JP2017139452A - インプリント装置および物品の製造方法 - Google Patents

インプリント装置および物品の製造方法 Download PDF

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Publication number
JP2017139452A
JP2017139452A JP2016240689A JP2016240689A JP2017139452A JP 2017139452 A JP2017139452 A JP 2017139452A JP 2016240689 A JP2016240689 A JP 2016240689A JP 2016240689 A JP2016240689 A JP 2016240689A JP 2017139452 A JP2017139452 A JP 2017139452A
Authority
JP
Japan
Prior art keywords
substrate
gas
mold
imprint
imprint apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016240689A
Other languages
English (en)
Japanese (ja)
Inventor
坂本　英治
Eiji Sakamoto
英治 坂本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to KR1020187021645A priority Critical patent/KR20180098626A/ko
Priority to PCT/JP2017/000578 priority patent/WO2017134989A1/ja
Priority to TW106101896A priority patent/TWI618116B/zh
Publication of JP2017139452A publication Critical patent/JP2017139452A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016240689A 2016-02-03 2016-12-12 インプリント装置および物品の製造方法 Pending JP2017139452A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020187021645A KR20180098626A (ko) 2016-02-03 2017-01-11 임프린트 장치 및 물품의 제조 방법
PCT/JP2017/000578 WO2017134989A1 (ja) 2016-02-03 2017-01-11 インプリント装置および物品の製造方法
TW106101896A TWI618116B (zh) 2016-02-03 2017-01-19 Imprinting device and method of manufacturing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016018746 2016-02-03
JP2016018746 2016-02-03

Publications (1)

Publication Number Publication Date
JP2017139452A true JP2017139452A (ja) 2017-08-10

Family

ID=59565103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016240689A Pending JP2017139452A (ja) 2016-02-03 2016-12-12 インプリント装置および物品の製造方法

Country Status (3)

Country Link
JP (1) JP2017139452A (ko)
KR (1) KR20180098626A (ko)
TW (1) TWI618116B (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019079926A (ja) * 2017-10-24 2019-05-23 キヤノン株式会社 インプリント装置、および物品製造方法
JP2019197765A (ja) * 2018-05-08 2019-11-14 大日本印刷株式会社 インプリントモールド用基板、インプリントモールド及びそれらの製造方法
US20210354363A1 (en) * 2020-05-13 2021-11-18 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
CN114167688A (zh) * 2020-09-11 2022-03-11 佳能株式会社 异物去除装置、光刻装置以及物品制造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7373334B2 (ja) * 2019-09-17 2023-11-02 キヤノン株式会社 インプリント装置及び物品の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2731950B2 (ja) * 1989-07-13 1998-03-25 キヤノン株式会社 露光方法
JP2002069634A (ja) * 2000-08-29 2002-03-08 Canon Inc 薄膜作製方法および薄膜作製装置
JP6064466B2 (ja) 2012-09-11 2017-01-25 大日本印刷株式会社 インプリント方法およびそれを実施するためのインプリント装置
JP6399839B2 (ja) * 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019079926A (ja) * 2017-10-24 2019-05-23 キヤノン株式会社 インプリント装置、および物品製造方法
JP7064310B2 (ja) 2017-10-24 2022-05-10 キヤノン株式会社 インプリント装置、および物品製造方法
JP2019197765A (ja) * 2018-05-08 2019-11-14 大日本印刷株式会社 インプリントモールド用基板、インプリントモールド及びそれらの製造方法
JP7077754B2 (ja) 2018-05-08 2022-05-31 大日本印刷株式会社 インプリントモールド用基板、インプリントモールド及びそれらの製造方法
US20210354363A1 (en) * 2020-05-13 2021-11-18 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
US12032283B2 (en) * 2020-05-13 2024-07-09 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
CN114167688A (zh) * 2020-09-11 2022-03-11 佳能株式会社 异物去除装置、光刻装置以及物品制造方法

Also Published As

Publication number Publication date
TW201729251A (zh) 2017-08-16
KR20180098626A (ko) 2018-09-04
TWI618116B (zh) 2018-03-11

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