JP2017194632A5 - - Google Patents

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JP2017194632A5
JP2017194632A5 JP2016086144A JP2016086144A JP2017194632A5 JP 2017194632 A5 JP2017194632 A5 JP 2017194632A5 JP 2016086144 A JP2016086144 A JP 2016086144A JP 2016086144 A JP2016086144 A JP 2016086144A JP 2017194632 A5 JP2017194632 A5 JP 2017194632A5
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particles
volume
optical apparatus
resin
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JP2016086144A
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JP6797548B2 (en
JP2017194632A (en
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Priority to JP2016086144A priority Critical patent/JP6797548B2/en
Priority claimed from JP2016086144A external-priority patent/JP6797548B2/en
Priority to US15/481,707 priority patent/US11163132B2/en
Publication of JP2017194632A publication Critical patent/JP2017194632A/en
Publication of JP2017194632A5 publication Critical patent/JP2017194632A5/ja
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Claims (20)

レンズと、前記レンズを鏡筒の内部に備えたレンズ鏡筒を有する光学機器であって、
前記レンズ鏡筒の外周表面の少なくとも一部に遮熱膜を有し、
前記遮熱膜は、ウレタン樹脂、アクリル樹脂、エポキシ樹脂、およびこれらの組合せ、の中から選択される樹脂中に、d線屈折率が2.5以上3.2以下であって平均粒径が2μm以上5μm以下である第1の粒子と、空孔を含有する第2の粒子とを含んでいることを特徴とする光学機器。
An optical apparatus comprising a lens and a lens barrel provided with the lens inside the lens barrel,
A heat shield film on at least a part of the outer peripheral surface of the lens barrel;
The Saeginetsumaku is urethane resins, acrylic resins, epoxy resins, and combinations thereof, the resin being selected from among the average particle size be at d-line refractive index of 2.5 or more 3.2 or less optics but wherein the first particles is 2μm or more 5μm or less, the Rukoto include a second particles containing voids.
前記第1の粒子を前記遮熱膜に対して20体積%以上60体積%以下の割合で含む請求項1に記載の光学機器。 The optical apparatus according to claim 1, wherein the first particles are contained in a ratio of 20% by volume or more and 60% by volume or less with respect to the heat shielding film. 前記第1の粒子が酸化チタンからなる請求項1または2に記載の光学機器。 The optical apparatus according to claim 1, wherein the first particle is made of titanium oxide. 前記第2の粒子が中空粒子である請求項1〜3のいずれか一項に記載の光学機器。 The optical apparatus according to any one of claims 1 to 3, wherein the second particles are hollow particles. 前記第2の粒子の平均粒径が5nm以上100nm以下である請求項4に記載の光学機器。 The optical instrument according to claim 4, wherein the average particle diameter of the second particles is 5 nm or more and 100 nm or less. 前記第2の粒子がシリカである請求項4または5に記載の光学機器。 The optical apparatus according to claim 4 or 5 which is the second particles starvation Rica. 前記第2の粒子が前記遮熱膜に対して5体積%以上50体積%以下の割合で含まれる請求項1〜6のいずれか一項に記載の光学機器。 The optical apparatus according to any one of claims 1 to 6, wherein the second particles are contained in a ratio of 5% by volume or more and 50% by volume or less with respect to the heat shielding film. 前記樹脂の鉛筆硬度がH以上5H以下である請求項1〜7のいずれか一項に記載の光学機器。 The optical device according to any one of claims 1 to 7 pencil hardness before Bark butter is less than H 5H. 前記遮熱膜が10μm以上70μm以下の平均膜厚を有する請求項1〜8のいずれか一項に記載の光学機器。   The optical apparatus according to any one of claims 1 to 8, wherein the heat shielding film has an average film thickness of 10 μm to 70 μm. ウレタン樹脂、アクリル樹脂、エポキシ樹脂、およびこれらの組合せ、の中から選択される樹脂中に、d線屈折率が2.5以上3.2以下であり平均粒径が2μm以上5μm以下である第1の粒子と、空孔を含有する第2の粒子を含むことを特徴とする遮熱膜。 Urethane resins, acrylic resins, epoxy resins, and combinations thereof, the resin being selected from among the average particle size is at d-line refractive index of 2.5 or more 3.2 or less is at 2μm or more 5μm or less Saeginetsumaku characterized the first particles, including that the second particles containing voids. 前記第1の粒子を前記遮熱膜に対して20体積%以上60体積%以下の割合で含む請求項10に記載の遮熱膜。 The heat shield film according to claim 10, wherein the first particles are contained in a ratio of 20% by volume or more and 60% by volume or less with respect to the heat shield film. 前記第1の粒子が酸化チタンからなる請求項10または11に記載の遮熱膜。 The heat shielding film according to claim 10, wherein the first particles are made of titanium oxide. 前記第2の粒子が中空粒子である請求項10〜12のいずれか一項に記載の遮熱膜。 The heat shielding film according to any one of claims 10 to 12, wherein the second particles are hollow particles. 前記第2の粒子の平均粒径が5nm以上100nm以下である請求項13に記載の遮熱膜。 The heat shielding film according to claim 13, wherein an average particle diameter of the second particles is 5 nm or more and 100 nm or less. 前記第2の粒子がシリカである請求項13または14に記載の遮熱膜。 Saeginetsumaku according to the second claim 13 or 14, which is a particle starvation Rica. 前記第2の粒子が前記遮熱膜に対して5体積%以上50体積%以下の割合で含まれる請求項10〜15のいずれか一項に記載の遮熱膜。 The heat shield film according to any one of claims 10 to 15, wherein the second particles are contained in a ratio of 5% by volume or more and 50% by volume or less with respect to the heat shield film. 前記樹脂の鉛筆硬度がH以上5H以下である請求項10〜16のいずれか一項に記載の遮熱膜。 Saeginetsumaku according to any one of claims 10 to 16 pencil hardness of the resins is less than H 5H. 10μm以上70μm以下の平均膜厚を有する請求項10〜17のいずれか一項に記載の遮熱膜。   The heat shielding film as described in any one of Claims 10-17 which has an average film thickness of 10 micrometers or more and 70 micrometers or less. ウレタン樹脂、アクリル樹脂、エポキシ樹脂、およびこれらの組合せ、の中から選択される樹脂を溶剤に溶解した溶液中に、d線屈折率が2.5以上3.2以下で平均粒径が2μm以上5μm以下である第1の粒子と、空孔を含有する第2の粒子と、を含む遮熱塗料。 Urethane resins, acrylic resins, epoxy resins, and an average particle diameter of 2μm were these unions, the resin chosen from the solution dissolved in a solvent, at d-line refractive index of 2.5 or more 3.2 or less A thermal barrier coating comprising a first particle which is not less than 5 μm and a second particle which contains pores . ウレタン樹脂、アクリル樹脂、エポキシ樹脂、およびこれらの組合せ、の中から選択される樹脂を溶剤に溶解した溶液中に、d線屈折率が2.5以上3.2以下で平均粒径が2μm以上5μm以下である第1の粒子と、空孔を含有する第2の粒子と、を含む遮熱塗料を塗布する工程を有することを特徴とする光学機器の製造方法。In a solution in which a resin selected from a urethane resin, an acrylic resin, an epoxy resin, and a combination thereof is dissolved in a solvent, the d-line refractive index is 2.5 or more and 3.2 or less, and the average particle diameter is 2 μm or more A method of manufacturing an optical apparatus, comprising the step of applying a thermal barrier coating comprising a first particle having a diameter of 5 μm or less and a second particle having a void.
JP2016086144A 2016-04-18 2016-04-22 Heat shield film, heat shield paint, and optical equipment Active JP6797548B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016086144A JP6797548B2 (en) 2016-04-22 2016-04-22 Heat shield film, heat shield paint, and optical equipment
US15/481,707 US11163132B2 (en) 2016-04-18 2017-04-07 Thermal barrier film, thermal barrier paint, and optical instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016086144A JP6797548B2 (en) 2016-04-22 2016-04-22 Heat shield film, heat shield paint, and optical equipment

Related Child Applications (1)

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JP2020192329A Division JP7071481B2 (en) 2020-11-19 2020-11-19 Heat shield film, heat shield paint, and optical equipment

Publications (3)

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JP2017194632A JP2017194632A (en) 2017-10-26
JP2017194632A5 true JP2017194632A5 (en) 2019-06-06
JP6797548B2 JP6797548B2 (en) 2020-12-09

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KR102613368B1 (en) * 2018-07-10 2023-12-13 가부시끼가이샤 레조낙 Manufacturing method of coating solution, coating solution and coating film
JP7154921B2 (en) * 2018-09-28 2022-10-18 キヤノン株式会社 Optical device, lens hood, method for manufacturing optical device, and method for manufacturing lens hood
JP7071481B2 (en) * 2020-11-19 2022-05-19 キヤノン株式会社 Heat shield film, heat shield paint, and optical equipment
JP7651294B2 (en) * 2020-12-16 2025-03-26 キヤノン株式会社 Films applied to the surface of optical equipment, optical equipment, paint
KR102355547B1 (en) * 2021-03-09 2022-02-08 주식회사 보성산업 Non-flammable paint composition for coating ceiling-type warmer with excellent deodorization, antibacterial, anti-condensation and adhesion properties, ans method of manufacturing the same

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JP4895343B2 (en) * 2004-09-22 2012-03-14 富士フイルム株式会社 Antireflection film, method for producing the same, polarizing plate, and image display device
JPWO2008041681A1 (en) * 2006-10-02 2010-02-04 旭硝子株式会社 Coating composition for forming antireflection film and article formed with antireflection film
JP2009139856A (en) * 2007-12-10 2009-06-25 Nikon Corp Lens barrel and imaging system
JP2010197847A (en) * 2009-02-26 2010-09-09 Dainippon Printing Co Ltd Composite optical filter
WO2012157682A1 (en) * 2011-05-16 2012-11-22 大日本印刷株式会社 Method for producing antireflection film, antireflection film, polarizing plate, and image display device
JP2013008025A (en) * 2011-05-26 2013-01-10 Jsr Corp Laminate for antireflection and manufacturing method thereof, and curable composition
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JP6744751B2 (en) * 2016-04-18 2020-08-19 キヤノン株式会社 Thermal barrier film for optical equipment, thermal barrier coating for optical equipment, and optical equipment using them

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