JP3820728B2 - 基板の測定装置 - Google Patents

基板の測定装置 Download PDF

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Publication number
JP3820728B2
JP3820728B2 JP02312998A JP2312998A JP3820728B2 JP 3820728 B2 JP3820728 B2 JP 3820728B2 JP 02312998 A JP02312998 A JP 02312998A JP 2312998 A JP2312998 A JP 2312998A JP 3820728 B2 JP3820728 B2 JP 3820728B2
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JP
Japan
Prior art keywords
height
measurement
measuring
window
color filter
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP02312998A
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English (en)
Japanese (ja)
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JPH11218466A5 (2
JPH11218466A (ja
Inventor
裕方 佐々本
英夫 井戸
肇 平田
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Toray Industries Inc
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Toray Industries Inc
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Priority to JP02312998A priority Critical patent/JP3820728B2/ja
Publication of JPH11218466A publication Critical patent/JPH11218466A/ja
Publication of JPH11218466A5 publication Critical patent/JPH11218466A5/ja
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Publication of JP3820728B2 publication Critical patent/JP3820728B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Testing Of Optical Devices Or Fibers (AREA)
  • Liquid Crystal (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP02312998A 1998-02-04 1998-02-04 基板の測定装置 Expired - Lifetime JP3820728B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02312998A JP3820728B2 (ja) 1998-02-04 1998-02-04 基板の測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02312998A JP3820728B2 (ja) 1998-02-04 1998-02-04 基板の測定装置

Publications (3)

Publication Number Publication Date
JPH11218466A JPH11218466A (ja) 1999-08-10
JPH11218466A5 JPH11218466A5 (2) 2005-02-10
JP3820728B2 true JP3820728B2 (ja) 2006-09-13

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JP02312998A Expired - Lifetime JP3820728B2 (ja) 1998-02-04 1998-02-04 基板の測定装置

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JP (1) JP3820728B2 (2)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6684097B1 (en) 1999-04-22 2004-01-27 University Of Miami Intraoperative monitoring of temperature-induced tissue changes with a high-resolution digital x-ray system during thermotherapy
EP2157480B1 (en) 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
JP2006105702A (ja) * 2004-10-01 2006-04-20 Keyence Corp 光学式変位計とそれを用いた粘性液体の塗布断面積の測定方法、光学変位計の測定プログラムおよびコンピュータで読み取り可能な記録媒体。
JP4696574B2 (ja) * 2005-02-02 2011-06-08 株式会社ニコン 半導体検査装置
KR20140140648A (ko) 2005-05-12 2014-12-09 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP4123271B2 (ja) 2005-11-28 2008-07-23 船井電機株式会社 液晶モジュール輝度測定装置
JP5040227B2 (ja) * 2006-09-11 2012-10-03 大日本印刷株式会社 カラーフィルタの検査装置及びカラーフィルタの検査方法
KR101530734B1 (ko) 2007-10-05 2015-06-22 가부시키가이샤 니콘 표시디바이스의 결함검출방법 및 표시디바이스의 결함검출장치
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP7602713B2 (ja) * 2021-03-02 2024-12-19 株式会社東京精密 パーティクル計測装置、三次元形状測定装置、プローバ装置、パーティクル計測システム及びパーティクル計測方法

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Publication number Publication date
JPH11218466A (ja) 1999-08-10

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