JP2013225672A5 - - Google Patents

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Publication number
JP2013225672A5
JP2013225672A5 JP2013066480A JP2013066480A JP2013225672A5 JP 2013225672 A5 JP2013225672 A5 JP 2013225672A5 JP 2013066480 A JP2013066480 A JP 2013066480A JP 2013066480 A JP2013066480 A JP 2013066480A JP 2013225672 A5 JP2013225672 A5 JP 2013225672A5
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JP
Japan
Prior art keywords
frequency power
power source
frequency
upper electrode
resonant circuit
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Pending
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JP2013066480A
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English (en)
Japanese (ja)
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JP2013225672A (ja
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Priority claimed from US13/433,004 external-priority patent/US9881772B2/en
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Publication of JP2013225672A publication Critical patent/JP2013225672A/ja
Publication of JP2013225672A5 publication Critical patent/JP2013225672A5/ja
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JP2013066480A 2012-03-28 2013-03-27 プラズマ均一性調整のためのマルチ高周波インピーダンス制御 Pending JP2013225672A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/433,004 US9881772B2 (en) 2012-03-28 2012-03-28 Multi-radiofrequency impedance control for plasma uniformity tuning
US13/433,004 2012-03-28

Related Child Applications (1)

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JP2018101938A Division JP6623256B2 (ja) 2012-03-28 2018-05-29 プラズマ均一性調整のためのマルチ高周波インピーダンス制御

Publications (2)

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JP2013225672A JP2013225672A (ja) 2013-10-31
JP2013225672A5 true JP2013225672A5 (2) 2016-05-12

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JP2013066480A Pending JP2013225672A (ja) 2012-03-28 2013-03-27 プラズマ均一性調整のためのマルチ高周波インピーダンス制御
JP2018101938A Active JP6623256B2 (ja) 2012-03-28 2018-05-29 プラズマ均一性調整のためのマルチ高周波インピーダンス制御

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JP2018101938A Active JP6623256B2 (ja) 2012-03-28 2018-05-29 プラズマ均一性調整のためのマルチ高周波インピーダンス制御

Country Status (6)

Country Link
US (2) US9881772B2 (2)
JP (2) JP2013225672A (2)
KR (1) KR102153141B1 (2)
CN (1) CN103367206B (2)
SG (2) SG193760A1 (2)
TW (2) TWI538571B (2)

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