JP4576437B2 - 荷電粒子加速装置 - Google Patents
荷電粒子加速装置 Download PDFInfo
- Publication number
- JP4576437B2 JP4576437B2 JP2008035441A JP2008035441A JP4576437B2 JP 4576437 B2 JP4576437 B2 JP 4576437B2 JP 2008035441 A JP2008035441 A JP 2008035441A JP 2008035441 A JP2008035441 A JP 2008035441A JP 4576437 B2 JP4576437 B2 JP 4576437B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- discharge
- charged particle
- acceleration
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/004—Charge control of objects or beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0473—Changing particle velocity accelerating
- H01J2237/04735—Changing particle velocity accelerating with electrostatic means
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Description
2 外側電極
3 絶縁管
4 分割抵抗
5 加速電源
6 加熱電源
7 引出電圧発生電源
8 引き出し電源
9 陰極
10 陽極
11 電子軌跡
12 セラミックス
100 電子ビーム
101 電子銃
102 加速管
103 収束レンズ
104 試料
105 対物レンズ
106 中間レンズ
107 投影レンズ
108 蛍光板
109 観察窓
110 カメラ室
Claims (3)
- 荷電粒子を加速させる荷電粒子加速装置であって、
電圧を印加され、電界を発生させる複数の加速電極を有し、前記加速電極は金属または合金よりなり、前記加速電極の少なくとも一部が放電抑制層により被覆されており、
前記放電抑制層は、80重量%以上のAl2O3と、当該Al 2 O 3 に混入された1重量%以上20重量%以下のTiO2またはTiCとを含有するセラミックスであることを特徴とする荷電粒子加速装置。 - 荷電粒子を加速させる荷電粒子加速装置であって、
電圧を印加され、電界を発生させる複数の加速電極を有し、前記加速電極は金属または合金よりなり、前記加速電極の少なくとも一部が放電抑制層により被覆されており、
前記放電抑制層は、80重量%以上のAl2O3を含有するセラミックスであり、
前記放電抑制層の電気抵抗率は、108Ω*cm以上1015Ω*cm以下であることを特徴とする荷電粒子加速装置。 - 請求項1ないし2のいずれかに記載された荷電粒子加速装置であって、
前記加速電極は真空中に配置されていることを特徴とする荷電粒子加速装置。
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008035441A JP4576437B2 (ja) | 2008-02-18 | 2008-02-18 | 荷電粒子加速装置 |
| US12/388,135 US8067907B2 (en) | 2008-02-18 | 2009-02-18 | Charged particle accelerator |
| US13/268,193 US8659243B2 (en) | 2008-02-18 | 2011-10-07 | Charged particle accelerator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008035441A JP4576437B2 (ja) | 2008-02-18 | 2008-02-18 | 荷電粒子加速装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010115882A Division JP4691610B2 (ja) | 2010-05-20 | 2010-05-20 | 電子顕微鏡 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009193896A JP2009193896A (ja) | 2009-08-27 |
| JP4576437B2 true JP4576437B2 (ja) | 2010-11-10 |
Family
ID=41052918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008035441A Expired - Fee Related JP4576437B2 (ja) | 2008-02-18 | 2008-02-18 | 荷電粒子加速装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8067907B2 (ja) |
| JP (1) | JP4576437B2 (ja) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009048400A1 (de) * | 2009-10-06 | 2011-04-14 | Siemens Aktiengesellschaft | HF-Resonatorkavität und Beschleuniger |
| DE102010009024A1 (de) * | 2010-02-24 | 2011-08-25 | Siemens Aktiengesellschaft, 80333 | HF-Resonatorkavität und Beschleuniger |
| JP5023199B2 (ja) | 2010-07-29 | 2012-09-12 | 株式会社日立ハイテクノロジーズ | 荷電粒子線放射装置 |
| US8558486B2 (en) * | 2010-12-08 | 2013-10-15 | Gtat Corporation | D. c. Charged particle accelerator, a method of accelerating charged particles using d. c. voltages and a high voltage power supply apparatus for use therewith |
| US8723452B2 (en) | 2010-12-08 | 2014-05-13 | Gtat Corporation | D.C. charged particle accelerator and a method of accelerating charged particles |
| TWI585880B (zh) * | 2011-11-10 | 2017-06-01 | 應用材料股份有限公司 | 透過雷射繞射測量3d半導體結構之溫度的設備及方法 |
| US9320128B2 (en) * | 2012-03-29 | 2016-04-19 | Schlumberger Technology Corporation | Well-logging apparatus with ring-shaped resistors and related methods |
| JP5959326B2 (ja) * | 2012-06-11 | 2016-08-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置 |
| WO2021203196A1 (en) | 2020-04-08 | 2021-10-14 | Best Theratronics, Ltd. | 70 mev to 150 mev cyclotron dedicated for medical treatment including a robotic chair/table |
| CN111683451A (zh) * | 2020-06-22 | 2020-09-18 | 北京卫星环境工程研究所 | 用于中高层大气原位探测载荷的微型带电粒子加速装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3694689A (en) * | 1971-02-24 | 1972-09-26 | Tektronix Inc | Electron beam deflection apparatus |
| US4879518A (en) * | 1987-10-13 | 1989-11-07 | Sysmed, Inc. | Linear particle accelerator with seal structure between electrodes and insulators |
| JP2898658B2 (ja) * | 1989-08-28 | 1999-06-02 | 株式会社日立製作所 | 多段加速方式荷電粒子線加速装置 |
| JPH03133100A (ja) * | 1989-10-17 | 1991-06-06 | Toshiba Corp | 多連高周波加速空胴 |
| JPH0746530B2 (ja) * | 1992-12-08 | 1995-05-17 | 学校法人立命館 | 加速管用高耐電圧絶縁物およびその製造法 |
| JPH06203996A (ja) | 1993-01-07 | 1994-07-22 | Shimadzu Corp | 加速管 |
| JPH1013102A (ja) * | 1996-06-20 | 1998-01-16 | Toshiba Corp | 高周波透過窓構体およびその製造方法 |
| US5811944A (en) * | 1996-06-25 | 1998-09-22 | The United States Of America As Represented By The Department Of Energy | Enhanced dielectric-wall linear accelerator |
| JPH1092363A (ja) | 1996-09-19 | 1998-04-10 | Jeol Ltd | 電子線用加速管 |
| JP2001099995A (ja) * | 1999-09-29 | 2001-04-13 | Koichi Kobayashi | レーザ光の閉じ込め方法及びこの方法を用いたレーザ光閉じ込め装置ならびに該装置を用いたタンデム型加速器の荷電変換装置、イオン化装置 |
| US7888891B2 (en) * | 2004-03-29 | 2011-02-15 | National Cerebral And Cardiovascular Center | Particle beam accelerator |
| JP4673212B2 (ja) | 2005-12-28 | 2011-04-20 | 株式会社日立メディコ | 直流高電圧真空装置 |
| JP2008226683A (ja) * | 2007-03-14 | 2008-09-25 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
| JP2008262713A (ja) | 2007-04-10 | 2008-10-30 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
-
2008
- 2008-02-18 JP JP2008035441A patent/JP4576437B2/ja not_active Expired - Fee Related
-
2009
- 2009-02-18 US US12/388,135 patent/US8067907B2/en not_active Expired - Fee Related
-
2011
- 2011-10-07 US US13/268,193 patent/US8659243B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009193896A (ja) | 2009-08-27 |
| US20120025741A1 (en) | 2012-02-02 |
| US8067907B2 (en) | 2011-11-29 |
| US20090224701A1 (en) | 2009-09-10 |
| US8659243B2 (en) | 2014-02-25 |
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