JP2012199380A - Formation method of electrical insulation resin rough surface - Google Patents
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Abstract
【課題】導体層及び絶縁樹脂層が交互に積層されてなる多層プリント配線板の絶縁樹脂粗化面形成方法において、絶縁樹脂に求められる低粗度且つ均一な粗化面をインプリント法により簡便に形成することを目的とする。
【解決手段】少なくとも(a)微細形状を有した面状の金型により前記絶縁樹脂層を上下から挟む工程と、(b)前記絶縁樹脂層を加圧及び硬化させる工程と、(c)前記金型及び前記絶縁樹脂層を引き剥がす工程と、を具備することを特徴とする。
【選択図】図1In a method for forming a roughened insulating resin surface of a multilayer printed wiring board in which conductor layers and insulating resin layers are alternately laminated, a low roughness and uniform roughened surface required for the insulating resin can be easily obtained by an imprint method. The purpose is to form.
At least (a) a step of sandwiching the insulating resin layer from above and below by a planar mold having a fine shape, (b) a step of pressing and curing the insulating resin layer, and (c) the above And a step of peeling off the mold and the insulating resin layer.
[Selection] Figure 1
Description
本発明は絶縁層と導体層を交互に積層する多層プリント配線板の製造方法に関する。例えば、プリント配線基板あるいは半導体パッケージ基板の製造に用いられている、導体層と絶縁層の密着をよくするために行う絶縁樹脂の粗化方法に関する。 The present invention relates to a method for manufacturing a multilayer printed wiring board in which insulating layers and conductor layers are alternately laminated. For example, the present invention relates to a method for roughening an insulating resin, which is used for manufacturing a printed wiring board or a semiconductor package substrate to improve adhesion between a conductor layer and an insulating layer.
近年電子機器の高機能化、小型・薄型化に伴い、電子部品の高密度実装化が急速に進展しつつある。これらを受けてプリント配線板、半導体パッケージ基板においては配線の微細化による配線の高密度化の要求が年々高まっている。 In recent years, with the increase in functionality, miniaturization and thinning of electronic devices, high-density mounting of electronic components is rapidly progressing. In response to these, in printed wiring boards and semiconductor package substrates, demands for higher wiring density due to finer wiring are increasing year by year.
プリント配線板、半導体パッケージ基板の製造方法として主にサブトラクティブ法とセミアディティブ法の2つの方法があり、一般的にセミアディティブ法が微細配線形成に有利となっている。 There are mainly two methods of manufacturing a printed wiring board and a semiconductor package substrate: a subtractive method and a semi-additive method, and the semi-additive method is generally advantageous for forming fine wiring.
セミアディティブ法による配線形成方法の一部を例をもって説明すると、エポキシ樹脂とガラスクロスからなるプリプレグと呼ばれる基材を銅板ではさみ、その上に絶縁樹脂をラミネートし絶縁層を形成する。作製した絶縁樹脂レーザー加工を行い微細なビアを形成した後、絶縁樹脂表面を粗化し、その後樹脂基板上に0.3〜3μm厚程度の薄い給電層を無電解めっきにより作製する。給電層上にフォトレジスト層を形成した後に、所望の回路パターンが描画されているマスクを介して紫外線露光することによって、配線回路を形成すべき部分の給電層が露出し、形成しない部分はフォトレジスト皮膜によって被覆されたレジストパターンを形成する。続いて給電層に電流を印加し、フォトレジストパターンを型とすることにより、配線回路を電解めっきにより形成する。続いてフォトレジストパターンをアルカリ剥離液にて除去し、給電層をエッチングにて除去することによって配線回路を形成する。 A part of the wiring forming method by the semi-additive method will be described as an example. A base material called a prepreg made of an epoxy resin and a glass cloth is sandwiched between copper plates, and an insulating resin is laminated thereon to form an insulating layer. After the formed insulating resin laser processing is performed to form fine vias, the surface of the insulating resin is roughened, and then a thin power supply layer having a thickness of about 0.3 to 3 μm is formed on the resin substrate by electroless plating. After forming a photoresist layer on the power supply layer, the portion of the power supply layer where the wiring circuit is to be formed is exposed by exposing it to ultraviolet rays through a mask on which a desired circuit pattern is drawn. A resist pattern covered with a resist film is formed. Subsequently, a current is applied to the power feeding layer, and a photoresist pattern is used as a mold, thereby forming a wiring circuit by electrolytic plating. Subsequently, the photoresist pattern is removed with an alkaline stripping solution, and the power feeding layer is removed by etching to form a wiring circuit.
セミアディティブ法で適用される絶縁樹脂の粗化工程は、始めに樹脂を膨潤させるコンディショナー処理を行い、次にアルカリ性過マンガン酸塩で処理することにより絶縁樹脂が溶解するという工程になる。粗化する液はアルカリ性過マンガン酸塩:40〜80g/l、温度:50〜80℃程度で使用しているが、この液は自家調整をおこなっているものがあり、それぞれの組成、条件が異なっている。絶縁樹脂表面の粗化処理は膨潤液、過マンガン酸塩溶液の濃度、温度、処理時間により変化する。また粗化液を均一に保つのは難しく、絶縁樹脂を均一に荒らすには粗化条件を十分に検討する必要がある。絶縁樹脂表面は、配線の微細化、高密度化の要求により、低粗度化、平坦化が求められている。 The roughening step of the insulating resin applied by the semi-additive method is a step in which the insulating resin is dissolved by first performing a conditioner treatment for swelling the resin and then treating with an alkaline permanganate. The liquid to be roughened is alkaline permanganate: 40-80 g / l, and temperature: 50-80 ° C., but this liquid has been self-adjusted. Is different. The roughening treatment on the surface of the insulating resin varies depending on the concentration of the swelling liquid and permanganate solution, the temperature, and the treatment time. Moreover, it is difficult to keep the roughening solution uniform, and it is necessary to thoroughly examine the roughening conditions in order to uniformly roughen the insulating resin. The surface of the insulating resin is required to have low roughness and flatness due to demands for finer wiring and higher density of wiring.
絶縁樹脂上に粗化面を形成するには過マンガン酸塩等の酸化剤を用いる方式が一般的である。しかしこの方式では粗化液の温度、処理時間などにより粗化面が大きく変化する、液の管理が難しいなどの問題がある。よって絶縁樹脂に均一な粗化面を形成する新たな方法が望まれていた。 In order to form a roughened surface on an insulating resin, a method using an oxidizing agent such as permanganate is common. However, this method has problems that the roughened surface changes greatly depending on the temperature of the roughening liquid, the processing time, etc., and that the liquid is difficult to manage. Therefore, a new method for forming a uniform roughened surface on the insulating resin has been desired.
絶縁樹脂の粗度は信号の伝達に影響するため、絶縁樹脂表面は粗度が小さく、平坦化が求められている。 Since the roughness of the insulating resin affects signal transmission, the surface of the insulating resin has a small roughness and is required to be flat.
微細な形状を高スループットに形成可能なインプリント装置があることが知られている。インプリントによる転写方法の一部を示すと、光硬化性樹脂をフィルム基板に塗布し、サブミクロン単位の微細な形状をもった金型を押し付け、光を照射し、その後引き剥がすことにより金型のパターンをフィルムに転写し、樹脂表面に微細な形状を形成する。インプリントは大面積転写に適しているため絶縁樹脂に微細な形状を形成するのに有用といえる。 It is known that there is an imprint apparatus capable of forming a fine shape with high throughput. A part of the imprint transfer method is to apply a photo-curing resin to a film substrate, press a mold with a fine shape of submicron unit, irradiate light, and then peel off the mold. The pattern is transferred to a film to form a fine shape on the resin surface. Since imprinting is suitable for large area transfer, it can be said that it is useful for forming a fine shape in an insulating resin.
絶縁樹脂の粗化方法は特許文献1〜4に見られるように、過マンガン酸などの酸化剤を用いておこなうのが一般的である。導体層との密着性の向上のための処理はいろいろと検討されているが、液管理が難しく、均一な粗化面の形成が難しい。特許文献5はインプリント法を用いて簡便かつ低コストにプリント配線板を作製するものであるが、インプリント法による微細回路パターン形成はコンタミネーションなど解決すべき問題が多い。 The roughening method of the insulating resin is generally performed using an oxidizing agent such as permanganic acid as seen in Patent Documents 1 to 4. Various treatments for improving the adhesion to the conductor layer have been studied, but it is difficult to manage the liquid and it is difficult to form a uniform roughened surface. Japanese Patent Application Laid-Open No. 2004-228561 uses a method of imprinting to produce a printed wiring board simply and at a low cost. However, forming a fine circuit pattern by imprinting has many problems to be solved such as contamination.
本発明は多層プリント配線板における微細回路パターン形成のなかで重要となる絶縁樹脂粗化面形成方法についての課題を解決するためのものである。絶縁樹脂粗化面形成は過マンガン酸塩等の酸化剤を用いておこなうのが一般的であり、液管理が難しく、均一な粗化面の形成が難しい。 The present invention is to solve the problem of a method for forming a roughened insulating resin surface, which is important in forming a fine circuit pattern in a multilayer printed wiring board. Insulating resin roughened surface formation is generally performed using an oxidizing agent such as permanganate, liquid management is difficult, and uniform roughened surface formation is difficult.
本発明はこのような問題に顧みて、絶縁樹脂に求められる低粗度且つ均一な粗化面をインプリント法により簡便に形成することで課題を解決することを目的とする。 In view of such a problem, an object of the present invention is to solve the problem by simply forming a low roughness and uniform roughened surface required for an insulating resin by an imprint method.
上記課題を解決するための本願請求項1の発明は、導体層及び絶縁樹脂層が交互に積層されてなる多層プリント配線板の絶縁樹脂粗化面形成方法において、少なくとも
(a)微細形状を有した面状の金型により前記絶縁樹脂層を上下から挟む工程と、
(b)前記絶縁樹脂層を加圧及び硬化させる工程と、
(c)前記金型及び前記絶縁樹脂層を引き剥がす工程と、
を具備することを特徴とする絶縁樹脂粗化面形成方法である。
In order to solve the above-mentioned problems, the invention of claim 1 is directed to a method for forming an insulating resin roughened surface of a multilayer printed wiring board in which conductor layers and insulating resin layers are alternately laminated. A step of sandwiching the insulating resin layer from above and below by a planar mold that is made
(B) pressurizing and curing the insulating resin layer;
(C) a step of peeling off the mold and the insulating resin layer;
The method for forming a roughened insulating resin surface is characterized by comprising:
また、本願請求項2の発明は、前記金型は、表面に径0.01〜2μm、高さ0.01〜0.5μmの突起がピッチ0.01〜2μmの範囲で一様に存在することを特徴とする請求項1に記載の絶縁樹脂粗化面形成方法である。 In the invention of claim 2, the mold has protrusions having a diameter of 0.01 to 2 μm and a height of 0.01 to 0.5 μm uniformly on the surface in a pitch range of 0.01 to 2 μm. The method for forming a roughened insulating resin surface according to claim 1.
また、本願請求項3の発明は、前記金型を用いて作製する絶縁樹脂粗化面は、JIS B 0633:2001に従って測定した表面粗さRaが10 nm〜200 nmの範囲であることを特徴とする請求項1又は2に記載の絶縁樹脂粗化面形成方法である。 In the invention of claim 3 of the present application, the roughened surface of the insulating resin produced using the mold has a surface roughness Ra measured in accordance with JIS B 0633: 2001 in the range of 10 nm to 200 nm. The method for forming a roughened insulating resin surface according to claim 1 or 2.
また、本願請求項4の発明は、前記絶縁樹脂層を上下から挟む工程の前に、前記金型の表面上に離形剤を均一に塗布することを特徴とする請求項1〜3の何れか1項に記載の絶縁樹脂粗化面形成方法である。 The invention of claim 4 of the present application is characterized in that a mold release agent is uniformly applied on the surface of the mold before the step of sandwiching the insulating resin layer from above and below. 2. A method for forming a roughened insulating resin surface according to item 1.
本願発明は、前述したように、絶縁樹脂粗化面形成において、層間絶縁をとるために樹脂を基板に真空ラミネートした後、熱硬化させる際に径0.01〜2μm、高さ0.01〜0.5μmの突起がピッチ0.01〜2μmの範囲で一様に存在する金型を上下から押
し付け、加圧・熱処理させることにより金型表面の形状を樹脂に転写させている。
また、本願発明は、離形剤を均一に塗布した金型を上下から押し付け、加圧した状態で樹脂を硬化させ、その後金型を樹脂から引き剥がす方法を採用している。
In the present invention, as described above, in forming the roughened insulating resin surface, the resin is vacuum laminated on the substrate in order to take interlayer insulation, and then thermally cured to have a diameter of 0.01 to 2 μm and a height of 0.01 to The shape of the surface of the mold is transferred to the resin by pressing a mold having protrusions of 0.5 μm uniformly in a pitch range of 0.01 to 2 μm from above and under pressure and heat treatment.
In addition, the present invention employs a method in which a metal mold uniformly coated with a release agent is pressed from above and below, the resin is cured under pressure, and then the metal mold is peeled off from the resin.
また、本願発明は、金型の表面形状を転写させることにより、JIS B 0633:2001に従って測定した絶縁樹脂粗化面の表面粗さRaが20nm〜200nmの範囲で制御可能な絶縁樹脂粗化面形成方法を採用している。 Further, the present invention provides a roughened insulating resin surface that can be controlled in a range of 20 nm to 200 nm in surface roughness Ra of the roughened insulating resin surface measured according to JIS B 0633: 2001 by transferring the surface shape of the mold. The forming method is adopted.
本願請求項1発明によれば、多層プリント配線板形成において、簡便な装置で低コストかつ高スループットに絶縁樹脂に粗化面を形成することができる。インプリント法により粗化面を形成するため、均一な粗化面を形成することが可能となる。粗化液を用いないため液管理の必要がなく、廃液が生まれないことから環境にも良いといえる。また上下から基板を金型で挟み込むことで反りと逓減することが可能となる。 According to the first aspect of the present invention, in forming a multilayer printed wiring board, a roughened surface can be formed on an insulating resin at a low cost and a high throughput with a simple apparatus. Since the roughened surface is formed by the imprint method, a uniform roughened surface can be formed. Since no roughening liquid is used, there is no need for liquid management, and no waste liquid is produced. In addition, it is possible to gradually reduce the warpage by sandwiching the substrate from above and below with a mold.
また本願請求項2の発明によれば、従来絶縁樹脂を変えることで達成してきた絶縁樹脂粗化面形成を微細な突起が一様に存在する金型を押し付けるというプロセスで達成できるため、樹脂によらず低粗度化可能となる。 Further, according to the invention of claim 2 of the present application, since the insulating resin roughened surface formation that has been achieved by changing the insulating resin can be achieved by a process of pressing a mold in which fine protrusions are uniformly present, Regardless of this, low roughness can be achieved.
また本願請求項3の発明によれば、絶縁粗化面上に微細回路が存在する部分を細かく、回路が存在しない箇所を粗くなど粗度をパターンにより変更することができるため、微細金属配線と下地である絶縁樹脂の密着性を向上させることが可能となる。
また本願請求項4の発明によれば、離形剤を金型表面上に塗布することで金型の引き剥がしが容易になり、金型を多数回の転写に用いることが可能となる。
According to the third aspect of the present invention, since the roughness can be changed by a pattern, such as a fine portion where the fine circuit exists on the insulating roughened surface and a rough portion where the circuit does not exist, the fine metal wiring and It becomes possible to improve the adhesiveness of the insulating resin as a base.
According to the invention of claim 4 of the present application, the mold can be easily peeled off by applying the release agent on the mold surface, and the mold can be used for many times of transfer.
本発明による絶縁樹脂粗化面形成方法の形態を図を用いて説明する。本発明による絶縁樹脂粗化面形成は樹脂ラミネートの際に行う。 An embodiment of a method for forming a roughened insulating resin surface according to the present invention will be described with reference to the drawings. Insulating resin roughened surface formation according to the present invention is performed during resin lamination.
回路形成された基板を乾燥させた後、両面にドライフィルム状の絶縁樹脂を仮張りする。次に絶縁樹脂が仮張りされた基板を真空状態にし、ラミネートを行う。その後平面プレスを行い、表面を平坦化する。その後ドライフィルム上に貼ってあるPETフィルムを剥離する。 After the circuit-formed substrate is dried, a dry film insulating resin is temporarily stretched on both sides. Next, the substrate on which the insulating resin is temporarily stretched is evacuated and laminated. Thereafter, flat pressing is performed to flatten the surface. Thereafter, the PET film stuck on the dry film is peeled off.
図1(a)では、この状態を、プリプレグ6に、導体層7を積層し、その上に絶縁樹脂層5を積層したもので例示している。 In FIG. 1A, this state is illustrated by a case where the conductor layer 7 is laminated on the prepreg 6 and the insulating resin layer 5 is laminated thereon.
次にPETフィルムが剥がされた絶縁樹脂5に、離形剤が塗布された、微細な突起が一様に存在する面状の金型1を上下から押し付け、絶縁樹脂層5と密着させたまま加圧・熱処理を行い、金型表面の微細な凹凸パターンをインプリント法により転写させる。加圧・熱処理を行い、樹脂を固めた後、金型1を引き剥がし、絶縁樹脂層5に粗化面を形成する。(図1(b))。このとき、金型1の端部に設けたアライメントパターンを利用し、金型と基板とのアライメントを行う。また図では、微細な凹凸パターンとして、サブミクロンピッチ(針径、ピッチ0.01〜1.0μm)の針状金型表面2、この針状金型表面2より粗いピッチ針径、ピッチ0.1〜2.0μm)の針状金型表面3で例示した。 Next, the planar mold 1 having fine projections uniformly applied is pressed from above and below to the insulating resin 5 from which the PET film has been peeled off, and the insulating resin layer 5 is kept in close contact therewith. Pressing and heat treatment are performed to transfer a fine uneven pattern on the mold surface by imprinting. After pressing and heat treatment to harden the resin, the mold 1 is peeled off to form a roughened surface on the insulating resin layer 5. (FIG. 1 (b)). At this time, alignment between the mold and the substrate is performed using an alignment pattern provided at the end of the mold 1. In the figure, as a fine uneven pattern, a needle-shaped mold surface 2 with a submicron pitch (needle diameter, pitch 0.01 to 1.0 μm), a pitch needle diameter coarser than this needle-shaped mold surface 2, pitch 0. The needle-shaped mold surface 3 of 1 to 2.0 μm) is exemplified.
作製した絶縁樹脂粗化面上にある離形剤の層は水、メタノール、イソプロピルアルコールなどの液に浸すか、UVオゾン洗浄などで取り除く。作製した絶縁樹脂にレーザー加工を行い微細なビアを形成した後、硫酸−過酸化水素混合液に浸し、ビア底の樹脂残りを除去する。その後、導電層を無電界銅めっき、電解銅めっきで形成し、微細配線パターンを作製する。 The release agent layer on the prepared insulating resin roughened surface is immersed in a liquid such as water, methanol, isopropyl alcohol, or removed by UV ozone cleaning or the like. After laser processing is performed on the manufactured insulating resin to form fine vias, the resin residue at the bottom of the vias is removed by dipping in a sulfuric acid-hydrogen peroxide mixture. Thereafter, the conductive layer is formed by electroless copper plating or electrolytic copper plating to produce a fine wiring pattern.
本発明による絶縁樹脂粗化面形成方法によれば、断面図1のような金型をインプリント法による絶縁樹脂粗化面形成方法により微細形状突起が一様に存在する金型表面の形状が反転された図2のようなパターンが樹脂表面に転写される。本発明による絶縁樹脂粗化面形成方法により図3のような断面形状を作製できる。本発明では図3のような断面形状をもった基板に電解銅めっき層作製、レジストパターン作製、パターン銅めっき形成、レジスト剥離、フラッシュエッチングなどの処理を繰り返し行うことで、多層プリント配線板を形成する。 According to the method for forming a roughened insulating resin surface according to the present invention, the shape of the mold surface on which the fine-shaped protrusions are uniformly present can be obtained by using the method shown in FIG. The inverted pattern as shown in FIG. 2 is transferred to the resin surface. The cross-sectional shape as shown in FIG. In the present invention, a multilayer printed wiring board is formed by repeatedly performing processes such as electrolytic copper plating layer preparation, resist pattern preparation, pattern copper plating formation, resist peeling, and flash etching on a substrate having a cross-sectional shape as shown in FIG. To do.
本発明による絶縁樹脂粗化面形成方法によれば、図1の様に絶縁樹脂を熱硬化させる際に上下から金型で加圧させているため、絶縁樹脂を平坦化することが可能となる。これにより配線パターンが微細になり、樹脂粗化面の平坦化に対する要求を解決できる。 According to the method for forming a roughened insulating resin surface according to the present invention, when the insulating resin is thermally cured as shown in FIG. . As a result, the wiring pattern becomes fine, and the demand for flattening the roughened resin surface can be solved.
絶縁樹脂層としては、熱硬化性樹脂のエポキシ樹脂やビスマレイミドトリアジン樹脂、イミド樹脂、アリル化フェニレンエーテル樹脂、熱可塑性樹脂の液晶ポリマー、PEEK樹脂、PTFE樹脂などが列挙されるが、中でもシリカフィラー含有率が高いエポキシ樹脂を使用すると絶縁性、誘電特性、耐熱性、寸法安定性、平坦性、熱膨張性、柔軟性が良く、プリント配線板を作る上で好ましい。 Examples of the insulating resin layer include thermosetting resin epoxy resin, bismaleimide triazine resin, imide resin, allylated phenylene ether resin, thermoplastic resin liquid crystal polymer, PEEK resin, PTFE resin, etc., among which silica filler When an epoxy resin having a high content is used, insulation, dielectric properties, heat resistance, dimensional stability, flatness, thermal expansion, and flexibility are good, and this is preferable for making a printed wiring board.
離形剤としては、シリコーン系離形剤やフッ素系離形剤が使用されるが、フッ素系離形剤を用いれば薄膜塗布性(数十nm程度)、離形性(接触角100°以上)など優れた特性を示すため、絶縁樹脂粗化面形成に用いる離形剤として好ましい。 Silicone release agents and fluorine release agents are used as release agents, but if fluorine release agents are used, thin film coatability (about several tens of nanometers), release properties (contact angle of 100 ° or more) ) And the like, it is preferable as a release agent used for forming a roughened insulating resin surface.
径0.01〜2.0μm、高さ0.01〜0.5μmの突起がピッチ0.01〜2.0μmの範囲で存在する金型により金型表面形状を反転させた無数の穴がある絶縁樹脂表面を作製することが可能となる。上記の範囲であれば絶縁樹脂層と無電解銅めっきの層を十分に密着させることができる。これは次世代のプリント配線板に求められている低粗度の粗化面に近く、絶縁樹脂粗化面形状として好ましい。 There are innumerable holes in which the mold surface shape is inverted by a mold having protrusions having a diameter of 0.01 to 2.0 μm and a height of 0.01 to 0.5 μm in a pitch range of 0.01 to 2.0 μm. An insulating resin surface can be produced. If it is said range, an insulating resin layer and the layer of electroless copper plating can fully be stuck. This is close to the rough surface with low roughness required for the next-generation printed wiring board, and is preferable as the rough shape of the insulating resin rough surface.
金型の材料としては石英、シリコン(Si)、シリコンカーバイト(SiC)、グラッシーカーボン(GC)、ニッケル(Ni)、タンタル(Ta)などが列挙されるが、中でも石英モールドを用いれば耐熱性、高剛性、耐薬品性、微細加工性に優れ、絶縁粗化面形成金型として好ましい。 Quartz, silicon (Si), silicon carbide (SiC), glassy carbon (GC), nickel (Ni), tantalum (Ta), and the like are listed as mold materials. High rigidity, chemical resistance, and fine workability are preferable as an insulating roughened surface forming mold.
本発明による絶縁樹脂粗化面形成用金型の作製方法の一例を示す。石英基板上に電子ビームレジストを塗布し、電子ビームを露光現像し、微細な形状を持った電子ビームレジストパターンの層を作製する。次にドライエッチングにより、表面にサブミクロンピッチの突起が一様に存在する石英金型を作製する。その後レジスト層を除去する。電子ビームリソグラフィを用いることで金型のパターンを高精度に作製でき、金型を自由に制御することが可能となる。 An example of the manufacturing method of the metal mold | die for insulating resin roughening surface formation by this invention is shown. An electron beam resist is applied onto a quartz substrate, and the electron beam is exposed and developed to produce an electron beam resist pattern layer having a fine shape. Next, by dry etching, a quartz mold having submicron pitch protrusions uniformly present on the surface is produced. Thereafter, the resist layer is removed. By using electron beam lithography, a mold pattern can be produced with high accuracy, and the mold can be freely controlled.
本発明における多層プリント配線板形成において、レーザーにUVレーザーを用いれば現在主流のCO2レーザーよりも短波長であるため小径なビアを形成できる。またUVレーザーは絶縁樹脂、銅に対して吸収しやすいため、熱影響の少ない加工が可能となる。 In forming a multilayer printed wiring board according to the present invention, if a UV laser is used as a laser, a via having a small diameter can be formed because it has a shorter wavelength than the current mainstream CO2 laser. Moreover, since UV laser is easy to absorb with respect to insulating resin and copper, processing with little heat influence is attained.
本発明における多層プリント配線板形成において、UVレーザーでビア形成後に硫酸‐過酸化水素水混合液でソフトエッチングを行えば、ビア底の樹脂残渣を除去するために行うデスミア処理を行わなくてよい。樹脂表面粗化にも過マンガン酸などの酸化剤を用いないため、多層プリント配線板の形成において、デスミア液の管理が必要ない、廃液が生まれないなどの利点がある。 In the formation of the multilayer printed wiring board in the present invention, if soft etching is performed with a sulfuric acid-hydrogen peroxide mixture after forming vias with a UV laser, it is not necessary to perform desmearing treatment to remove the resin residue on the bottom of the vias. Since an oxidizing agent such as permanganic acid is not used for the roughening of the resin surface, there is an advantage that in the formation of the multilayer printed wiring board, management of the desmear liquid is not necessary and no waste liquid is generated.
本発明による絶縁樹脂粗化面形成方法によれば、金型の設計により配線パターンによって粗度を制御できる。これにより絶縁樹脂上にプリント配線板の配線パターンが有る場合には0.01μm〜1.0μmピッチの突起が一様に存在する金型を転写させ、粗度を大きく (細かく凹凸を設ける)し、アンカー効果により下地の銅との密着性を向上させる。絶縁樹脂上にパターンがない部分については粗度0.1〜2.0μmのピッチの突起が一様に存在する金型を転写させ、粗度を小さく(粗く凹凸を設ける)することで無電解銅めっきの層を除去しやすくする。以上により多層プリント配線板における配線パターンの密着性、線間の絶縁信頼性を向上させることが期待できる。 According to the method for forming a roughened insulating resin surface according to the present invention, the roughness can be controlled by the wiring pattern by designing the mold. As a result, when there is a printed wiring board wiring pattern on the insulating resin, a mold having protrusions with a pitch of 0.01 μm to 1.0 μm uniformly is transferred to increase the roughness (provide fine irregularities). The adhesion with the underlying copper is improved by the anchor effect. For areas where there is no pattern on the insulating resin, electroless transfer is performed by transferring a mold in which protrusions with a pitch of 0.1 to 2.0 μm are uniformly present, and reducing the roughness (roughly uneven). Make it easier to remove the copper plating layer. As described above, it can be expected that the adhesion of the wiring pattern in the multilayer printed wiring board and the insulation reliability between the lines are improved.
本発明による絶縁樹脂粗化面形成方法は、従来の樹脂ラミネートの工程である回路形成された基板の両面に真空状態でドライフィルムをラミネートし、オーブンで熱硬化させて絶縁層を形成させる工程を応用している。本発明の工程の詳細を示す。多層プリント配線基板を乾燥させ、層間絶縁膜として熱で硬化する性質をもつエポキシ樹脂を仮張りした。次に真空ラミネートにより配線間に樹脂を埋め込んだ。次に平面プレスを行い、絶縁樹脂層を平坦化し、PETフィルムを剥離した。次にフッ素系離形剤を均一に塗布した微細な突起形状が一様に存在する金型を挟み込むようにプレスし、樹脂表面に粗化面を作製し、その後金型を密着させたまま樹脂を焼き固め(180℃/30min)、固まった後金型を引き剥がした。 The method for forming a roughened insulating resin surface according to the present invention includes a step of laminating a dry film in a vacuum state on both sides of a circuit-formed substrate, which is a conventional resin laminating step, and thermally curing in an oven to form an insulating layer. Applied. The detail of the process of this invention is shown. The multilayer printed wiring board was dried, and an epoxy resin having a property of being cured by heat as an interlayer insulating film was temporarily attached. Next, resin was embedded between the wirings by vacuum lamination. Next, flat pressing was performed to flatten the insulating resin layer, and the PET film was peeled off. Next, press the mold so that the fine protrusions uniformly coated with the fluorine-based mold release agent are sandwiched between them, create a roughened surface on the resin surface, and then keep the mold in close contact with the resin. Was hardened (180 ° C./30 min), and after solidifying, the mold was peeled off.
作製した絶縁樹脂粗化面上にある離形剤の層は、UVオゾン洗浄で取り除いた。その後UVレーザー加工でビア穴を形成し、硫酸−過酸化水素混合液に浸し、ビア底の樹脂残りを除去した。その後、無電解銅めっき、ドライフィルムパターン形成、電解銅めっきで回路形成を行った。 The release agent layer on the produced insulating resin roughened surface was removed by UV ozone cleaning. Thereafter, via holes were formed by UV laser processing and immersed in a sulfuric acid-hydrogen peroxide mixture to remove the resin residue on the bottom of the via. Then, circuit formation was performed by electroless copper plating, dry film pattern formation, and electrolytic copper plating.
以上説明したように、多層プリント配線板作製における本発明の絶縁樹脂粗化面形成法によれば、粗化液を用いることなく金型により絶縁樹脂表面を荒らすことが可能となる。すなわち、金型を制御することで、絶縁樹脂を適切に荒らすことができる。また次世代の絶縁樹脂に求められている粗化面の平坦化、低粗度化を達成することが可能となる。粗化工程をやらずにすむのでセミアディティブ法による多層プリント板配線形成工程の短縮につながり、安価にプリント配線板を作製できるといえる。 As described above, according to the method for forming a roughened insulating resin surface of the present invention in the production of a multilayer printed wiring board, the surface of the insulating resin can be roughened with a mold without using a roughening solution. That is, the insulating resin can be appropriately roughened by controlling the mold. In addition, it is possible to achieve the flattened rough surface and low roughness required for the next generation insulating resin. Since the roughening process is not required, the process for forming a multilayer printed board wiring by the semi-additive method can be shortened, and it can be said that the printed wiring board can be manufactured at a low cost.
さらに、本発明は、従来過マンガン酸塩等の酸化剤により行っていた粗化を微細形状をもった金型を転写し行うことで、薬液コスト、廃液の処理コストを低減でき、環境にもよい。また回路パターンにより粗化形状を変化させることで、金属配線パターンがある箇所だけ下地の基板との密着性をよくできるため配線間の絶縁信頼性の向上が期待できる。また絶縁樹脂の表面のみ粗化することが可能であるため、層間絶縁性の向上も期待できる。さらにインプリント法により粗化を行うためプリント基板の反りを抑えられる。本技術は多層プリント配線板の性能向上につながり、樹脂の密着を必要とするすべてのデバイス作製工程で広く適用することが可能である。 Furthermore, the present invention can reduce the chemical solution cost and the waste liquid processing cost by transferring a mold having a fine shape to the roughening, which has been conventionally performed by an oxidizing agent such as permanganate, and is also effective for the environment. Good. In addition, by changing the roughened shape according to the circuit pattern, it is possible to improve the adhesion with the base substrate only at a place where the metal wiring pattern is present, and thus it is possible to improve the insulation reliability between the wirings. Further, since only the surface of the insulating resin can be roughened, an improvement in interlayer insulation can be expected. Further, since the roughening is performed by the imprint method, the warping of the printed circuit board can be suppressed. This technique leads to an improvement in the performance of the multilayer printed wiring board, and can be widely applied to all device manufacturing processes that require resin adhesion.
1 金型
2 サブミクロンピッチ(針径、ピッチ0.01〜1.0μm)の針状金型表面
3 2より粗いピッチ(針径、ピッチ0.1〜2.0μm)の針状金型表面
4 アライメント用パターン
5 絶縁樹脂層
6 プリプレグ
7 導体層
8 絶縁樹脂粗化用金型上面図
9 インプリント法による粗化面作製後のプリント配線板断面図例
10 スルーホール
11 金属配線パターン
1 Mold 2 Needle-shaped mold surface with submicron pitch (needle diameter, pitch 0.01 to 1.0 μm) 32 Needle-shaped mold surface with coarser pitch (needle diameter, pitch 0.1 to 2.0 μm) 4 Alignment Pattern 5 Insulating Resin Layer 6 Prepreg 7 Conductor Layer 8 Insulating Resin Roughening Mold Top View 9 Printed Wiring Board Cross Section Example After Roughening Surface Fabrication by Imprint Method 10 Through Hole 11 Metal Wiring Pattern
Claims (4)
(a)微細形状を有した面状の金型により前記絶縁樹脂層を上下から挟む工程と、
(b)前記絶縁樹脂層を加圧及び硬化させる工程と、
(c)前記金型及び前記絶縁樹脂層を引き剥がす工程と、
を具備することを特徴とする絶縁樹脂粗化面形成方法。 In a method for forming a roughened insulating resin surface of a multilayer printed wiring board in which conductor layers and insulating resin layers are alternately laminated, at least (a) the insulating resin layer is sandwiched from above and below by a planar mold having a fine shape. Process,
(B) pressurizing and curing the insulating resin layer;
(C) a step of peeling off the mold and the insulating resin layer;
An insulating resin roughened surface forming method comprising:
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| JP2011062332A JP2012199380A (en) | 2011-03-22 | 2011-03-22 | Formation method of electrical insulation resin rough surface |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2011062332A JP2012199380A (en) | 2011-03-22 | 2011-03-22 | Formation method of electrical insulation resin rough surface |
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| JP2012199380A true JP2012199380A (en) | 2012-10-18 |
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| JP (1) | JP2012199380A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015195364A (en) * | 2014-03-27 | 2015-11-05 | 積水化学工業株式会社 | Manufacturing method of laminated structure |
| JP2016178210A (en) * | 2015-03-20 | 2016-10-06 | 日本特殊陶業株式会社 | Wiring board manufacturing method |
| JP2024138542A (en) * | 2020-10-28 | 2024-10-08 | 大日本印刷株式会社 | Wiring board and method for manufacturing the same |
-
2011
- 2011-03-22 JP JP2011062332A patent/JP2012199380A/en not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015195364A (en) * | 2014-03-27 | 2015-11-05 | 積水化学工業株式会社 | Manufacturing method of laminated structure |
| JP2016178210A (en) * | 2015-03-20 | 2016-10-06 | 日本特殊陶業株式会社 | Wiring board manufacturing method |
| JP2024138542A (en) * | 2020-10-28 | 2024-10-08 | 大日本印刷株式会社 | Wiring board and method for manufacturing the same |
| JP7751814B2 (en) | 2020-10-28 | 2025-10-09 | 大日本印刷株式会社 | Wiring board and method for manufacturing the same |
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