JP2017173331A - 層状ナノリボンに基づいた化学センサー - Google Patents
層状ナノリボンに基づいた化学センサー Download PDFInfo
- Publication number
- JP2017173331A JP2017173331A JP2017058830A JP2017058830A JP2017173331A JP 2017173331 A JP2017173331 A JP 2017173331A JP 2017058830 A JP2017058830 A JP 2017058830A JP 2017058830 A JP2017058830 A JP 2017058830A JP 2017173331 A JP2017173331 A JP 2017173331A
- Authority
- JP
- Japan
- Prior art keywords
- nanoribbons
- active layered
- layered nanomaterial
- substrate
- chemical sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4146—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS involving nanosized elements, e.g. nanotubes, nanowires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
- H10D62/882—Graphene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
- H10P14/3406—Carbon, e.g. diamond-like carbon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3436—Deposited materials, e.g. layers characterised by the chemical composition being chalcogenide semiconductor materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/69—Etching of wafers, substrates or parts of devices using masks for semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
- H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Electrochemistry (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Molecular Biology (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
【解決手段】活性な層状ナノ材料の複数のナノリボンを含む基板と、物質と接触するときに複数のナノリボンの少なくとも一部の電気的又は物理的特性における変化を測定するための物質検出構成要素と、を有する化学センサーが記載される。
【選択図】図1
Description
本特許出願は、2016年3月25日に出願された“Chemical Sensor based on layered nanoribbons”という題名の仮出願番号第62/313,526号に対する優先権を主張し、本出願の譲渡人に譲渡され、それによって、全ての目的のためにここで参照によって明示的に組み込まれる。
Claims (20)
- 基板と:
前記基板の上に位置する活性な層状ナノ材料の複数のナノリボンと;
物質と接触するときに前記複数のナノリボンの少なくとも一部の、電気的又は物理的特性の変化を測定するための物質検出構成要素と;
を含む、化学センサー。 - 前記活性な層状ナノ材料が、グラフェンを含む、請求項1に記載の化学センサー。
- 前記活性な層状ナノ材料が、二次元材料を含む、請求項1に記載の化学センサー。
- 前記二次元材料が、二硫化モリブデンを含む、請求項3に記載の化学センサー。
- 前記複数のナノリボンの少なくとも一部が、実質的に均一のエッジ形状を有する、請求項1に記載の化学センサー。
- 前記実質的に均一のエッジ形状が、ジグザグエッジ又はアームチェアエッジの内の一以上を含む、請求項5に記載の化学センサー。
- 前記複数のナノリボンの少なくとも一部における前記活性な層状ナノ材料を清潔にするために、前記複数のナノリボンの少なくとも一部を連続的に照射するための放射源をさらに含む、請求項1に記載の化学センサー。
- 前記放射源が、連続的な紫外線光照射を供給する、請求項7に記載の化学センサー。
- 化学的電界効果トランジスタ(FET)であって、
電荷を供給するためのソース端と;
前記複数のナノリボンの少なくとも一部へ電位を供給するためのゲート端と;
前記ソース端から電流を受け取るためのドレイン端と;
を含む、化学的電界効果トランジスタ(FET)、をさらに含み、
前記基板が、前記ゲート端に結合され、前記物質検出構成要素が、前記ソース端へ電荷を供給する、請求項1に記載の化学センサー。 - 基板の上に位置する複数のナノリボンへ電荷を供給する段階であって、前記複数のナノリボンが、活性な層状ナノ材料から成る、段階と;
前記複数のナノリボンの物理的又は電気的特性における変化をモニタリングする段階と;
前記複数のナノリボンの前記物理的又は電気的特性における前記変化がしきい値に達することを決定することに基づいて物質の存在を検出する段階と;
を含む、化学センサーを用いて物質を検出するための方法。 - 前記活性な層状ナノ材料が、グラフェンを含む、請求項10に記載の方法。
- 前記活性な層状ナノ材料が、二次元材料を含む、請求項10に記載の方法。
- 前記二次元材料が、二硫化モリブデンを含む、請求項12に記載の方法。
- 前記複数のナノリボンの少なくとも一部が、実質的に均一のエッジ形状を有する、請求項10に記載の方法。
- 前記実質的に均一のエッジ形状が、ジグザグエッジ又はアームチェアエッジの内の一以上を含む、請求項14に記載の方法。
- 基板の上に活性な層状ナノ材料を配する段階と;
フォトレジスト層によって前記活性な層状ナノ材料を被覆する段階と;
複数の平行な梁を有するマスクを前記フォトレジスト層へ適用する段階と;
前記マスクによって覆われた前記活性な層状ナノ材料の領域を露出するために前記基板を現像して、前記フォトレジスト層によって被覆された前記活性な層状ナノ材料の複数のナノリボンを生成する段階と;
前記活性な層状ナノ材料の前記露出された領域をエッチング除去して、前記複数のナノリボンのエッジに関して実質的に均一のエッジ形状を達成する段階と;
前記複数のナノリボンから前記フォトレジスト層の残りの部分を除去する段階と;
を含む、化学センサーによって化学的検出を促進するための基板を構築するための方法。 - 前記活性な層状ナノ材料が、グラフェンを含む、請求項16に記載の方法。
- 前記活性な層状ナノ材料が、二次元材料を含む、請求項16に記載の方法。
- 前記二次元材料が、二硫化モリブデンを含む、請求項18に記載の方法。
- 前記実質的に均一のエッジ形状が、ジグザグエッジ又はアームチェアエッジの内の一以上を含む、請求項16に記載の方法。
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662313526P | 2016-03-25 | 2016-03-25 | |
| US62/313,526 | 2016-03-25 | ||
| US15/453,324 | 2017-03-08 | ||
| US15/453,324 US10514357B2 (en) | 2016-03-25 | 2017-03-08 | Chemical sensor based on layered nanoribbons |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017173331A true JP2017173331A (ja) | 2017-09-28 |
| JP6974018B2 JP6974018B2 (ja) | 2021-12-01 |
Family
ID=59896414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017058830A Expired - Fee Related JP6974018B2 (ja) | 2016-03-25 | 2017-03-24 | 層状ナノリボンに基づいた化学センサー |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10514357B2 (ja) |
| JP (1) | JP6974018B2 (ja) |
| CN (1) | CN107228919B (ja) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10141412B2 (en) * | 2016-10-25 | 2018-11-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Field effect transistor using transition metal dichalcogenide and a method for manufacturing the same |
| US11913901B2 (en) * | 2018-01-04 | 2024-02-27 | Lyten, Inc. | Analyte sensing device |
| US11988628B2 (en) * | 2018-01-04 | 2024-05-21 | Lyten, Inc. | Container including analyte sensing device |
| US20210181146A1 (en) * | 2018-01-04 | 2021-06-17 | Lyten, Inc. | Sensing device for detecting analytes in packages |
| CN110311010B (zh) * | 2019-06-28 | 2022-06-07 | 西安交通大学 | 一种基于石墨烯纳米带的红外宽光谱探测器 |
| US11519068B2 (en) | 2020-04-16 | 2022-12-06 | Honda Motor Co., Ltd. | Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides |
| US12060642B2 (en) | 2020-04-16 | 2024-08-13 | Honda Motor Co., Ltd. | Method for growth of atomic layer ribbons and nanoribbons of transition metal dichalcogenides |
| US11639546B2 (en) * | 2020-04-16 | 2023-05-02 | Honda Motor Co., Ltd. | Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides |
| US20220406923A1 (en) * | 2021-06-17 | 2022-12-22 | Honda Motor Co., Ltd. | Bilayer metal dichalcogenides, syntheses thereof, and uses thereof |
| CN113948612B (zh) * | 2021-10-18 | 2025-03-28 | 清华大学 | 一维二硒化铂纳米带的制备方法及制备的二硒化铂纳米带 |
| CN121141760B (zh) * | 2025-11-18 | 2026-03-24 | 成都理工大学 | 一种基于边缘结构调控的石墨烯气体传感器及其制备方法 |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010530063A (ja) * | 2007-06-08 | 2010-09-02 | バラス アール. タクラパリ, | ナノ構造電界効果型センサならびに同センサを形成する方法および使用する方法 |
| JP2011045944A (ja) * | 2009-08-26 | 2011-03-10 | National Institute For Materials Science | ナノリボン及びその製造方法、ナノリボンを用いたfet及びその製造方法、ナノリボンを用いた塩基配列決定方法およびその装置 |
| US20120282594A1 (en) * | 2011-05-08 | 2012-11-08 | Honda Motor Co., Ltd. | Method of enhanced detection for nanomaterial-based molecular sensors |
| US20130309776A1 (en) * | 2011-07-22 | 2013-11-21 | The Trustees Of The University Of Pennsylvania | Graphene-Based Nanopore and Nanostructure Devices and Methods for Macromolecular Analysis |
| JP2013253010A (ja) * | 2011-12-01 | 2013-12-19 | Tohoku Univ | グラフェン構造体及びそれを用いた半導体装置並びにそれらの製造方法 |
| JP2014052237A (ja) * | 2012-09-06 | 2014-03-20 | Seiko Instruments Inc | ガスセンサ、ガス測定装置、及びガスセンサの製造方法 |
| WO2014171969A1 (en) * | 2013-04-18 | 2014-10-23 | The Board Of Trustees Of The University Of Illinois | Method and apparatus analyzing a target material |
| WO2014191892A1 (en) * | 2013-05-29 | 2014-12-04 | Csir | A field effect transistor and a gas detector including a plurality of field effect transistors |
| JP2014532982A (ja) * | 2011-10-21 | 2014-12-08 | ユニバーシティ・オブ・ユタ・リサーチ・ファウンデイション | 均一複数バンドギャップデバイス |
| WO2015032646A1 (en) * | 2013-09-04 | 2015-03-12 | Basf Se | Purification process for graphene nanoribbons |
| JP2015521107A (ja) * | 2012-03-05 | 2015-07-27 | テフニーシェ・ユニヴェルツィーテイト・デルフト | 高精細ナノ構造を除去する方法、部分的独立層、部分的独立層を備えるセンサー、及びそのセンサーを使用する方法 |
| US20150355540A1 (en) * | 2013-03-25 | 2015-12-10 | Korea Electronics Technology Institute | Photosensitive coating composition, coating conductive film using photosensitive coating composition, and method for forming coating conductive film |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7301199B2 (en) * | 2000-08-22 | 2007-11-27 | President And Fellows Of Harvard College | Nanoscale wires and related devices |
| CN1590998A (zh) * | 2003-09-06 | 2005-03-09 | 鸿富锦精密工业(深圳)有限公司 | 气体传感器 |
| US8052932B2 (en) * | 2006-12-22 | 2011-11-08 | Research Triangle Institute | Polymer nanofiber-based electronic nose |
| US20080030352A1 (en) | 2006-02-27 | 2008-02-07 | Thorn Security Limited | Methods and systems for gas detection |
| US20070275230A1 (en) * | 2006-05-26 | 2007-11-29 | Robert Murphy | Methods and systems for creating a material with nanomaterials |
| GB0802912D0 (en) * | 2008-02-15 | 2008-03-26 | Carben Semicon Ltd | Thin-film transistor, carbon-based layer and method of production thereof |
| US20100224998A1 (en) | 2008-06-26 | 2010-09-09 | Carben Semicon Limited | Integrated Circuit with Ribtan Interconnects |
| KR101681950B1 (ko) | 2009-01-15 | 2016-12-05 | 삼성전자주식회사 | 그라펜 에지의 화학적 변형 방법 및 이에 의하여 얻어진 그라펜 |
| US20100226811A1 (en) * | 2009-03-05 | 2010-09-09 | Xerox Corporation | Feature forming process using plasma treatment |
| JP5299506B2 (ja) | 2009-04-21 | 2013-09-25 | 富士通株式会社 | グラフェンシート系材料の処理方法及び電子機器の製造方法 |
| US20120261644A1 (en) | 2011-04-18 | 2012-10-18 | International Business Machines Corporation | Structure and method of making graphene nanoribbons |
| JP5772299B2 (ja) | 2011-06-29 | 2015-09-02 | 富士通株式会社 | 半導体デバイス及びその製造方法 |
| US9388513B2 (en) | 2011-07-01 | 2016-07-12 | The University Of Kentucky Research Foundation | Crystallographically-oriented carbon nanotubes grown on few-layer graphene films |
| US9472450B2 (en) | 2012-05-10 | 2016-10-18 | Samsung Electronics Co., Ltd. | Graphene cap for copper interconnect structures |
| KR101993767B1 (ko) | 2012-10-17 | 2019-07-01 | 한국전자통신연구원 | 그래핀 나노리본 센서 |
| US9356151B2 (en) | 2013-02-01 | 2016-05-31 | William Marsh Rice University | Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask |
| US10345289B2 (en) * | 2013-04-18 | 2019-07-09 | The Board Of Trustees Of The University Of Illinois | Method and apparatus for analyzing a target material |
| CN104538449B (zh) | 2014-12-29 | 2018-09-14 | 连江县维佳工业设计有限公司 | 一种石墨烯场效应晶体管结构及其大规模制作工艺 |
| CN105301061B (zh) * | 2015-09-23 | 2018-05-22 | 西南交通大学 | 一种自组装式网格状α-MoO3纳米带气敏传感器 |
-
2017
- 2017-03-08 US US15/453,324 patent/US10514357B2/en active Active
- 2017-03-23 CN CN201710177201.2A patent/CN107228919B/zh not_active Expired - Fee Related
- 2017-03-24 JP JP2017058830A patent/JP6974018B2/ja not_active Expired - Fee Related
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010530063A (ja) * | 2007-06-08 | 2010-09-02 | バラス アール. タクラパリ, | ナノ構造電界効果型センサならびに同センサを形成する方法および使用する方法 |
| JP2011045944A (ja) * | 2009-08-26 | 2011-03-10 | National Institute For Materials Science | ナノリボン及びその製造方法、ナノリボンを用いたfet及びその製造方法、ナノリボンを用いた塩基配列決定方法およびその装置 |
| US20120282594A1 (en) * | 2011-05-08 | 2012-11-08 | Honda Motor Co., Ltd. | Method of enhanced detection for nanomaterial-based molecular sensors |
| US20130309776A1 (en) * | 2011-07-22 | 2013-11-21 | The Trustees Of The University Of Pennsylvania | Graphene-Based Nanopore and Nanostructure Devices and Methods for Macromolecular Analysis |
| JP2014532982A (ja) * | 2011-10-21 | 2014-12-08 | ユニバーシティ・オブ・ユタ・リサーチ・ファウンデイション | 均一複数バンドギャップデバイス |
| JP2013253010A (ja) * | 2011-12-01 | 2013-12-19 | Tohoku Univ | グラフェン構造体及びそれを用いた半導体装置並びにそれらの製造方法 |
| JP2015521107A (ja) * | 2012-03-05 | 2015-07-27 | テフニーシェ・ユニヴェルツィーテイト・デルフト | 高精細ナノ構造を除去する方法、部分的独立層、部分的独立層を備えるセンサー、及びそのセンサーを使用する方法 |
| JP2014052237A (ja) * | 2012-09-06 | 2014-03-20 | Seiko Instruments Inc | ガスセンサ、ガス測定装置、及びガスセンサの製造方法 |
| US20150355540A1 (en) * | 2013-03-25 | 2015-12-10 | Korea Electronics Technology Institute | Photosensitive coating composition, coating conductive film using photosensitive coating composition, and method for forming coating conductive film |
| WO2014171969A1 (en) * | 2013-04-18 | 2014-10-23 | The Board Of Trustees Of The University Of Illinois | Method and apparatus analyzing a target material |
| WO2014191892A1 (en) * | 2013-05-29 | 2014-12-04 | Csir | A field effect transistor and a gas detector including a plurality of field effect transistors |
| WO2015032646A1 (en) * | 2013-09-04 | 2015-03-12 | Basf Se | Purification process for graphene nanoribbons |
Also Published As
| Publication number | Publication date |
|---|---|
| US20170276641A1 (en) | 2017-09-28 |
| CN107228919A (zh) | 2017-10-03 |
| JP6974018B2 (ja) | 2021-12-01 |
| CN107228919B (zh) | 2022-02-15 |
| US10514357B2 (en) | 2019-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2017173331A (ja) | 層状ナノリボンに基づいた化学センサー | |
| Zhang et al. | Reversible thermoelectric regulation of electromagnetic and chemical enhancement for rapid SERS detection | |
| Kim et al. | Fabrication and characterization of large-area, semiconducting nanoperforated graphene materials | |
| Tan et al. | Edge effects on the pH response of graphene nanoribbon field effect transistors | |
| Puster et al. | Toward sensitive graphene nanoribbon–nanopore devices by preventing electron beam-induced damage | |
| Jung et al. | Simple approach for high-contrast optical imaging and characterization of graphene-based sheets | |
| Kim et al. | The structural and electrical evolution of graphene by oxygen plasma-induced disorder | |
| Yasaei et al. | Bimodal phonon scattering in graphene grain boundaries | |
| Wang et al. | Thermal transport in suspended and supported few-layer graphene | |
| Cui et al. | Ultrasensitive chemical sensing through facile tuning defects and functional groups in reduced graphene oxide | |
| Kim et al. | Highly selective environmental nanosensors based on anomalous response of carbon nanotube conductance to mercury ions | |
| Cong et al. | Fabrication of graphene nanodisk arrays using nanosphere lithography | |
| Paula et al. | Femtosecond laser micromachining of polylactic acid/graphene composites for designing interdigitated microelectrodes for sensor applications | |
| Kazemi et al. | RETRACTED ARTICLE: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography | |
| Walter et al. | Luminescence, patterned metallic regions, and photon-mediated electronic changes in single-sided fluorinated graphene sheets | |
| Xiong et al. | Thermal transport in supported graphene nanomesh | |
| Braun et al. | Spatially mapping thermal transport in graphene by an opto-thermal method | |
| Hasan et al. | Enhanced ionic sensitivity in solution‐gated graphene‐hexagonal boron nitride heterostructure field‐effect transistors | |
| Rodriguez-Fernandez et al. | Unraveling thermal transport properties of MoTe2 thin films using the optothermal Raman technique | |
| Ahmadian Yazdi et al. | Phononics of graphene interfaced with flowing ionic fluid: an avenue for high spatial resolution flow sensor applications | |
| Hao et al. | Fast response temperature sensor based on reduced graphene oxide through electron beam direct writing | |
| Wang et al. | Dip-pen nanolithography of electrical contacts to single-walled carbon nanotubes | |
| Begliarbekov et al. | Optical control of edge chirality in graphene | |
| Dhahi et al. | Polysilicon nanogap fabrication using a thermal oxidation process | |
| Dhahi et al. | Fabrication of Lateral Polysilicon Gap of Less than 50 nm Using Conventional Lithography |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20181005 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200213 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20201223 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210105 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210308 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20211005 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20211104 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6974018 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |