JP4121961B2 - 走査型プローブ顕微鏡 - Google Patents
走査型プローブ顕微鏡 Download PDFInfo
- Publication number
- JP4121961B2 JP4121961B2 JP2003568346A JP2003568346A JP4121961B2 JP 4121961 B2 JP4121961 B2 JP 4121961B2 JP 2003568346 A JP2003568346 A JP 2003568346A JP 2003568346 A JP2003568346 A JP 2003568346A JP 4121961 B2 JP4121961 B2 JP 4121961B2
- Authority
- JP
- Japan
- Prior art keywords
- scanner
- stage
- cantilever
- mirror
- supported
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000523 sample Substances 0.000 title claims description 82
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000005452 bending Methods 0.000 claims description 6
- 230000004044 response Effects 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000010979 ruby Substances 0.000 description 5
- 229910001750 ruby Inorganic materials 0.000 description 5
- 238000004091 panning Methods 0.000 description 4
- 238000004630 atomic force microscopy Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000013256 coordination polymer Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 241001522296 Erithacus rubecula Species 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910000595 mu-metal Inorganic materials 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 238000004628 non contact atomic force microscopy Methods 0.000 description 1
- 238000000879 optical micrograph Methods 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 238000004621 scanning probe microscopy Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
- G01Q20/02—Monitoring the movement or position of the probe by optical means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/02—Coarse scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/02—Probe holders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/724—Devices having flexible or movable element
- Y10S977/732—Nanocantilever
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/868—Scanning probe structure with optical means
- Y10S977/869—Optical microscope
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/868—Scanning probe structure with optical means
- Y10S977/87—Optical lever arm for reflecting light
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/873—Tip holder
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/88—Manufacture, treatment, or detection of nanostructure with arrangement, process, or apparatus for testing
- Y10S977/881—Microscopy or spectroscopy, e.g. sem, tem
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Description
1) 走査精度:x−y軸とz軸との間のクロストーク(cross talk)が全くないため、高い走査精度が得られる。
2) サンプルの大きさ:サンプルがx−y方向にのみ走査されるため、小形サンプルだけではなく大形サンプルも充分高速で走査することができる。
3) 走査速度:zスキャナは、大きい力の高い共振周波数を有すると共に、カンチレバーとPSPDだけを走査すればよいため、従来技術よりzサーボ周波数応答が遥かに大きい。
4) 便利性:レーザー光線調節器具は探針ヘッドに固定され、このようなレーザー光線調節器具を、別途の工具を使うことなく便利且つ正確に調節できるよう、充分大きくすることができる。
5) 光視覚:カンチレバーの上側に充分な空間が確保できるため、直立軸上光学顕微鏡(direct on-axis optical microscope)を収容することができる。
6) 焦点合わせ(panning):ブラケットを有する単一体光学顕微鏡を使用することにより、光学顕微鏡の像がさらに鮮明で明らかになる。
Claims (7)
- 固定フレーム;
前記固定フレームに取り付けられた第1スキャナ;
前記第1スキャナに取り付けられて、前記第1スキャナにより平面上に移動可能なサンプルチェック;
前記第1スキャナから物理的に分離されて、前記固定フレームに取り付けられたzステージ上に設けられた第2スキャナ;
前記第2スキャナに支持されて、前記サンプルチェックの移動平面に垂直な線に沿って、前記第2スキャナにより移動可能なカンチレバー;
前記カンチレバーの自由端に取り付けられた探針;
前記カンチレバー上に設けられた反射器;
前記反射器に向かって、前記zステージ上に設けられた光源;
前記zステージ上に設けられた第1ミラー:
前記光源からの光であって、前記反射器と前記第一ミラーにより反射された光の一部を受光するために、前記zステージ上に設けられた前記第2スキャナにより支持される光検出器;及び
前記zステージ上に支持されて、前記第1ミラーと平行な第2ミラーを含んでなり、
前記第1ミラーは、探針の移動線に対し角度を成して配向されて、前記第1ミラーと第2ミラーとは、前記移動線の両側面に配列される走査型プローブ顕微鏡。 - 前記探針の移動線に沿って配列された直立軸上光学顕微鏡(Direct on-axis optical microscope)をさらに含むことを特徴とすることを特徴とする、請求項1記載の走査型プローブ顕微鏡。
- 前記第2スキャナは静電圧アクチュエータ( stacked piezoelectric actuator )を含むことを特徴とする、請求項1に記載の走査型プローブ顕微鏡。
- 固定フレーム;
前記固定フレームに取り付けられた第1スキャナ;
前記第1スキャナに取り付けられて、前記第1スキャナにより平面上に移動可能なサンプルチェック;
前記第1スキャナから物理的に分離されて、前記固定フレームに取り付けられたzステージ上に設けられた第2スキャナ;
前記第2スキャナに支持されて、前記サンプルチェックの移動平面に垂直な線に沿って、前記第2スキャナにより移動可能なカンチレバー;
前記カンチレバーの自由端に取り付けられた探針;
前記カンチレバー上に設けられた反射器;
前記反射器に向かって、前記zステージ上に設けられた光源;
前記zステージ上に設けられた第1ミラー:
前記光源からの光であって、前記反射器と前記第一ミラーにより反射された光の一部を受光するために、前記zステージ上に設けられた前記第2スキャナにより支持される光検出器;及び
前記zステージ上に支持されて、前記第1ミラーと平行な第2ミラーを含んでなり、
前記第1ミラーは、探針の移動線に平行に配向されて、前記第1ミラーと第2ミラーとは、前記移動線の両側面に配列される走査型プローブ顕微鏡。 - 前記第1スキャナは、x−y屈曲ステージを含むことを特徴とする、請求項1に記載の走査型プローブ顕微鏡。
- 固定フレーム;
前記固定フレームに取り付けられた2次元屈曲ステージ;
前記2次元屈曲ステージに取り付けられて、前記2次元屈曲ステージにより、前記固定フレームに対して平面上に移動可能なサンプルチェック;
前記固定フレームに取り付けられた1次元移動ステージ上に設けられ、前記1次元移動ステージの移動方向への線形移動に制限されて、前記平面に垂直なスキャナ;
前記スキャナに支持されて、一つの自由端を有するカンチレバー;
前記1次元移動ステージにより支持されて、前記1次元移動ステージの移動方向に平行な軸を有する対物レンズ;
前記カンチレバーと前記対物レンズとの間に前記1次元移動ステージにより支持されて、前記軸に沿って配列されるプリズム;
前記軸から外側にオフセットされ、前記1次元移動ステージにより支持されて、プリズムに向かう光源;
前記カンチレバー上に配列された反射器:
前記軸からオフセットされて、前記光源に隣接し、前記1次元移動ステージにより支持される第1ミラー;及び
前記光源から一部の光を受光するように位置されて、前記1次元移動ステージ上に設けられた前記スキャナにより支持される光検出器を含んでなり、
前記光源からの光は、前記プリズムにより、前記軸に沿って反射されて、前記プリズムからの光は、前記反射器により、前記軸に対し斜めに反射されて、前記反射器からの光は、前記第1ミラーにより反射される走査型プローブ顕微鏡。 - 前記レンズの軸は、前記カンチレバーの移動線と一致し、前記平面に垂直であることを特徴とする、請求項6記載の走査型プローブ顕微鏡。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/077,835 US6677567B2 (en) | 2002-02-15 | 2002-02-15 | Scanning probe microscope with improved scan accuracy, scan speed, and optical vision |
| PCT/KR2002/002222 WO2003069271A1 (en) | 2002-02-15 | 2002-11-27 | Improved scanning probe microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005517911A JP2005517911A (ja) | 2005-06-16 |
| JP4121961B2 true JP4121961B2 (ja) | 2008-07-23 |
Family
ID=27732728
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003568346A Expired - Lifetime JP4121961B2 (ja) | 2002-02-15 | 2002-11-27 | 走査型プローブ顕微鏡 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US6677567B2 (ja) |
| EP (1) | EP1377794B1 (ja) |
| JP (1) | JP4121961B2 (ja) |
| KR (1) | KR100646441B1 (ja) |
| AU (1) | AU2002356461A1 (ja) |
| WO (1) | WO2003069271A1 (ja) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6923044B1 (en) * | 2001-03-08 | 2005-08-02 | General Nanotechnology Llc | Active cantilever for nanomachining and metrology |
| DE10294375D2 (de) * | 2001-09-24 | 2004-08-26 | Jpk Instruments Ag | Vorrichtung zum Halten einer Messsonde für ein Rastersondenmikroskop |
| JP4432806B2 (ja) * | 2005-03-09 | 2010-03-17 | 株式会社島津製作所 | 走査型プローブ顕微鏡 |
| US7941286B2 (en) | 2006-01-31 | 2011-05-10 | Asylum Research Corporation | Variable density scanning |
| KR20070115502A (ko) * | 2006-06-02 | 2007-12-06 | 파크시스템스 주식회사 | 주사 탐침 현미경 및 이를 이용한 측정방법 |
| US20080006083A1 (en) * | 2006-06-26 | 2008-01-10 | Feinstein Adam J | Apparatus and method of transporting and loading probe devices of a metrology instrument |
| US20090200462A1 (en) * | 2006-11-17 | 2009-08-13 | Park Systems Corp. | Scanning probe microscope capable of measuring samples having overhang structure |
| KR100761059B1 (ko) * | 2006-09-29 | 2007-09-21 | 파크시스템스 주식회사 | 오버행 샘플 측정이 가능한 주사 탐침 현미경 |
| GB0702965D0 (en) * | 2007-02-15 | 2007-03-28 | Univ St Andrews | Cantilever device and method |
| US8166567B2 (en) * | 2007-03-16 | 2012-04-24 | Bruker Nano, Inc. | Fast-scanning SPM scanner and method of operating same |
| US8904560B2 (en) | 2007-05-07 | 2014-12-02 | Bruker Nano, Inc. | Closed loop controller and method for fast scanning probe microscopy |
| US20090032705A1 (en) * | 2007-07-31 | 2009-02-05 | Schroeder Dale W | Fast Tip Scanning For Scanning Probe Microscope |
| US7770231B2 (en) * | 2007-08-02 | 2010-08-03 | Veeco Instruments, Inc. | Fast-scanning SPM and method of operating same |
| WO2009085184A1 (en) * | 2007-12-21 | 2009-07-09 | University Of Akron | Protected metallic tip or metallized scanning probe microscopy tip for optical applications |
| US8832859B2 (en) * | 2008-09-18 | 2014-09-09 | Ali R. Afshari | Probe alignment tool for the scanning probe microscope |
| KR101038360B1 (ko) | 2009-08-31 | 2011-06-01 | 영남대학교 산학협력단 | 원자간력 현미경용 z축 스캐너 |
| KR101678041B1 (ko) * | 2010-02-17 | 2016-11-21 | 삼성전자 주식회사 | 원자간 힘 현미경 및 이를 이용한 시료 측정방법 |
| US8402560B2 (en) | 2010-05-04 | 2013-03-19 | Park Systems Corp. | Scanning probe microscope with drift compensation |
| US8474060B2 (en) * | 2011-04-29 | 2013-06-25 | Bruker Nano, Inc. | Scanning probe microscope with compact scanner |
| KR101417209B1 (ko) * | 2011-07-07 | 2014-07-11 | 한양대학교 산학협력단 | 주사 탐침 현미경을 이용하여 획득된 데이터 값들에 존재하는 왜곡의 제거 장치 및 방법 |
| US8817240B2 (en) | 2012-05-25 | 2014-08-26 | Mitutoyo Corporation | Interchangeable optics configuration for a chromatic range sensor optical pen |
| US8736817B2 (en) | 2012-05-25 | 2014-05-27 | Mitutoyo Corporation | Interchangeable chromatic range sensor probe for a coordinate measuring machine |
| US8635711B1 (en) * | 2012-09-13 | 2014-01-21 | Ut-Battelle, Llc | High throughput reproducible cantilever functionalization |
| US9068822B2 (en) | 2013-07-03 | 2015-06-30 | Mitutoyo Corporation | Chromatic range sensor probe detachment sensor |
| KR101476808B1 (ko) * | 2013-07-04 | 2014-12-29 | 파크시스템스 주식회사 | 스캐너 장치 및 이를 포함하는 원자현미경 |
| KR101678183B1 (ko) * | 2014-12-24 | 2016-11-22 | 파크시스템스 주식회사 | 레이저 스팟의 이동 범위를 제한하는 헤드 및 이를 구비하는 원자현미경 |
| EP3118631A1 (en) * | 2015-07-15 | 2017-01-18 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Scanning probe microscopy system for mapping high aspect ratio nanostructures on a surface of a sample |
| WO2018222707A1 (en) | 2017-05-30 | 2018-12-06 | Scuba Probe Technologies Llc | Atomic force microscope probes and methods of manufacturing probes |
| KR102236590B1 (ko) * | 2019-08-21 | 2021-04-06 | 경북대학교 산학협력단 | 고속 원자힘 현미경 |
| WO2021145578A1 (ko) | 2020-01-14 | 2021-07-22 | 파크시스템스 주식회사 | 기울어진 팁을 이용하여 측정 대상의 표면의 특성을 얻는 방법, 이 방법이 수행되기 위한 원자 현미경 및 이 방법이 수행되기 위해 저장 매체에 저장된 컴퓨터 프로그램 |
| WO2022065928A1 (ko) | 2020-09-24 | 2022-03-31 | 파크시스템스 주식회사 | 측정 장치에 의해 측정 대상의 표면의 특성을 측정하는 방법, 이 방법이 수행되기 위한 원자 현미경 및 이 방법이 수행되기 위해 저장 매체에 저장된 컴퓨터 프로그램 |
| US20230324434A1 (en) | 2020-09-24 | 2023-10-12 | Park Systems Corp. | Method for measuring characteristics of surface of object to be measured by means of measuring apparatus using variable set point setting, atomic microscope for performing method, and computer program stored in storage medium for performing method |
| US11619649B1 (en) | 2021-11-26 | 2023-04-04 | Park Systems Corp. | Atomic force microscope equipped with optical measurement device and method of acquiring information on surface of measurement target using the same |
| EP4187259A1 (en) | 2021-11-26 | 2023-05-31 | Park Systems Corp. | Atomic force microscope equipped with optical measurement device and method of acquiring information on surface of measurement target using the same |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US35514A (en) * | 1862-06-10 | Improved corkscrew | ||
| US3600811A (en) * | 1967-08-22 | 1971-08-24 | Zeiss Stiftung | Arrangement for measuring or adjusting two-dimensional position coordinates |
| US5103095A (en) | 1990-05-23 | 1992-04-07 | Digital Instruments, Inc. | Scanning probe microscope employing adjustable tilt and unitary head |
| US5157251A (en) | 1991-03-13 | 1992-10-20 | Park Scientific Instruments | Scanning force microscope having aligning and adjusting means |
| US5210410A (en) * | 1991-09-26 | 1993-05-11 | The Board Of Trustees Of The Leland Stanford Junior University | Scanning probe microscope having scan correction |
| US5376790A (en) | 1992-03-13 | 1994-12-27 | Park Scientific Instruments | Scanning probe microscope |
| US5448399A (en) | 1992-03-13 | 1995-09-05 | Park Scientific Instruments | Optical system for scanning microscope |
| WO1993018525A1 (en) | 1992-03-13 | 1993-09-16 | Park Scientific Instruments Corp. | Scanning probe microscope |
| US5672816A (en) * | 1992-03-13 | 1997-09-30 | Park Scientific Instruments | Large stage system for scanning probe microscopes and other instruments |
| JP3364531B2 (ja) * | 1994-05-31 | 2003-01-08 | 日立建機株式会社 | 光てこ方式の走査型プローブ顕微鏡及び原子間力顕微鏡 |
| JPH10506457A (ja) * | 1994-07-28 | 1998-06-23 | ジェネラル ナノテクノロジー エルエルシー | 走査型プローブ顕微鏡装置 |
| US5948972A (en) * | 1994-12-22 | 1999-09-07 | Kla-Tencor Corporation | Dual stage instrument for scanning a specimen |
| US5705814A (en) * | 1995-08-30 | 1998-01-06 | Digital Instruments, Inc. | Scanning probe microscope having automatic probe exchange and alignment |
| US5666051A (en) * | 1995-10-04 | 1997-09-09 | Thermo King Corporation | System and method for mapping residual surface stresses in a value ring |
| US5955661A (en) * | 1997-01-06 | 1999-09-21 | Kla-Tencor Corporation | Optical profilometer combined with stylus probe measurement device |
| US5854487A (en) | 1997-02-28 | 1998-12-29 | Park Scientific Instruments | Scanning probe microscope providing unobstructed top down and bottom up views |
| US5773824A (en) * | 1997-04-23 | 1998-06-30 | International Business Machines Corporation | Method for improving measurement accuracy using active lateral scanning control of a probe |
| JPH11344500A (ja) * | 1998-06-01 | 1999-12-14 | Olympus Optical Co Ltd | 走査型プローブ顕微鏡 |
| US5939709A (en) * | 1997-06-19 | 1999-08-17 | Ghislain; Lucien P. | Scanning probe optical microscope using a solid immersion lens |
| KR100262628B1 (ko) * | 1997-12-30 | 2000-08-01 | 구자홍 | 고분해능 초전도 양자간섭소자 주사현미경 |
| US6185991B1 (en) | 1998-02-17 | 2001-02-13 | Psia Corporation | Method and apparatus for measuring mechanical and electrical characteristics of a surface using electrostatic force modulation microscopy which operates in contact mode |
| US6169281B1 (en) * | 1998-07-29 | 2001-01-02 | International Business Machines Corporation | Apparatus and method for determining side wall profiles using a scanning probe microscope having a probe dithered in lateral directions |
| WO2001052004A1 (en) * | 2000-01-11 | 2001-07-19 | Electro Scientific Industries, Inc. | Abbe error correction system and method |
| US6847029B2 (en) * | 2000-07-27 | 2005-01-25 | Zetetic Institute | Multiple-source arrays with optical transmission enhanced by resonant cavities |
| US20020092340A1 (en) * | 2000-10-30 | 2002-07-18 | Veeco Instruments Inc. | Cantilever array sensor system |
| US6871527B2 (en) * | 2001-07-18 | 2005-03-29 | The Regents Of The University Of California | Measurement head for atomic force microscopy and other applications |
-
2002
- 2002-02-15 US US10/077,835 patent/US6677567B2/en not_active Expired - Lifetime
- 2002-10-29 KR KR1020020066054A patent/KR100646441B1/ko not_active Expired - Lifetime
- 2002-11-27 EP EP02806801.3A patent/EP1377794B1/en not_active Expired - Lifetime
- 2002-11-27 JP JP2003568346A patent/JP4121961B2/ja not_active Expired - Lifetime
- 2002-11-27 WO PCT/KR2002/002222 patent/WO2003069271A1/en not_active Ceased
- 2002-11-27 AU AU2002356461A patent/AU2002356461A1/en not_active Abandoned
-
2003
- 2003-12-29 US US10/748,827 patent/US6945100B2/en not_active Expired - Lifetime
-
2004
- 2004-01-12 US US10/755,750 patent/US6951129B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003069271A1 (en) | 2003-08-21 |
| KR20030068375A (ko) | 2003-08-21 |
| US20040140426A1 (en) | 2004-07-22 |
| US6677567B2 (en) | 2004-01-13 |
| EP1377794B1 (en) | 2013-08-14 |
| EP1377794A1 (en) | 2004-01-07 |
| JP2005517911A (ja) | 2005-06-16 |
| US6951129B2 (en) | 2005-10-04 |
| AU2002356461A1 (en) | 2003-09-04 |
| US20040140424A1 (en) | 2004-07-22 |
| US6945100B2 (en) | 2005-09-20 |
| KR100646441B1 (ko) | 2006-11-14 |
| US20030155481A1 (en) | 2003-08-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4121961B2 (ja) | 走査型プローブ顕微鏡 | |
| US5440920A (en) | Scanning force microscope with beam tracking lens | |
| KR101410191B1 (ko) | 고속 스캐닝 탐침 현미경 및 그 작동방법 | |
| US5854487A (en) | Scanning probe microscope providing unobstructed top down and bottom up views | |
| US6530268B2 (en) | Apparatus and method for isolating and measuring movement in a metrology apparatus | |
| JP4797150B2 (ja) | 走査機構およびこれを用いた機械走査型顕微鏡 | |
| US5952657A (en) | Atomic force microscope with integrated optics for attachment to optical microscope | |
| US6005251A (en) | Voice coil scanner for use in scanning probe microscope | |
| JP3497734B2 (ja) | 走査型プローブ顕微鏡 | |
| EP1927845A1 (en) | Cantilever holder and scanning probe microscope including the same | |
| US9519005B2 (en) | Scanning mechanism and scanning probe microscope | |
| JP3780028B2 (ja) | 走査型プローブ顕微鏡用の調整治具 | |
| EP3450994B1 (en) | Atomic force microscope with optical guiding mechanism | |
| JP2008051690A (ja) | 光学式変位検出機構及びそれを用いた表面情報計測装置 | |
| JP2002082037A (ja) | 原子間力顕微鏡用光てこ光学系 | |
| JP4262621B2 (ja) | 原子間力顕微鏡 | |
| JP4162508B2 (ja) | 走査型プローブ顕微鏡用の走査機構及び走査型プローブ顕微鏡 | |
| JP4914580B2 (ja) | 走査型プローブ顕微鏡 | |
| JPH05256642A (ja) | 原子間力顕微鏡 | |
| JPH0972924A (ja) | 走査型プローブ顕微鏡 | |
| JPH11230973A (ja) | チップ保持機構 | |
| EP0759537A2 (en) | A scanning force microscope with optical device | |
| JPH11271342A (ja) | 走査型プローブ顕微鏡 | |
| WO1999010705A2 (en) | A scanning probe microscope system removably attached to an optical microscope objective | |
| JPH07159418A (ja) | 走査型プローブ顕微鏡 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060808 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20061108 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20061115 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070207 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071211 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080310 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080408 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080430 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110509 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4121961 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110509 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120509 Year of fee payment: 4 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130509 Year of fee payment: 5 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |