JP2016100600A - 電子パッケージ用の電気インターコネクト - Google Patents
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Abstract
【解決手段】当該電気インターコネクトは、片面にトレンチが形成された誘電体層と、前記トレンチを充填し且つ前記誘電体層の前記片面より上まで延在する信号導体とを含む。当該電気インターコネクトは更に、前記誘電体層の反対面に取り付けられた導電性の基準層を含む。該導電性の基準層は、電流が前記信号導体を通り抜けるときに前記信号導体に電磁結合される。
【選択図】図1
Description
Claims (24)
- 誘電体層であり、当該誘電体層の片面に形成されたトレンチを含む誘電体層と、
前記トレンチを充填し且つ前記誘電体層の前記片面より上まで延在する信号導体と、
前記誘電体層の反対面に取り付けられた導電性の基準層であり、電流が前記信号導体を通り抜けるときに前記信号導体に電磁結合される導電性の基準層と、
を有する電子パッケージ用の電気インターコネクト。 - 前記信号導体は、前記トレンチを充填する第1の部分と、前記トレンチより上にある第2の部分とを含む、請求項1に記載の電気インターコネクト。
- 前記信号導体の前記第1の部分は、前記信号導体の前記第2の部分と一体である、請求項2に記載の電気インターコネクト。
- 前記信号導体の前記第1の部分は、前記信号導体の前記第2の部分とは異なる幅を有する、請求項2又は3に記載の電気インターコネクト。
- 前記信号導体の前記第2の部分は、前記誘電体層の前記片面と係合している、請求項2乃至4の何れかに記載の電気インターコネクト。
- 前記信号導体の前記第1の部分は、前記信号導体の前記第2の部分とは異なる厚さを有する、請求項2乃至5の何れかに記載の電気インターコネクト。
- 当該電気インターコネクトは更に、複数の更なる信号導体を有し、前記更なる信号導体の各々は、前記誘電体層の別のトレンチを充填し且つ前記誘電体層の前記片面より上まで延在し、前記複数の更なる信号導体は各々、電流が前記複数の更なる信号導体を通り抜けるときに前記導電性の基準層に電磁結合される、請求項1乃至5の何れかに記載の電気インターコネクト。
- 前記誘電体層は第1の誘電体層であり、当該電気インターコネクトは更に、
前記第1の誘電体層の前記片面に取り付けられた第2の誘電体層であり、前記信号導体を露出させる開口を含む第2の誘電体層と、
前記第2の誘電体層の前記開口内で前記信号導体に電気接続されたはんだバンプと
を有する、請求項1乃至7の何れかに記載の電気インターコネクト。 - 誘電体層の片面にトレンチを形成し、前記誘電体層の反対面は導電性の基準層を含み、且つ
前記誘電体層の前記片面の前記トレンチを、前記誘電体層の前記片面より上まで延在する信号導体で充填し、該信号導体は、電流が該信号導体を通り抜けるときに前記導電性の基準層に電磁結合されることになる、
ことを有する方法。 - 前記誘電体層の前記片面の前記トレンチを、前記誘電体層の前記片面より上まで延在する信号導体で充填することは、
前記誘電体層の前記片面上及び前記誘電体層の前記トレンチ内に導電材料を形成し、且つ
パターニングされたマスクを前記導電材料上に形成し、該パターニングされたマスクは前記誘電体層の前記片面上にあるが前記誘電体層の前記トレンチ内にはない、
ことを有する、請求項9に記載の方法。 - 前記誘電体層の前記片面の前記トレンチを、前記誘電体層の前記片面より上まで延在する信号導体で充填することは更に、
前記トレンチを充填し且つ前記誘電体層の前記片面より上まで延在する前記信号導体を形成するように、前記トレンチ内に導電材料を追加し、且つ
前記信号導体を形成するように、前記誘電体層の前記片面から前記パターニングされたマスク及び前記導電材料を除去する、
ことを有する、請求項10に記載の方法。 - 前記誘電体層の前記片面上及び前記誘電体層の前記トレンチ内に前記導電材料を形成することは、前記誘電体層の前記片面上及び前記誘電体層の前記トレンチ内に前記導電材料を無電解めっきすることを含む、請求項10又は11に記載の方法。
- 前記トレンチを充填し且つ前記誘電体層の前記片面より上まで延在する前記信号導体を形成するように、前記トレンチ内に前記導電材料を追加することは、前記トレンチを充填し且つ前記誘電体層の前記片面より上まで延在する前記信号導体を形成するように、前記トレンチ内に前記導電材料を電解めっきすることを含む、請求項11又は12に記載の方法。
- 前記トレンチを充填し且つ前記誘電体層の前記片面より上まで延在する前記信号導体を形成するように、前記トレンチ内に前記導電材料を電解めっきすることは、前記信号導体が前記誘電体層の前記片面と係合するように前記誘電体層の前記片面上に前記導電材料を電解めっきすることを含む、請求項13に記載の方法。
- 片面と反対面とを含む誘電体層であり、前記反対面はトレンチを含む、誘電体層と、
前記誘電体層の前記片面上の信号導体と、
前記誘電体層の前記反対面上に取り付けられた導電性の基準層であり、当該導電性の基準層は、前記誘電体層の前記反対面と係合し、且つ前記トレンチを充填する突出部を含み、電流が前記信号導体を通り抜けるときに前記信号導体が当該導電性の基準層に電磁結合される、導電性の基準層と、
を有する電子パッケージ用の電気インターコネクト。 - 前記信号導体は第1の信号導体であり、当該電気インターコネクトは更に、前記誘電体層の前記片面上の第2の信号導体を有し、該第2の信号導体は、電流が該第2の信号導体を通り抜けるときに前記導電性の基準層に電磁結合される、請求項15に記載の電気インターコネクト。
- 前記導電性の基準層の前記突出部は、前記第1の信号導体及び前記第2の信号導体から等距離に位置する、請求項16に記載の電気インターコネクト。
- 前記誘電体層の前記反対面は複数のトレンチを含み、当該電気インターコネクトは更に、前記誘電体層の前記片面上に複数の更なる信号導体を有し、前記導電性の基準層は、前記トレンチを充填する複数の突出部を含み、前記信号導体は各々、電流が該信号導体を通り抜けるときに前記突出部のうちの少なくとも1つに電磁結合される、請求項15乃至17の何れかに記載の電気インターコネクト。
- 前記突出部のうちの少なくとも一部は、2つの異なる信号導体から等距離に位置する、請求項15乃至18の何れかに記載の電気インターコネクト。
- 前記誘電体層は第1の誘電体層であり、当該電気インターコネクトは更に、
前記第1の誘電体層の前記片面に取り付けられた第2の誘電体層であり、前記信号導体を露出させる開口を含む第2の誘電体層と、
前記第2の誘電体層の前記開口内で前記信号導体に電気接続されたはんだバンプと
を有する、請求項15乃至19の何れかに記載の電気インターコネクト。 - 誘電体層の片面上に信号導体を形成し、
前記誘電体層の反対面にトレンチを形成し、且つ
前記誘電体層の前記反対面上に導電性の基準層を形成し、該導電性の基準層は、前記トレンチを充填する突出部を含み、該突出部は、電流が前記信号導体を通り抜けるときに前記信号導体に電磁結合されることになる、
ことを有する方法。 - 前記誘電体層の前記反対面上及び前記トレンチ内に前記導電性の基準層を形成することは、前記誘電体層の前記反対面上及び前記トレンチ内に前記導電性の基準層を電解めっきすることを含む、請求項21に記載の方法。
- 当該方法は更に、
前記誘電体層の前記片面上に複数の信号導体を形成し、且つ
前記誘電体層の前記反対面に複数のトレンチを形成する
ことを有し、
前記導電性の基準層は、前記複数のトレンチを充填する複数の突出部を含み、該複数の突出部は各々、電流がそれぞれの信号導体を通り抜けるときに対応する信号導体に電磁結合されることになる、
請求項21又は22に記載の方法。 - 前記誘電体層の前記反対面に前記複数のトレンチを形成することは、前記突出部のうちの少なくとも一部が2つの異なる信号導体から等距離に位置するように、前記誘電体層の前記反対面に前記複数のトレンチを形成することを含む、請求項23に記載の方法。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/555,124 US9552995B2 (en) | 2014-11-26 | 2014-11-26 | Electrical interconnect for an electronic package |
| US14/555,124 | 2014-11-26 |
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| JP6466305B2 JP6466305B2 (ja) | 2019-02-06 |
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| US11955436B2 (en) * | 2019-04-24 | 2024-04-09 | Intel Corporation | Self-equalized and self-crosstalk-compensated 3D transmission line architecture with array of periodic bumps for high-speed single-ended signal transmission |
| CN110913570A (zh) * | 2019-12-16 | 2020-03-24 | 西安子国微科技有限公司 | 一种高性能信息处理及接口方法 |
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| JP2012124452A (ja) * | 2010-12-06 | 2012-06-28 | Samsung Electro-Mechanics Co Ltd | プリント基板およびその製造方法 |
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| JP2007193999A (ja) * | 2006-01-17 | 2007-08-02 | Sony Chemical & Information Device Corp | 伝送ケーブル |
| TWI312560B (en) * | 2006-10-20 | 2009-07-21 | Phoenix Prec Technology Corporatio | Package substrate and method thereof |
| US8563336B2 (en) * | 2008-12-23 | 2013-10-22 | International Business Machines Corporation | Method for forming thin film resistor and terminal bond pad simultaneously |
| US8343810B2 (en) * | 2010-08-16 | 2013-01-01 | Stats Chippac, Ltd. | Semiconductor device and method of forming Fo-WLCSP having conductive layers and conductive vias separated by polymer layers |
| US8716852B2 (en) * | 2012-02-17 | 2014-05-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Micro-electro mechanical systems (MEMS) having outgasing prevention structures and methods of forming the same |
| US8987851B2 (en) * | 2012-09-07 | 2015-03-24 | Mediatek Inc. | Radio-frequency device package and method for fabricating the same |
| US8962349B1 (en) * | 2013-11-25 | 2015-02-24 | Avalanche Technology, Inc. | Method of manufacturing magnetic tunnel junction memory element |
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| WO2010064467A1 (ja) * | 2008-12-05 | 2010-06-10 | イビデン株式会社 | 多層プリント配線板、及び、多層プリント配線板の製造方法 |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP6466305B2 (ja) | 2019-02-06 |
| MY175102A (en) | 2020-06-06 |
| TWI614867B (zh) | 2018-02-11 |
| US9552995B2 (en) | 2017-01-24 |
| TW201631727A (zh) | 2016-09-01 |
| US20160148866A1 (en) | 2016-05-26 |
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