JP2015138667A - イオン源、イオン銃、分析装置 - Google Patents

イオン源、イオン銃、分析装置 Download PDF

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Publication number
JP2015138667A
JP2015138667A JP2014009699A JP2014009699A JP2015138667A JP 2015138667 A JP2015138667 A JP 2015138667A JP 2014009699 A JP2014009699 A JP 2014009699A JP 2014009699 A JP2014009699 A JP 2014009699A JP 2015138667 A JP2015138667 A JP 2015138667A
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JP
Japan
Prior art keywords
ion
sample
cluster
ions
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014009699A
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English (en)
Japanese (ja)
Inventor
大輔 坂井
Daisuke Sakai
大輔 坂井
真生 十河
Mao Sogo
真生 十河
賢三 平岡
Kenzo Hiraoka
賢三 平岡
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Ulvac PHI Inc
Original Assignee
Ulvac PHI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac PHI Inc filed Critical Ulvac PHI Inc
Priority to JP2014009699A priority Critical patent/JP2015138667A/ja
Priority to US14/600,338 priority patent/US9372161B2/en
Priority to EP15152080.6A priority patent/EP2899742B1/fr
Publication of JP2015138667A publication Critical patent/JP2015138667A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0468—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components with means for heating or cooling the sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/165—Electrospray ionisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0812—Ionized cluster beam [ICB] sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2516—Secondary particles mass or energy spectrometry
    • H01J2237/2527—Ions [SIMS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Optics & Photonics (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2014009699A 2014-01-22 2014-01-22 イオン源、イオン銃、分析装置 Pending JP2015138667A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014009699A JP2015138667A (ja) 2014-01-22 2014-01-22 イオン源、イオン銃、分析装置
US14/600,338 US9372161B2 (en) 2014-01-22 2015-01-20 Ion source, ion gun, and analysis instrument
EP15152080.6A EP2899742B1 (fr) 2014-01-22 2015-01-22 Instrument d'analyse avec une source d'ions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014009699A JP2015138667A (ja) 2014-01-22 2014-01-22 イオン源、イオン銃、分析装置

Publications (1)

Publication Number Publication Date
JP2015138667A true JP2015138667A (ja) 2015-07-30

Family

ID=52440557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014009699A Pending JP2015138667A (ja) 2014-01-22 2014-01-22 イオン源、イオン銃、分析装置

Country Status (3)

Country Link
US (1) US9372161B2 (fr)
EP (1) EP2899742B1 (fr)
JP (1) JP2015138667A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017098183A (ja) * 2015-11-27 2017-06-01 エムエス・ソリューションズ株式会社 イオン化方法、イオン化装置及び質量分析計

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017511571A (ja) * 2014-04-02 2017-04-20 ザ ボード オブ トラスティーズ オブ ザ レランド スタンフォード ジュニア ユニバーシティー 質量分析法によるサブミクロン元素画像解析の装置及び方法
KR102257901B1 (ko) * 2014-09-19 2021-05-31 삼성전자주식회사 반도체 검사 장비 및 이를 이용한 반도체 소자의 검사 방법
JP6640531B2 (ja) * 2015-11-02 2020-02-05 国立大学法人名古屋大学 電子が持つエネルギーの計測装置と計測方法
DE102016125585B4 (de) * 2016-12-23 2019-01-17 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Optik für Elektronen aus einem Objekt, Verwendung derselben in einem Spektrometer für Röntgenphotoelektronenspektroskopie für Elektronen aus einem Objekt und Spektrometer
JP6851283B2 (ja) * 2017-07-31 2021-03-31 日本電子株式会社 画像処理装置、分析装置、および画像処理方法
CN109142165B (zh) * 2018-08-23 2024-02-02 金华职业技术学院 一种粒子成像装置
CN109813795B (zh) * 2018-12-26 2022-05-13 宁波大学 离子源质谱联用方法
JP7179661B2 (ja) * 2019-03-27 2022-11-29 アルバック・ファイ株式会社 ガスクラスターイオンビーム装置、分析装置
CN112309821B (zh) * 2019-07-25 2024-07-30 苏州微木智能系统有限公司 一种法拉第盘、离子迁移管及离子迁移谱仪
CN112863979B (zh) * 2021-01-14 2022-02-08 西安交通大学 一种微纳尺度离子束外束引出装置
US11715620B2 (en) * 2021-04-28 2023-08-01 Tel Manufacturing And Engineering Of America, Inc. Tuning gas cluster ion beam systems
DE102021112503B4 (de) * 2021-05-12 2025-03-27 Carl Zeiss Microscopy Gmbh Teilchenstrahlvorrichtung mit einer Ablenkeinheit
CN113720899A (zh) * 2021-09-08 2021-11-30 中国科学院大连化学物理研究所 一种高分辨率中性团簇红外光谱装置

Citations (4)

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US4160161A (en) * 1978-05-30 1979-07-03 Phillips Petroleum Company Liquid chromatograph/mass spectrometer interface
WO2005111594A1 (fr) * 2004-05-18 2005-11-24 Yamanashi Tlo Co., Ltd. Méthode et appareil pour analyse via un découpage sélectif d'une liaison non colvalente etc. d'un biopolymère
JP2012018800A (ja) * 2010-07-07 2012-01-26 Hitachi High-Technologies Corp 荷電粒子ビーム装置、および試料作成方法
JP2013541165A (ja) * 2010-10-12 2013-11-07 ヴィージー システムズ リミテッド イオン銃の改良及びイオン銃に関連する改良

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JP2564404B2 (ja) * 1989-09-20 1996-12-18 株式会社日立製作所 質量分析方法
JP2662321B2 (ja) 1991-05-31 1997-10-08 科学技術振興事業団 超低速クラスターイオンビームによる表面処理方法
JPH0676749A (ja) * 1992-08-28 1994-03-18 Shimadzu Corp イオン源
US5796111A (en) * 1995-10-30 1998-08-18 Phrasor Scientific, Inc. Apparatus for cleaning contaminated surfaces using energetic cluster beams
US6825463B2 (en) 1997-05-23 2004-11-30 Northeastern University On-line and off-line deposition of liquid samples for matrix assisted laser desorption ionization-time of flight (MALDI-TOF) mass spectroscopy
EP1193730A1 (fr) 2000-09-27 2002-04-03 Eidgenössische Technische Hochschule Zürich Dispositif d'analyse à ionisation à pression atmosphérique et méthode d'analyse d'échantillons associée
JP4497889B2 (ja) 2003-10-29 2010-07-07 アルバック・ファイ株式会社 電子分光分析方法及び分析装置
US8835880B2 (en) * 2006-10-31 2014-09-16 Fei Company Charged particle-beam processing using a cluster source
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JP2011141199A (ja) 2010-01-07 2011-07-21 Univ Of Yamanashi 帯電液滴エッチングを用いた試料表面汚染物除去方法及び装置
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Publication number Priority date Publication date Assignee Title
US4160161A (en) * 1978-05-30 1979-07-03 Phillips Petroleum Company Liquid chromatograph/mass spectrometer interface
WO2005111594A1 (fr) * 2004-05-18 2005-11-24 Yamanashi Tlo Co., Ltd. Méthode et appareil pour analyse via un découpage sélectif d'une liaison non colvalente etc. d'un biopolymère
JP2012018800A (ja) * 2010-07-07 2012-01-26 Hitachi High-Technologies Corp 荷電粒子ビーム装置、および試料作成方法
JP2013541165A (ja) * 2010-10-12 2013-11-07 ヴィージー システムズ リミテッド イオン銃の改良及びイオン銃に関連する改良

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017098183A (ja) * 2015-11-27 2017-06-01 エムエス・ソリューションズ株式会社 イオン化方法、イオン化装置及び質量分析計

Also Published As

Publication number Publication date
US20150206732A1 (en) 2015-07-23
EP2899742A1 (fr) 2015-07-29
EP2899742B1 (fr) 2017-09-06
US9372161B2 (en) 2016-06-21

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