JP2013509604A5 - - Google Patents

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JP2013509604A5
JP2013509604A5 JP2012535777A JP2012535777A JP2013509604A5 JP 2013509604 A5 JP2013509604 A5 JP 2013509604A5 JP 2012535777 A JP2012535777 A JP 2012535777A JP 2012535777 A JP2012535777 A JP 2012535777A JP 2013509604 A5 JP2013509604 A5 JP 2013509604A5
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JP2012535777A 2009-10-28 2010-10-26 光源及びマスクの最適化のためのパターン選択方法 Active JP5666609B2 (ja)

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US25573809P 2009-10-28 2009-10-28
US61/255,738 2009-10-28
US36040410P 2010-06-30 2010-06-30
US61/360,404 2010-06-30
PCT/EP2010/066106 WO2011051249A1 (en) 2009-10-28 2010-10-26 Method of pattern selection for source and mask optimization

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JP2013509604A JP2013509604A (ja) 2013-03-14
JP2013509604A5 true JP2013509604A5 (2) 2013-12-12
JP5666609B2 JP5666609B2 (ja) 2015-02-12

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JP2010235012A Active JP5156075B2 (ja) 2009-10-28 2010-10-20 フルチップ光源およびマスク最適化のためのパターン選択
JP2010235013A Active JP5433550B2 (ja) 2009-10-28 2010-10-20 回折シグネチャ解析に基づく設計レイアウト内の最適なパターンの選択
JP2012535777A Active JP5666609B2 (ja) 2009-10-28 2010-10-26 光源及びマスクの最適化のためのパターン選択方法

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JP2010235013A Active JP5433550B2 (ja) 2009-10-28 2010-10-20 回折シグネチャ解析に基づく設計レイアウト内の最適なパターンの選択

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US (5) US8739082B2 (2)
JP (3) JP5156075B2 (2)
KR (2) KR101800758B1 (2)
CN (3) CN102597872B (2)
NL (2) NL2005523A (2)
TW (3) TWI463245B (2)
WO (1) WO2011051249A1 (2)

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