JP2012177193A - 液体材料気化装置 - Google Patents
液体材料気化装置 Download PDFInfo
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- JP2012177193A JP2012177193A JP2012054917A JP2012054917A JP2012177193A JP 2012177193 A JP2012177193 A JP 2012177193A JP 2012054917 A JP2012054917 A JP 2012054917A JP 2012054917 A JP2012054917 A JP 2012054917A JP 2012177193 A JP2012177193 A JP 2012177193A
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- gas
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- cooling
- liquid material
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
【解決手段】液体材料LMとキャリアガスCGとを混合して気液混合体GLを生成する気液混合部1と、前記気液混合部1からの気液混合体GLを気化しこの気化によって生じたガスを前記キャリアガスCGによって外部へ導出する加熱型の気化部2と、前記気液混合部1と前記気化部2とを接続し、内部に前記気液混合体GLの流路を有する接続部3と、前記接続部3を冷却する接続部冷却部4と、を具備する。
【選択図】図1
Description
Claims (4)
- 液体材料とキャリアガスとを混合して気液混合体を生成する気液混合部と、
前記気液混合部からの気液混合体を気化しこの気化によって生じたガスを前記キャリアガスによって外部へ導出する加熱型の気化部とを具備し、
前記気化部が、捩ってスパイラル形状にした平板を路内に1又は複数配して成ることを特徴とする液体材料気化装置。 - 前記気化部の後段にフィルタが設けられていることを特徴とする請求項1記載の液体材料気化装置。
- 前記気化部が、ガス導入路と、ガス導出路と、これらガス導入路およびガス導出路の接続部分に設けられたノズル部とを具備したものであることを特徴とする請求項1記載の液体材料気化装置。
- 前記ノズル部よりも後ろにフィルタが設けられていることを特徴とする請求項3記載の液体材料気化装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012054917A JP5475817B2 (ja) | 2006-04-05 | 2012-03-12 | 液体材料気化装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006103803 | 2006-04-05 | ||
| JP2006103803 | 2006-04-05 | ||
| JP2012054917A JP5475817B2 (ja) | 2006-04-05 | 2012-03-12 | 液体材料気化装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008508715A Division JP5090341B2 (ja) | 2006-04-05 | 2007-04-04 | 液体材料気化装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012177193A true JP2012177193A (ja) | 2012-09-13 |
| JP5475817B2 JP5475817B2 (ja) | 2014-04-16 |
Family
ID=38563735
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008508715A Active JP5090341B2 (ja) | 2006-04-05 | 2007-04-04 | 液体材料気化装置 |
| JP2012054917A Active JP5475817B2 (ja) | 2006-04-05 | 2012-03-12 | 液体材料気化装置 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008508715A Active JP5090341B2 (ja) | 2006-04-05 | 2007-04-04 | 液体材料気化装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8280235B2 (ja) |
| EP (1) | EP2009137A4 (ja) |
| JP (2) | JP5090341B2 (ja) |
| KR (1) | KR101058976B1 (ja) |
| CN (3) | CN105256288A (ja) |
| WO (1) | WO2007114474A1 (ja) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014233655A (ja) * | 2013-05-31 | 2014-12-15 | 株式会社堀場エステック | 攪拌器及び攪拌器の製造方法 |
| JP2017104815A (ja) * | 2015-12-11 | 2017-06-15 | 株式会社堀場エステック | 液体材料気化装置 |
| WO2019082674A1 (ja) * | 2017-10-23 | 2019-05-02 | 株式会社堀場エステック | 気化装置及び気化装置用分離器 |
| WO2020039886A1 (ja) * | 2018-08-24 | 2020-02-27 | 株式会社堀場エステック | 気化器、液体材料気化装置、及び気化方法 |
| WO2024080180A1 (ja) * | 2022-10-12 | 2024-04-18 | 株式会社堀場エステック | 液体材料気化装置および液体材料気化方法 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8755679B2 (en) | 2006-04-05 | 2014-06-17 | Horiba Stec, Co., Ltd. | Liquid material vaporizer |
| JP5004890B2 (ja) * | 2008-07-24 | 2012-08-22 | 株式会社日立国際電気 | 気化器、基板処理装置及び半導体装置の製造方法 |
| US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
| JP6151943B2 (ja) * | 2013-03-26 | 2017-06-21 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
| KR102108802B1 (ko) | 2014-05-07 | 2020-05-11 | 현대자동차주식회사 | 연소실로 유입되는 흡기의 온도를 제어하기 위한 에어히터 및 그 작동방법 |
| KR102409471B1 (ko) * | 2014-12-22 | 2022-06-16 | 가부시키가이샤 호리바 에스텍 | 유체 가열기 |
| JP6450469B2 (ja) * | 2015-11-10 | 2019-01-09 | 東京エレクトロン株式会社 | 気化器、成膜装置及び温度制御方法 |
| KR102483924B1 (ko) | 2016-02-18 | 2023-01-02 | 삼성전자주식회사 | 기화기 및 이를 구비하는 박막 증착 장치 |
| US10983537B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
| JP7223496B2 (ja) * | 2017-12-14 | 2023-02-16 | 株式会社堀場エステック | 混合器及び気化装置 |
| KR102250139B1 (ko) | 2018-01-23 | 2021-05-10 | (주)티티에스 | 액체 소스 기화 장치 및 기화 방법 |
| CN110643975B (zh) * | 2018-06-27 | 2021-09-28 | 东北大学 | 一种金属有机化学源液体的蒸发输运装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69312436T2 (de) * | 1992-12-15 | 1998-02-05 | Applied Materials Inc | Verdampfung von flüssigen Reaktionspartnern für CVD |
| US5630878A (en) * | 1994-02-20 | 1997-05-20 | Stec Inc. | Liquid material-vaporizing and supplying apparatus |
| US5520001A (en) * | 1994-02-20 | 1996-05-28 | Stec, Inc. | Vapor controller |
| JP3893177B2 (ja) * | 1996-11-12 | 2007-03-14 | 松下電器産業株式会社 | 気化装置、cvd装置及び薄膜製造方法 |
| US6409839B1 (en) * | 1997-06-02 | 2002-06-25 | Msp Corporation | Method and apparatus for vapor generation and film deposition |
| US6258170B1 (en) * | 1997-09-11 | 2001-07-10 | Applied Materials, Inc. | Vaporization and deposition apparatus |
| CN1091170C (zh) * | 1998-02-18 | 2002-09-18 | 佛山市扬戈热处理有限公司 | 一种热处理工艺及设备 |
| JP2000345345A (ja) * | 1999-06-04 | 2000-12-12 | Mitsubishi Electric Corp | Cvd装置およびcvd装置用気化装置 |
| JP2001004095A (ja) * | 1999-06-18 | 2001-01-09 | Nippon M K S Kk | 気化器 |
| KR100360494B1 (ko) * | 1999-09-21 | 2002-11-13 | 삼성전자 주식회사 | 기화장치 |
| JP4251429B2 (ja) * | 2001-11-28 | 2009-04-08 | 株式会社堀場エステック | 液体材料気化装置 |
| JP3881569B2 (ja) * | 2002-03-13 | 2007-02-14 | 株式会社堀場エステック | 液体材料気化装置 |
| JP4276409B2 (ja) * | 2002-06-21 | 2009-06-10 | 株式会社堀場エステック | 液体材料気化装置 |
| JP4607474B2 (ja) * | 2004-02-12 | 2011-01-05 | 東京エレクトロン株式会社 | 成膜装置 |
-
2007
- 2007-04-04 EP EP07741029A patent/EP2009137A4/en not_active Withdrawn
- 2007-04-04 CN CN201510413970.9A patent/CN105256288A/zh active Pending
- 2007-04-04 CN CN201210352861.7A patent/CN102912319B/zh active Active
- 2007-04-04 US US12/295,862 patent/US8280235B2/en active Active
- 2007-04-04 WO PCT/JP2007/057593 patent/WO2007114474A1/ja not_active Ceased
- 2007-04-04 KR KR1020087024259A patent/KR101058976B1/ko active Active
- 2007-04-04 JP JP2008508715A patent/JP5090341B2/ja active Active
- 2007-04-04 CN CNA2007800109411A patent/CN101410548A/zh active Pending
-
2012
- 2012-03-12 JP JP2012054917A patent/JP5475817B2/ja active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014233655A (ja) * | 2013-05-31 | 2014-12-15 | 株式会社堀場エステック | 攪拌器及び攪拌器の製造方法 |
| JP2017104815A (ja) * | 2015-12-11 | 2017-06-15 | 株式会社堀場エステック | 液体材料気化装置 |
| WO2019082674A1 (ja) * | 2017-10-23 | 2019-05-02 | 株式会社堀場エステック | 気化装置及び気化装置用分離器 |
| JPWO2019082674A1 (ja) * | 2017-10-23 | 2020-09-17 | 株式会社堀場エステック | 気化装置及び気化装置用分離器 |
| JP7184794B2 (ja) | 2017-10-23 | 2022-12-06 | 株式会社堀場エステック | 気化装置及び気化装置用分離器 |
| WO2020039886A1 (ja) * | 2018-08-24 | 2020-02-27 | 株式会社堀場エステック | 気化器、液体材料気化装置、及び気化方法 |
| JPWO2020039886A1 (ja) * | 2018-08-24 | 2021-09-24 | 株式会社堀場エステック | 気化器、液体材料気化装置、及び気化方法 |
| JP7402801B2 (ja) | 2018-08-24 | 2023-12-21 | 株式会社堀場エステック | 気化器、液体材料気化装置、及び気化方法 |
| WO2024080180A1 (ja) * | 2022-10-12 | 2024-04-18 | 株式会社堀場エステック | 液体材料気化装置および液体材料気化方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090097831A1 (en) | 2009-04-16 |
| EP2009137A4 (en) | 2010-03-24 |
| WO2007114474A1 (ja) | 2007-10-11 |
| US8280235B2 (en) | 2012-10-02 |
| JPWO2007114474A1 (ja) | 2009-08-20 |
| CN102912319B (zh) | 2014-12-10 |
| CN105256288A (zh) | 2016-01-20 |
| JP5475817B2 (ja) | 2014-04-16 |
| EP2009137A1 (en) | 2008-12-31 |
| JP5090341B2 (ja) | 2012-12-05 |
| CN101410548A (zh) | 2009-04-15 |
| KR20080110603A (ko) | 2008-12-18 |
| KR101058976B1 (ko) | 2011-08-23 |
| CN102912319A (zh) | 2013-02-06 |
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