JP2015111673A5 - - Google Patents
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- JP2015111673A5 JP2015111673A5 JP2014236390A JP2014236390A JP2015111673A5 JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5 JP 2014236390 A JP2014236390 A JP 2014236390A JP 2014236390 A JP2014236390 A JP 2014236390A JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5
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Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13194135 | 2013-11-22 | ||
| EP13194135.3 | 2013-11-22 | ||
| EP14155685.2A EP2876498B1 (en) | 2013-11-22 | 2014-02-19 | Illumination system of a microlithographic projection exposure apparatus |
| EP14155685.2 | 2014-02-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015111673A JP2015111673A (ja) | 2015-06-18 |
| JP2015111673A5 true JP2015111673A5 (2) | 2016-05-19 |
Family
ID=49626852
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016533545A Active JP6343344B2 (ja) | 2013-11-22 | 2014-11-13 | マイクロリソグラフィ投影露光装置の照明系 |
| JP2014236389A Active JP6034845B2 (ja) | 2013-11-22 | 2014-11-21 | マイクロリソグラフィ投影露光装置の照明系 |
| JP2014236390A Pending JP2015111673A (ja) | 2013-11-22 | 2014-11-21 | マイクロリソグラフィ投影露光装置の照明系 |
| JP2016210859A Active JP6434473B2 (ja) | 2013-11-22 | 2016-10-27 | マイクロリソグラフィ投影露光装置の照明系 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016533545A Active JP6343344B2 (ja) | 2013-11-22 | 2014-11-13 | マイクロリソグラフィ投影露光装置の照明系 |
| JP2014236389A Active JP6034845B2 (ja) | 2013-11-22 | 2014-11-21 | マイクロリソグラフィ投影露光装置の照明系 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016210859A Active JP6434473B2 (ja) | 2013-11-22 | 2016-10-27 | マイクロリソグラフィ投影露光装置の照明系 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US9310690B2 (2) |
| EP (2) | EP2876499B1 (2) |
| JP (4) | JP6343344B2 (2) |
| KR (3) | KR101922314B1 (2) |
| CN (3) | CN105745580B (2) |
| TW (1) | TWI638238B (2) |
| WO (1) | WO2015074746A1 (2) |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014203040A1 (de) | 2014-02-19 | 2015-08-20 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen |
| DE102014203041A1 (de) | 2014-02-19 | 2015-08-20 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen |
| KR20180010242A (ko) * | 2015-05-21 | 2018-01-30 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래픽 투영 장치의 작동 방법 |
| CN105068381A (zh) * | 2015-07-27 | 2015-11-18 | 江苏影速光电技术有限公司 | 一种曝光机光阑承载结构及曝光机光阑更换方法 |
| TWI575300B (zh) * | 2015-08-31 | 2017-03-21 | 中強光電股份有限公司 | 投影裝置以及照明系統 |
| WO2017050360A1 (en) * | 2015-09-23 | 2017-03-30 | Carl Zeiss Smt Gmbh | Method of operating a microlithographic projection apparatus and illuminations system of such an apparatus |
| DE102015221991A1 (de) * | 2015-11-09 | 2017-05-11 | Carl Zeiss Microscopy Gmbh | Mikroskopierverfahren zur Ermittlung eines Kontrastbildes und Mikroskop |
| DE102015224522B4 (de) | 2015-12-08 | 2018-06-21 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems |
| DE102015224521B4 (de) | 2015-12-08 | 2018-06-21 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsanlage und Verfahren zum Betreiben einer solchen Anlage |
| WO2017108448A1 (en) * | 2015-12-22 | 2017-06-29 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic apparatus |
| CN106933049B (zh) * | 2015-12-30 | 2020-06-16 | 上海微电子装备（集团）股份有限公司 | 一种用于半导体光刻的曝光系统与曝光方法 |
| US10061201B2 (en) * | 2016-10-24 | 2018-08-28 | Hrl Laboratories, Llc | Bottom up apparatus design for formation of self-propagating photopolymer waveguides |
| US11473081B2 (en) | 2016-12-12 | 2022-10-18 | xCella Biosciences, Inc. | Methods and systems for screening using microcapillary arrays |
| EP3559747B1 (de) * | 2016-12-20 | 2026-03-18 | EV Group E. Thallner GmbH | Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht |
| WO2018113918A1 (de) * | 2016-12-20 | 2018-06-28 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht |
| JP7208902B2 (ja) * | 2016-12-30 | 2023-01-19 | エクセラ・バイオサイエンシーズ・インコーポレイテッド | マルチステージサンプル回収システム |
| CN109654392B (zh) * | 2017-01-11 | 2020-09-04 | 哈尔滨理工大学 | 第一遮挡板和具有第一遮挡板的鼻孔照明装置 |
| US11099007B2 (en) * | 2017-02-16 | 2021-08-24 | Nikon Corporation | Test of operational status of a digital scanner during lithographic exposure process |
| CN107421439B (zh) * | 2017-04-21 | 2019-05-14 | 上海交通大学 | 一种无成像目标显著性检测与坐标跟踪系统及方法 |
| CN119937255A (zh) | 2017-06-19 | 2025-05-06 | 苏斯微技术解决方案有限公司 | 光学系统和方法 |
| US11175487B2 (en) | 2017-06-19 | 2021-11-16 | Suss Microtec Photonic Systems Inc. | Optical distortion reduction in projection systems |
| WO2019064503A1 (ja) * | 2017-09-29 | 2019-04-04 | 株式会社ニコン | 電子ビーム装置、照明光学系、及びデバイス製造方法 |
| WO2019064502A1 (ja) * | 2017-09-29 | 2019-04-04 | 株式会社ニコン | 電子ビーム装置及びデバイス製造方法 |
| JP7020859B2 (ja) | 2017-10-24 | 2022-02-16 | キヤノン株式会社 | 照明光学系、露光装置および物品の製造方法 |
| WO2019180960A1 (ja) * | 2018-03-23 | 2019-09-26 | Ｐｒｉｍｅｔａｌｓ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｊａｐａｎ株式会社 | レーザ加工ヘッド及びレーザ加工装置並びにレーザ加工ヘッドの調整方法 |
| CN112236721A (zh) * | 2018-06-19 | 2021-01-15 | Ev 集团 E·索尔纳有限责任公司 | 用于像点曝光的方法和设备 |
| US10503076B1 (en) * | 2018-08-29 | 2019-12-10 | Applied Materials, Inc. | Reserving spatial light modulator sections to address field non-uniformities |
| CN109116554B (zh) * | 2018-10-11 | 2020-12-04 | 北京环境特性研究所 | 光学积分器的设计方法 |
| EP3640735A1 (en) | 2018-10-18 | 2020-04-22 | ASML Netherlands B.V. | Methods and apparatus for inspection of a structure and associated apparatuses |
| EP3890876B1 (en) | 2018-12-06 | 2024-05-01 | Xcella Biosciences, Inc. | Lateral loading of microcapillary arrays |
| WO2020183229A1 (en) * | 2019-03-12 | 2020-09-17 | Lumus Ltd. | Image projector |
| CN111856745B (zh) * | 2019-04-30 | 2023-03-17 | 上海微电子装备（集团）股份有限公司 | 一种光照射装置 |
| EP3736550A1 (en) * | 2019-05-10 | 2020-11-11 | X-Rite Switzerland GmbH | Illumination device for a spectrophotometer having integrated mixing optics, and method for illuminating a sample |
| KR102914229B1 (ko) | 2020-08-18 | 2026-01-16 | 가부시키가이샤 니콘 | 노광 장치, 계측 장치, 계측 방법, 및 디바이스 제조 방법 |
| US11366307B2 (en) * | 2020-08-27 | 2022-06-21 | Kla Corporation | Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection |
| DE102021202847A1 (de) | 2021-03-24 | 2022-09-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie |
| CN113189848B (zh) * | 2021-04-21 | 2024-02-13 | 之江实验室 | 一种基于光纤阵列的多通道并行式超分辨直写式光刻系统 |
| CN115390362A (zh) * | 2021-05-25 | 2022-11-25 | 赫智科技(苏州)有限公司 | 一种4k光刻的方法 |
| US20230123834A1 (en) * | 2021-10-19 | 2023-04-20 | Meta Platforms Technologies, Llc | Euv lithography using polymer crystal based reticle |
| CN115128809B (zh) * | 2022-05-17 | 2023-11-28 | 南京工业职业技术大学 | 一种实现全息波导显示系统均匀成像的光栅效率分布表征与优化方法 |
| DE102022116214B4 (de) * | 2022-06-29 | 2024-06-13 | Carl Zeiss Industrielle Messtechnik Gmbh | Messkamera und Verfahren zur zweidimensionalen Vermessung von Gegenständen |
| CN116027641A (zh) * | 2022-12-29 | 2023-04-28 | 中国科学院光电技术研究所 | 一种兼容同轴和离轴的照明装置及照明的方法 |
| DE102024205430A1 (de) | 2024-06-13 | 2025-12-18 | Carl Zeiss Smt Gmbh | Optomechanisches System für die Projektionslithographie |
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| US5517279A (en) | 1993-08-30 | 1996-05-14 | Hugle; William B. | Lens array photolithography |
| JP2674578B2 (ja) * | 1995-08-29 | 1997-11-12 | 株式会社ニコン | 走査露光装置及び露光方法 |
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| US6404499B1 (en) | 1998-04-21 | 2002-06-11 | Asml Netherlands B.V. | Lithography apparatus with filters for optimizing uniformity of an image |
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| KR100480620B1 (ko) | 2002-09-19 | 2005-03-31 | 삼성전자주식회사 | 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법 |
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| WO2005040927A2 (en) | 2003-10-18 | 2005-05-06 | Carl Zeiss Smt Ag | Device and method for illumination dose adjustments in microlithography |
| US20060087634A1 (en) | 2004-10-25 | 2006-04-27 | Brown Jay M | Dynamic illumination uniformity and shape control for lithography |
| US7706072B2 (en) * | 2004-12-27 | 2010-04-27 | Nikon Corporation | Optical integrator, illumination optical device, photolithograph, photolithography, and method for fabricating device |
| TWI456267B (zh) * | 2006-02-17 | 2014-10-11 | 卡爾蔡司Ｓｍｔ有限公司 | 用於微影投射曝光設備之照明系統 |
| JP2007279113A (ja) * | 2006-04-03 | 2007-10-25 | Nikon Corp | 走査型露光装置及びデバイスの製造方法 |
| US7932993B2 (en) | 2006-09-16 | 2011-04-26 | Wenhui Mei | Divided sub-image array scanning and exposing system |
| WO2008076114A1 (en) | 2006-12-19 | 2008-06-26 | Thomson Licensing | High resolution dmd projection system |
| CN101796460B (zh) | 2007-08-30 | 2013-05-01 | 卡尔蔡司Smt有限责任公司 | 微光刻投射曝光设备中用于照明掩模的照明系统 |
| US8451427B2 (en) * | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| US20090091730A1 (en) * | 2007-10-03 | 2009-04-09 | Nikon Corporation | Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
| SG185313A1 (en) * | 2007-10-16 | 2012-11-29 | Nikon Corp | Illumination optical system, exposure apparatus, and device manufacturing method |
| CN101681123B (zh) * | 2007-10-16 | 2013-06-12 | 株式会社尼康 | 照明光学系统、曝光装置以及元件制造方法 |
| US8379187B2 (en) * | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| WO2009060745A1 (ja) * | 2007-11-06 | 2009-05-14 | Nikon Corporation | 制御装置、露光方法、及び露光装置 |
| JP5582287B2 (ja) | 2007-11-06 | 2014-09-03 | 株式会社ニコン | 照明光学装置及び露光装置 |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP5326259B2 (ja) * | 2007-11-08 | 2013-10-30 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
| NL1036108A1 (nl) * | 2007-11-09 | 2009-05-12 | Asml Netherlands Bv | Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product. |
| EP2243047B1 (en) * | 2008-02-15 | 2021-03-31 | Carl Zeiss SMT GmbH | Facet mirror for use in a projection exposure apparatus for microlithography |
| DE102008001511A1 (de) | 2008-04-30 | 2009-11-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| WO2009142440A2 (ko) * | 2008-05-20 | 2009-11-26 | Jung Jin Ho | 마스크 리스 노광장치용 광학부품 |
| DE102008002749A1 (de) | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| EP2146248B1 (en) | 2008-07-16 | 2012-08-29 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
| WO2010024106A1 (ja) * | 2008-08-28 | 2010-03-04 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
| JP5403244B2 (ja) * | 2009-07-16 | 2014-01-29 | 株式会社ニコン | 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 |
| WO2011012148A1 (en) * | 2009-07-31 | 2011-02-03 | Carl Zeiss Smt Gmbh | Optical beam deflecting element and method of adjustment |
| JP2011108851A (ja) * | 2009-11-17 | 2011-06-02 | Canon Inc | 露光装置及びデバイスの製造方法 |
| JP5809637B2 (ja) | 2009-11-18 | 2015-11-11 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置およびデバイス製造方法 |
| DE102009054540B4 (de) | 2009-12-11 | 2011-11-10 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Mikrolithographie |
| JP2012004561A (ja) | 2010-06-16 | 2012-01-05 | Nikon Corp | 照明方法、照明光学装置、及び露光装置 |
| KR101470769B1 (ko) * | 2010-08-30 | 2014-12-09 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래픽 투영 노광 장치의 조명 시스템 |
| JP2012069656A (ja) | 2010-09-22 | 2012-04-05 | Nikon Corp | 空間光変調器、照明装置及び露光装置、並びにデバイス製造方法 |
| JP2012099686A (ja) | 2010-11-04 | 2012-05-24 | Nikon Corp | 光源形成方法、露光方法、及びデバイス製造方法 |
| WO2012100791A1 (en) | 2011-01-29 | 2012-08-02 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic projection exposure apparatus |
| US8823921B2 (en) | 2011-08-19 | 2014-09-02 | Ultratech, Inc. | Programmable illuminator for a photolithography system |
| US8390917B1 (en) | 2011-08-24 | 2013-03-05 | Palo Alto Research Center Incorporated | Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics |
-
2014
- 2014-02-19 EP EP14155686.0A patent/EP2876499B1/en active Active
- 2014-02-19 EP EP14155685.2A patent/EP2876498B1/en active Active
- 2014-11-13 KR KR1020167016113A patent/KR101922314B1/ko active Active
- 2014-11-13 CN CN201480063069.7A patent/CN105745580B/zh active Active
- 2014-11-13 WO PCT/EP2014/003049 patent/WO2015074746A1/en not_active Ceased
- 2014-11-13 JP JP2016533545A patent/JP6343344B2/ja active Active
- 2014-11-17 US US14/543,110 patent/US9310690B2/en active Active
- 2014-11-17 US US14/543,079 patent/US9500954B2/en active Active
- 2014-11-19 TW TW103140015A patent/TWI638238B/zh active
- 2014-11-20 KR KR1020140162782A patent/KR101736549B1/ko active Active
- 2014-11-21 JP JP2014236389A patent/JP6034845B2/ja active Active
- 2014-11-21 KR KR1020140163298A patent/KR101751581B1/ko active Active
- 2014-11-21 JP JP2014236390A patent/JP2015111673A/ja active Pending
- 2014-11-24 CN CN201410858447.2A patent/CN104656378B/zh active Active
- 2014-11-24 CN CN201410858448.7A patent/CN104656379B/zh active Active
-
2016
- 2016-03-31 US US15/086,475 patent/US9910359B2/en not_active Expired - Fee Related
- 2016-10-27 JP JP2016210859A patent/JP6434473B2/ja active Active
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