JP2014103113A - 有機発光素子用基板、その製造方法、及びこれを具備する有機発光装置 - Google Patents
有機発光素子用基板、その製造方法、及びこれを具備する有機発光装置 Download PDFInfo
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- JP2014103113A JP2014103113A JP2013237984A JP2013237984A JP2014103113A JP 2014103113 A JP2014103113 A JP 2014103113A JP 2013237984 A JP2013237984 A JP 2013237984A JP 2013237984 A JP2013237984 A JP 2013237984A JP 2014103113 A JP2014103113 A JP 2014103113A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
- C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
- C03C10/0045—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0028—Compositions for glass with special properties for crystal glass, e.g. lead-free crystal glass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
- Dispersion Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Glass Compositions (AREA)
Abstract
【解決手段】このために、本発明は、有機発光素子が蒸着される基板であって、透明結晶化ガラスからなり、内部に多数の結晶化粒子が分布されていることを特徴とする有機発光素子用基板、その製造方法、及びこれを具備する有機発光装置を提供する。
【選択図】図1
Description
結晶促進促進剤を含むリチウムアルミノシリケート系ガラスを850℃で1時間熱処理して透明結晶化ガラスを製造した。そして、該製造した透明結晶化ガラスを対象として、透過率、反射率、及び結晶化度を測定した結果、最大の透過率は87.6%、反射率は8.43%、結晶化度は84%と測定された。
前記実施例1と同様な組成のガラスを850℃で2時間熱処理して透明結晶化ガラスを製造した。そして、該製造した透明結晶化ガラスを対象として、透過率、反射率、及び結晶化度を測定した結果、最大の透過率は87.9%、反射率は8.43%、結晶化度は87%と測定された。
前記実施例1と同様な組成のガラスを900℃で1時間熱処理して透明結晶化ガラスを製造した。そして、該製造した透明結晶化ガラスを対象として、透過率、反射率、及び結晶化度を測定した結果、最大の透過率は83.6%、反射率は9.06%、結晶化度は88%と測定された。
前記実施例1と同様な組成のガラスを1000℃で1時間熱処理して透明結晶化ガラスを製造した。そして、該製造した透明結晶化ガラスを対象として、透過率、反射率、及び結晶化度を測定した結果、最大の透過率は60.5%、反射率は24.07%、結晶化度は89%と測定された。
前記実施例1と同様な組成のガラスを対象として、熱処理前の透過率、反射率、及び結晶化度を測定した結果、最大の透過率は87.6%、反射率は8.0%、結晶化度は84%と測定された。
110 結晶化粒子
Claims (11)
- 有機発光素子が蒸着される基板であって、
透明結晶化ガラスからなり、内部に多数の結晶化粒子が分布されていることを特徴とする有機発光素子用基板。 - 前記結晶化粒子は、0.01〜3μmの大きさを有することを特徴とする請求項1に記載の有機発光素子用基板。
- 前記透明結晶化ガラスは、10〜25体積%の非晶質構造を含むことを特徴とする請求項1または2に記載の有機発光素子用基板。
- 前記透明結晶化ガラスは、リチウムアルミノシリケート系ガラスであることを特徴とする請求項1〜3のいずれかに記載の有機発光素子用基板。
- 前記結晶化粒子は、コーディエライト(cordierite)、シリカ(silica)、ユークリプタイト(eucryptite)、及びスポジュメン(spodumene)のうちの少なくとも一つの結晶相からなることを特徴とする請求項4に記載の有機発光素子用基板。
- 表面粗度(RRMS)が0.01μm以下であることを特徴とする請求項1〜5のいずれかに記載の有機発光素子用基板。
- 可視光透過率が50%以上であることを特徴とする請求項1〜6のいずれかに記載の有機発光素子用基板。
- 有機発光素子が蒸着される透明結晶化ガラスからなる基板を製造する方法であって、
結晶化粒子を析出させる結晶促進促進剤を含む前記透明結晶化ガラスを熱処理し、析出される前記結晶化粒子の大きさを制御することを特徴とする有機発光素子用基板の製造方法。 - 前記透明結晶化ガラスを850℃〜1000℃で1〜2時間熱処理することを特徴とする請求項8に記載の有機発光素子用基板の製造方法。
- 前記結晶化粒子は、コーディエライト、シリカ、ユークリプタイト、及びスポジュメンのうちの少なくとも一つの結晶相からなることを特徴とする請求項8または9に記載の有機発光素子用基板の製造方法。
- 請求項1〜7のいずれかに記載の有機発光素子用基板を光取り出し基板として具備することを特徴とする有機発光装置。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2012-0131698 | 2012-11-20 | ||
| KR1020120131698A KR101570968B1 (ko) | 2012-11-20 | 2012-11-20 | 유기 발광소자용 기판, 그 제조방법 및 이를 구비하는 유기 발광소자 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014103113A true JP2014103113A (ja) | 2014-06-05 |
| JP6220643B2 JP6220643B2 (ja) | 2017-10-25 |
Family
ID=50728476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013237984A Expired - Fee Related JP6220643B2 (ja) | 2012-11-20 | 2013-11-18 | 有機発光素子用基板、その製造方法、及びこれを具備する有機発光装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20140141958A1 (ja) |
| JP (1) | JP6220643B2 (ja) |
| KR (1) | KR101570968B1 (ja) |
| CN (1) | CN103840086B (ja) |
| TW (1) | TWI538275B (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014144907A (ja) * | 2013-01-04 | 2014-08-14 | Nippon Electric Glass Co Ltd | ガラス板 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014112552A1 (ja) * | 2013-01-18 | 2014-07-24 | 日本電気硝子株式会社 | 結晶性ガラス基板及び結晶化ガラス基板並びに拡散板及びそれを備えた照明装置 |
| KR102518130B1 (ko) | 2016-08-04 | 2023-04-06 | 삼성디스플레이 주식회사 | 유기발광 표시장치 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001319774A (ja) * | 2000-05-10 | 2001-11-16 | Nippon Electric Glass Co Ltd | 無機elディスプレイ基板及びそれを用いた無機elディスプレイ |
| JP2006044997A (ja) * | 2004-08-05 | 2006-02-16 | Nippon Electric Glass Co Ltd | Li2O−Al2O3−SiO2系透明結晶化ガラス |
| JP2007145691A (ja) * | 2005-10-25 | 2007-06-14 | Ohara Inc | 結晶化ガラスおよび結晶化ガラスの製造方法 |
| WO2009017035A1 (ja) * | 2007-07-27 | 2009-02-05 | Asahi Glass Co., Ltd. | 透光性基板、その製造方法、有機led素子及びその製造方法 |
| WO2011106489A2 (en) * | 2010-02-26 | 2011-09-01 | Corning Incorporated | Glass-ceramic with bulk scattering properties and methods of making them |
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|---|---|---|---|---|
| US3498775A (en) * | 1966-06-17 | 1970-03-03 | Owens Illinois Inc | Method for producing a glass-ceramic article |
| US7071132B2 (en) * | 2000-07-07 | 2006-07-04 | Kabushiki Kaisha Ohara | Low expansion transparent glass ceramics |
| WO2004094327A2 (en) * | 2003-04-01 | 2004-11-04 | Corning Incorporated | Lamp reflector substrate, glass, glass-ceramic materials and process for making the same |
| DE102004008824B4 (de) * | 2004-02-20 | 2006-05-04 | Schott Ag | Glaskeramik mit geringer Wärmeausdehnung sowie deren Verwendung |
| JP2006030681A (ja) * | 2004-07-16 | 2006-02-02 | Fuji Electric Holdings Co Ltd | 有機elパネル |
| JP4688633B2 (ja) * | 2005-10-27 | 2011-05-25 | 京セラ株式会社 | 光反射体、発光素子搭載用配線基板、および発光装置 |
| JP4977406B2 (ja) * | 2006-06-06 | 2012-07-18 | 株式会社オハラ | 結晶化ガラス及び結晶化ガラスの製造方法 |
| JP2007201502A (ja) * | 2007-04-20 | 2007-08-09 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| JP2011116636A (ja) | 2009-11-05 | 2011-06-16 | Nippon Electric Glass Co Ltd | 結晶化ガラスの製造方法および結晶化ガラス |
-
2012
- 2012-11-20 KR KR1020120131698A patent/KR101570968B1/ko not_active Expired - Fee Related
-
2013
- 2013-11-18 JP JP2013237984A patent/JP6220643B2/ja not_active Expired - Fee Related
- 2013-11-19 US US14/084,268 patent/US20140141958A1/en not_active Abandoned
- 2013-11-20 CN CN201310586040.4A patent/CN103840086B/zh not_active Expired - Fee Related
- 2013-11-20 TW TW102142214A patent/TWI538275B/zh not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001319774A (ja) * | 2000-05-10 | 2001-11-16 | Nippon Electric Glass Co Ltd | 無機elディスプレイ基板及びそれを用いた無機elディスプレイ |
| JP2006044997A (ja) * | 2004-08-05 | 2006-02-16 | Nippon Electric Glass Co Ltd | Li2O−Al2O3−SiO2系透明結晶化ガラス |
| JP2007145691A (ja) * | 2005-10-25 | 2007-06-14 | Ohara Inc | 結晶化ガラスおよび結晶化ガラスの製造方法 |
| WO2009017035A1 (ja) * | 2007-07-27 | 2009-02-05 | Asahi Glass Co., Ltd. | 透光性基板、その製造方法、有機led素子及びその製造方法 |
| WO2011106489A2 (en) * | 2010-02-26 | 2011-09-01 | Corning Incorporated | Glass-ceramic with bulk scattering properties and methods of making them |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014144907A (ja) * | 2013-01-04 | 2014-08-14 | Nippon Electric Glass Co Ltd | ガラス板 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103840086A (zh) | 2014-06-04 |
| CN103840086B (zh) | 2017-04-12 |
| KR101570968B1 (ko) | 2015-11-23 |
| TW201429018A (zh) | 2014-07-16 |
| US20140141958A1 (en) | 2014-05-22 |
| JP6220643B2 (ja) | 2017-10-25 |
| TWI538275B (zh) | 2016-06-11 |
| KR20140064403A (ko) | 2014-05-28 |
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