JP2013242302A5 - - Google Patents
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- Publication number
- JP2013242302A5 JP2013242302A5 JP2013089059A JP2013089059A JP2013242302A5 JP 2013242302 A5 JP2013242302 A5 JP 2013242302A5 JP 2013089059 A JP2013089059 A JP 2013089059A JP 2013089059 A JP2013089059 A JP 2013089059A JP 2013242302 A5 JP2013242302 A5 JP 2013242302A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- primary
- ion
- irradiated
- spectral data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002500 ions Chemical class 0.000 claims 30
- 230000003595 spectral effect Effects 0.000 claims 8
- 238000004458 analytical method Methods 0.000 claims 7
- 238000001228 spectrum Methods 0.000 claims 4
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000005011 time of flight secondary ion mass spectroscopy Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013089059A JP6180779B2 (ja) | 2012-04-24 | 2013-04-22 | 分析方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012099032 | 2012-04-24 | ||
| JP2012099032 | 2012-04-24 | ||
| JP2013089059A JP6180779B2 (ja) | 2012-04-24 | 2013-04-22 | 分析方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013242302A JP2013242302A (ja) | 2013-12-05 |
| JP2013242302A5 true JP2013242302A5 (2) | 2016-03-10 |
| JP6180779B2 JP6180779B2 (ja) | 2017-08-16 |
Family
ID=49379228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013089059A Expired - Fee Related JP6180779B2 (ja) | 2012-04-24 | 2013-04-22 | 分析方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8772712B2 (2) |
| JP (1) | JP6180779B2 (2) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201308505D0 (en) * | 2013-05-13 | 2013-06-19 | Ionoptika Ltd | Use of a gas cluster ion beam containing hydrocarbon for sample analysis |
| CA2996854C (en) * | 2015-09-11 | 2022-11-29 | Ion-Tof Technologies Gmbh | Secondary ion mass spectrometer and secondary ion mass spectrometric method |
| JP6645379B2 (ja) * | 2016-08-09 | 2020-02-14 | 住友電気工業株式会社 | 質量分析方法 |
| EP3290913B1 (de) * | 2016-09-02 | 2022-07-27 | ION-TOF Technologies GmbH | Sekundärionenmassenspektrokopisches verfahren, system und verwendungen hiervon |
| WO2018116138A1 (en) | 2016-12-19 | 2018-06-28 | Perkinelmer Health Sciences Canada, Inc. | Inorganic and organic mass spectrometry systems and methods of using them |
| JP7185620B2 (ja) * | 2017-04-04 | 2022-12-07 | 株式会社半導体エネルギー研究所 | 有機半導体素子の分析方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887743A (ja) * | 1981-11-17 | 1983-05-25 | Shimadzu Corp | 二次イオン質量分析計 |
| US4851669A (en) * | 1988-06-02 | 1989-07-25 | The Regents Of The University Of California | Surface-induced dissociation for mass spectrometry |
| US5087815A (en) * | 1989-11-08 | 1992-02-11 | Schultz J Albert | High resolution mass spectrometry of recoiled ions for isotopic and trace elemental analysis |
| US5527731A (en) * | 1992-11-13 | 1996-06-18 | Hitachi, Ltd. | Surface treating method and apparatus therefor |
| JP3658397B2 (ja) * | 2002-06-28 | 2005-06-08 | キヤノン株式会社 | 飛行時間型二次イオン質量分析法による素子の情報取得方法、および、情報取得装置 |
| US6989528B2 (en) * | 2003-06-06 | 2006-01-24 | Ionwerks, Inc. | Gold implantation/deposition of biological samples for laser desorption three dimensional depth profiling of tissues |
| DE102005027937B3 (de) * | 2005-06-16 | 2006-12-07 | Ion-Tof Gmbh | Verfahren zur Analyse einer Festkörperprobe |
| US7687771B2 (en) * | 2006-01-12 | 2010-03-30 | Ionics Mass Spectrometry Group | High sensitivity mass spectrometer interface for multiple ion sources |
| JP5142580B2 (ja) * | 2006-06-29 | 2013-02-13 | キヤノン株式会社 | 表面解析方法および表面解析装置 |
| JP2008175654A (ja) | 2007-01-17 | 2008-07-31 | Asahi Kasei Corp | Ｔｏｆ−ｓｉｍｓを用いた混合有機化合物の組成割合の特定方法 |
| EP2056333B1 (de) * | 2007-10-29 | 2016-08-24 | ION-TOF Technologies GmbH | Flüssigmetallionenquelle, Sekundärionenmassenspektrometer, sekundärionenmassenspektrometisches Analyseverfahren sowie deren Verwendungen |
| US7825389B2 (en) * | 2007-12-04 | 2010-11-02 | Tel Epion Inc. | Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture |
| EP2270480A4 (en) * | 2008-04-23 | 2014-01-15 | Ulvac Inc | ANALYTICAL METHOD |
| GB2460855B (en) * | 2008-06-11 | 2013-02-27 | Kratos Analytical Ltd | Electron spectroscopy |
| CN102106017B (zh) | 2008-08-13 | 2015-06-24 | 三菱化学株式会社 | 有机电致发光元件、有机电致发光显示装置以及有机电致发光光源 |
| JP2011029043A (ja) | 2009-07-27 | 2011-02-10 | Hyogo Prefecture | 質量分析器および質量分析方法 |
| US8651048B2 (en) * | 2010-04-21 | 2014-02-18 | University Of North Texas | Controlled deposition of metal and metal cluster ions by surface field patterning in soft-landing devices |
| EP2560576B1 (en) * | 2010-04-22 | 2018-07-18 | Micell Technologies, Inc. | Stents and other devices having extracellular matrix coating |
| JP5031066B2 (ja) * | 2010-05-26 | 2012-09-19 | 兵庫県 | クラスタービーム発生装置、基板処理装置、クラスタービーム発生方法及び基板処理方法 |
| US8614416B2 (en) * | 2010-06-08 | 2013-12-24 | Ionwerks, Inc. | Nonoparticulate assisted nanoscale molecular imaging by mass spectrometery |
-
2013
- 2013-04-16 US US13/863,698 patent/US8772712B2/en not_active Expired - Fee Related
- 2013-04-22 JP JP2013089059A patent/JP6180779B2/ja not_active Expired - Fee Related
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