyance apparatus 100 is configured to convey the substrate B placed on a processing table A, and includes: a first substrate lifting mechanism 110 configured to lift up the substrate B from the processing table A; and the substrate holding mechanism 120 that is opened and closed in accordance with the size of the substrate B, and holds the substrate B that has been lifted up. Further, the processing table A includes a first fixing table A1 and a second fixing table A2, the substrate holding mechanism 120 moves between the first fixing table A1 and the second fixing table A2, and the substrate B is conveyed from the first fixing table A1 to the second fixing table A2 with the cooperation of the first substrate lifting mechanism 110 and the substrate holding mechanism 120.

Description

  The present invention relates to a substrate transfer apparatus and a substrate transfer method for transferring a substrate on a processing table.

  When thermal processing is performed on a thin substrate, a substrate transfer device that sequentially transfers the substrate to a plurality of processing stands is used. FIG. 7 is a schematic view showing a conventional substrate transfer apparatus 700. The substrate transport apparatus 700 includes a placement table 3 for placing a substrate, and a substrate moving mechanism 4 that lifts and moves the substrate. FIG. 7A shows a substrate transfer apparatus 700 that transfers a substrate a, and FIG. 7B shows a substrate transfer apparatus 700 that transfers a substrate b having a size different from that of the substrate a. By the cooperation of the table 3 and the substrate moving mechanism 4, the substrate a and the substrate b can be sequentially conveyed. The substrate moving mechanism 4 has a substrate holding portion 40. Since the substrate holding portion 40 has a staircase shape, the substrate a and the substrate b having a size matching the staircase shape can be transported without changing the mechanical parts.

JP 2009-227420 A

  However, since the staircase shape of the substrate holding portion is fixed, the staircase shape cannot be changed. Therefore, when a substrate having a size that does not match the step shape of the substrate holding portion 40 is transported, the substrate holding portion 40 must be replaced or the step shape of the substrate holding portion 40 must be changed. In particular, when the laying table 3 also functions as a heating device, it is necessary to stop the conveyance and to stop the heating, so that a time loss due to a decrease in the temperature of the processing table due to the setup change or a re-increase is large. The work efficiency and energy efficiency were bad.

An object of the present invention is to provide a substrate transport apparatus that can adjust the size of a substrate holding mechanism in accordance with the size of a substrate to be transported.

  In order to solve the above problems, a characteristic configuration of a substrate transfer apparatus according to the present invention is a substrate transfer apparatus that transfers a substrate on a processing table, a substrate lifting mechanism that lifts the substrate from the processing table, A substrate holding mechanism that opens and closes in accordance with the size and holds the lifted substrate.

  According to the substrate transfer apparatus of the present invention, the size of the substrate holding mechanism is not fixed, and the size of the substrate holding mechanism can be adjusted according to the size of the substrate to be transferred. As a result, it is possible to realize a substrate transfer apparatus that can handle transfer of various sizes of substrates without changing the components of the substrate holding mechanism.

  According to a preferred embodiment of the substrate transfer apparatus of the present invention, the processing table includes a first fixed table and a second fixed table, and the substrate holding mechanism is between the first fixed table and the second fixed table. And the substrate is transported from the first fixing base to the second fixing base by the cooperation of the substrate lifting mechanism and the substrate holding mechanism.

  According to a preferred embodiment of the substrate transfer apparatus of the present invention, the substrate holding mechanism includes a first holding unit that holds one of the substrates, and a second holding unit that holds the other one different from one of the substrates. The first holding unit and the second holding unit move along the substrate transport direction, and the distance between the first holding unit and the second holding unit is changed. Accordingly, the substrate holding mechanism opens and closes along the substrate transport direction. As a result, the installation area can be reduced as compared with a substrate transfer apparatus having a mechanism that opens and closes in a direction perpendicular to the substrate transfer direction.

  According to a preferred embodiment of the substrate transfer apparatus according to the present invention, the substrate transfer device further includes guide rails provided along the substrate transfer direction, and the first holding unit and the second holding unit are adapted to the size of the substrate. The first holding part and the second holding part move on the guide rail to transport the substrate from the first fixed base to the second fixed base. Therefore, the number of guide rails compared to the case where the movement for opening and closing according to the size of the board and the movement for transporting the board from the first fixed base to the second fixed base are performed on separate guide rails. Can be saved, and the substrate transfer apparatus can be made compact.

  According to a preferred embodiment of the substrate transport apparatus of the present invention, the substrate holding mechanism further includes a rotation driving mechanism, and the first holding unit and the second holding unit are locked to the rotation driving mechanism, and the rotation driving mechanism. The first holding part and the second holding part move far and near by the rotation of. Therefore, the substrate holding mechanism can be opened and closed by the rotation of the rotation driving mechanism. As a result, the opening / closing operation of the substrate holding mechanism can be realized with a simple structure.

  According to a preferred embodiment of the substrate transfer apparatus according to the present invention, the first fixed base and the second fixed base hold the entire surface of the substrate. Therefore, the entire surface of the substrate can be uniformly processed. In particular, when the fixed table functions as a heating table or a cooling table, the entire surface of the substrate can be uniformly heated or cooled.

  According to a preferred embodiment of the substrate transfer apparatus of the present invention, the first fixed base includes the first heat generating part that generates heat at the first temperature, and the second fixed base generates the second heat generated at the second temperature. A part. Therefore, regardless of whether the first temperature and the second temperature are the same or different, the substrate can be heat-treated at various temperatures during the transfer of the substrate.

  According to a preferred embodiment of the substrate transport method according to the present invention, there is provided a substrate transport method for transporting a substrate on a processing table, in accordance with a substrate lifting process for lifting the substrate from the processing table and the size of the substrate. A substrate holding step of opening and closing and holding the lifted substrate.

  According to a preferred embodiment of the substrate transport method according to the present invention, a substrate lifting mechanism that lifts the substrate from the processing table, and a substrate holding mechanism that opens and closes according to the size of the substrate and holds the lifted substrate are provided. In the substrate transfer apparatus, the processing table includes a first fixing table and a second fixing table, and in the substrate holding process, the substrate holding mechanism performs a step of moving between the first fixing table and the second fixing table. Then, a step of transporting the substrate from the first fixed base to the second fixed base is executed by the substrate lifting step and the substrate holding step.

  According to a preferred embodiment of the substrate transport method of the present invention, the substrate holding mechanism includes a first holding unit that holds one of the substrates, and a second holding unit that holds the other one different from one of the substrates. And a rotation driving mechanism in which the first holding unit and the second holding unit are locked. In the substrate holding step, the first holding unit and the second holding unit move in the near and far directions by the rotation of the rotation driving mechanism. Execute the process.

  According to a preferred embodiment of the substrate transport method of the present invention, the substrate lifting mechanism includes a first substrate lifting mechanism and a second substrate lifting mechanism, and the first substrate lifting mechanism holds the substrate from the first fixed base. A step of raising, a step of reducing the distance between the first holding unit and the second holding unit in accordance with the size of the substrate, holding the lifted substrate by the substrate holding mechanism, a step of lowering the first substrate lifting mechanism, and a substrate A step of moving the holding mechanism from the first fixing base to the second fixing base, a step of lifting the substrate from the substrate holding mechanism by the second substrate lifting mechanism, and extending a distance between the first holding portion and the second holding portion, Separating the lifted substrate from the substrate holding mechanism, lowering the second substrate lifting mechanism, placing the substrate on the second fixing base, and moving the substrate holding mechanism from the second fixing base to the first fixing base. Include.

It is a schematic diagram which shows the board | substrate conveyance apparatus which concerns on this invention. It is a schematic diagram which shows a 1st board | substrate lifting mechanism. It is a schematic diagram which shows the drive mechanism of a board | substrate holding mechanism. It is a schematic diagram which shows the rotational drive mechanism of a 1st holding | maintenance part and a 2nd holding | maintenance part. It is a schematic diagram which shows the board | substrate conveyance procedure of a board | substrate conveyance apparatus. It is a schematic diagram which shows the rotational drive mechanism different from the rotational drive mechanism shown in FIG. It is a schematic diagram which shows the conventional board | substrate conveyance apparatus.

  With reference to FIGS. 1-6, embodiment regarding the board | substrate conveyance apparatus and board | substrate conveyance method of this invention is described. The present invention is not intended to be limited to the configurations described in the embodiments and drawings described below, and includes configurations equivalent to those configurations.

[Substrate transfer device]
FIG. 1 is a schematic view showing a substrate transfer apparatus 100 according to the present invention. The substrate transport apparatus 100 transports the substrate B on the processing table A. The substrate transport apparatus 100 includes a first substrate lifting mechanism 110 and a substrate holding mechanism 120.

  The first substrate lifting mechanism 110 lifts the substrate B from the processing table A. The substrate holding mechanism 120 opens and closes according to the size of the substrate B, and holds the substrate B lifted by the first substrate lifting mechanism 110. The processing table A includes a first fixed table A1 and a second fixed table A2. The substrate holding mechanism 120 is a movable unit that moves between the first fixed base A1 and the second fixed base A2. By the cooperation of the first substrate lifting mechanism 110 and the substrate holding mechanism 120, the substrate B is transferred from the first fixed base A1 to the second fixed base A2. As a result, the substrate B is transported along the direction α.

  The substrate transport apparatus 100 further includes a second substrate lifting mechanism 130. The first substrate lifting mechanism 110 and the second substrate lifting mechanism 130 are fixed units fixed to the base. The first substrate lifting mechanism 110 includes first lifting / lowering means 112 and a first support pin group 114. The second substrate lifting mechanism 130 includes second lifting / lowering means 132 and a second support pin group 134. Details of the first substrate lifting mechanism 110 and the second substrate lifting mechanism 130 will be described later with reference to FIG.

  The substrate holding mechanism 120 includes a first holding unit 121 that holds one of the first substrates B1 (upstream side with respect to the transport direction α of the substrate B) and another one (substrate B that is different from the first substrate B1). 2nd holding part 123 which hold | maintains (the downstream side with respect to the conveyance direction (alpha)), the 1st connection member 122, and the 2nd connection member 124 are provided. The first holding unit 121 is a holding unit on the upstream side with respect to the transport direction α of the substrate B, and the second holding unit 123 is a holding unit on the downstream side with respect to the transport direction α of the substrate B. The first holding unit 121 and the second holding unit 123 move along the substrate transport direction α, and the distance between the first holding unit 121 and the second holding unit 123 is changed.

  The 1st connection member 122 connects a some upstream holding | maintenance part by the connection part a1, the connection part a2, and the connection part a3. The second connecting member 124 connects a plurality of downstream holding portions with a connecting portion. Specifically, the second connecting member 124 connects the second holding part 123 with the connecting part b1, connects the holding part 143 with the connecting part b2, and connects the holding part 163 with the connecting part b3.

  The first holding unit 121 includes a first slider 121a, a second slider 121b, a holding arm 121c, and a first holding claw group 121d. The first slider 121a and the second slider 121b guide the movement of the first holding unit 121 along the transport direction α of the substrate B.

  The first holding claw group 121d is provided on the holding arm 121c. The first holding claw group 121d directly holds one of the first substrates B1 (upstream with respect to the transport direction α of the substrate B). The first holding claw group 121d includes three holding claws, and the three holding claws are arranged so as to be orthogonal to the transport direction α of the first substrate B1.

  The plurality of upstream holding units and the plurality of downstream holding units (second holding unit 123, holding unit 143, and holding unit 163) have the same configuration as the first holding unit 121. For example, the second holding unit 123 includes a second holding claw group 123d. The second holding claw group 123d is provided on a holding arm provided in the second holding unit 123. The second holding claw group 123d directly holds one of the first substrates B1 (downstream with respect to the transport direction α of the substrate B). The second holding claw group 123d includes three holding claws, and the three holding claws are arranged so as to be orthogonal to the transport direction α of the first substrate B1.

  The first holding claw group 121d and the second holding claw group 123d are arranged so as to face each other. The first holding unit 121 and the second holding unit 123 move in accordance with the size of the first substrate B1, and the first holding claw group 121d and the second holding claw group 123d hold the first substrate B1.

  The substrate transfer apparatus 100 further includes a guide rail 170. The guide rail 170 includes a first guide rail 170a and a second guide rail 170b. The first guide rail 170a and the second guide rail 170b are installed on a base C (not shown) in parallel with each other along the substrate transport direction α. A first slider 121a is attached to the first guide rail 170a, and a second slider 121b is attached to the second guide rail 170b.

  The substrate transfer device 100 is a walking beam type substrate transfer device. According to the walking beam type, the processing table A (the first fixing table A1 and the second fixing table A2) is fixed, and the substrate holding mechanism 120 is moved along the transport direction of the substrate B with the first fixing table A1 and the second fixing table. By reciprocating with A2, the substrate B on the first substrate lifting mechanism 110 can be moved one stroke at a time. One stroke corresponds to the distance from the center of the first fixed base A1 to the center of the second fixed base A2. For example, according to the substrate transfer apparatus 100, the first holding unit 121 and the second holding unit 123 are arranged on the guide rail 170 to transfer the substrate B from the first fixed base A1 to the second fixed base A2 by one stroke. To move.

  In the substrate transport apparatus 100, since the substrate holding mechanism 120 opens and closes in accordance with the size of the substrate B, it is not necessary to change or reconfigure mechanical parts when transporting substrates of different sizes. By appropriately selecting the number and arrangement of the holding claws and the number and arrangement of the support pins, it is possible to handle a substrate having a stepless size. Moreover, if the shape of the holding claw is L-shaped, it is possible to prevent the substrate from being dropped or the substrate from being displaced due to conveyance. As a result, an operation in which the acceleration / deceleration is increased and the conveyance time is shortened is possible.

  In the substrate transfer apparatus 100 according to the present invention, the size of the substrate B is 1200 mm in the length (vertical length) in the α direction and 2200 mm in the horizontal length. Since it opens and closes according to the size, it is necessary to change or reconfigure the substrate transfer device 100 even when transferring substrates of different sizes (1500 mm vertical, 1700 mm horizontal, 1400 mm vertical, 2400 mm horizontal). There is no.

  The substrate transfer apparatus 100 of the present invention includes a first substrate lifting mechanism 110 that lifts a substrate B from a processing table A, and a substrate holding mechanism 120 that opens and closes according to the size of the substrate B and holds the lifted substrate B. . Therefore, the size of the substrate holding mechanism 120 is not fixed, and the size of the substrate holding mechanism 120 can be adjusted according to the size of the substrate B to be transferred. As a result, it is possible to realize the substrate transport apparatus 100 that can support transport of various sizes of substrates without changing the components of the substrate holding mechanism 120. The size of the substrate that can be handled without setup change is stepless.

  Furthermore, according to a preferred characteristic configuration of the substrate transport apparatus 100, the substrate holding mechanism 100 includes a first holding unit 121 that holds one of the substrates B and a second that holds the other one different from the one of the substrates B. The first holding unit 121 and the second holding unit 123 move along the transport direction α of the substrate B, and the distance between the first holding unit 121 and the second holding unit 123 is changed. Accordingly, the substrate holding mechanism 100 opens and closes along the transport direction α of the substrate B. As a result, the installation area can be reduced as compared with a substrate transport apparatus having a mechanism that opens and closes in a direction perpendicular to the transport direction α of the substrate B.

  FIG. 2 is a schematic diagram showing the first substrate lifting mechanism 110. FIG. 2A shows the first substrate lifting mechanism 110 in which the first substrate B1 is lowered onto the first fixing base A1, and FIG. 2B shows the first substrate lifting from the first fixing base A1 to the first substrate B1. A substrate lifting mechanism 110 is shown. As described with reference to FIG. 1, the first fixed base A1 is fixed to a base (not shown). The first fixing base A1 has a plurality of through holes (through holes A1a, through holes A1b, and through holes A1c) at predetermined intervals.

  The first substrate lifting mechanism 110 includes first lifting / lowering means 112 and a first support pin group 114. The first support pin group 114 includes a support pin 114a, a support pin 114b, and a support pin 114c. The support pin 114a is inserted into the through hole A1a, the support pin 114b is inserted into the through hole A1b, and the support pin 114c is inserted into the through hole A1c from the first lifting / lowering means 112 side so as not to protrude from the mounting surface of the first fixing base A1. ing.

  The first support pin group 114 is connected to the first elevating means 112. The first elevating means 112 is configured to change the first support pin group 114 from the state in which the first support pin group 114 is inherent to the first fixed base A1 to the state in which the first support pin group 114 protrudes from the first fixed base A1. The group 114 is reciprocated along the β direction. As the first lifting / lowering means 112 raises the first support pin group 114, the first substrate lifting mechanism 110 lifts the first substrate B1 from the first fixed base A1. When the first lifting / lowering means 112 lowers the first support pin group 114, the first substrate lifting mechanism 110 lowers the first substrate B1 onto the first fixing base A1.

  The second substrate lifting mechanism 130 has the same configuration as the first substrate lifting mechanism 110, and has the same effects. Specifically, the second substrate lifting mechanism 130 includes second elevating means 132 and a second support pin group 134. When the second lifting / lowering means 132 raises the second support pin group 134, the second substrate lifting mechanism 130 lifts the second substrate B2 from the second fixed base A2. When the second lifting / lowering means 132 lowers the second support pin group 134, the second substrate lifting mechanism 130 lowers the second substrate B2 onto the second fixed base A2.

  FIG. 3 is a schematic diagram showing the drive mechanism 200 of the substrate holding mechanism 120. A substrate holding mechanism 120 (not shown) is connected to the driving mechanism 200, and the substrate holding mechanism 120 is moved by driving the driving mechanism 200. The substrate holding mechanism 120 and the drive mechanism 200 move on guide rails provided in the transport direction α of the substrate B.

  The drive mechanism 200 is fixed to the support base 210, the slider 220, the slider 230, the rotation drive unit 240 fixed to the support base 210, the pinion gear 250 attached to the rotation drive unit 240, and the base C. Rack 260. The slider 220 and the slider 230 are attached to the guide rail 170. The driving force from the rotation driving unit 240 is transmitted to the pinion gear 250, and the driving mechanism 200 moves on the guide rail 170 by the rotation of the pinion gear 250 along the δ direction.

  The substrate holding mechanism 120 and the drive mechanism 200 are both installed on the guide rail 170. Therefore, the number of guide rails can be saved as compared with the case where the substrate holding mechanism 120 and the drive mechanism 200 are installed on separate guide rails, and the substrate transport apparatus 100 can be made more compact.

  FIG. 4 is a schematic diagram illustrating the first rotation driving mechanism 300 of the first holding unit 121 and the second holding unit 123. 4A shows a state in which the first holding unit 121 and the second holding unit 123 are separated (open state), and FIG. 4B shows that the first holding unit 121 and the second holding unit 123 are close to each other. Indicates the closed state. The first holding unit 121 and the second holding unit 123 are connected to the first rotation driving mechanism 300, and the first holding unit 121 and the second holding unit 123 are guided by switching the rotation direction of the first rotation driving mechanism 300. Moves in the distance (opening and closing movement) on the rail 170.

  The first rotation drive mechanism 300 includes a first fixing means 301 fixed to the support base 210, a first timing pulley 302 fixed to the first fixing means 301, and a second fixing means 303 fixed to the support base 210. And a second timing pulley 304 fixed to the second fixing means 303, a first rotating means 305, and a timing belt 306. The first holding part 121 is connected to the timing belt 306 at the connecting part a1. The second holding portion 123 is connected to the timing belt 306 at the connecting portion b1.

  Driving the first rotation driving mechanism 300 to the substrate holding mechanism 120 (the first holding unit 121 and the second holding unit 123) by the first timing pulley 302, the second timing pulley 304, the timing belt 306, and the first rotating unit 305.・ Transmission function occurs. The first rotating means 305 is connected to the first timing pulley 302. The first holding unit 121 and the second holding unit 123 move in opposite directions by switching the rotation direction of the first rotating unit 305.

  As shown in FIG. 4A, when the first timing pulley 302 rotates in the ε1 direction (clockwise), the first holding unit 121 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). Then, the second holding unit 123 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 away from each other, the substrate holding mechanism 120 is opened. As shown in FIG. 4B, when the first timing pulley 302 rotates in the ε2 direction (counterclockwise), the first holding unit 121 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). The second holding unit 123 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 in the approaching direction, the substrate holding mechanism 120 is closed.

  The opening / closing distance of the substrate holding mechanism 120 (for example, the distance between the first holding unit 121 and the second holding unit 123) corresponds to the degree of rotation of the first rotation driving mechanism 300. Therefore, by setting the degree of rotation of the first rotation drive mechanism 300 in advance so as to match the size of the substrate to be transferred, the substrate transfer apparatus 100 capable of transferring substrates of various sizes can be realized. For example, the degree of rotation of the first rotation drive mechanism 300 in advance (for example, the substrate B) according to each size of the substrate B (size x), the substrate Y (size y), and the substrate Z (size z). Level A, level B for substrate Y, and level C for substrate Z), and the level is changed according to the size of the substrate to be transferred. For example, when transporting a plurality of substrates B, the degree of rotation of the first rotation drive mechanism 300 is set to level A. When the transfer of the plurality of substrates B is completed and the plurality of substrates Y are transferred, the degree of rotation of the first rotation drive mechanism 300 is set to level B. Further, when the plurality of substrates Y are transported and the plurality of substrates Z are transported, the degree of rotation of the first rotation drive mechanism 300 is set to level C. As a result, the substrate holding mechanism 120 opens and closes so as to match the size of the substrate to be transferred, and it is possible to save the trouble of changing the position of the substrate transfer apparatus 100 or making a change.

  According to a preferred characteristic configuration of the substrate transfer apparatus 100 of the present invention, the substrate holding apparatus 100 further includes a guide rail 170 provided along the transfer direction of the substrate B, and the first holding unit 121 and the second holding unit 123 include the substrate B The first holding part 121 and the second holding part 123 transport the substrate B from the first fixing base A1 to the second fixing base A2. Therefore, it moves on the guide rail 170. Therefore, compared with the case where the movement for opening and closing according to the size of the substrate B and the movement for transporting the substrate B from the first fixed base A1 to the second fixed base A2 are performed on separate guide rails. The number of guide rails can be saved, and the substrate transfer apparatus 100 can be made compact.

  According to a preferred characteristic configuration of the substrate transport apparatus 100 of the present invention, the substrate holding mechanism 120 further includes the first rotation driving mechanism 300, and the first holding unit 121 and the second holding unit 123 are the first rotation driving mechanism. The first holding unit 121 and the second holding unit 123 move in the near and far direction by the rotation of the first rotation driving mechanism 300, which is locked by the 300. Therefore, the substrate holding mechanism 120 can be opened and closed by the rotation of the first rotation drive mechanism 300. As a result, the opening / closing operation of the substrate holding mechanism 120 can be realized with a simple structure.

[Substrate transport method]
FIG. 5 is a schematic diagram illustrating a substrate transfer procedure of the substrate transfer apparatus 100. The substrate transfer method of the present invention is executed by the substrate transfer apparatus 100. With reference to FIGS. 1 to 5, Steps S <b> 602 to S <b> 618 that are substrate transfer procedures of the substrate transfer apparatus 100 will be described.

  Step S602: The first fixing base A1 holds the first substrate B1, and the second fixing base A2 holds the second substrate B2. The first support pin group 114 is lowered and does not support the first substrate B1, and the second support pin group 134 is lowered and does not support the second substrate B2. The substrate holding mechanism 120 is in an open state.

  Step S604: The first support pin group 114 rises and lifts the first substrate B1 from the first fixed base A1. The second support pin group 134 rises and lifts the second substrate B2 from the second fixed base A2. The first support pin group 114 supports the first substrate B1, and the second support pin group 134 supports the second substrate B2. That is, the first substrate lifting mechanism 110 lifts the first substrate B1 from the first fixing base A1, and the second substrate lifting mechanism 130 lifts the second substrate B2 from the second fixing base A2. The first substrate B1 is lifted to a height of 150 mm from the first fixed base A1, and the second substrate B2 is lifted to a height of 150 mm from the second fixed base A2.

  Step S606: The first holding unit 121 and the second holding unit 123 move on the guide rail 170 in a direction approaching each other toward the first substrate B1. That is, the distance between the first holding unit 121 and the second holding unit 123 is reduced according to the size of the first substrate B1. The substrate holding mechanism 120 is in a closed state.

  Step S608: The first substrate lifting mechanism 110 and the second substrate lifting mechanism 130 are lowered while the first substrate B1 and the second substrate B2 are lifted by the substrate holding mechanism 120 (that is, the first support pin group 114 and the second support). The pin group 134 is lowered). The substrate holding mechanism 120 holds the first substrate B1 and the second substrate B2.

  Step S610: In a state where the first substrate B1 is lifted by the substrate holding mechanism 120 (the first holding unit 121 and the second holding unit 123), the substrate holding mechanism 120 moves from the first fixing base A1 to the second fixing base A2 by 500 mm / second. It moves on the guide rail 170 downstream by one stroke at a speed of sec. One stroke is a distance (2400 mm) from the center of the first fixed base A1 to the center of the second fixed base A2.

  Step S612: The substrate is lifted from the substrate holding mechanism 120 by the first substrate lifting mechanism 110 and the second substrate lifting mechanism 130. That is, the first support pin group 114 rises and protrudes from the first fixed base A1, and supports the next substrate that has been transported. The second support pin group 134 rises and protrudes from the second fixed base A2 to support the first substrate B1.

  Step S614: The first holding unit 121 and the second holding unit 123 move on the guide rail 170 in a direction away from the first substrate B1. That is, the distance between the first holding unit 121 and the second holding unit 123 is increased while the substrate B is lifted from the substrate holding mechanism 120, and the substrate holding mechanism 120 is separated from the lifted substrate. The substrate holding mechanism 120 is opened.

  Step S616: The first substrate lifting mechanism 110 is lowered, and the substrate supported by the first support pin group 114 is placed on the first fixed base A1. When the first support pin group 114 is lowered to be in the first fixing base A1, the substrate that has been supported is held on the first fixing base A1. The second substrate lifting mechanism 130 is lowered, and the first substrate B1 is placed on the second fixed base A2. When the second support pin group 134 is lowered to be in a state of being in the second fixing base A2, the first substrate B1 is held on the second fixing base A2.

  Step S618: The substrate holding mechanism 120 (the first holding unit 121 and the second holding unit 123) moves on the guide rail 170 from the second fixed base A2 to the first fixed base A1. As the substrate holding mechanism 120 moves upstream by one stroke, the substrate holding mechanism 120 returns to the starting position.

  As described above with reference to FIG. 5, by performing Steps S604 to S610 by the substrate transport apparatus 100, the substrate holding mechanism 120 moves in the downstream direction, and the first substrate B1 is moved to the first fixed base A1. To the second fixed base A2. By executing steps S612 to S618 by the substrate transport apparatus 100, the substrate holding mechanism 120 lowers the first substrate B1 to the second fixing base A2, and the substrate holding mechanism 120 moves in the upstream direction.

[Rotation drive mechanism]
FIG. 6 is a schematic diagram illustrating another example of the first rotation drive mechanism 300. FIG. 6A shows the second rotation drive mechanism 310. The substrate transport apparatus 100 may include a second rotation drive mechanism 310 instead of the first rotation drive mechanism 300. The second rotation drive mechanism 310 includes a third fixing means 311 fixed to the support base 210 and a second rotating means 312 fixed to the third fixing means 311. The 1st holding | maintenance part 121 is connected with the 1st connection member 122 by the connection part a1. The 2nd holding | maintenance part 123 is connected with the 2nd connection member 124 by the connection part b1. The first connecting member 122 and the second connecting member 124 are slidably locked to the second rotating means 312. Specifically, the first connecting member 122 and the second connecting member 124 are locked to the second rotating means 312 with a gear, and the first holding part 121 and the second connecting member 124 are switched by switching the rotation direction of the second rotating means 312. The holding part 123 slides in opposite directions.

  For example, when the second rotating unit 312 rotates in the ε1 direction (clockwise), the first holding unit 121 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B), and the second holding unit 123 It moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 away from each other, the substrate holding mechanism 120 is opened. For example, when the second rotation unit 312 rotates in the direction opposite to the ε1 direction (counterclockwise), the first holding unit 121 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). 2 The holding part 123 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 in the approaching direction, the substrate holding mechanism 120 is closed.

  FIG. 6B shows the third rotation drive mechanism 320. The substrate transport apparatus 100 may include a third rotation drive mechanism 320 instead of the first rotation drive mechanism 300. The third rotation driving mechanism 320 includes a fourth fixing unit 321 fixed to the support base 210, a third rotating unit 322 fixed to the fourth fixing unit 321, and a first connection fixed to the first holding unit 121. A shaft 323 and a second connecting shaft 324 fixed to the second holding portion 123 are provided. Furthermore, the 1st holding | maintenance part 121 is connected with the 1st connection member 122 by the connection part a1. The second holding portion 123 is connected to the second connecting member 124 by the connecting portion b1.

  The third rotating means 322 and the first connecting shaft 323 have a bolt and nut relationship. The third rotating means 322 and the first connecting shaft 323 have a groove that meshes with each other so that the first connecting shaft 323 extends when the third rotating means 322 rotates in the σ1 direction. The third rotating means 322 and the second connecting shaft 324 are in a bolt-nut relationship. The third rotating means 322 and the second connecting shaft 324 have a groove that meshes with each other so that the second connecting shaft 324 extends when the third rotating means 322 rotates in the σ1 direction. Specifically, the first connecting shaft 323 and the second connecting shaft 324 are locked so as to mesh with the third rotating means 322, and the first holding portion 121 is switched by switching the rotation direction of the third rotating means 322. And the second holding portion 123 slide in opposite directions.

  For example, when the third rotating means 322 rotates in the σ1 direction, the first connecting shaft 323 extends, and the first holding unit 121 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). Similarly, when the third rotating means 322 rotates in the σ1 direction, the second connecting shaft 324 extends, and the second holding portion 123 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 away from each other, the substrate holding mechanism 120 is opened. As the third rotating means 322 rotates in the direction opposite to the σ1 direction, the first connecting shaft 323 contracts, and the first holding unit 121 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). Similarly, when the third rotating means 322 rotates in the direction opposite to the σ1 direction, the second connecting shaft 324 contracts, and the second holding portion 123 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). To do. By moving the first holding unit 121 and the second holding unit 123 in the approaching direction, the substrate holding mechanism 120 is closed.

  FIG. 6C shows the fourth rotation drive mechanism 330. The substrate transport apparatus 100 may include a fourth rotation drive mechanism 330 instead of the first rotation drive mechanism 300. The fourth rotation driving mechanism 330 includes a fifth fixing unit 331, a fourth rotating unit 332 fixed to the fifth fixing unit 331, a first nut 333 fixed to the first holding unit 121, and a second holding unit. And a second nut 334 fixed to 123. Further, the fourth rotation drive mechanism 330 includes a first rotation support member 335, a second rotation support member 336, and a screw shaft 337. The fifth fixing means 331, the first rotation support member 335, and the second rotation support member 336 are fixed to the support base 210.

  The first rotation support member 335 and the second rotation support member 336 support the screw shaft 337. Further, the screw shaft 337 is fixed to the fourth rotating means 332 via the first nut 333 and the second nut 334. The first nut 333, the second nut 334, and the screw shaft 337 are arranged so that the first holding part 121 and the second holding part 123 move in the opposite directions when the fourth rotating means 332 rotates in the σ1 direction. Grooves that engage each other are dug. Specifically, grooves are dug in opposite directions (reverse screw relationship) on both sides of the screw shaft 337 (the first rotation support member 335 side and the second rotation support member 336 side). Accordingly, the first holding unit 121 and the second holding unit 123 slide in the opposite directions.

  For example, when the fourth rotation unit 332 rotates in the σ1 direction, the first holding unit 121 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). Similarly, when the fourth rotating unit 332 rotates in the σ1 direction, the second holding unit 123 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 away from each other, the substrate holding mechanism 120 is opened. Further, as the fourth rotating means 332 rotates in the direction opposite to the σ1 direction, the first holding unit 121 moves in the α2 direction (downstream with respect to the transport direction α of the substrate B). As the fourth rotating means 332 rotates in the direction opposite to the σ1 direction, the second holding unit 123 moves in the α1 direction (upstream with respect to the transport direction α of the substrate B). By moving the first holding unit 121 and the second holding unit 123 in the approaching direction, the substrate holding mechanism 120 is closed.

  The configuration of the rotation drive mechanism is not limited to the first rotation drive mechanism 300, the second rotation drive mechanism 310, the third rotation drive mechanism 320, and the fourth rotation drive mechanism 330. As long as the first holding part 121 and the second holding part 123 are locked by the rotating means, and the first holding part 121 and the second holding part 123 move in the distance by the rotation of the rotating means, the configuration of the rotation drive mechanism is as follows. Is optional.

  The substrate transport apparatus and the substrate transport method of the present invention have been described above with reference to FIGS. According to the substrate transfer apparatus and the substrate transfer method of the present invention, the size of the substrate holding mechanism is not fixed, and the size of the substrate holding mechanism and the opening / closing width of the substrate holding mechanism are adjusted according to the size of the substrate to be transferred. Can do. As a result, it is possible to realize a substrate transfer apparatus that can handle transfer of various sizes of substrates without changing the components of the substrate holding mechanism.

According to the embodiment of the present invention, the substrate transport apparatus 100 is not limited to the walking beam type as long as the substrate holding mechanism 120 can be opened and closed in accordance with the size of the substrate to hold the lifted substrate.
The approaching / separating movement of the first holding unit 121 and the second holding unit 123 is not limited to the use of the rotation drive mechanism. Other known slide mechanisms can be used.

  According to the embodiment of the present invention, the first fixed base A1 and the second fixed base A2 have the same size. For example, the α-direction length (vertical length) of the first fixing base A1 and the α-direction length (vertical length) of the second fixing base A2 are 1700 mm, and the horizontal length of the first fixing base A1. The horizontal length of the second fixing base A2 is 2500 mm, but the size can be arbitrarily determined. One stroke corresponds to the distance from the center of the first fixed base A1 to the center of the second fixed base A2, and the distance is 2400 mm, but the center of the first fixed base A1 to the center of the second fixed base A2 The distance up to depends on the size of the first fixed base A1 and the second fixed base A2, and may be arbitrary.

  According to the embodiment of the present invention, as for the size of the substrate B, the α-direction length (vertical length) is 1200 mm and the horizontal length is 2200 mm, but the vertical 1500 mm and horizontal 1700 mm substrate. Alternatively, the substrate may be 1400 mm long and 2400 mm wide. Furthermore, even a substrate having a size different from these can be transferred.

  The relationship between the size of the fixing base for fixing the substrate and the size of the substrate is arbitrary. When the first fixing base A1 and the second fixing base A2 are larger than the substrate or the same size as the substrate, the first fixing base A1 and the second fixing base A2 can hold the entire surface of the substrate. When the first fixing base A1 and the second fixing base A2 hold the entire surface of the substrate, the entire surface of the substrate can be uniformly processed. In particular, when the fixed base functions as a heating base, the entire surface of the substrate can be heated uniformly. Further, when the fixed base functions as a cooling base, the entire surface of the substrate can be uniformly cooled. Note that according to the embodiment of the present invention, the fixing base is not limited to the configuration for holding the entire surface of the substrate. A configuration in which the size of the fixing base is smaller than the size of the substrate and the fixing base cannot hold the entire surface of the substrate is also within the scope of the present invention.

  According to the embodiment of the present invention, the substrate holding mechanism 120 moves at a speed of 500 mm / sec, but the moving speed and acceleration / deceleration of the substrate holding mechanism 120 are arbitrary. If the shape of the holding claw is L-shaped, it is possible to prevent the substrate from dropping off or the substrate from being displaced due to the conveyance. Therefore, it is possible to increase the acceleration / deceleration of the substrate holding mechanism 120 and shorten the conveyance time. .

  According to the embodiment of the present invention, the first fixed base A1 may include a first heat generating part that generates heat at the first temperature. Furthermore, the second fixing base A2 may include a second heat generating part that generates heat at the second temperature. Heat is applied to the substrate in accordance with the heat generation temperature. The heating temperature and cooling temperature for the substrate are arbitrary depending on the number of processing steps and the content of processing. For example, the first temperature and the second temperature are 40 ° C to 200 ° C. Whether the first temperature and the second temperature are the same or different, the substrate can be heat-treated at various temperatures during the transfer of the substrate.

  According to the embodiment of the present invention, three holding portions are connected to each of the first connecting member 122 and the second connecting member 124, but the number of holding portions to be connected is not limited. Depending on the scale of the substrate transfer apparatus and the number of processing steps, the number of holders to be connected can be arbitrarily determined.

  According to the embodiment of the present invention, the number of support pins included in the first support pin group 114 and the second support pin group 134 is not limited. As long as the substrate can be lifted, the number of support pins can be one or more. Further, the number of holding claws included in the first holding claw group 121d and the second holding claw group 123d is not limited. As long as the substrate can be held, the number of holding claws may be one or more.

  According to the substrate transfer device and the substrate transfer method of the present invention, a substrate transfer device capable of adjusting the size of the substrate holding mechanism in accordance with the size of the substrate to be transferred is realized. For example, it can be used for processing a glass substrate included in a liquid crystal display device or a plasma display device.

A processing base A1 first fixing base A2 second fixing base B substrate B1 first substrate B2 second substrate 100 substrate transport device 110 first substrate lifting mechanism 112 first lifting means 114 first support pin group 120 substrate holding mechanism 121 first 1 holding part 122 1st connection member 123 2nd holding part 124 2nd connection member 130 2nd board | substrate lifting mechanism

Claims (11)

A substrate transfer device for transferring a substrate on a processing table,
A substrate lifting mechanism for lifting the substrate from the processing table;
A substrate transfer device comprising: a substrate holding mechanism that opens and closes according to the size of the substrate and holds the lifted substrate. The processing table includes a first fixed table and a second fixed table,
The substrate holding mechanism moves between the first fixed base and the second fixed base,
The substrate transfer apparatus according to claim 1, wherein the substrate is transferred from the first fixed base to the second fixed base by cooperation of the substrate lifting mechanism and the substrate holding mechanism. The substrate holding mechanism is
A first holding unit for holding one of the substrates;
A second holding portion for holding the other one of the substrates different from the one,
The first holding unit and the second holding unit move along a transport direction of the substrate, and change a distance between the first holding unit and the second holding unit. The board | substrate conveyance apparatus of description. A guide rail provided along the transport direction of the substrate;
The first holding part and the second holding part move on the guide rail to open and close according to the size of the substrate,
The substrate transfer according to claim 3, wherein the first holding unit and the second holding unit move on the guide rail in order to transfer the substrate from the first fixed base to the second fixed base. apparatus. The substrate holding mechanism further includes a rotation driving mechanism,
The first holding part and the second holding part are locked to the rotation drive mechanism,
5. The substrate transfer apparatus according to claim 3, wherein the first holding unit and the second holding unit move in a near-far direction by rotation of the rotation drive mechanism.   The substrate transfer apparatus according to claim 2, wherein the first fixing base and the second fixing base hold the entire surface of the substrate. The first fixing base includes a first heat generating part that generates heat at a first temperature,
The substrate transfer apparatus according to claim 2, wherein the second fixing base includes a second heat generating portion that generates heat at a second temperature. A substrate transfer method for transferring a substrate on a processing table,
A substrate lifting step of lifting the substrate from the processing table;
And a substrate holding step of holding the lifted substrate that opens and closes in accordance with the size of the substrate. In a substrate transport apparatus comprising a substrate lifting mechanism that lifts the substrate from the processing table, and a substrate holding mechanism that opens and closes according to the size of the substrate and holds the lifted substrate.
The processing table includes a first fixed table and a second fixed table,
In the substrate holding step, the substrate holding mechanism performs a step of moving between the first fixed base and the second fixed base;
The substrate transfer method according to claim 8, wherein a step of transferring the substrate from the first fixed base to the second fixed base is executed by the substrate lifting step and the substrate holding step. The substrate holding mechanism is
A first holding unit for holding one of the substrates;
A second holding unit for holding the other one of the substrates different from the one;
A rotation drive mechanism in which the first holding part and the second holding part are locked;
The substrate transfer method according to claim 9, wherein, in the substrate holding step, the step of moving the first holding unit and the second holding unit in the near and far directions is performed by the rotation of the rotation driving mechanism. The substrate lifting mechanism includes a first substrate lifting mechanism and a second substrate lifting mechanism,
Lifting the substrate from the first fixed base by the one substrate lifting mechanism;
Reducing the distance between the first holding unit and the second holding unit according to the size of the substrate, and holding the lifted substrate by the substrate holding mechanism;
Lowering the first substrate lifting mechanism;
Moving the substrate holding mechanism from the first fixed base to the second fixed base;
Lifting the substrate from the substrate holding mechanism by the second substrate lifting mechanism;
Extending the distance between the first holding unit and the second holding unit, and separating the lifted substrate from the substrate holding mechanism;
Lowering the second substrate lifting mechanism and placing the substrate on the second fixed base;
The substrate transfer method according to claim 8, further comprising: moving the substrate holding mechanism from the second fixed base to the first fixed base.

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