JP2014201832A - 蒸着装置及びそれに適用するマスク組立体 - Google Patents
蒸着装置及びそれに適用するマスク組立体 Download PDFInfo
- Publication number
- JP2014201832A JP2014201832A JP2013227594A JP2013227594A JP2014201832A JP 2014201832 A JP2014201832 A JP 2014201832A JP 2013227594 A JP2013227594 A JP 2013227594A JP 2013227594 A JP2013227594 A JP 2013227594A JP 2014201832 A JP2014201832 A JP 2014201832A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- tension member
- frame
- vapor deposition
- deposition apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
110 マスクフレーム
120 フレーム支持台
130、930 マスク
140 移送部
150、150a〜150h、250、350、440、550、650、750、850、950、1050 引張部材
160 蒸着物質供給源
Claims (9)
- フレーム開口部を有するマスクフレームと、
前記フレーム開口部を覆うように前記マスクフレームの上面に結合されるマスクと、
前記フレーム開口部の外周のうち少なくとも一部の下部または上部に配置され、上部または下部に移動して前記マスクのうち前記フレーム開口部と対応するマスクの第1部分を前記マスクフレームの上面と接触する第2部分より前記マスクフレームの上面からの垂直距離が遠く位置するようにする引張部材を含む蒸着装置。 - 前記第1部分が前記第2部分より前記マスクフレームから前記マスク方向に高い位置に位置する請求項1に記載の蒸着装置。
- 前記第1部分が前記第2部分より前記マスクで前記マスクフレーム方向に低い位置に位置する請求項1に記載の蒸着装置。
- 前記引張部材は、前記フレーム開口部内で前記フレーム開口部の外周に沿って配置される一つのブロックを含む請求項1〜3のいずれか一項に記載の蒸着装置。
- 前記引張部材は、前記マスクと接触する接触部を含み、前記接触部の断面は多角形、半球型、半楕円形及びこれらの組合せ形状のうち何れか一つを有する請求項1〜4のいずれか一項に記載の蒸着装置。
- 前記マスクは、前記第1部分と第2部分との間に連結された第3部分を含み、
前記引張部材は、前記マスクの第1部分と接触する接触部を含み、
前記第1部分と第3部分が接する部分と前記接触部の側面との間に離隔空間が形成される請求項1〜5のいずれか一項に記載の蒸着装置。 - 前記フレーム開口部は、四辺を有する四角平面形状を有し、
前記引張部材は、前記四辺のうち少なくとも何れか一つの辺に配置されるブロックを含む請求項1〜6のいずれか一項に記載の蒸着装置。 - 前記フレーム開口部は、四辺を有する四角平面形状を有し、
前記引張部材は、前記四辺のうち少なくとも何れか一つの辺に分割された複数のブロックを含み、
前記複数のブロックは、互いに接するかまたは互いに離隔するように配置される請求項1〜7のいずれか一項に記載の蒸着装置。 - 前記マスクの上面から離隔した上部に配置され、前記マスクの上面に基板を配置させる移送部と、
前記マスクの下面から離隔した下部に配置され、前記マスクを介して前記基板に蒸着物を供給する蒸着物質供給源をさらに含む請求項1〜8のいずれか一項に記載の蒸着装置。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2013-0038664 | 2013-04-09 | ||
| KR1020130038664A KR102079170B1 (ko) | 2013-04-09 | 2013-04-09 | 증착 장치 및 그에 적용되는 마스크 조립체 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014201832A true JP2014201832A (ja) | 2014-10-27 |
| JP6403184B2 JP6403184B2 (ja) | 2018-10-10 |
Family
ID=51668094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013227594A Active JP6403184B2 (ja) | 2013-04-09 | 2013-10-31 | 蒸着装置及びそれに適用するマスク組立体 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6403184B2 (ja) |
| KR (1) | KR102079170B1 (ja) |
| CN (1) | CN104099561B (ja) |
| TW (1) | TWI628300B (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019516865A (ja) * | 2016-05-24 | 2019-06-20 | イマジン・コーポレイション | 高精度シャドーマスク堆積システム及びその方法 |
| US11275315B2 (en) | 2016-05-24 | 2022-03-15 | Emagin Corporation | High-precision shadow-mask-deposition system and method therefor |
| JP2023149070A (ja) * | 2022-03-30 | 2023-10-13 | 大日本印刷株式会社 | 蒸着システム及び蒸着方法 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102322010B1 (ko) * | 2014-10-24 | 2021-11-05 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법 |
| KR102082784B1 (ko) * | 2014-12-11 | 2020-03-02 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법 |
| KR20180112191A (ko) * | 2017-03-31 | 2018-10-12 | 엘지디스플레이 주식회사 | 증착용 마스크 및 그 증착장치 |
| JP6749275B2 (ja) * | 2017-03-31 | 2020-09-02 | 芝浦メカトロニクス株式会社 | アウターマスク、プラズマ処理装置、およびフォトマスクの製造方法 |
| KR102690567B1 (ko) * | 2018-10-02 | 2024-08-01 | 삼성디스플레이 주식회사 | 증착 장치 |
| KR102796879B1 (ko) * | 2018-10-02 | 2025-04-21 | 삼성디스플레이 주식회사 | 증착 장치 |
| KR102711116B1 (ko) * | 2019-01-24 | 2024-09-27 | 삼성디스플레이 주식회사 | 표시장치 제조를 위한 마스크유닛 |
| KR102691946B1 (ko) * | 2019-07-04 | 2024-08-05 | 주식회사 원익아이피에스 | 마스크조립체 및 이를 구비하는 기판처리장치 |
| CN112323018B (zh) * | 2020-11-02 | 2022-12-13 | 昆山工研院新型平板显示技术中心有限公司 | 掩模版框架和掩模版组件 |
| KR102667444B1 (ko) * | 2021-10-29 | 2024-05-20 | 주식회사 힘스 | OLEDoS에 필요한 원형 웨이퍼용 메탈 마스크 인장기 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5218840U (ja) * | 1975-07-30 | 1977-02-10 | ||
| JPS5831077A (ja) * | 1981-08-17 | 1983-02-23 | Hitachi Ltd | マスク構造体 |
| JP2004311335A (ja) * | 2003-04-10 | 2004-11-04 | Dainippon Printing Co Ltd | 金属薄板の枠貼り方法及び装置 |
| JP2012092395A (ja) * | 2010-10-27 | 2012-05-17 | Canon Inc | 成膜方法及び成膜装置 |
| JP2014098208A (ja) * | 2012-11-14 | 2014-05-29 | Samsung Display Co Ltd | パターニングスリットシートフレーム・アセンブリ |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100889764B1 (ko) * | 2003-10-04 | 2009-03-20 | 삼성모바일디스플레이주식회사 | 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체및, 그것을 이용한 박막 증착 방법 |
| CN101250685A (zh) * | 2008-02-25 | 2008-08-27 | 信利半导体有限公司 | 一种有机电致发光显示器掩膜板的制作方法 |
| KR101833234B1 (ko) * | 2011-06-21 | 2018-03-02 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 프레임 어셈블리 |
| CN102618821A (zh) * | 2012-04-09 | 2012-08-01 | 友达光电股份有限公司 | 用于沉积制程的遮罩张紧机的遮罩框架组 |
-
2013
- 2013-04-09 KR KR1020130038664A patent/KR102079170B1/ko active Active
- 2013-10-12 CN CN201310475755.2A patent/CN104099561B/zh active Active
- 2013-10-17 TW TW102137584A patent/TWI628300B/zh active
- 2013-10-31 JP JP2013227594A patent/JP6403184B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5218840U (ja) * | 1975-07-30 | 1977-02-10 | ||
| JPS5831077A (ja) * | 1981-08-17 | 1983-02-23 | Hitachi Ltd | マスク構造体 |
| JP2004311335A (ja) * | 2003-04-10 | 2004-11-04 | Dainippon Printing Co Ltd | 金属薄板の枠貼り方法及び装置 |
| JP2012092395A (ja) * | 2010-10-27 | 2012-05-17 | Canon Inc | 成膜方法及び成膜装置 |
| JP2014098208A (ja) * | 2012-11-14 | 2014-05-29 | Samsung Display Co Ltd | パターニングスリットシートフレーム・アセンブリ |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019516865A (ja) * | 2016-05-24 | 2019-06-20 | イマジン・コーポレイション | 高精度シャドーマスク堆積システム及びその方法 |
| US11275315B2 (en) | 2016-05-24 | 2022-03-15 | Emagin Corporation | High-precision shadow-mask-deposition system and method therefor |
| JP2023149070A (ja) * | 2022-03-30 | 2023-10-13 | 大日本印刷株式会社 | 蒸着システム及び蒸着方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6403184B2 (ja) | 2018-10-10 |
| CN104099561B (zh) | 2018-12-14 |
| KR20140122067A (ko) | 2014-10-17 |
| TWI628300B (zh) | 2018-07-01 |
| KR102079170B1 (ko) | 2020-02-20 |
| CN104099561A (zh) | 2014-10-15 |
| TW201439345A (zh) | 2014-10-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6403184B2 (ja) | 蒸着装置及びそれに適用するマスク組立体 | |
| CN107699854B (zh) | 掩膜组件及其制造方法 | |
| KR101202346B1 (ko) | 박막 증착용 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법 | |
| JP6307221B2 (ja) | フレームおよびこれを含むマスク組立体 | |
| CN103774087B (zh) | 用于制造用于平板显示器的沉积掩模组件的设备 | |
| JP5710843B2 (ja) | マスクユニットおよび蒸着装置 | |
| KR20120105292A (ko) | 증착 마스크 및 증착 마스크 제조 방법 | |
| KR102270080B1 (ko) | 박막 증착 장치 | |
| TWI580803B (zh) | 遮罩及具有其之遮罩組件 | |
| KR102106333B1 (ko) | 마스크 조립체 및 이를 이용한 유기 발광 표시 장치의 제조 방법 | |
| US20210336147A1 (en) | Mask | |
| KR20160033338A (ko) | 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법 | |
| CN107604306A (zh) | 用于oled器件蒸镀的掩膜板及其制造的oled器件 | |
| EP3456856A1 (en) | Mask plate | |
| JP7297944B2 (ja) | マスク版 | |
| WO2019114090A1 (zh) | 柔性显示面板及其制作方法 | |
| CN105586568A (zh) | 一种掩膜板框架模组、蒸镀方法、阵列基板 | |
| US9000455B2 (en) | Shadow mask assembly | |
| JP2020527748A (ja) | マスク及び表示パネル | |
| KR20200064228A (ko) | 마스크 프레임 조립체 및 마스크 프레임 조립체 제조 방법 | |
| DE102018127237B4 (de) | Vorrichtung zum Ablagern eines ultrafeinen Musters, Verfahren zum Ablagern eines ultrafeinen Musters, das diese verwendet, und lichtemittierende Anzeigevorrichtung, die durch das Verfahren zum Ablagern eines ultrafeinen Musters hergestellt ist | |
| JP4974671B2 (ja) | 表示素子製造用マスク | |
| US20210364912A1 (en) | Mask tension frame and mask tension process | |
| TWI486470B (zh) | 蒸鍍設備 | |
| KR20130031444A (ko) | 마스크 프레임 조립체 및 그 제조 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160907 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20170421 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170425 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20170519 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170725 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170912 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171212 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20180206 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180605 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20180612 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180807 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20180810 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180906 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6403184 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20181102 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |