JP4473249B2 - 強誘電分域アレイ構造及びその製造方法、及び該構造を有する強誘電フィルム - Google Patents
強誘電分域アレイ構造及びその製造方法、及び該構造を有する強誘電フィルム Download PDFInfo
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- JP4473249B2 JP4473249B2 JP2006257546A JP2006257546A JP4473249B2 JP 4473249 B2 JP4473249 B2 JP 4473249B2 JP 2006257546 A JP2006257546 A JP 2006257546A JP 2006257546 A JP2006257546 A JP 2006257546A JP 4473249 B2 JP4473249 B2 JP 4473249B2
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- ferroelectric
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
- H10P14/6516—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
- H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3
Landscapes
- Semiconductor Memories (AREA)
- Physical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Description
「Atomic Polarization and Local Reactivity on Ferroelectric Surface: A New Route toward Complex Nanostructure」、Kalinin等、Nano Lett.、2002年、Vlo.2、 No.6、 589〜593 「Nonlinear Photonic Crystals」、Berge、Phys. Rev. Lett.、1998年、Vol.81、No.19、4136〜4139
100 強誘電分域アレイ構造
120 強誘電分域構造
12 強誘電フィルムの表面
20 基板
22 基板の上表面
30 平板電極
40 電圧源
Claims (7)
- 1ナノメートル以上100ナノメートル以下の直径の円形状の輪郭を有し、前記直径が相等しい複数の強誘電分域構造が、隣接する二つの強誘電分域構造の中心の距離を等しくし、かつ、前記中心の距離を1ナノメートル以上100ナノメートル以下として、強誘電フィルム内に三角格子状に緊密に配列された強誘電分域アレイ構造であって、
前記強誘電分域アレイ構造の結晶格子定数が、前記中心の距離と同じであることを特徴とする強誘電分域アレイ構造。
- 前記複数の強誘電分域構造の分極方向は一致であることを特徴とする請求項1に記載の強誘電分域アレイ構造。
- 一つの表面を備え、且つ一定の厚さを有する強誘電フィルムを提供するステップと、
前記強誘電フィルムに、前記表面に垂直なように、1×10 7 〜5×10 8 ボルト/メートルの範囲の一定の電界を印加することにより、前記強誘電フィルム内に、請求項1に記載の強誘電分域アレイ構造を形成するステップと、を備えたことを特徴とする強誘電分域アレイ構造の製造方法。 - 前記強誘電フィルムの形成方法は、分子ビーム・エピタクシー、移動強化エピタクシー、化学ビームエピタクシー、有機金属化学蒸着法、又は有機金属分子ビームエピタクシーを含むことを特徴とする請求項3に記載の強誘電分域アレイ構造の製造方法。
- 前記電界は、一対の平板電極の間に一定の電圧を印加することにより形成することを特徴とする請求項3に記載の強誘電分域アレイ構造の製造方法。
- 前記電圧の最も小さい値の分布範囲は、0.1〜10ボルトであることを特徴とする請求項5に記載の強誘電分域アレイ構造の製造方法。
- 請求項1又は2に記載の強誘電分域アレイ構造を備えることを特徴とする強誘電フィルム。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100375111A CN100561767C (zh) | 2005-09-23 | 2005-09-23 | 铁电畴阵列结构及其制备方法,及具有该结构的铁电膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007096304A JP2007096304A (ja) | 2007-04-12 |
| JP4473249B2 true JP4473249B2 (ja) | 2010-06-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006257546A Expired - Fee Related JP4473249B2 (ja) | 2005-09-23 | 2006-09-22 | 強誘電分域アレイ構造及びその製造方法、及び該構造を有する強誘電フィルム |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7604877B2 (ja) |
| JP (1) | JP4473249B2 (ja) |
| CN (1) | CN100561767C (ja) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0809840D0 (en) * | 2008-05-30 | 2008-07-09 | Univ Catholique Louvain | Ferroelectric organic memories with ultra-low voltage operation |
| CN101913868B (zh) * | 2010-08-06 | 2012-09-26 | 桂林电子科技大学 | 铌酸钾钠织构陶瓷与铌酸钾钠单晶的制备方法 |
| CN102030308B (zh) * | 2010-10-27 | 2012-08-01 | 复旦大学 | 基于铁电薄膜电畴的极化组装微小颗粒有序阵列的方法 |
| CN102173797A (zh) * | 2011-01-28 | 2011-09-07 | 上海海事大学 | 一种合成纳米钽铌酸钾钠粉体的方法 |
| WO2018094397A1 (en) * | 2016-11-21 | 2018-05-24 | The Government Of The United States Of America As Represented By The Secretary Of The Navy | Two-dimensional materials integrated with multiferroic layers |
| CN108560060B (zh) * | 2018-04-18 | 2020-11-27 | 重庆科技学院 | 基于pfm的铌酸锂纳米畴加工及成像方法 |
| CN108987560B (zh) * | 2018-07-25 | 2022-02-01 | 湘潭大学 | 一种基于结晶学工程的具有多级多畴纳米结构的钙钛矿铁电薄膜及其制备方法 |
| CN111547676B (zh) * | 2020-04-10 | 2023-06-02 | 华南师范大学 | 一种新型铁电涡旋态纳米岛阵列的制备方法 |
| CN113943978B (zh) * | 2021-10-13 | 2022-06-14 | 南开大学 | 铌酸锂晶体畴结构的制备方法、光电器件 |
| CN114262939B (zh) * | 2021-11-12 | 2022-12-23 | 济南量子技术研究院 | 一种周期极化钽铌酸钾晶体及其制备方法 |
| CN115850779B (zh) * | 2022-12-02 | 2024-04-02 | 浙江大学 | 一种具有微纳阵列结构的聚偏氟乙烯基铁电薄膜的制备方法及其产品和应用 |
| CN116314449B (zh) * | 2023-02-27 | 2025-06-13 | 复旦大学 | 一种基于平板电容器模型的柔性铁电纳米薄膜极化方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3970959A (en) * | 1973-04-30 | 1976-07-20 | The Regents Of The University Of California | Two dimensional distributed feedback devices and lasers |
| US5800767A (en) * | 1994-09-16 | 1998-09-01 | The Board Of Trustees Of The Leland Stanford Junior University | Electric field domain patterning |
| CN1172367A (zh) * | 1996-07-31 | 1998-02-04 | 南京大学 | 准周期微米超晶格的制备方法及其在激光变频方面的应用 |
| CN1065571C (zh) * | 1996-12-13 | 2001-05-09 | 南京大学 | 一种用电场诱导铌酸锂铁电薄膜取向生长的方法及装置 |
| AU2002353619A1 (en) * | 2002-11-16 | 2004-06-15 | Key Sung Metal Co., Ltd. | Piezoelectric ceramics crystal-oriented under electric field and method of manufacturing the same |
| TWI297802B (en) * | 2003-03-27 | 2008-06-11 | Univ Nat Taiwan | Method of fabricating two-dimensional ferroelectric nonlinear crystals with periodically inverted domains |
| US7741633B2 (en) * | 2005-12-31 | 2010-06-22 | Sungkyunkwan University Foundation For Corporate Collaboration | Ferroelectric oxide artificial lattice, method for fabricating the same and ferroelectric storage medium for ultrahigh density data storage device |
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- 2005-09-23 CN CNB2005100375111A patent/CN100561767C/zh not_active Expired - Fee Related
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- 2006-05-10 US US11/432,240 patent/US7604877B2/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| CN1937274A (zh) | 2007-03-28 |
| US20070072010A1 (en) | 2007-03-29 |
| CN100561767C (zh) | 2009-11-18 |
| US7604877B2 (en) | 2009-10-20 |
| JP2007096304A (ja) | 2007-04-12 |
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