JP4358915B2 - 半導体製造システム - Google Patents
半導体製造システム Download PDFInfo
- Publication number
- JP4358915B2 JP4358915B2 JP06822597A JP6822597A JP4358915B2 JP 4358915 B2 JP4358915 B2 JP 4358915B2 JP 06822597 A JP06822597 A JP 06822597A JP 6822597 A JP6822597 A JP 6822597A JP 4358915 B2 JP4358915 B2 JP 4358915B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- heater
- thermocouple
- measured
- power supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Landscapes
- Control Of Resistance Heating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06822597A JP4358915B2 (ja) | 1997-03-21 | 1997-03-21 | 半導体製造システム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06822597A JP4358915B2 (ja) | 1997-03-21 | 1997-03-21 | 半導体製造システム |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009163640A Division JP5184455B2 (ja) | 2009-07-10 | 2009-07-10 | 半導体製造システム、半導体製造方法、温度制御方法及び半導体製造装置のコントローラ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10270454A JPH10270454A (ja) | 1998-10-09 |
| JPH10270454A5 JPH10270454A5 (2) | 2005-02-17 |
| JP4358915B2 true JP4358915B2 (ja) | 2009-11-04 |
Family
ID=13367665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06822597A Expired - Lifetime JP4358915B2 (ja) | 1997-03-21 | 1997-03-21 | 半導体製造システム |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4358915B2 (2) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4878801B2 (ja) * | 2005-09-26 | 2012-02-15 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法 |
| JP5510991B2 (ja) * | 2007-09-06 | 2014-06-04 | 株式会社日立国際電気 | 半導体製造装置及び基板処理方法 |
| JP2012231145A (ja) * | 2012-05-22 | 2012-11-22 | Hitachi Kokusai Electric Inc | 半導体製造システム、半導体製造方法、温度制御方法、温度制御装置及び半導体製造装置のコントローラ |
| CN113272940B (zh) | 2019-01-07 | 2024-03-26 | 株式会社国际电气 | 基板处理装置、半导体装置的制造方法以及加热器单元 |
| US11056372B2 (en) * | 2019-04-30 | 2021-07-06 | Applied Materials, Inc. | Low temperature biasable substrate support |
| JP7811871B2 (ja) * | 2022-03-23 | 2026-02-06 | 株式会社Screenホールディングス | 熱処理装置 |
| CN119790487A (zh) * | 2022-12-26 | 2025-04-08 | 株式会社国际电气 | 基板处理系统、基板处理装置、半导体器件的制造方法以及程序 |
-
1997
- 1997-03-21 JP JP06822597A patent/JP4358915B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10270454A (ja) | 1998-10-09 |
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